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    • 12. 发明专利
    • JUNCTION TYPE FIELD EFFECT TRANSISTOR
    • JPS57177570A
    • 1982-11-01
    • JP6237681
    • 1981-04-27
    • HITACHI ELECTRONICSHITACHI LTD
    • UJIIE KAZUAKIYAMAGUCHI KEN
    • H01L29/80H01L29/10H01L29/417
    • PURPOSE:To obtain a J-FET with high linear I-V characteristic, by forming two comb gate regions respectively independent on a semiconductor region for a gate being alternately arranged with the intervals therebetween different each other. CONSTITUTION:The n type semiconductor region 2 is epitaxial-grown on an n type Si substrate 1 to diffusion-form the first and second comb p type gate regions 3 and 4 with an SiO2 film with fixed pattern as a mask. At this time, the comb parts 3a-3c and 4a-4c of the regions 3 and 4 are alternately arranged with the intervals different each other. Next, the SiO2 film used for a mask is removed to epitaxial-grow the n type region 2 with small size thereon with the regions 3 and 4 as the burried layers with an n type drain region 5 provided thereon by epitaxial growth to be surrounded by an SiO2 film 6. Thereafter, the film 6 is provided with an opening and a drain electrode 9 contacting the region 5 with the first and second gate electrode 7 and 8 formed on the end parts of the upper surfaces on the regions 3 and 4 and a source electrode 10 on the back of the substrate 1.
    • 13. 发明专利
    • Memory device for semiconductor
    • 半导体存储器件
    • JPS6124094A
    • 1986-02-01
    • JP14238084
    • 1984-07-11
    • Hitachi LtdHitachi Micro Comput Eng Ltd
    • UJIIE KAZUAKISATO NOBUYUKITERASAWA MASAAKINABEYA SHINJI
    • G11C17/00G11C16/06
    • PURPOSE: To shorten a rewriting time of data in total by withdrawing a charge inputted by write-in voltage by higher voltage, and by making the length of an erasing time the same degree as that of a write-in time.
      CONSTITUTION: A boosting circuit 8 consists of switches MOSFETs Q
      1 , Q
      2 connected in series with clamp diodes D
      1 , D
      2 to form a fixed write-in voltage Vpp
      1 and an erasing voltage Vpp
      2 controlling the voltage generated by charge pump 10 generating far higher voltage than electric source voltage Vcc, pushing up the level gradually receiving supply of charge from electric source voltage Vcc supplied from the outside. The voltage boosted by a charge pump 10 is clamped by break down voltage of clamp diode to generate the stabilized write-in voltage Vpp
      1 and erasing voltage Vpp
      2 . Thus, the time for rewriting all the data of EEPROM device will be largely shortened.
      COPYRIGHT: (C)1986,JPO&Japio
    • 目的:通过以较高的电压撤销由写入电压输入的电荷,并使擦除时间的长度与写入时间相同的程度来缩短数据的重写时间。 构成:升压电路8由与钳位二极管D1,D2串联连接的开关MOSFET Q1,Q2组成,以形成固定的写入电压Vpp1,以及擦除电压Vpp2,其控制由电荷泵10产生的电压远高于电压 源极电压Vcc,从外部提供的电源电压Vcc向上推动逐渐接收电荷的电平。 由电荷泵10升压的电压被钳位二极管的分压钳位,以产生稳定的写入电压Vpp1和擦除电压Vpp2。 因此,重写EEPROM设备的所有数据的时间将大大缩短。
    • 14. 发明专利
    • JUNCTION TYPE FIELD EFFECT SEMICONDUCTOR DEVICE
    • JPS57177569A
    • 1982-11-01
    • JP6237581
    • 1981-04-27
    • HITACHI ELECTRONICSHITACHI LTD
    • UJIIE KAZUAKIYAMAGUCHI KEN
    • H01L29/80H01L27/098
    • PURPOSE:To allow the on-off action of multisignals and the mixing or resultant of multisignals for the most appropriate state for contactless switches, etc., by providing a plurality of gate and drain regions in a integral body with a source region common. CONSTITUTION:An n type layer 2 is epitaxial-grown on an n type Si substrate 1 serving as a source region with an SiO2 film 3 selectively provided on the center thereof for the diffusion-formation of P type gate regions 4 and 5 with the film as the mask. Next, the film 3 is removed with the epitaxial growth of the n type layer 2 contacting a layer 2 again over the entire surface including the regions 4 and 5 for the diffusion-formation of n type drain regions 6 and 7 corresponded to the regions 4 and 5. Thereafter, the clearance between the regions is filled to adhere an SiO2 film 8 over the entire surface for the formation of the first and second electrodes 9 and 10 which correspond to the regions 4 and 5, and the first and second drain electrodes 11 and 12 are provided corresponding to the regions 6 and 7. Thus, the first transistor 14 is constituted of the regions 4 and 6 and electrodes 9 and 11, and the second transistor 15 of the regions 5 and 7 and electrodes 10 and 12.