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    • 11. 发明授权
    • Laser with a selectively changed current confining layer
    • 具有选择性改变的电流限制层的激光器
    • US5903588A
    • 1999-05-11
    • US812620
    • 1997-03-06
    • James K. GuenterRalph H. Johnson
    • James K. GuenterRalph H. Johnson
    • H01S5/18H01S5/042H01S5/183H01S3/191
    • H01S5/1833H01S5/18311H01S5/0425H01S5/2081
    • A laser structure is provided with two current confining layers of a material that is subject to oxidation in the presence of an oxidizing agent. The laser structure is shaped to expose edges of the current confining layers to permit the edges to be exposed to the oxidizing agent. The current confining layers are oxidized selectively to create electrically resistive material at the oxidized portions and electrically conductive material at the unoxidized portions. The unoxidized portions of the layers are surrounded by the oxidized and electrically resistive portions in order to direct current from one electrical contact pad by passing through a preselected portion of an active region of the laser. The laser structure can be a vertical cavity surface emitting laser. The device achieves the current confining and directing function without the need to use ion bombardment or implantation to provide the current confining structure within the body of the laser.
    • 激光结构设置有在氧化剂存在下经历氧化的材料的两个电流限制层。 激光结构被成形为暴露电流限制层的边缘以允许边缘暴露于氧化剂。 电流限制层被选择性氧化以在氧化部分处形成电阻材料,并在未氧化部分处形成导电材料。 层的未氧化部分被氧化和电阻部分包围,以便通过穿过激光器的有源区域的预选部分来引导来自一个电接触焊盘的电流。 激光器结构可以是垂直腔表面发射激光器。 该装置实现了当前的限制和引导功能,而不需要使用离子轰击或植入来在激光器的主体内提供电流限制结构。
    • 18. 发明授权
    • Vertical cavity surface emitting laser having multiple top-side contacts
    • 具有多个顶侧触点的垂直腔面发射激光器
    • US08193019B2
    • 2012-06-05
    • US12917449
    • 2010-11-01
    • Ralph H. JohnsonR. Scott PennerJames Robert BiardColby Fitzgerald
    • Ralph H. JohnsonR. Scott PennerJames Robert BiardColby Fitzgerald
    • H01L21/00
    • H01S5/18308H01S5/0425H01S5/18311H01S5/1833H01S5/18341H01S5/18358H01S5/305
    • A VCSEL with undoped mirrors. An essentially undoped bottom DBR mirror is formed on a substrate. A periodically doped first conduction layer region is formed on the bottom DBR mirror. The first conduction layer region is heavily doped at a location where the optical electric field is at about a minimum. An active layer, including quantum wells, is on the first conduction layer region. A periodically doped second conduction layer region is connected to the active layer. The second conduction layer region is heavily doped where the optical electric field is at a minimum. An aperture is formed in the epitaxial structure above the quantum wells. A top mirror coupled to the periodically doped second conduction layer region. The top mirror is essentially undoped and formed in a mesa structure. An oxide is formed around the mesa structure to protect the top mirror during wet oxidation processes.
    • 具有未掺杂镜像的VCSEL。 在基板上形成基本上未掺杂的底部DBR反射镜。 在底部DBR镜上形成周期性掺杂的第一导电层区域。 第一导电层区域在光电场处于最小值的位置处被重掺杂。 包括量子阱的有源层在第一导电层区域上。 周期性掺杂的第二导电层区域连接到有源层。 第二导电层区域是重掺杂的,其中光电场处于最小。 在量子阱上方的外延结构中形成孔径。 耦合到周期性掺杂的第二导电层区域的上反射镜。 顶部镜子基本上是未掺杂的并且形成在台面结构中。 在台面结构周围形成氧化物,以在湿式氧化过程中保护顶镜。