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    • 11. 发明授权
    • Microscope and sample observation method
    • 显微镜和样品观察法
    • US07110172B2
    • 2006-09-19
    • US10880100
    • 2004-06-30
    • Hirotoshi TeradaIkuo ArataMasaharu TokiwaHiroshi TanabeShigeru Sakamoto
    • Hirotoshi TeradaIkuo ArataMasaharu TokiwaHiroshi TanabeShigeru Sakamoto
    • G02B21/00
    • G02B21/0016G02B21/33Y10S359/90
    • For a semiconductor device S as an inspected object, there are provided an image acquisition part 1, an optical system 2 including an objective lens 20, and a solid immersion lens (SIL) 3 movable between an insertion position including an optical axis from the semiconductor device S to the objective lens 20 and a standby position off the optical axis. Then observation is carried out in two control modes consisting of a first mode in which the SIL 3 is located at the standby position and in which focusing and aberration correction are carried out based on a refractive index no and a thickness to of a substrate of the semiconductor device S, and a second mode in which the SIL 3 is located at the insertion position and in which focusing and aberration correction are carried out based on the refractive index no and thickness t0 of the substrate, and a refractive index n1, a thickness d1, and a radius of curvature R1 of SIL 3. This provides a microscope and a sample observation method capable of readily performing observation of the sample necessary for an analysis of microstructure or the like of the semiconductor device.
    • 对于作为检查对象的半导体装置S,提供了图像获取部分1,包括物镜20的光学系统2和在包括来自半导体的光轴的插入位置之间可移动的固体浸没透镜(SIL)3 装置S到物镜20和离开光轴的待机位置。 然后在两个控制模式中进行观察,该两种控制模式包括SIL 3位于待机位置的第一模式,并且基于第一模式的基板的折射率no和厚度对其执行聚焦和像差校正 半导体器件S和第二模式,其中SIL 3位于插入位置,并且基于衬底的折射率no和厚度t 0 0进行聚焦和像差校正, 和折射率n 1 1,厚度d 1,以及SIL 3的曲率半径R 1 1。 这提供了能够容易地观察对半导体器件的微细结构等的分析所需的样品的显微镜和样品观察方法。
    • 12. 发明申请
    • Solid immersion lens holder
    • 固体浸没镜头支架
    • US20050094293A1
    • 2005-05-05
    • US10878527
    • 2004-06-29
    • Hiroshi TanabeIkuo ArataHirotoshi Terada
    • Hiroshi TanabeIkuo ArataHirotoshi Terada
    • G02B7/14G02B21/33G02B7/02
    • G02B7/14G02B21/33
    • An arrangement, equipped with a holder 9, which supports a solid immersion lens 3 in the gravity direction with the bottom surface of solid immersion lens 3 being protruded downward through an opening 9b, is provided. With this arrangement, when solid immersion lens 3 is set on an observed object, solid immersion lens 3 is put in a state in which it is raised by the observed object and is made free with respect to holder 9. Also in this state, an excessive pressure will not be applied to the observed object and yet solid immersion lens 3 is put in close contact in conformance with the observed object and temperature drifts at the holder 9 side or the observed object side are cut off from the counterpart side and thus the influences of such temperature drifts are eliminated. A solid immersion lens holder, with which the damaging of the observed object can be eliminated and which enables high-precision observation, is thus provided.
    • 提供了一种装置,其具有保持器9,其在固体浸没透镜3的底面通过开口部分9b向下突出而在重力方向上支撑固体浸没透镜3。 通过这种布置,当固体浸没透镜3设置在观察对象上时,固体浸没透镜3被置于被观察物体升高的状态,并相对于保持器9而自由。 同样在这种状态下,不会对观察到的物体施加过大的压力,并且固体浸没透镜3与观察到的物体保持紧密接触,并且保持器9侧的温度漂移或被观察物体侧被切断 相应的一方,因此消除了这种温度漂移的影响。 因此提供了可以消除观察对象的损坏并且能够进行高精度观察的固体浸没透镜保持器。
    • 14. 发明申请
    • IMMERSION LENS HOLDING DEVICE
    • 倾斜镜头保持装置
    • US20120113534A1
    • 2012-05-10
    • US13375496
    • 2010-05-28
    • Ikuo ArataHirotoshi TeradaToshimichi Ishizuka
    • Ikuo ArataHirotoshi TeradaToshimichi Ishizuka
    • G02B7/02G02B7/04
    • G02B21/33G02B7/16G02B21/248G02B27/32
    • A solid immersion lens supporting device includes a lens holder 30 that holds a solid immersion lens 20 in a free state in which a lens bottom surface 22 protrudes downward through a lower opening 32 so as not to fix the solid immersion lens, and a lens cover 40 which is provided to an upper opening 31 of the lens holder 30, and in which a cover bottom surface 42 on the solid immersion lens 20 side is on a plane perpendicular to an optical axis, the lens cover coming into one-point contact with a spherical lens top surface 21 of the solid immersion lens 20. Further, the lens cover 40 is provided with a positioning portion which is capable of carrying out positioning of the solid immersion lens 20 with respect to the objective lens with reference to an image of the lens cover 40 observed via the objective lens. Thereby, the immersion lens supporting device which is capable of efficiently carrying out movement, installation, and positioning of the immersion lens onto a sample is realized.
    • 固体浸没透镜支撑装置包括:透镜保持器30,其保持固体浸没透镜20处于自由状态,透镜底面22通过下开口32向下突出,以便不固定固体浸没透镜;以及透镜盖 40,其被提供到透镜保持器30的上开口31,并且固体浸没透镜20侧的盖底面42位于与光轴垂直的平面上,透镜盖与 固体浸没透镜20的球面透镜顶表面21.此外,透镜盖40设置有能够相对于物镜执行固体浸没透镜20相对于物镜的定位的定位部分 通过物镜观察透镜盖40。 由此,可以实现能够有效地进行浸渍透镜的移动,安装和定位的浸没透镜支撑装置。
    • 15. 发明授权
    • Semiconductor failure analysis apparatus which acquires a failure observed image, failure analysis method, and failure analysis program
    • 获取故障观察图像,故障分析方法和故障分析程序的半导体故障分析装置
    • US07865012B2
    • 2011-01-04
    • US11586721
    • 2006-10-26
    • Toshiyuki MajimaAkira ShimaseHirotoshi TeradaKazuhiro Hotta
    • Toshiyuki MajimaAkira ShimaseHirotoshi TeradaKazuhiro Hotta
    • G06K9/00
    • G01N21/95607G01N2021/95615
    • A failure analysis apparatus 10 is composed of an inspection information acquirer 11 for acquiring a failure observed image P2 of a semiconductor device, a layout information acquirer 12 for acquiring layout information, and a failure analyzer 13 for analyzing a failure. The failure analyzer 13 extracts as a candidate interconnection for a failure, an interconnection passing an analysis region, out of a plurality of interconnections, using interconnection information to describe a configuration of interconnections in the semiconductor device by a pattern data group of interconnection patterns in respective layers, and, for extracting the candidate interconnection, it performs an equipotential trace of the interconnection patterns using the pattern data group, thereby extracting the candidate interconnection. This substantializes a semiconductor failure analysis apparatus, failure analysis method, and failure analysis program capable of securely and efficiently performing the analysis of the failure of the semiconductor device using the failure observed image.
    • 故障分析装置10由用于获取半导体装置的故障观察图像P2的检查信息获取部11,用于获取布局信息的布局信息获取部12以及用于分析故障的故障分析部13构成。 故障分析器13通过互连信息提取出故障的候选互连,通过分析区域的互连,使用互连信息,以通过相应的互连模式的图案数据组来描述半导体器件中的互连的配置 并且为了提取候选互连,它使用模式数据组来执行互连模式的等势线,从而提取候选互连。 这实现了半导体故障分析装置,故障分析方法和故障分析程序,其能够安全有效地执行使用故障观察图像的半导体器件的故障的分析。
    • 16. 发明授权
    • Fluorescence lifetime distribution image measuring system and its measuring method
    • 荧光寿命分布图像测量系统及其测量方法
    • US07453567B2
    • 2008-11-18
    • US10516076
    • 2003-05-28
    • Haruhisa SaitohHirotoshi Terada
    • Haruhisa SaitohHirotoshi Terada
    • G01J3/30G01J3/28
    • G01N21/6408
    • Pulse excitation light, emitted from a laser light source 10, is scanned in a first direction by a first scanning means 100, scanned in a second direction, perpendicular to the first direction, by a second scanning means 120, converged by an objective optical system 140, and illuminated onto sample 50. Fluorescences, emitted from sample 50, are output from objective optical system 140 to second scanning means 120, scanned in the second direction, perpendicular to the first direction, and output to a light separation means 110 by second scanning means 120, output from light separation means 110 to a streak camera, and recorded as variations of time of the fluorescence intensities by streak camera 30. Fluorescence lifetimes are calculated based on these variations with time of the fluorescence intensities and a fluorescence lifetime distribution image is prepared.
    • 由激光光源10发射的脉冲激发光由第一扫描装置100沿第一方向扫描,第一扫描装置100通过第二扫描装置120沿第二方向垂直于第一方向扫描,由物镜光学系统 140,并照射到样品50上。 从样品50发射的荧光从物镜光学系统140输出到与第一方向垂直扫描的第二扫描装置120,并通过第二扫描装置120输出到光分离装置110,从光分离 意味着110到条纹相机,并且被条纹相机30的荧光强度的时间变化记录下来。 基于荧光强度随时间的变化计算荧光寿命并制备荧光寿命分布图像。
    • 19. 发明申请
    • Microscope and sample observation method
    • 显微镜和样品观察法
    • US20070146871A1
    • 2007-06-28
    • US11711638
    • 2007-02-28
    • Hirotoshi TeradaIkuo Arata
    • Hirotoshi TeradaIkuo Arata
    • G02B21/00
    • G01N21/1717G01N21/8806G01N21/9501G01N2021/0342G02B21/02G02B21/365
    • For a semiconductor device S as a sample of an observed object, there are provided an image acquisition part 1 for carrying out observation of the semiconductor device S, and an optical system 2 comprising an objective lens 20. A solid immersion lens (SIL) 3 for magnifying an image of the semiconductor device S is arranged movable between an insertion position where the solid immersion lens includes an optical axis from the semiconductor device S to the objective lens 20 and is in close contact with a surface of the semiconductor device S, and a standby position off the optical axis. Then an image containing reflected light from SIL 3 is acquired with the SIL 3 at the insertion position, and the insertion position of SIL 3 is adjusted by SIL driver 30, with reference to the image. This realizes a semiconductor inspection apparatus (microscope) capable of readily performing observation of the sample necessary for an analysis of microstructure of a semiconductor device or the like, and a semiconductor inspection method (sample observation method) therewith.
    • 对于作为观察对象的样本的半导体器件S,设置有用于执行半导体器件S的观察的图像获取部分1和包括物镜20的光学系统2.固体浸没透镜(SIL)3 用于放大半导体器件S的图像的布置可以在固体浸没透镜包括从半导体器件S到物镜20的光轴并且与半导体器件S的表面紧密接触的插入位置之间移动,以及 离开光轴的待机位置。 然后,通过SIL 3在插入位置获取包含来自SIL 3的反射光的图像,并且参考图像,通过SIL驱动器30调整SIL 3的插入位置。 这实现了能够容易地观察对半导体装置等的微结构进行分析所需的样品的半导体检查装置(显微镜)以及半导体检查方法(样本观察方法)。
    • 20. 发明申请
    • Fluorescence lifetime distribution image measuring system and its measuring method
    • 荧光寿命分布图像测量系统及其测量方法
    • US20050157292A1
    • 2005-07-21
    • US10516076
    • 2003-05-28
    • Haruhisa SaitohHirotoshi Terada
    • Haruhisa SaitohHirotoshi Terada
    • G01N21/64
    • G01N21/6408
    • Pulse excitation light, emitted from a laser light source 10, is scanned in a first direction by a first scanning means 100, scanned in a second direction, perpendicular to the first direction, by a second scanning means 120, converged by an objective optical system 140, and illuminated onto sample 50. Fluorescences, emitted from sample 50, are output from objective optical system 140 to second scanning means 120, scanned in the second direction, perpendicular to the first direction, and output to a light separation means 110 by second scanning means 120, output from light separation means 110 to a streak camera, and recorded as variations of time of the fluorescence intensities by streak camera 30. Fluorescence lifetimes are calculated based on these variations with time of the fluorescence intensities and a fluorescence lifetime distribution image is prepared.
    • 由激光光源10发射的脉冲激发光由第一扫描装置100沿第一方向扫描,第一扫描装置100通过第二扫描装置120沿第二方向垂直于第一方向扫描,由物镜光学系统 140,并照射到样品50上。 从样品50发射的荧光从物镜光学系统140输出到与第一方向垂直扫描的第二扫描装置120,并通过第二扫描装置120输出到光分离装置110,从光分离 意味着110到条纹相机,并且被条纹相机30的荧光强度的时间变化记录下来。 基于荧光强度随时间的变化计算荧光寿命并制备荧光寿命分布图像。