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    • 12. 发明授权
    • Air-gap type FBAR, method for fabricating the same, and filter and duplexer using the same
    • 气隙型FBAR,其制造方法,以及使用该FBAR的过滤器和双工器
    • US07253703B2
    • 2007-08-07
    • US10959313
    • 2004-10-07
    • In-sang SongYun-kwon ParkByeoung-ju HaJun-sik Hwang
    • In-sang SongYun-kwon ParkByeoung-ju HaJun-sik Hwang
    • H03H9/54H03H9/70H03H9/10H03H9/15H03H3/02
    • H03H9/587H03H3/02H03H9/105H03H9/173Y10T29/42
    • An air-gap type thin film bulk acoustic resonator (FBAR) and method for fabricating the same. Also disclosed are a filter and a duplexer employing the air-gap type FBAR. The air-gap type FBAR includes: a first substrate having a cavity part at a predetermined region on its upper surface; a dielectric film stacked on the upper part of the first substrate; a first air gap formed between the first substrate and the dielectric film; a stacked resonance part including a lower electrode/piezoelectric layer/upper electrode formed on the upper part of the dielectric film; a second substrate having a cavity part at a predetermined region on its lower surface and joined to the first substrate; and a second air gap formed between the stacked resonance part and the second substrate. A thin film of predetermined thickness made of a liquid crystal polymer (LCP) may be used as the dielectric film.
    • 气隙式薄膜体声波谐振器(FBAR)及其制造方法。 还公开了采用气隙型FBAR的过滤器和双工器。 气隙式FBAR包括:第一基板,其上表面上的预定区域具有空腔部分; 电介质膜,其堆叠在所述第一基板的上部; 在所述第一基板和所述电介质膜之间形成的第一气隙; 堆叠的共振部分,包括形成在电介质膜的上部的下电极/压电层/上电极; 第二基板,在其下表面上的预定区域具有空腔部分,并且与第一基板接合; 以及在所述层叠的共振部和所述第二基板之间形成的第二气隙。 可以使用由液晶聚合物(LCP)制成的预定厚度的薄膜作为电介质膜。
    • 19. 发明授权
    • Film bulk acoustic resonator having supports and manufacturing method therefore
    • 因此,具有支撑体和制造方法的膜体声谐振器
    • US07095298B2
    • 2006-08-22
    • US10854793
    • 2004-05-27
    • Il-jong SongDuck-hwan KimIn-sang SongYun-kwon ParkByeoung-ju Ha
    • Il-jong SongDuck-hwan KimIn-sang SongYun-kwon ParkByeoung-ju Ha
    • H03H9/54H03H3/02
    • H03H9/172H03H3/02H03H9/0514H03H9/0547Y10T29/42
    • A film bulk acoustic resonator (FBAR) has a support structure, a piezoelectric resonator, and a signal line that is electrically connected, e.g., through a via, to the piezoelectric resonator, all on a semiconductor substrate. Support(s) and/or the via mount the piezoelectric resonator at a predetermined distance from the semiconductor substrate, allowing an ideal shape of the resonator to be realized. The signal line may include a patterned inductor. A capacitor can be formed between the via and the signal line. The resonance characteristics can be enhanced since the substrate loss caused by the driving of the resonator can be prevented due to an air gap formed by the predetermined distance. The resonance frequency can be adjusted by altering the pattern of the inductor, the capacitance of the capacitor and/or the thickness of the piezoelectric layer, also allowing Impedance matching to be readily realized.
    • 薄膜体声波谐振器(FBAR)具有支撑结构,压电谐振器和信号线,其全部在半导体衬底上,例如通过通孔电连接到压电谐振器。 支撑件和/或通孔将压电谐振器安装在离半导体衬底预定距离处,从而实现谐振器的理想形状。 信号线可以包括图案化电感器。 可以在通孔和信号线之间形成电容器。 由于由于由预定距离形成的气隙可以防止由共振器的驱动引起的衬底损耗,所以可以提高谐振特性。 可以通过改变电感器的图案,电容器的电容和/或压电层的厚度来调节谐振频率,并且可以容易地实现阻抗匹配。