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11. 发明授权

US06424048B1 Semiconductor chip, semiconductor device, circuit board and electronic equipment and production methods for them 有权
标题翻译：半导体芯片，半导体器件，电路板及电子设备及其生产方法
公开(公告)号：US06424048B1
公开(公告)日：2002-07-23
申请号：US09601411
申请日：2000-08-14
申请人： Kazushige Umetsu , Jun Amako , Shinichi Yotsuya , Katsuji Arakawa
发明人： Kazushige Umetsu , Jun Amako , Shinichi Yotsuya , Katsuji Arakawa
IPC分类号： H01L2940
CPC分类号： B23K26/06 , B23K26/064 , B23K26/0643 , B23K26/0648 , B23K26/0665 , H01L21/486 , H01L21/76898 , H01L23/481 , H01L25/0657 , H01L25/50 , H01L2223/54453 , H01L2224/16 , H01L2225/06513 , H01L2225/06541 , H01L2924/00014 , H01L2224/0401
摘要： A semiconductor chip having a vertical current conduction structure of a high aspect ratio and high reliability: a semiconductor device, a circuit substrate, and an electronic apparatus each containing such semiconductor chips; and a method for producing them. A prehole (3) is formed in a silicon substrate (10) surface-oriented to a (100) face by laser beam irradiation. The prehole (3) is enlarged by anisotropic etching to thereby form a through-hole (4). An electrically insulating film is formed on an inner wall of the through-hole (4). An electrically conducting material is provided inside the insulating film to thereby form a metal bump (30).
摘要翻译：具有高纵横比和高可靠性的垂直导电结构的半导体芯片：包含这种半导体芯片的半导体器件，电路基板和电子设备; 及其制造方法。在通过激光束照射对（100）面进行表面取向的硅衬底（10）中形成预孔（3）。通过各向异性蚀刻使预孔（3）扩大，从而形成通孔（4）。在通孔（4）的内壁上形成电绝缘膜。导电材料设置在绝缘膜的内部，从而形成金属凸块（30）。

12. 发明授权

US07637601B2 Droplet discharging head, droplet discharging apparatus, method for manufacturing droplet discharging head and method for manufacturing droplet discharging apparatus 失效
标题翻译：液滴喷射头，液滴喷射装置，液滴喷射头的制造方法和液滴喷射装置的制造方法
公开(公告)号：US07637601B2
公开(公告)日：2009-12-29
申请号：US11778276
申请日：2007-07-16
申请人： Kazufumi Oya , Katsuji Arakawa
发明人： Kazufumi Oya , Katsuji Arakawa
IPC分类号： B41J2/045
CPC分类号： B41J2/1631 , B41J2/161 , B41J2/1628 , B41J2/1629 , B41J2/1632 , B41J2/1642
摘要： A droplet discharging head includes: a nozzle substrate that has a plurality of nozzle holes; a cavity substrate that communicates with the nozzle holes and which has a plurality of independent discharge chambers, the discharge chambers generating pressure therein so as to discharge droplets through the nozzle holes; a reservoir substrate that has a reservoir concave section and is provided between the nozzle substrate and the cavity substrate, the reservoir concave section functioning a reservoir, the reservoir being shared for communicating with the discharge chambers; a resin thin film formed on an entire inner surface of the reservoir concave section by film deposition, the resin thin film not being formed in the reservoir substrate on a side of an adhesion interface with the nozzle substrate or the cavity substrate; and a bottom surface of the reservoir concave section functioning a diaphragm section, the diaphragm section including the resin thin film and buffering pressure fluctuation.
摘要翻译：液滴喷射头包括：具有多个喷嘴孔的喷嘴基板; 与喷嘴孔连通并且具有多个独立的排出室的空腔基板，所述排出室在其中产生压力，以便通过喷嘴孔排出液滴; 具有储存器凹部并设置在所述喷嘴基板和所述空腔基板之间的储存器基板，所述储存器凹部用于储存器，所述储存器被共享用于与所述排出室连通; 通过膜沉积在储存器凹部的整个内表面上形成的树脂薄膜，树脂薄膜不在与喷嘴基板或空腔基板的粘合界面的一侧上形成在储存器基板中; 并且所述储存器凹部的底面起隔膜部分的作用，所述隔膜部分包括所述树脂薄膜并缓冲压力波动。

13. 发明申请

US20080309718A1 NOZZLE PLATE, DROPLET DISCHARGE HEAD, METHOD FOR MANUFACTURING THE SAME AND DROPLET DISCHARGE DEVICE 有权
标题翻译：喷嘴板，喷射头卸料头，其制造方法和喷射装置
公开(公告)号：US20080309718A1
公开(公告)日：2008-12-18
申请号：US12120403
申请日：2008-05-14
申请人： Kazufumi Oya , Katsuji Arakawa
发明人： Kazufumi Oya , Katsuji Arakawa
IPC分类号： B41J2/14
CPC分类号： B41J2/1433 , B41J2/162 , B41J2/1628 , B41J2/1629 , B41J2/1631 , B41J2/1632
摘要： A nozzle plate includes a silicon substrate, and a nozzle hole formed in the silicon substrate for discharging a liquid droplet provided with: a first nozzle portion formed perpendicularly to a surface of the silicon substrate; a second nozzle portion formed on a same axis as an axis of the first nozzle portion and having a cross-sectional area that is larger than a cross-sectional area of the first nozzle portion; and an inclined portion having a cross-sectional area gradually increasing from the first nozzle portion to the second nozzle portion.
摘要翻译：喷嘴板包括硅基板和形成在硅基板中的用于排出液滴的喷嘴孔，该液滴设置有垂直于硅基板的表面形成的第一喷嘴部分; 第二喷嘴部分，形成在与第一喷嘴部分的轴线相同的轴线上，并且具有比第一喷嘴部分的横截面面积大的横截面积; 以及具有从第一喷嘴部分到第二喷嘴部分的横截面积逐渐增加的倾斜部分。

14. 发明授权

US07306744B2 Method of manufacturing a nozzle plate 失效
标题翻译：制造喷嘴板的方法
公开(公告)号：US07306744B2
公开(公告)日：2007-12-11
申请号：US11116045
申请日：2005-04-27
申请人： Yoshihide Matsuo , Katsuji Arakawa
发明人： Yoshihide Matsuo , Katsuji Arakawa
IPC分类号： G01D15/00
CPC分类号： B41J2/1632 , B41J2/162 , B41J2/1623 , B41J2/1628 , B41J2/1634 , B41J2/1642 , B41J2/1643 , B41J2/1645 , B41J2/1646
摘要： A method of manufacturing a nozzle plate 2 is disclosed. The nozzle plate 2 has a plurality of nozzle openings 22 through each of which a droplet is adapted to be ejected. The method includes the steps of: preparing a processing substrate (silicon substrate 10) constituted from silicon as a main material, the processing substrate having two major surfaces; providing a supporting substrate 50 for supporting the processing substrate onto one major surface of the processing substrate 50; and forming the plurality of nozzle openings 22 on the other major surface of the processing substrate by subjecting the other major surface of the processing substrate to an etching process while the processing substrate is supported by the supporting substrate 50.
摘要翻译：公开了一种制造喷嘴板2的方法。喷嘴板2具有多个喷嘴开口22，每个喷嘴开口各自喷射液滴。该方法包括以下步骤：制备由硅作为主要材料构成的处理衬底（硅衬底10），处理衬底具有两个主表面; 提供用于将处理基板支撑在处理基板50的一个主表面上的支撑基板50; 并且在处理基板被支撑基板50支撑的同时，通过对处理基板的另一个主表面进行蚀刻处理，在处理基板的另一主表面上形成多个喷嘴开口22。

15. 发明授权

US06563079B1 Method for machining work by laser beam 有权
标题翻译：激光束加工加工方法
公开(公告)号：US06563079B1
公开(公告)日：2003-05-13
申请号：US09673874
申请日：2000-10-23
申请人： Kazushige Umetsu , Jun Amako , Shinichi Yotsuya , Katsuji Arakawa
发明人： Kazushige Umetsu , Jun Amako , Shinichi Yotsuya , Katsuji Arakawa
IPC分类号： B23K2600
CPC分类号： B81C1/00087 , B23K26/009 , B23K26/066 , B23K26/18 , B23K26/384 , B41J2/16 , B41J2/1603 , B41J2/1629 , B41J2/1631 , B41J2/1634 , B41J2/1645 , B81C2201/0143 , H01L21/486 , H01L21/76898 , H01L23/481 , H01L2223/54453 , H01L2224/13 , H01L2224/13009 , H01L2224/14181 , H01L2224/16 , H01L2224/16146 , H01L2224/81
摘要： A method for processing a work in which a processed hole with a high aspect ratio is formed by laser machining. Silicon oxide films (2) are formed as protective films on front and rear surfaces, respectively, of a silicon substrate (1). The silicon substrate (1) is irradiated with a laser light through the protective films (2) to thereby perform a perforating process. Alternatively, the silicon substrate (1) is irradiated with a circularly or randomly polarized laser light. Hence, a processed hole with a high aspect ratio can be obtained. Moreover, the processed hole can be shaped straightly, so that processing accuracy is improved.
摘要翻译：一种通过激光加工形成具有高纵横比的加工孔的工件的处理方法。氧化硅膜（2）分别在硅衬底（1）的前表面和后表面上形成为保护膜。用激光照射硅衬底（1），通过保护膜（2）进行穿孔处理。或者，用圆形或随机偏振的激光照射硅衬底（1）。因此，可以获得具有高纵横比的加工孔。此外，加工孔可以直线成型，从而提高加工精度。

16. 发明授权

US08485640B2 Nozzle plate, droplet discharge head, method for manufacturing the same and droplet discharge device 有权
标题翻译：喷嘴板，液滴喷射头，制造方法和液滴喷射装置
公开(公告)号：US08485640B2
公开(公告)日：2013-07-16
申请号：US12120403
申请日：2008-05-14
申请人： Kazufumi Oya , Katsuji Arakawa
发明人： Kazufumi Oya , Katsuji Arakawa
IPC分类号： B41J2/14
CPC分类号： B41J2/1433 , B41J2/162 , B41J2/1628 , B41J2/1629 , B41J2/1631 , B41J2/1632
摘要： A nozzle plate includes a silicon substrate, and a nozzle hole formed in the silicon substrate for discharging a liquid droplet provided with: a first nozzle portion formed perpendicularly to a surface of the silicon substrate; a second nozzle portion formed on a same axis as an axis of the first nozzle portion and having a cross-sectional area that is larger than a cross-sectional area of the first nozzle portion; and an inclined portion having a cross-sectional area gradually increasing from the first nozzle portion to the second nozzle portion.
摘要翻译：喷嘴板包括硅基板和形成在硅基板中的用于排出液滴的喷嘴孔，该液滴设置有垂直于硅基板的表面形成的第一喷嘴部分; 第二喷嘴部分，形成在与第一喷嘴部分的轴线相同的轴线上，并且具有比第一喷嘴部分的横截面面积大的横截面积; 以及具有从第一喷嘴部分到第二喷嘴部分的横截面积逐渐增加的倾斜部分。

17. 发明申请

US20070200877A1 Method for producing nozzle substrate, method for producing droplet-discharging head, head for discharging droplets, and apparatus for discharging droplets 审中-公开
标题翻译：喷嘴基板的制造方法，液滴喷射头的制造方法，液滴的喷射头，以及液滴喷出装置
公开(公告)号：US20070200877A1
公开(公告)日：2007-08-30
申请号：US11703753
申请日：2007-02-07
申请人： Katsuji Arakawa
发明人： Katsuji Arakawa
IPC分类号： B41J2/01 , G01D15/00
CPC分类号： B41J2/16 , B41J2/1623 , B41J2/1628 , B41J2/1629 , B41J2/1632 , B41J2/1635 , B41J2/1642 , B41J2/1645 , B41J2/1646 , B41J2002/043 , B41J2002/14419
摘要： The present invention includes a step of forming concave portions to be nozzle openings by an etching process on a substrate to be processed, a step of bonding a first support substrate to a surface of the concave-portion-formed process side, a step of subjecting the processed substrate to a thinning process from a surface of an opposite side of a surface bonded to the first support substrate so as to have a desired thickness, thereby opening an end of the concave portion, a step of bonding a second support substrate to a surface of the concave-portion-opened side, a step of separating the first support substrate from the processed substrate and bonding a third support substrate to the separated surface of the processed substrate, and a step of separating the second support substrate from the processed substrate.
摘要翻译：本发明包括通过在待加工基板上的蚀刻工艺形成作为喷嘴开口的凹部的步骤，将第一支撑基板接合到凹部形成的工艺侧的表面的步骤，将处理后的基板从与第一支撑基板接合的表面的相反侧的表面进行变薄处理，以具有期望的厚度，从而打开凹部的端部，将第二支撑基板接合到凹部开口侧的表面，将第一支撑基板与被处理基板分离并将第三支撑基板接合到被处理基板的分离面的工序，以及将第二支撑基板与被处理基板分离的工序。

18. 发明申请

US20060118512A1 Method for manufacturing droplet ejection head, droplet ejection head, and droplet ejection apparatus 有权
标题翻译：液滴喷射头，液滴喷射头和液滴喷射装置的制造方法
公开(公告)号：US20060118512A1
公开(公告)日：2006-06-08
申请号：US11295758
申请日：2005-12-07
申请人： Katsuji Arakawa , Yasutaka Matsumoto
发明人： Katsuji Arakawa , Yasutaka Matsumoto
IPC分类号： G01D15/00
CPC分类号： B41J2/1634 , B41J2/16 , B41J2/1623 , B41J2/1628 , B41J2/1642 , B41J2/1645 , B41J2/1646 , B41J2002/043 , Y10T29/42 , Y10T29/49401 , Y10T156/1056
摘要： A method for manufacturing a droplet ejection head includes a step of forming recessed sections for forming nozzles by etching a first face of a silicon substrate, a step of bonding a support substrate to the first face of the silicon substrate, a step of reducing the thickness of the silicon substrate by processing a second face of the silicon substrate that is opposite to the first face thereof, and a step of removing the support substrate from the silicon substrate after the reduction of the thickness of the silicon substrate. A droplet ejection head manufactured by the method is provided. A droplet ejection apparatus includes the droplet ejection head.
摘要翻译：一种制造液滴喷射头的方法包括：通过蚀刻硅衬底的第一面来形成用于形成喷嘴的凹部的步骤，将支撑衬底接合到硅衬底的第一面的步骤，将厚度减小的步骤通过处理与其第一面相反的硅衬底的第二面，以及在硅衬底的厚度减小之后从硅衬底去除支撑衬底的步骤。提供了通过该方法制造的液滴喷射头。液滴喷射装置包括液滴喷射头。

19. 发明授权

US09170418B2 Variable wavelength interference filter, optical module, optical analysis device, and method for manufacturing variable wavelength interference filter 有权
标题翻译：可变波长干涉滤波器，光学模块，光学分析装置以及制造可变波长干涉滤波器的方法
公开(公告)号：US09170418B2
公开(公告)日：2015-10-27
申请号：US13368625
申请日：2012-02-08
申请人： Katsuji Arakawa , Nozomu Hirokubo , Hiroshi Komatsu
发明人： Katsuji Arakawa , Nozomu Hirokubo , Hiroshi Komatsu
IPC分类号： G02B26/00 , B81B7/00 , G01J3/26
CPC分类号： G02B26/001 , B81B7/0035 , G01J3/26
摘要： A variable wavelength interference filter includes a first substrate having a fixed mirror, a second substrate bonded to the first substrate and having a movable portion and a movable mirror fixed to the movable portion, a third substrate bonded to the second substrate on the side opposite to the first substrate, and an electrostatic actuator which displaces the movable portion in a substrate thickness direction, wherein a penetration hole connecting a light exiting-side space between the first substrate and the second substrate and a light incident-side space between the second substrate and the third substrate to a space outside the filter is formed, and the penetration hole is sealed with a sealant which tightly closes each space in a reduced-pressure state.
摘要翻译：可变波长干涉滤光器包括具有固定反射镜的第一基板，与第一基板接合的第二基板，具有固定到可动部分的可动部分和可动反射镜，第三基板在与第二基板相对的一侧第一基板和静电致动器，其在基板厚度方向上移动可动部，其中，连接第一基板和第二基板之间的出射侧空间的穿透孔和第二基板与第二基板之间的光入射侧空间形成第三基板到过滤器外部的空间，并且用密封剂密封贯通孔，该密封剂在减压状态下紧密地封闭每个空间。

20. 发明申请

US20050269289A1 Method of manufacturing a nozzle plate 失效
标题翻译：制造喷嘴板的方法
公开(公告)号：US20050269289A1
公开(公告)日：2005-12-08
申请号：US11116045
申请日：2005-04-27
申请人： Yoshihide Matsuo , Katsuji Arakawa
发明人： Yoshihide Matsuo , Katsuji Arakawa
IPC分类号： B41J2/135 , B41J2/16 , G11B5/127
CPC分类号： B41J2/1632 , B41J2/162 , B41J2/1623 , B41J2/1628 , B41J2/1634 , B41J2/1642 , B41J2/1643 , B41J2/1645 , B41J2/1646
摘要： A method of manufacturing a nozzle plate 2 is disclosed. The nozzle plate 2 has a plurality of nozzle openings 22 through each of which a droplet is adapted to be ejected. The method includes the steps of: preparing a processing substrate (silicon substrate 10) constituted from silicon as a main material, the processing substrate having two major surfaces; providing a supporting substrate 50 for supporting the processing substrate onto one major surface of the processing substrate 50; and forming the plurality of nozzle openings 22 on the other major surface of the processing substrate by subjecting the other major surface of the processing substrate to an etching process while the processing substrate is supported by the supporting substrate 50.
摘要翻译：公开了一种制造喷嘴板2的方法。喷嘴板2具有多个喷嘴开口22，每个喷嘴开口各自喷射液滴。该方法包括以下步骤：制备由硅作为主要材料构成的处理衬底（硅衬底10），处理衬底具有两个主表面; 提供用于将处理基板支撑在处理基板50的一个主表面上的支撑基板50; 并且在处理基板被支撑基板50支撑的同时，通过对处理基板的另一个主表面进行蚀刻处理，在处理基板的另一主表面上形成多个喷嘴开口22。

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