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11. 发明申请

US20050230834A1 Multi-stage curing of low K nano-porous films 有权
标题翻译：低K纳米多孔膜的多阶段固化
公开(公告)号：US20050230834A1
公开(公告)日：2005-10-20
申请号：US11085416
申请日：2005-03-21
申请人： Francimar Schmitt , Yi Zheng , Kang Yim , Sang Ahn , Lester D'Cruz , Dustin Ho , Alexandros Demos , Li-Qun Xia , Derek Witty , Hichem M'Saad
发明人： Francimar Schmitt , Yi Zheng , Kang Yim , Sang Ahn , Lester D'Cruz , Dustin Ho , Alexandros Demos , Li-Qun Xia , Derek Witty , Hichem M'Saad
IPC分类号： C23C16/40 , C23C16/50 , C23C16/56 , H01L21/3105 , H01L21/312 , H01L21/316 , H01L21/469 , H01L21/768 , H01L23/52
CPC分类号： H01L21/76825 , C23C16/401 , C23C16/56 , H01L21/02126 , H01L21/02203 , H01L21/02208 , H01L21/02274 , H01L21/02304 , H01L21/02351 , H01L21/02362 , H01L21/3105 , H01L21/3121 , H01L21/31695 , H01L21/76811 , H01L21/76813 , H01L21/7682 , H01L2221/1047 , Y10T428/249978
摘要： Embodiments in accordance with the present invention relate to multi-stage curing processes for chemical vapor deposited low K materials. In certain embodiments, a combination of electron beam irradiation and thermal exposure steps may be employed to control selective outgassing of porogens incorporated into the film, resulting in the formation of nanopores. In accordance with one specific embodiment, a low K layer resulting from reaction between a silicon-containing component and a non-silicon containing component featuring labile groups, may be cured by the initial application of thermal energy, followed by the application of radiation in the form of an electron beam.
摘要翻译：根据本发明的实施方案涉及用于化学气相沉积的低K材料的多阶段固化方法。在某些实施方案中，可以采用电子束照射和热暴露步骤的组合来控制掺入薄膜中的孔原子的选择性除气，从而形成纳米孔。根据一个具体实施方案，由含硅组分和含有不稳定基团的不含硅组分之间的反应产生的低K层可以通过初始施加热能来固化，随后在形式的电子束。

12. 发明申请

US20060193515A1 Image processing method for removing glasses from color facial images 失效
标题翻译：从彩色面部图像中去除眼镜的图像处理方法
公开(公告)号：US20060193515A1
公开(公告)日：2006-08-31
申请号：US10532658
申请日：2003-05-10
申请人： Hyoung Kim , Sang Ahn , You Hwa Oh
发明人： Hyoung Kim , Sang Ahn , You Hwa Oh
IPC分类号： G06K9/34 , G06K9/03
CPC分类号： G06K9/00275 , G06K9/00228 , G06K9/00281
摘要： An image processing method obtains a glassless image from a color frontal facial image bearing glasses by using a recursive principal component analysis (PCA) reconstruction. The image processing method comprises the steps of a) receiving an RGB color frontal facial image; b) extracting candidates of eye regions from the received RGB color frontal facial image; c) determining an exact eye region out of the candidates and normalizing the received RGB color frontal facial image; d) extracting a glasses frame region by using color information contained in the received RGB color frontal facial image and edge information of a glasses frame; e) performing an RGB-HSI transformation on the normalized frontal facial image; f) generating H′, S′, and I′ glassless compensated images; g) obtaining R′, G′, and B′ compensated images by performing an HSI-RGB transformation on the H′, S′, and I′ glassless compensated images; and h) creating a glassless final color facial image on the basis of the R′, G′, and B′ compensated images.
摘要翻译：图像处理方法通过使用递归主成分分析（PCA）重建从彩色正面面部图像承载眼镜获得无玻璃图像。该图像处理方法包括以下步骤：a）接收RGB彩色正面面部图像; b）从接收到的RGB彩色正面面部图像中提取眼睛区域的候选者; c）确定候选者中的精确眼睛区域并对所接收的RGB彩色正面面部图像进行归一化; d）通过使用包含在所接收的RGB彩色正面面部图像中的颜色信息和眼镜框架的边缘信息来提取眼镜框区域; e）对归一化的正面面部图像执行RGB-HSI变换; f）产生H'，S'和I'玻璃化补偿图像; g）通过对H'，S'和I'无玻璃光补偿的图像执行HSI-RGB变换来获得R'，G'和B'补偿图像; 以及h）基于R'，G'和B'补偿图像创建无玻璃色的最终彩色面部图像。

13. 发明申请

US20060030709A1 PNA monomer and precursor 有权
公开(公告)号：US20060030709A1
公开(公告)日：2006-02-09
申请号：US11182935
申请日：2005-07-15
申请人： Sung Kim , Hyunil Lee , Jong Lim , Hoon Choi , Jae Jeon , Sang Ahn , Sung Lee , Won Yoon
发明人： Sung Kim , Hyunil Lee , Jong Lim , Hoon Choi , Jae Jeon , Sang Ahn , Sung Lee , Won Yoon
IPC分类号： A61K31/522 , C07D473/12 , C07D473/14 , C07D405/14
CPC分类号： C07D417/04 , C07B2200/11 , C07D277/80 , C07D417/12 , C07D417/14 , Y02P20/55
摘要： This application relates to monomers of the general formula (I) for the preparation of PNA (peptide nucleic acid) oligomers and provides method for the synthesis of both predefined sequence PNA oligomers and random sequence PNA oligomers: wherein E is nitrogen or C—R′; J is sulfur or oxygen; R′, R1, R2, R3, R4 is independently H, halogen, alkyl, nitro, nitrile, alkoxy, halogenated alkyl, halogenated alkoxy, phenyl or halogenated phenyl, R5 is H or protected or unprotected side chain of natural or unnatural α-amino acid; and B is a natural or unnatural nucleobase, wherein when said nucleobase has an exocyclic amino function, said function is protected by protecting group which is labile to acids but stable to weak to medium bases in the presence of thiol.

14. 发明申请

US20060003374A1 Method of making PNA oligomers 有权
标题翻译：制备PNA低聚物的方法
公开(公告)号：US20060003374A1
公开(公告)日：2006-01-05
申请号：US11182936
申请日：2005-07-15
申请人： Sung Kim , Hyunil Lee , Jong Lim , Hoon Choi , Jae Jeon , Sang Ahn , Sung Lee , Won Yoon
发明人： Sung Kim , Hyunil Lee , Jong Lim , Hoon Choi , Jae Jeon , Sang Ahn , Sung Lee , Won Yoon
IPC分类号： C12Q1/68 , C07D473/02 , C07D473/14 , C07D43/14
CPC分类号： C07D417/04 , C07B2200/11 , C07D277/80 , C07D417/12 , C07D417/14 , Y02P20/55
摘要： This application relates to monomers of the general formula (I) for the preparation of PNA (peptide nucleic acid) oligomers and provides method for the synthesis of both predefined sequence PNA oligomers and random sequence PNA oligomers: wherein E is nitrogen or C—R′; J is sulfur or oxygen; R′, R1, R2, R3, R4 is independently H, halogen, alkyl, nitro, nitrile, alkoxy, halogenated alkyl, halogenated alkoxy, phenyl or halogenated phenyl, R5 is H or protected or unprotected side chain of natural or unnatural α-amino acid; and B is a natural or unnatural nucleobase, wherein when said nucleobase has an exocyclic amino function, said function is protected by protecting group which is labile to acids but stable to weak to medium bases in the presence of thiol.
摘要翻译：本申请涉及用于制备PNA（肽核酸）寡聚体的通式（I）的单体，并提供合成预定义的序列PNA寡聚体和随机序列PNA寡聚体的方法：其中E为氮或C-R' ; J为硫或氧; R'，R 1，R 2，R 3，R 4独立地是H，卤素，烷基，硝基，腈，烷氧基，卤代烷基，卤代烷氧基，苯基或卤代苯基，R 5是H或被保护或未被保护的天然或非天然α- 氨基酸; 并且B是天然或非天然核碱基，其中当所述核碱基具有环外氨基功能时，所述功能受到在硫醇存在下对酸不稳定但对弱至中碱稳定的保护基保护。

15. 发明申请

US20050233591A1 Techniques promoting adhesion of porous low K film to underlying barrier layer 有权
标题翻译：促进多孔低K膜粘附到底层阻挡层的技术
公开(公告)号：US20050233591A1
公开(公告)日：2005-10-20
申请号：US11046090
申请日：2005-01-28
申请人： Francimar Schmitt , Alexandros Demos , Derek Witty , Hichem M'Sadd , Sang Ahn , Lester D'Cruz , Khaled Elsheref , Zhenjiang Cui
发明人： Francimar Schmitt , Alexandros Demos , Derek Witty , Hichem M'Sadd , Sang Ahn , Lester D'Cruz , Khaled Elsheref , Zhenjiang Cui
IPC分类号： B44C1/22 , C23C16/40 , C23C16/56 , H01L21/302 , H01L21/3105 , H01L21/316 , H01L21/768
CPC分类号： H01L21/31633 , C23C16/401 , C23C16/56 , H01L21/02126 , H01L21/02203 , H01L21/02274 , H01L21/02304 , H01L21/02351 , H01L21/02362 , H01L21/31058 , H01L21/31695 , H01L21/76801 , H01L21/76811 , H01L21/76813 , H01L21/7682 , H01L21/76825 , H01L21/76828 , H01L21/76832 , H01L2221/1047
摘要： Adhesion of a porous low K film to an underlying barrier layer is improved by forming an intermediate layer lower in carbon content, and richer in silicon oxide, than the overlying porous low K film. This adhesion layer can be formed utilizing one of a number of techniques, alone or in combination. In one approach, the adhesion layer can be formed by introduction of a rich oxidizing gas such as O2/CO2/etc. to oxidize Si precursors immediately prior to deposition of the low K material. In another approach, thermally labile chemicals such as alpha-terpinene, cymene, and any other non-oxygen containing organics are removed prior to low K film deposition. In yet another approach, the hardware or processing parameters, such as the manner of introduction of the non-silicon containing component, may be modified to enable formation of an oxide interface prior to low K film deposition. In still another approach, parameters of ebeam treatment such as dosage, energy, or the use of thermal annealing, may be controlled to remove carbon species at the interface between the barrier and the low K film. In a further approach, a pre-treatment plasma may be introduced prior to low k deposition to enhance heating of the barrier interface, such that a thin oxide interface is formed when low K deposition gases are introduced and the low K film is deposited.
摘要翻译：通过与上覆的多孔低K膜形成碳含量较低的中间层和富含氧化硅的多孔低K膜与下面的阻挡层的粘附性得到改善。可以利用单独或组合的多种技术之一形成该粘合层。在一种方法中，粘合层可以通过引入富氧化气体如O 2 / CO 2/2等形成。以在沉积低K材料之前立即氧化Si前体。在另一种方法中，在低K膜沉积之前，除去热不稳定化学品如α-萜品烯，伞花烃和任何其它不含氧的有机物。在另一种方法中，可以修改硬件或处理参数，例如引入非硅含量组分的方式，以使得能够在低K膜沉积之前形成氧化物界面。在另一种方法中，可以控制ebeam处理的参数，例如剂量，能量或使用热退火，以去除阻挡层和低K膜之间的界面处的碳物质。在另一种方法中，可以在低k沉积之前引入预处理等离子体以增强阻挡界面的加热，使得当引入低K沉积气体并沉积低K膜时，形成薄氧化物界面。

16. 发明申请

US20070117050A1 Maintenance of photoresist activity on the surface of dielectric arcs for 90 nm feature sizes 失效
标题翻译：在90nm特征尺寸的介质电弧表面上保持光致抗蚀剂活性
公开(公告)号：US20070117050A1
公开(公告)日：2007-05-24
申请号：US11639274
申请日：2006-12-13
申请人： Sang Ahn , Sudha Rathi , Heraldo Bothelho
发明人： Sang Ahn , Sudha Rathi , Heraldo Bothelho
IPC分类号： G03C5/00
CPC分类号： G03F7/322 , G03F7/091 , G03F7/16
摘要： We have determined that it is necessary to remove hydroxyl groups from the surface of a DARC over which a CAR photoresist is applied, to reduce poisoning of the photoresist during imaging. The poisoning is reduced by treating the surface of the DARC film with a hydrogen or helium-containing plasma which is capable of removing the hydroxyl groups.
摘要翻译：我们已经确定需要从其上涂覆有CAR光致抗蚀剂的DARC的表面除去羟基，以减少成像期间光致抗蚀剂的中毒。通过用能够去除羟基的氢或氦等离子体处理DARC膜的表面来减少中毒。

17. 发明申请

US20070108609A1 Bumped chip carrier package using lead frame and method for manufacturing the same 审中-公开
标题翻译：使用引线框架的凸起芯片载体封装及其制造方法
公开(公告)号：US20070108609A1
公开(公告)日：2007-05-17
申请号：US11518491
申请日：2006-09-11
申请人： In Kang , Sang Ahn
发明人： In Kang , Sang Ahn
IPC分类号： H01L23/48 , H01L21/44
CPC分类号： H01L21/4832 , H01L23/3107 , H01L23/49548 , H01L24/48 , H01L24/83 , H01L2224/05553 , H01L2224/2929 , H01L2224/29339 , H01L2224/48091 , H01L2224/48247 , H01L2224/48465 , H01L2224/73265 , H01L2224/83801 , H01L2224/83851 , H01L2924/00014 , H01L2924/01046 , H01L2924/01078 , H01L2924/01079 , H01L2924/0781 , H01L2924/10161 , H01L2924/14 , H01L2924/15311 , H01L2924/181 , H01L2924/1815 , H01L2924/18301 , H01L2924/3512 , H01L2924/00 , H01L2924/0665 , H01L2224/45099 , H01L2224/45015 , H01L2924/207
摘要： A bumped chip carrier (BCC) package may include a semiconductor chip on which at least one bonding pad is formed, at least one lead frame terminal arranged close to the semiconductor chip, wherein a lower portion of the lead frame terminal is located beneath a bottom side of the semiconductor chip, at least one bonding wire electrically connecting the bonding pad with the lead frame terminal, and a resin mold encapsulating the semiconductor chip, the bonding wire, and an upper portion of the lead frame terminal with a molding resin, wherein the upper portion of the lead frame terminal is electrically connected to the bonding pad by the bonding wire, and the lower portion of lead frame terminal extending beyond the resin mold has a dimple therein.
摘要翻译：凸起的芯片载体（BCC）封装可以包括其上形成有至少一个焊盘的半导体芯片，布置在半导体芯片附近的至少一个引线框架端子，其中引线框架端子的下部位于底部在所述半导体芯片的一侧，将所述接合焊盘与所述引线框端子电连接的至少一个接合线，以及用模制树脂封装所述半导体芯片，所述接合线和所述引线框架端子的上部的树脂模具，其中引线框架端子的上部通过接合线电连接到接合焊盘，并且延伸超过树脂模具的引线框架端子的下部在其中具有凹坑。

18. 发明申请

US20070103457A1 Communication terminal 有权
标题翻译：通讯终端
公开(公告)号：US20070103457A1
公开(公告)日：2007-05-10
申请号：US11546352
申请日：2006-10-12
申请人： Sang Ahn , Jong Lim
发明人： Sang Ahn , Jong Lim
IPC分类号： G09G5/00
CPC分类号： H04M1/0295 , H04M1/0214 , H04M1/0235
摘要： A communication terminal equipped with a sliding-type flat display module includes a main body and a flat display which slides between retracted and extended positions along a first axis relative to the main body and which rotates to a tilted position along a second axis when in the extended position. The first axis may be substantially perpendicular to the second axis. In the retracted position, the flat display is unable to rotate to the tilted position along the second axis. Also, in this position, the display is partially visible to allow information to be read by a user while at the same time being protected within a receiving part of the terminal.
摘要翻译：具有滑动型平板显示模块的通信终端包括主体和平面显示器，其在相对于主体的第一轴线的缩回位置和延伸位置之间滑动，并且当在第二轴线处于第二轴线时旋转到倾斜位置延长位置第一轴线可以基本上垂直于第二轴线。在缩回位置，平面显示器不能沿着第二轴线旋转到倾斜位置。此外，在该位置，显示器是部分可见的，以允许用户读取信息，同时在终端的接收部分内受到保护。

19. 发明申请

US20060140974A1 Method for selectively inhibiting reuptake of serotonin and norepinephrine using yeast extract 有权
标题翻译：使用酵母提取物选择性抑制5-羟色胺和去甲肾上腺素再摄取的方法
公开(公告)号：US20060140974A1
公开(公告)日：2006-06-29
申请号：US11141497
申请日：2005-05-31
申请人： Yun Choe , Il Kang , Hyung Suh , Young Choi , Hee Yun , Kyung Kim , Sang Ahn , Ki Kim , Won Hwang , Jin Kim
发明人： Yun Choe , Il Kang , Hyung Suh , Young Choi , Hee Yun , Kyung Kim , Sang Ahn , Ki Kim , Won Hwang , Jin Kim
IPC分类号： A61K36/064 , A61K36/06
CPC分类号： A61K36/064 , A23L33/145 , A23P20/20 , A23V2002/00 , A61K36/06 , A23V2250/218 , A23V2200/31 , A23V2200/322 , A23V2200/332
摘要： A yeast extract or yeast-derived bioactive peptide having an activity of selectively inhibiting reuptake of serotonin and norepinephrine, which can be effectively used in preventing or treating various diseases related to reuptake of serotonin and norepinephrine, especially depression, anxiety, stress, fatigue and obesity are provided. Also, a yeast extract or yeast-derived bioactive peptide having activities as an anti-stress agent, an anti-fatigue agent, premenstrual syndrome (PMS) and menstrual pain relaxants, and a brain-neurotrophic factor, and a method for preparing the bioactive peptide are provided. The yeast extract or yeast-derived bioactive peptide is effective in relieving stress, nervousness, anxiety, tension, insomnia, fatigue, and imbalance in the autonomic nerve regulation. Therefore, the yeast extract or yeast-derived bioactive peptide is vailable as an anti-depression agent, an anti-anxiety agent, an anti-stress agent, an anti-fatigue agent, an anti-obesity agent, premenstrual syndrome and menstrual pain relaxants, a bain-neurotrophin, and a source of active foods having these activities.
摘要翻译：具有选择性抑制5-羟色胺和去甲肾上腺素再摄取的活性的酵母提取物或酵母衍生生物活性肽，其可有效用于预防或治疗与再摄取5-羟色胺和去甲肾上腺素，特别是抑郁，焦虑，压力，疲劳和肥胖有关的各种疾病被提供。此外，具有活性作为抗应激剂，抗疲劳剂，经前综合征（PMS）和月经痛松弛剂的酵母提取物或酵母衍生的生物活性肽和脑神经营养因子，以及制备生物活性物质的方法提供肽。酵母提取物或酵母衍生的生物活性肽有效缓解压力，紧张，焦虑，紧张，失眠，疲劳，自主神经调节失调。因此，酵母提取物或酵母衍生的生物活性肽作为抗抑郁剂，抗焦虑剂，抗应激剂，抗疲劳剂，抗肥胖剂，经前综合征和月经痛缓解剂，一种贝宁神经营养因子，以及具有这些活性的活性食物的来源。

20. 发明申请

US20050118541A1 Maintenance of photoresist adhesion and activity on the surface of dielectric ARCS for 90 nm feature sizes 审中-公开
标题翻译：保持光刻胶的粘附和活性在介质ARCS表面90纳米特征尺寸
公开(公告)号：US20050118541A1
公开(公告)日：2005-06-02
申请号：US10724454
申请日：2003-11-28
申请人： Sang Ahn , Sudha Rathi , Heraldo Bothelho
发明人： Sang Ahn , Sudha Rathi , Heraldo Bothelho
IPC分类号： G03C5/18 , G03F7/09 , G03F7/16 , G03F7/32
CPC分类号： G03F7/322 , G03F7/091 , G03F7/16
摘要： We have traced the detachment of photoresist during development of patterned features in the range of about 90 nm and smaller to a combination of the reduced “foot print” of the pattern on the underlying substrate and to the contact angle between the underlying substrate surface and the developing reagent. By maintaining a contact angle of about 30 degrees or greater, the detachment of the photoresist from the underlying substrate can be avoided for photoresists including feature sizes in the range of about 90 nm. We have achieved an increased contact angle between the DARC surface and a water-based CAR photoresist developer while simultaneously reducing CAR poisoning by treating the surface of the DARC after film formation.
摘要翻译：我们已经在大约90nm和更小范围内的图案化特征的显影过程中追踪了光致抗蚀剂的分离，使得在下面的衬底上的图案的减少的“脚印”与下面的衬底表面之间的接触角的组合开发试剂。通过保持大约30度或更大的接触角，可以避免光致抗蚀剂从下面的衬底上的分离，所述光致抗蚀剂包括在约90nm范围内的特征尺寸。我们已经实现了DARC表面和水性CAR光刻胶显影剂之间的增加的接触角，同时通过在成膜后处理DARC的表面同时减少CAR中毒。

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