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11. 发明授权

EP1288862B1 Image evaluation method and microscope 有权
标题翻译：图像处理方法和显微镜
公开(公告)号：EP1288862B1
公开(公告)日：2008-10-15
申请号：EP02018519.5
申请日：2002-08-16
申请人： Hitachi, Ltd.
发明人： Ishitani, Tohru , Sato, Mitsugu , Todokoro, Hideo , Otaka, Tadashi , Iizumi, Takashi , Takane, Atsushi
IPC分类号： G06T7/00 , H01J37/00 , H01J37/26 , H01J37/28 , H01J37/22
CPC分类号： H01J37/28 , H01J37/222 , H01J37/263 , H01J2237/2823

12. 发明公开

EP1288862A2 Image evaluation method and microscope 有权
标题翻译：图像处理方法和显微镜
公开(公告)号：EP1288862A2
公开(公告)日：2003-03-05
申请号：EP02018519.5
申请日：2002-08-16
申请人： Hitachi, Ltd.
发明人： Ishitani, Tohru , Sato, Mitsugu , Todokoro, Hideo , Otaka, Tadashi , Iizumi, Takashi , Takane, Atsushi
IPC分类号： G06T7/00 , H01J37/00
CPC分类号： H01J37/28 , H01J37/222 , H01J37/263 , H01J2237/2823
摘要： Image evaluation method capable of objectively evaluating the image resolution of a microscope image. An image resolution method is characterized in that resolution in partial regions of an image is obtained over an entire area of the image or a portion of the image, averaging is performed over the entire area of the image or the portion of the image, and the averaged value is established as the resolution evaluation value of the entire area of the image or the portion of the image. This method eliminates the subjective impressions of the evaluator from evaluation of microscope image resolution, so image resolution evaluation values of high accuracy and good repeatability can be obtained.

13. 发明公开

EP0397161A3 Methods for device transplantation 失效
标题翻译：用于设备移植的方法
公开(公告)号：EP0397161A3
公开(公告)日：1992-05-20
申请号：EP90108795.7
申请日：1990-05-10
申请人： HITACHI, LTD.
发明人： Ohnishi, Tsuyoshi, c/o Hitachi Daini Kyoshinryo , Kawanami, Yoshimi, c/o Hitachi Fuchuryo , Madokoro, Yuuichi, c/o Hitachi Daiyon Kyoshinryo , Umemura, Kaoru , Ishitani, Tohru
IPC分类号： H01L21/00
CPC分类号： H01L21/67138 , H01L24/24 , H01L2924/12042 , H01L2924/14 , H05K13/0486 , H01L2924/00
摘要： A method for device transplantation is provided. The method includes the conveyance process of conveying a microminiature device (5), which has been premanufactured, to a desired place located on a sample (200), observing and fabricating the new device (5) with a focused beam (1), and repairing passive elements or active elements located on the sample (200) or transplanting the new microminiature devices (5) based on the observed results.

14. 发明公开

EP0397161A2 Methods for device transplantation 失效
标题翻译： Verfahren zur Transplantierung von Bausteinen。
公开(公告)号：EP0397161A2
公开(公告)日：1990-11-14
申请号：EP90108795.7
申请日：1990-05-10
申请人： HITACHI, LTD.
发明人： Ohnishi, Tsuyoshi, c/o Hitachi Daini Kyoshinryo , Kawanami, Yoshimi, c/o Hitachi Fuchuryo , Madokoro, Yuuichi, c/o Hitachi Daiyon Kyoshinryo , Umemura, Kaoru , Ishitani, Tohru
IPC分类号： H01L21/00
CPC分类号： H01L21/67138 , H01L24/24 , H01L2924/12042 , H01L2924/14 , H05K13/0486 , H01L2924/00
摘要： A method for device transplantation is provided. The method includes the conveyance process of conveying a microminiature device (5), which has been premanufactured, to a desired place located on a sample (200), observing and fabricating the new device (5) with a focused beam (1), and repairing passive elements or active elements located on the sample (200) or transplanting the new microminiature devices (5) based on the observed results.
摘要翻译：提供了一种器件移植方法。该方法包括将已经被预先制造的微型装置（5）输送到位于样品（200）上的期望位置，用聚焦光束（1）观察和制造新装置（5）的传送过程，以及基于所观察到的结果，修复位于样品（200）上的无源元件或活性元件或移植新的微型装置（5）。

15. 发明授权

EP0091777B1 Liquid metal ion source 失效
标题翻译：液体金属离子源
公开(公告)号：EP0091777B1
公开(公告)日：1989-01-11
申请号：EP83301924.3
申请日：1983-04-06
申请人： Hitachi, Ltd.
发明人： Ishitani, Tohru , Tamura, Hifumi , Shimase, Akira
IPC分类号： H01J27/22
CPC分类号： H01J27/26

16. 发明公开

EP0179294A1 Ion microbeam apparatus 失效
标题翻译： Ionenmikrostrahlvorrichtung。
公开(公告)号：EP0179294A1
公开(公告)日：1986-04-30
申请号：EP85112117.8
申请日：1985-09-25
申请人： HITACHI, LTD.
发明人： Kawanami, Yoshimi , Ishitani, Tohru , Umemura, Kaoru , Tamura, Hifumi
IPC分类号： H01J37/317 , H01J37/147
CPC分类号： H01J37/04 , H01J37/3007
摘要： An ion microbeam apparatus is disclosed which comprises an ion source (1), a beam convergence system (3a, 3b, 5, 6a, 6b, 20) for accelerating, converging and deflecting the ions emitted from the ion source (1) and a sample table (4) supporting thereon a sample (4a). In order easily to change the diameter of the ion beam radiated to the sample (4a), a beam control unit (20) is disposed in the beam convergence system, the beam control unit (20) comprising beam diameter contraction beams (7), a pre-stage deflection plate (13a, 13b) disposed at a pre-stage of the beam diameter contraction means (7) and deflecting the ion beam so that it passes through a predetermined position of the beam diameter contraction means (7), and a post-stage deflection plate (14a, 14b) disposed at the post-stage of the beam diameter contraction means (7) and returns the ion beam, that has passed through the beam diameter contraction means (7), to the original beam optical axis (10).
摘要翻译：公开了一种离子光束装置，其包括离子源（1），用于加速，会聚和偏转从离子源（1）发射的离子的束收敛系统（3a，3b，5，6a，6b，20）样品台（4），其上支撑有样品（4a）。为了容易地改变辐射到样品（4a）的离子束的直径，光束控制单元（20）设置在光束会聚系统中，光束控制单元（20）包括光束直径收缩光束（7）设置在光束直径收缩装置（7）的前级的偏转板（13a，13b），并使离子束偏转，使其通过光束直径收缩装置（7）的预定位置;以及设置在光束直径收缩装置（7）的后级处的后级偏转板（14a，14b），并将已经通过光束直径收缩装置（7）的离子束返回到原始光束光学轴（10）。

17. 发明公开

EP0114496A3 Liquid metal ion source 失效
标题翻译：液体金属离子源
公开(公告)号：EP0114496A3
公开(公告)日：1985-05-15
申请号：EP83307759
申请日：1983-12-20
申请人： HITACHI, LTD.
发明人： Ishitani, Tohru , Tamura, Hifumi , Umemura, Kaoru
IPC分类号： H01J27/26
CPC分类号： H01J27/26
摘要： A liquid metal ion source has a carrier strip 3 which melts and holds a substance 5 being ionized, a needle anode 1 located so that its pointed tip projects the ions of the molten substance supplied by the carrier strip, and a draw-out electrode 7 to apply a strong electric field between itself and the anode, thereby drawing out the ions from the pointed tip of the anode. The ion source has a thermal stress-absorbing element 10 installed between the needle anode and its support 2, or a plurality of such members between the carrier strip and its supports, to take up the thermal stresses that would result from the difference in thermal expansion coefficients between the needle anode and the carrier strip when both are secured to their supports, and which would damage the connected components.
摘要翻译：液体金属离子源具有熔融并保持被离子化的物质5的载体带3，将针状阳极1定位为使其尖端突出由载体带供应的熔融物质的离子和引出电极7 在其自身和阳极之间施加强电场，从而从阳极的尖端引出离子。离子源具有安装在针阳极及其支撑件2之间的热应力吸收元件10，或者载体带与其支撑件之间的多个这样的构件，以承受由热膨胀差引起的热应力当两者都固定到其支撑件上时，针阳极和载体带之间的系数，并且将损坏连接的部件。

18. 发明公开

EP0114496A2 Liquid metal ion source 失效
标题翻译： Flüssigmetall-Ionenquelle。
公开(公告)号：EP0114496A2
公开(公告)日：1984-08-01
申请号：EP83307759.7
申请日：1983-12-20
申请人： HITACHI, LTD.
发明人： Ishitani, Tohru , Tamura, Hifumi , Umemura, Kaoru
IPC分类号： H01J27/26
CPC分类号： H01J27/26
摘要： A liquid metal ion source has a carrier strip 3 which melts and holds a substance 5 being ionized, a needle anode 1 located so that its pointed tip projects the ions of the molten substance supplied by the carrier strip, and a draw-out electrode 7 to apply a strong electric field between itself and the anode, thereby drawing out the ions from the pointed tip of the anode. The ion source has a thermal stress-absorbing element 10 installed between the needle anode and its support 2, or a plurality of such members between the carrier strip and its supports, to take up the thermal stresses that would result from the difference in thermal expansion coefficients between the needle anode and the carrier strip when both are secured to their supports, and which would damage the connected components.
摘要翻译：液体金属离子源具有熔融并保持被离子化的物质5的载体带3，将针状阳极1定位为使其尖端突出由载体带供应的熔融物质的离子和引出电极7 在其自身和阳极之间施加强电场，从而从阳极的尖端引出离子。离子源具有安装在针阳极及其支撑件2之间的热应力吸收元件10，或者载体带与其支撑件之间的多个这样的构件，以承受由热膨胀差引起的热应力当两者都固定到其支撑件上时，针阳极和载体带之间的系数，并且将损坏连接的部件。

19. 发明公开

EP0091777A2 Liquid metal ion source 失效
标题翻译：液态金属离子源。
公开(公告)号：EP0091777A2
公开(公告)日：1983-10-19
申请号：EP83301924.3
申请日：1983-04-06
申请人： Hitachi, Ltd.
发明人： Ishitani, Tohru , Tamura, Hifumi , Shimase, Akira
IPC分类号： H01J27/22
CPC分类号： H01J27/26
摘要： A liquid metal ion source according to the present invention has a needle electrode (1) whose fore end is disposed at a position speced from a reservoir (3') for holding a source material (2), and is provided with means (12,13,13') for freely varying the distance from the reservoir (3') to the fore end of the needle electrode (1). This distance can therefore be optimized to give more stable operation under a wider range of conditions.

20. 发明授权

EP1197985B1 Scanning charged-particle microscope 有权
标题翻译：扫描带电粒子束显微镜
公开(公告)号：EP1197985B1
公开(公告)日：2009-08-12
申请号：EP01120621.6
申请日：2001-08-29
申请人： Hitachi, Ltd.
发明人： Ishitani, Tohru , Todokoro, Hideo , Sato, Mitsugu
IPC分类号： H01J37/09 , H01J37/28
CPC分类号： H01J37/28 , H01J37/09

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