专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

11. 发明授权

US07747109B2 MEMS device having support structures configured to minimize stress-related deformation and methods for fabricating same 有权
标题翻译：具有构造成使应力相关变形最小化的支撑结构的MEMS器件及其制造方法
公开(公告)号：US07747109B2
公开(公告)日：2010-06-29
申请号：US11506594
申请日：2006-08-18
申请人： Fan Zhong , Lior Kogut
发明人： Fan Zhong , Lior Kogut
IPC分类号： G02F1/01
CPC分类号： G02B26/0841 , B81B3/0072 , B81B2201/047 , B81B2203/0163 , B81B2203/019 , B81B2203/0307 , B81B2203/053 , B81C1/00142 , B81C1/00666 , B81C2201/0167 , G02B26/001 , Y10S359/90
摘要： Embodiments of MEMS devices include a movable layer supported by overlying support structures, and may also include underlying support structures. In one embodiment, the residual stresses within the overlying support structures and the movable layer are substantially equal. In another embodiment, the residual stresses within the overlying support structures and the underlying support structures are substantially equal. In certain embodiments, substantially equal residual stresses are be obtained through the use of layers made from the same materials having the same thicknesses. In further embodiments, substantially equal residual stresses are obtained through the use of support structures and/or movable layers which are mirror images of one another.
摘要翻译： MEMS器件的实施例包括由上覆的支撑结构支撑的可移动层，并且还可以包括下面的支撑结构。在一个实施例中，覆盖的支撑结构和可移动层内的残余应力基本相等。在另一个实施例中，上覆支撑结构和下面的支撑结构内的残余应力基本相等。在某些实施例中，通过使用由具有相同厚度的相同材料制成的层，可以获得基本相等的残余应力。在另外的实施例中，通过使用作为彼此的镜像的支撑结构和/或可移动层来获得基本相等的残余应力。

12. 发明授权

US07969638B2 Device having thin black mask and method of fabricating the same 有权
标题翻译：具有薄黑色掩模的装置及其制造方法
公开(公告)号：US07969638B2
公开(公告)日：2011-06-28
申请号：US12101073
申请日：2008-04-10
申请人： Gang Xu , Chun-Ming Wang , Fan Zhong , Qi Luo
发明人： Gang Xu , Chun-Ming Wang , Fan Zhong , Qi Luo
IPC分类号： G02F1/03 , G02B27/00
CPC分类号： G02B5/003 , G02B5/201 , G02B26/001
摘要： A thin black mask is created using a single mask process. A dielectric layer is deposited over a substrate. An absorber layer is deposited over the dielectric layer and a reflector layer is deposited over the absorber layer. The absorber layer and the reflector layer are patterned using a single mask process.
摘要翻译：使用单个掩码进程创建一个细黑色掩模。介电层沉积在衬底上。在电介质层上沉积吸收层，在吸收层上沉积反射层。使用单个掩模工艺对吸收层和反射层进行构图。

13. 发明申请

US20090257105A1 DEVICE HAVING THIN BLACK MASK AND METHOD OF FABRICATING THE SAME 有权
标题翻译：具有黑色掩模的装置及其制造方法
公开(公告)号：US20090257105A1
公开(公告)日：2009-10-15
申请号：US12101073
申请日：2008-04-10
申请人： Gang Xu , Chun-Ming Wang , Fan Zhong , Qi Luo
发明人： Gang Xu , Chun-Ming Wang , Fan Zhong , Qi Luo
IPC分类号： G02B26/00
CPC分类号： G02B5/003 , G02B5/201 , G02B26/001
摘要： A thin black mask is created using a single mask process. A dielectric layer is deposited over a substrate. An absorber layer is deposited over the dielectric layer and a reflector layer is deposited over the absorber layer. The absorber layer and the reflector layer are patterned using a single mask process.
摘要翻译：使用单个掩码进程创建一个细黑色掩模。介电层沉积在衬底上。在电介质层上沉积吸收层，在吸收层上沉积反射层。使用单个掩模工艺对吸收层和反射层进行构图。

14. 发明授权

US09134527B2 Pixel via and methods of forming the same 有权
标题翻译：像素通道和形成方法
公开(公告)号：US09134527B2
公开(公告)日：2015-09-15
申请号：US13079599
申请日：2011-04-04
申请人： Hojin Lee , Fan Zhong , Yi Tao
发明人： Hojin Lee , Fan Zhong , Yi Tao
IPC分类号： G02B26/00 , B81B7/00
CPC分类号： G02B26/001 , B81B7/0006 , B81B2201/047 , Y10T29/49002
摘要： This disclosure provides systems, methods and apparatuses for pixel vias. In one aspect, a method of forming an electromechanical device having a plurality of pixels includes depositing an electrically conductive black mask on a substrate at each of four corners and along at least one edge region of each pixel, depositing a dielectric layer over the black mask, depositing an optical stack including a stationary electrode over the dielectric layer, and depositing a mechanical layer over the optical stack. The method further includes providing a conductive via in a first pixel of the plurality of pixels, the via disposed in the dielectric layer and electrically connecting the stationary electrode to the black mask, the via disposed in a position along an edge of the first pixel, spaced offset from the edge of the first pixel in a direction towards the center of the first pixel.
摘要翻译：本公开提供了用于像素通孔的系统，方法和装置。在一个方面，一种形成具有多个像素的机电装置的方法包括在四个角中的每一个并且沿着每个像素的至少一个边缘区域在基板上沉积导电黑色掩模，在黑色掩模上沉积介电层在电介质层上沉积包括固定电极的光学堆叠，并在光学堆叠上沉积机械层。所述方法还包括在所述多个像素的第一像素中提供导电通孔，所述通孔设置在所述电介质层中，并且将所述固定电极电连接到所述黑色掩模，所述通孔设置在沿着所述第一像素的边缘的位置，在朝向第一像素的中心的方向上偏离第一像素的边缘。

15. 发明申请

US20140071139A1 IMOD PIXEL ARCHITECTURE FOR IMPROVED FILL FACTOR, FRAME RATE AND STICTION PERFORMANCE 审中-公开
标题翻译：改进填充因子，框架速率和姿态性能的IMOD像素架构
公开(公告)号：US20140071139A1
公开(公告)日：2014-03-13
申请号：US13614973
申请日：2012-09-13
申请人： Kostadin D. Djordjev , Alok Govil , Yi Tao , Fan Zhong
发明人： Kostadin D. Djordjev , Alok Govil , Yi Tao , Fan Zhong
IPC分类号： G06T1/00 , B05D5/12 , G02B26/00 , B05D5/06
CPC分类号： G02B26/001
摘要： Pixels that include display elements that are configured with different structural dimensions corresponding to the color of light they provide are disclosed. In one implementation, a display device includes an array having a plurality of electromechanical pixels disposed on a substrate, each pixel including at least a first display element and a second display element. Each of the first and second display elements interferometrically modulating light by moving a reflective element between a relaxed position spaced apart from the substrate to an actuated position further away from the substrate than the relaxed position by applying a voltage across the reflective element and a stationary electrode. The stationary electrode of each display element is sized to provide actuation of the movable reflective element using the same actuation voltage even though the electrical gap through which the reflective element moves is different within a pixel.
摘要翻译：公开了包括配置有不同结构尺寸的显示元件的像素，其对应于它们提供的光的颜色。在一个实施方式中，显示装置包括具有设置在基板上的多个机电像素的阵列，每个像素至少包括第一显示元件和第二显示元件。第一和第二显示元件中的每一个通过在反射元件和电极之间施加电压使反射元件在与基板间隔开的松弛位置与远离基板的致动位置之间移动而干涉地调制光，。每个显示元件的固定电极的尺寸设置成使用相同的致动电压来提供可移动反射元件的致动，即使反射元件移动的电隙在像素内是不同的。

16. 发明申请

US20130088498A1 ELECTROMECHANICAL SYSTEMS DEVICE WITH NON-UNIFORM GAP UNDER MOVABLE ELEMENT 审中-公开
标题翻译：机电系统装置与可移动元件下的非均匀接缝
公开(公告)号：US20130088498A1
公开(公告)日：2013-04-11
申请号：US13269285
申请日：2011-10-07
申请人： Yi Tao , Kostadin Djordjev , Fan Zhong
发明人： Yi Tao , Kostadin Djordjev , Fan Zhong
IPC分类号： G06T1/00 , G02B26/00 , H01L21/30
CPC分类号： G02B26/001
摘要： Systems, methods and apparatus are provided for electromechanical systems devices having a non-uniform gap under a mechanical layer. An electromechanical systems device includes a movable element supported at its edges over a substrate by at least two support structures. The movable element can be spaced from the substrate by a gap having two or more different heights in two or more corresponding distinct regions. The gap has a first height in a first region below the gap, such as an active area of the device, and a second height in a second region adjacent the support structure. In an interferometric modulator implementation, the second region can be encompasses within an anchor region with a black mask.
摘要翻译：为在机械层下具有不均匀间隙的机电系统装置提供系统，方法和装置。机电系统装置包括通过至少两个支撑结构在其衬底上的边缘处支撑的可移动元件。可移动元件可以在两个或更多个相应的不同区域中与衬底间隔开具有两个或更多个不同高度的间隙。间隙在间隙下方的第一区域中具有第一高度，例如装置的有效面积，以及与支撑结构相邻的第二区域中的第二高度。在干涉式调制器实现中，第二区域可以包围在具有黑色掩模的锚定区域内。

17. 发明授权

US08270056B2 Display device with openings between sub-pixels and method of making same 有权
标题翻译：具有子像素之间的开口的显示装置及其制造方法
公开(公告)号：US08270056B2
公开(公告)日：2012-09-18
申请号：US12409425
申请日：2009-03-23
申请人： Yi Tao , Fan Zhong , Marc Mignard
发明人： Yi Tao , Fan Zhong , Marc Mignard
IPC分类号： G02B26/08 , G02B7/188
CPC分类号： G02B26/001 , B81B3/0086 , B81B2201/047 , B81B2203/053 , B81B2207/053
摘要： An electromechanical systems device includes a plurality of supports disposed over a substrate and a deformable reflective layer disposed over the plurality of supports. The deformable reflective layer includes a plurality of substantially parallel columns extending in a first direction. Each column has one or more slots extending in a second direction generally perpendicular to the first direction. The slots can be created at boundary edges of sub-portions of the columns so as to partially mechanically separate the sub-portions without electrically disconnecting them. A method of fabricating an electromechanical device includes depositing an electrically conductive deformable reflective layer over a substrate, removing one or more portions of the deformable layer to form a plurality of electrically isolated columns, and forming at least one crosswise slot in at least one of the columns.
摘要翻译：机电系统装置包括设置在基板上的多个支撑件和设置在多个支撑件上的可变形反射层。可变形反射层包括沿第一方向延伸的多个大致平行的列。每列具有一个或多个槽，其大致垂直于第一方向在第二方向上延伸。可以在列的子部分的边界边缘处创建槽，以便部分地机械地分离子部分而不断开它们。制造机电装置的方法包括在衬底上沉积导电的可变形反射层，去除可变形层的一个或多个部分以形成多个电隔离的柱，并且在至少一个列。

18. 发明申请

US20120194496A1 APPARATUS AND METHOD FOR SUPPORTING A MECHANICAL LAYER 审中-公开
标题翻译：用于支持机械层的装置和方法
公开(公告)号：US20120194496A1
公开(公告)日：2012-08-02
申请号：US13019159
申请日：2011-02-01
申请人： Fan Zhong , David Heald , Wenyu Sun , Chuan Pu , Chandra Tupelly
发明人： Fan Zhong , David Heald , Wenyu Sun , Chuan Pu , Chandra Tupelly
IPC分类号： G06F3/038 , G02B26/00 , H02N11/00 , B05D5/12 , C03C15/00
CPC分类号： G02B26/001
摘要： This disclosure provides systems, methods and apparatuses for supporting a mechanical layer. In one aspect, an electromechanical systems device includes a substrate, a mechanical layer, and a post positioned on the substrate for supporting the mechanical layer. The mechanical layer is spaced from the substrate and defines one side of a gap between the mechanical layer and the substrate, and the mechanical layer is movable in the gap between an actuated position and a relaxed position. The post includes a wing portion in contact with a portion of the mechanical layer, the wing portion positioned between the gap and the mechanical layer. The wing portion can include a plurality of layers configured to control the curvature of the mechanical layer.
摘要翻译：本公开提供了用于支撑机械层的系统，方法和装置。在一个方面，机电系统装置包括基板，机械层和位于基板上用于支撑机械层的柱。机械层与衬底间隔开并且限定机械层和衬底之间的间隙的一侧，并且机械层可以在致动位置和松弛位置之间的间隙中移动。该柱包括与机械层的一部分接触的翼部，翼部位于间隙和机械层之间。机翼部分可以包括被配置为控制机械层的曲率的多个层。

19. 发明授权

US07609917B2 Method and apparatus for controlling waveguide birefringence by selection of a waveguide core width for a top cladding 有权
标题翻译：通过选择顶部包层的波导芯宽度来控制波导双折射的方法和装置
公开(公告)号：US07609917B2
公开(公告)日：2009-10-27
申请号：US12079930
申请日：2008-03-28
申请人： Farnaz Parhami , Liang Zhao , Fan Zhong
发明人： Farnaz Parhami , Liang Zhao , Fan Zhong
IPC分类号： G02B6/12 , G02B6/10 , G02B6/34
CPC分类号： G02B6/12023 , G02B6/126
摘要： A method and apparatus for controlling waveguide birefringence by selection of a waveguide core width for a tuned top clad is described herein. In one example, a dopant concentration within a top cladding material is between 3-6% (wt.). Given a tuned top cladding composition, a width of the waveguide core is pre-selected such that birefringence is minimized, i.e., a zero, or near zero. The desirable width of the waveguide core is determined by calculating the distribution of stress in the top cladding over a change in temperature. From this distribution of stress, a relationship between the polarization dependent wavelength and variable widths of the waveguide in the arrayed waveguide grating are determined. This relationship determines a zero value, or near zero value, of polarization dependent wavelength for a given range of waveguide widths. Accordingly, the width of the waveguide may be selected such that the polarization dependent wavelength is minimized.
摘要翻译：本文描述了通过选择用于调谐顶部包层的波导芯宽度来控制波导双折射的方法和装置。在一个实例中，顶部包层材料内的掺杂剂浓度在3-6％（重量）之间。给定一个调整的顶部包层组成，预先选择波导芯的宽度，使得双折射最小化，即零或接近零。通过计算在顶部包层中的应力在温度变化中的分布来确定波导芯的期望宽度。根据这种应力分布，确定阵列波导光栅中波导的偏振相关波长与可变宽度之间的关系。对于给定的波导宽度范围，该关系确定偏振相关波长的零值或近零值。因此，可以选择波导的宽度使得偏振相关波长最小化。

20. 发明申请

US20070047889A1 GeBPSG top clad for a planar lightwave circuit 有权
标题翻译： GeBPSG顶部包层用于平面光波电路
公开(公告)号：US20070047889A1
公开(公告)日：2007-03-01
申请号：US11591085
申请日：2006-11-01
申请人： Fan Zhong , Michael Lennon
发明人： Fan Zhong , Michael Lennon
IPC分类号： G02B6/10
CPC分类号： C23C16/401 , G02B6/122 , G02B2006/121
摘要： A method of depositing a top clad layer for an optical waveguide of a planar lightwave circuit. A GeBPSG top clad layer for an optical waveguide structure of a planar lightwave circuit is fabricated such that the top clad layer comprises doped silica glass, wherein the dopant includes Ge (Germanium), P (Phosphorus), and B (Boron). In depositing a top clad layer for the optical waveguide, three separate doping gasses (e.g., GeH4, PH3, and B2H6) are added during the PECVD (plasma enhanced chemical vapor deposition) process to make Ge, P and B doped silica glass (GeBPSG). The ratio of the Ge, P, and B dopants is configured to reduce the formation of crystallization areas within the top clad layer and maintain a constant refractive index within the top clad layer across an anneal temperature range. A thermal anneal process for the top clad layer can be a temperature within a range of 950 C to 1050 C. The GeBPSG top clad layer reduces the insertion loss of passive arrayed waveguide grating devices and active planar lightwave circuit devices.
摘要翻译：一种沉积用于平面光波电路的光波导的顶包层的方法。制造用于平面光波电路的光波导结构的GeBPSG顶包层，使得顶包层包括掺杂的石英玻璃，其中掺杂剂包括Ge（锗），P（磷）和B（硼）。在沉积用于光波导的顶部包覆层时，三个单独的掺杂气体（例如，GeH 4，PH 3 3和B 2 H）在PECVD（等离子体增强化学气相沉积）工艺中添加制备Ge，P和B掺杂的石英玻璃（GeBPSG）的工艺。 Ge，P和B掺杂剂的比例被配置为减少顶部包层内的结晶区域的形成，并且在整个退火温度范围内在顶部包覆层内保持恒定的折射率。用于顶部包层的热退火工艺可以是在950℃至1050℃范围内的温度.GeBPSG顶部包层降低了无源阵列波导光栅器件和有源平面光波电路器件的插入损耗。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式