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    • 13. 发明申请
    • NANOWIRE-BASED PHOTODIODE
    • 基于纳米级的光刻胶
    • WO2009136906A1
    • 2009-11-12
    • PCT/US2008/062683
    • 2008-05-05
    • HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P.WANG, Shih-yuanTAN, Michael R.
    • WANG, Shih-yuanTAN, Michael R.
    • H01L31/10H01L31/101
    • H01L31/105B82Y20/00
    • A nanowire-based photodiode 100 and an interdigital p - i - n photodiode 200 use an i -type semiconductor nanowire 140, 240 in an i -region of the photodiode 100, 200. The nanowire-based photodiode 100, 200 includes a first sidewall 110, 212, 210 of a first semiconductor doped with a p -type dopant, a second sidewall 120, 222, 220 of the first semiconductor doped with an n -type dopant, and an intrinsic semiconductor nanowire 140, 240 that spans a trench 130, 230 between the first and second sidewalls. The trench is wider at a top than at a bottom adjacent to a substrate 150, 160, 250. The first semiconductor of one or both of the first sidewall and the second sidewall is single crystalline and together the first sidewall, the nanowire and the second sidewall form a p - i - n semiconductor junction of the photodiode.
    • 基于纳米线的光电二极管100和叉指式光电二极管200在光电二极管100,200的i区域中使用i型半导体纳米线140,240。纳米线基光电二极管100,200包括第一侧壁110,212, 掺杂有p型掺杂剂的第一半导体的第二半导体210,掺杂有n型掺杂剂的第一半导体的第二侧壁120,222,220以及跨越沟槽130,230之间的本征半导体纳米线140,240 第一和第二侧壁。 沟槽在顶部比在与衬底150,160,250相邻的底部更宽。第一侧壁和第二侧壁中的一个或两个的第一半导体是单晶的,并且第一侧壁,纳米线和第二侧壁 侧壁形成光电二极管的引脚半导体结。