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    • 11. 发明授权
    • Method for sensing etch of distributed bragg reflector in real time
    • 用于实时感测分布式布拉格反射器的蚀刻的方法
    • US06193900B1
    • 2001-02-27
    • US09143484
    • 1998-08-28
    • Jong Hyeob BaekBun Lee
    • Jong Hyeob BaekBun Lee
    • B24B4900
    • G02B5/1857G02B2006/12104G02B2006/12176
    • A method for sensing the etch of distributed Bragg reflector (called DBR below) in a real time is provided. More particularly, a method for searching informations of etch speed and etch stop step by monitoring the etching procedure in the wet etching method which is a post-process in the semiconductor device manufacturing process. A laser beam is irradiated on the sample sunk in the etching solution during the etching process is on the way. Then, computer measures the intensity of laser beam reflected on the sample, analyzes the periodic signals occurred by its interference and obtains the etching speed of the sample in a real time. The laser provides thermal energy on the sample during wet etching and occurs irregular etching speed on a beam contacting part of sample and non contacting part. Uniform etching speed can be obtained in the entire sample using a convex lens having a suitable focal distance.
    • 提供了用于实时感测分布式布拉格反射器(以下称为DBR)的蚀刻的方法。 更具体地,涉及一种用于通过在半导体器件制造过程中通过监视作为后处理的湿式蚀刻方法中的蚀刻步骤来搜索蚀刻速度和蚀刻停止步骤的信息的方法。 在蚀刻过程中,激光束被照射在蚀刻溶液中沉没的样品上。 然后,计算机测量样品反射的激光束的强度,分析其干涉产生的周期信号,实时获取样品的蚀刻速度。 激光在湿蚀刻期间在样品上提供热能,并在样品和非接触部分的光束接触部分上发生不规则的蚀刻速度。 使用具有合适焦距的凸透镜可以在整个样品中获得均匀的蚀刻速度。
    • 12. 发明授权
    • Method for fabricating grating coupler
    • 光栅耦合器的制作方法
    • US5855669A
    • 1999-01-05
    • US842872
    • 1997-04-17
    • Jong-Hyeob BaekBun Lee
    • Jong-Hyeob BaekBun Lee
    • G02B6/293C30B25/02G02B5/18G02B6/122G02B6/124G02B6/34H01L21/203C30B25/16
    • C30B25/02C30B29/40G02B6/124G02B6/34
    • A grating coupler is formed by growing an optical waveguide layer on a substrate by an epitaxial growing process such as a metalorganic chemical vapor deposition and a molecular beam deposition. The optical waveguide layer has a surface on which a cross-hatch pattern serving as the grating is continuously formed. The optical waveguide layer is formed with a material having a reflective index greater than a reflective index of the substrate or an atmosphere. Specifically, the substrate is formed with GaAs and the optical waveguide layer is formed with InGaAs. Further, the substrate is an on-substrate having an orientation coinciding with a �100! plane, so as to form the optical waveguide layer having continuous cross-hatch patterns on the surface thereof. The spacing between the cross-hatch patterns can be varied according to variation of a growth temperature of the optical waveguide layer.
    • 通过外延生长工艺如金属有机化学气相沉积和分子束沉积在衬底上生长光波导层来形成光栅耦合器。 光波导层具有连续形成用作光栅的交叉影线图案的表面。 光波导层由具有大于基板的反射率或大气的反射率的材料形成。 具体地,基板由GaAs形成,并且光波导层由InGaAs形成。 此外,基板是具有与[100]面重合的取向的基板,从而在其表面上形成具有连续交叉图案的光波导层。 交叉线图案之间的间隔可以根据光波导层的生长温度的变化而变化。