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11. 发明授权

US09715171B2 Imprint lithographic apparatus and imprint lithographic method 有权
公开(公告)号：US09715171B2
公开(公告)日：2017-07-25
申请号：US12964459
申请日：2010-12-09
申请人： Hans Butler , Johannes Petrus Martinus Bernardus Vermeulen , Marc Wilhelmus Maria Van Der Wijst , Jeroen Pieter Starreveld , Cornelius Adrianus Lambertus De Hoon , Francois Xavier Debiesme
发明人： Hans Butler , Johannes Petrus Martinus Bernardus Vermeulen , Marc Wilhelmus Maria Van Der Wijst , Jeroen Pieter Starreveld , Cornelius Adrianus Lambertus De Hoon , Francois Xavier Debiesme
IPC分类号： B29C59/02 , G03F7/00 , F16F15/03 , F16F9/53 , F16F15/00 , F16F15/027 , B82Y10/00 , B82Y40/00 , B29C43/02
CPC分类号： G03F7/0002 , B29C2043/025 , B82Y10/00 , B82Y40/00 , F16F9/535 , F16F15/002 , F16F15/0275 , F16F15/03
摘要： An imprint lithography apparatus includes an actuator configured to displace an imprint template holder relative to a substrate holder to perform an imprint process. The imprint template holder and/or the substrate holder being supported on a support structure, the support structure being mounted to a vibration isolation system that is mounted to a base of the apparatus. The vibration isolation system is configured to provide a vibration isolation of the support structure relative to the base. A control unit is configured to control the actuator during the imprint process. The control unit is arranged to control an adjustable member of the vibration isolation system to adjust a dynamical characteristic of the vibration isolation system during at least part of the imprint process so as to reduce a displacement of the support structure relative to the base due to a force exerted on the support structure during the imprint process.

12. 发明申请

US20110163477A1 IMPRINT LITHOGRAPHIC APPARATUS AND IMPRINT LITHOGRAPHIC METHOD 有权
标题翻译：印刷光刻设备和印刷光刻方法
公开(公告)号：US20110163477A1
公开(公告)日：2011-07-07
申请号：US12964459
申请日：2010-12-09
申请人： Hans Butler , Johannes Petrus Martinus Bernardus Vermeulen , Marc Wilhelmus Maria Van Der Wijst , Jeroen Pieter Starreveld , Cornelius Adrianus Lambertus De Hoon , Francois Xavier Debiesme
发明人： Hans Butler , Johannes Petrus Martinus Bernardus Vermeulen , Marc Wilhelmus Maria Van Der Wijst , Jeroen Pieter Starreveld , Cornelius Adrianus Lambertus De Hoon , Francois Xavier Debiesme
IPC分类号： B29C59/02
CPC分类号： G03F7/0002 , B29C2043/025 , B82Y10/00 , B82Y40/00 , F16F9/535 , F16F15/002 , F16F15/0275 , F16F15/03
摘要： An imprint lithography apparatus includes an actuator configured to displace an imprint template holder relative to a substrate holder to perform an imprint process. The imprint template holder and/or the substrate holder being supported on a support structure, the support structure being mounted to a vibration isolation system that is mounted to a base of the apparatus. The vibration isolation system is configured to provide a vibration isolation of the support structure relative to the base. A control unit is configured to control the actuator during the imprint process. The control unit is arranged to control an adjustable member of the vibration isolation system to adjust a dynamical characteristic of the vibration isolation system during at least part of the imprint process so as to reduce a displacement of the support structure relative to the base due to a force exerted on the support structure during the imprint process.
摘要翻译：压印光刻设备包括致动器，其构造成使压印模板保持器相对于衬底保持器移位以执行压印处理。压印模板保持器和/或衬底保持器被支撑在支撑结构上，支撑结构安装到安装到设备的基座上的隔振系统。隔振系统构造成提供支撑结构相对于底座的隔振。控制单元构造成在压印过程中控制致动器。控制单元布置成控制隔振系统的可调节构件，以在至少部分压印过程中调节隔振系统的动态特性，以便减少支撑结构相对于底座的位移，这是由于在压印过程中施加在支撑结构上的力。

13. 发明授权

US08781775B2 Lithographic apparatus and method for correcting a position of a stage of a lithographic apparatus 有权
标题翻译：用于校正光刻设备的台阶位置的光刻设备和方法
公开(公告)号：US08781775B2
公开(公告)日：2014-07-15
申请号：US13018226
申请日：2011-01-31
申请人： Hans Butler , Emiel Jozef Melanie Eussen , Willem Herman Gertruda Anna Koenen , Engelbertus Antonius Fransiscus Van Der Pasch , Harmen Klaas Van Der Schoot , Marc Wilhelmus Maria Van Der Wijst , Marcus Martinus Petrus Adrianus Vermeulen , Cornelius Adrianus Lambertus De Hoon
发明人： Hans Butler , Emiel Jozef Melanie Eussen , Willem Herman Gertruda Anna Koenen , Engelbertus Antonius Fransiscus Van Der Pasch , Harmen Klaas Van Der Schoot , Marc Wilhelmus Maria Van Der Wijst , Marcus Martinus Petrus Adrianus Vermeulen , Cornelius Adrianus Lambertus De Hoon
IPC分类号： G01C17/38
CPC分类号： G03F7/70775 , G03F7/70516 , G03F7/70758 , G03F7/70783
摘要： A lithographic apparatus includes a stage to hold an object, the stage being moveable relative to a reference structure in a motion range; a magnet structure to provide a spatially varying magnetic field in at least a part of the motion range, the magnet structure being moveable relative to the reference structure and the stage; a first position measurement system to provide a first measurement signal corresponding to a position of the stage and/or the object in a measurement direction relative to the reference structure; a second position measurement system to provide a second measurement signal corresponding to a position of the stage relative to the magnet structure; and a data processor to correct the first measurement signal with a value dependent on the second measurement signal to provide a corrected first measurement signal representative of the position of the stage and/or the object relative to the reference structure in the measurement direction.
摘要翻译：光刻设备包括用于保持物体的平台，所述平台相对于基准结构在运动范围内可移动; 磁体结构，用于在所述运动范围的至少一部分中提供空间变化的磁场，所述磁体结构可相对于所述参考结构和所述平台移动; 第一位置测量系统，用于相对于参考结构在测量方向上提供对应于舞台和/或物体的位置的第一测量信号; 第二位置测量系统，用于提供对应于舞台相对于磁体结构的位置的第二测量信号; 以及数据处理器，用取决于所述第二测量信号的值来校正所述第一测量信号，以在所述测量方向上提供表示所述平台和/或所述对象相对于所述参考结构的位置的校正的第一测量信号。

14. 发明申请

US20090103066A1 Lithographic Apparatus and Device Manufacturing Method 有权
标题翻译：光刻设备和器件制造方法
公开(公告)号：US20090103066A1
公开(公告)日：2009-04-23
申请号：US12244326
申请日：2008-10-02
申请人： Hans BUTLER , Marc Wilhelmus Maria Van Der Wijst , Cornelius Adrianus Lambertus De Hoon
发明人： Hans BUTLER , Marc Wilhelmus Maria Van Der Wijst , Cornelius Adrianus Lambertus De Hoon
IPC分类号： G03B27/42 , G01B11/14
CPC分类号： G03F7/70775 , G03F7/709 , G05D19/02
摘要： A control system for controlling a position or position related quantity of an object is provided. A measurement system is configured to measure a position or position related quantity of the object. A controller is configured to provide a control signal on the basis of the measured position or position related quantity. A actuator actuates the object on the basis of the control signal. A filter unit, which may be a partial order filter unit, filters the measured position or position related quantity.
摘要翻译：提供了一种用于控制物体的位置或位置相关量的控制系统。测量系统被配置为测量对象的位置或位置相关量。控制器被配置为基于所测量的位置或位置相关量提供控制信号。执行器基于控制信号致动物体。可以是部分级过滤器单元的过滤器单元过滤所测量的位置或位置相关量。

15. 发明授权

US07538273B2 Cable connection to decrease the passing on of vibrations from a first object to a second object 有权
标题翻译：电缆连接以减少从第一物体到第二物体的振动传递
公开(公告)号：US07538273B2
公开(公告)日：2009-05-26
申请号：US11500495
申请日：2006-08-08
申请人： Hans Butler , Martinus Van Duijnhoven , Johan Hendrik Geerke , Joost De Pee , Cornelius Adrianus Lambertus De Hoon
发明人： Hans Butler , Martinus Van Duijnhoven , Johan Hendrik Geerke , Joost De Pee , Cornelius Adrianus Lambertus De Hoon
IPC分类号： H02G15/08
CPC分类号： G03F7/709 , G03F7/70691 , G03F7/70833 , G03F7/70991
摘要： A cable connection between a first object and a second object includes a cable bundle of one or more cables having a certain length. One end of the cable bundle is fixed to the first object and another end of the bundle is fixed to the second object. A cable bundle holder configured to hold the cable bundle at a certain location along the length of the cable bundle, and a control system configured to control the position of the cable bundle holder with respect to the second object are presented. A control system for cable connection, and a method of reducing the transfer of vibrations from a first object to a second object via a cable connection are also presented.
摘要翻译：第一物体和第二物体之间的电缆连接包括具有一定长度的一根或多根电缆的电缆束。电缆束的一端固定在第一物体上，束束的另一端固定在第二物体上。电缆束保持器被配置为沿着电缆束的长度将电缆束保持在特定位置，并且呈现配置为控制电缆束保持器相对于第二对象的位置的控制系统。还提出了用于电缆连接的控制系统以及通过电缆连接减少振动从第一物体传递到第二物体的方法。

16. 发明申请

US20080035372A1 Cable connection, control system for a cable connection, and method to decrease the passing on of vibrations from a first object to a second object via a cable connection 有权
标题翻译：用于电缆连接的电缆连接，控制系统以及通过电缆连接减少振动从第一物体传递到第二物体的方法
公开(公告)号：US20080035372A1
公开(公告)日：2008-02-14
申请号：US11500495
申请日：2006-08-08
申请人： Hans Butler , Martinus Van Duijnhoven , Johan Hendrik Geerke , Joost De Pee , Cornelius Adrianus Lambertus De Hoon
发明人： Hans Butler , Martinus Van Duijnhoven , Johan Hendrik Geerke , Joost De Pee , Cornelius Adrianus Lambertus De Hoon
IPC分类号： H01R4/00
CPC分类号： G03F7/709 , G03F7/70691 , G03F7/70833 , G03F7/70991
摘要： A cable connection between a first object and a second object includes a cable bundle of one or more cables having a certain length, one end of the bundle fixed to the first object and another end of the bundle fixed to the second object, a cable bundle holder configured to hold the bundle at a location along the length of the bundle, and a control system configured to control a position of the cable bundle holder with respect to the second object. A control system for a cable connection, and a method of reducing the transfer of vibrations from a first object to a second object via a cable connection are also presented.
摘要翻译：第一物体和第二物体之间的电缆连接包括具有一定长度的一根或多根电缆的电缆束，束的一端固定到第一物体，另一端固定在第二物体上，电缆束保持器构造成将束保持在沿着束的长度的位置处;以及控制系统，被配置为控制电缆束保持器相对于第二物体的位置。还提出了一种用于电缆连接的控制系统，以及通过电缆连接减少振动从第一物体传递到第二物体的方法。

17. 发明授权

US08743344B2 Cable connection, control system, and method to decrease the passing on of vibrations from a first object to a second object 有权
标题翻译：电缆连接，控制系统和减少振动从第一物体传递到第二物体的方法
公开(公告)号：US08743344B2
公开(公告)日：2014-06-03
申请号：US12470773
申请日：2009-05-22
申请人： Hans Butler , Martinus Van Duijnhoven , Johan Hendrik Geerke , Joost De Pee , Cornelius Adrianus Lambertus De Hoon
发明人： Hans Butler , Martinus Van Duijnhoven , Johan Hendrik Geerke , Joost De Pee , Cornelius Adrianus Lambertus De Hoon
IPC分类号： G03B27/32
CPC分类号： G03F7/709 , G03F7/70691 , G03F7/70833 , G03F7/70991
摘要： A cable connection between a first object and a second object includes a cable bundle of one or more cables having a certain length. One end of the cable bundle is fixed to the first object and another end of the bundle is fixed to the second object. A cable bundle holder configured to hold the cable bundle at a certain location along the length of the cable bundle, and a control system configured to control the position of the cable bundle holder with respect to the second object are presented. A control system for cable connection, and a method of reducing the transfer of vibrations from a first object to a second object via a cable connection are presented.
摘要翻译：第一物体和第二物体之间的电缆连接包括具有一定长度的一根或多根电缆的电缆束。电缆束的一端固定在第一物体上，另一端固定在第二物体上。电缆束保持器被配置为沿着电缆束的长度将电缆束保持在特定位置，并且呈现配置为控制电缆束保持器相对于第二对象的位置的控制系统。提出了一种用于电缆连接的控制系统，以及通过电缆连接减少振动从第一物体传递到第二物体的方法。

18. 发明申请

US20100020525A1 Cable Connection, Control System, and Method to Decrease the Passing on of Vibrations from a First Object to a Second Object 有权
标题翻译：电缆连接，控制系统和减少从第一个对象到第二个对象的振动传递的方法
公开(公告)号：US20100020525A1
公开(公告)日：2010-01-28
申请号：US12470773
申请日：2009-05-22
申请人： Hans BUTLER , Martinus Van Duijnhoven , Johan Hendrik Geerke , Joost De Pee , Cornelius Adrianus Lambertus De Hoon
发明人： Hans BUTLER , Martinus Van Duijnhoven , Johan Hendrik Geerke , Joost De Pee , Cornelius Adrianus Lambertus De Hoon
IPC分类号： H02B1/20 , G03B27/00
CPC分类号： G03F7/709 , G03F7/70691 , G03F7/70833 , G03F7/70991
摘要： A cable connection between a first object and a second object includes a cable bundle of one or more cables having a certain length. One end of the cable bundle is fixed to the first object and another end of the bundle is fixed to the second object. A cable bundle holder configured to hold the cable bundle at a certain location along the length of the cable bundle, and a control system configured to control the position of the cable bundle holder with respect to the second object are presented. A control system for cable connection, and a method of reducing the transfer of vibrations from a first object to a second object via a cable connection are presented.
摘要翻译：第一物体和第二物体之间的电缆连接包括具有一定长度的一根或多根电缆的电缆束。电缆束的一端固定在第一物体上，另一端固定在第二物体上。电缆束保持器被配置为沿着电缆束的长度将电缆束保持在特定位置，并且呈现配置为控制电缆束保持器相对于第二对象的位置的控制系统。提出了一种用于电缆连接的控制系统，以及通过电缆连接减少振动从第一物体传递到第二物体的方法。

19. 发明申请

US20080230677A1 Lithographic apparatus comprising a vibration isolation support device 有权
标题翻译：光刻设备包括隔振支撑装置
公开(公告)号：US20080230677A1
公开(公告)日：2008-09-25
申请号：US11725560
申请日：2007-03-20
申请人： Cornelius Adrianus Lambertus De Hoon
发明人： Cornelius Adrianus Lambertus De Hoon
IPC分类号： H02K5/24 , G03B27/54
CPC分类号： G03F7/709 , G03F7/70716
摘要： A lithographic apparatus includes an illumination system configured to condition a radiation beam, a support constructed to support a patterning device capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, a substrate table constructed to hold a substrate, and a projection system configured to project the patterned radiation beam onto a target portion of the substrate. At least one vibration isolation support device can be provided for supporting an object of the apparatus. The object can be rotatably supported at the vibration isolation support device by way of a rotational support having a center of rotation. The rotational support can have its center of rotation located substantially at the center of gravity of the vibration isolation support device.
摘要翻译：光刻设备包括被配置为调节辐射束的照明系统，构造成支撑能够在其横截面中赋予辐射束图案以形成图案化辐射束的图案形成装置的支撑件，构造成保持衬底和被配置为将图案化的辐射束投影到衬底的目标部分上的投影系统。可以提供至少一个隔振支撑装置来支撑装置的物体。该物体可以通过具有旋转中心的旋转支撑件可旋转地支撑在隔振支撑装置上。旋转支撑件可以具有基本上位于隔振支撑装置的重心的旋转中心。

20. 发明授权

US08102505B2 Lithographic apparatus comprising a vibration isolation support device 有权
标题翻译：光刻设备包括隔振支撑装置
公开(公告)号：US08102505B2
公开(公告)日：2012-01-24
申请号：US11725560
申请日：2007-03-20
申请人： Cornelius Adrianus Lambertus De Hoon
发明人： Cornelius Adrianus Lambertus De Hoon
IPC分类号： G03B27/32 , G03B27/42 , G03B27/58 , G03B27/62 , F16C17/00 , F16C32/06 , H02K41/02
CPC分类号： G03F7/709 , G03F7/70716
摘要： A lithographic apparatus includes an illumination system configured to condition a radiation beam, a support constructed to support a patterning device capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, a substrate table constructed to hold a substrate, and a projection system configured to project the patterned radiation beam onto a target portion of the substrate. At least one vibration isolation support device can be provided for supporting an object of the apparatus. The object can be rotatably supported at the vibration isolation support device by way of a rotational support having a center of rotation. The rotational support can have its center of rotation located substantially at the center of gravity of the vibration isolation support device.
摘要翻译：光刻设备包括被配置为调节辐射束的照明系统，构造成支撑能够在其横截面中赋予辐射束图案以形成图案化辐射束的图案形成装置的支撑件，构造成保持衬底和被配置为将图案化的辐射束投影到衬底的目标部分上的投影系统。可以提供至少一个隔振支撑装置来支撑装置的物体。该物体可以通过具有旋转中心的旋转支撑件可旋转地支撑在隔振支撑装置上。旋转支撑件可以具有基本上位于隔振支撑装置的重心的旋转中心。

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