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11. 发明授权

US09588434B2 Catoptric illumination system for microlithography tool 有权
标题翻译：用于微光刻工具的Catoptric照明系统
公开(公告)号：US09588434B2
公开(公告)日：2017-03-07
申请号：US13562515
申请日：2012-07-31
申请人： Jens Ossmann , Martin Endres , Ralf Stuetzle
发明人： Jens Ossmann , Martin Endres , Ralf Stuetzle
IPC分类号： G03B27/54 , G03F7/20
CPC分类号： G03F7/702 , G03F7/70075 , G03F7/70083
摘要： In general, in one aspect, the invention features a system that includes an illumination system of a microlithography tool, the illumination system including a first component having a plurality of elements. During operation of the system, the elements direct radiation from a source along an optical path to an arc-shaped object field at an object plane of a projection objective, and at least one of the elements has a curved shape that is different from the arc-shape of the object field.
摘要翻译：通常，在一个方面，本发明的特征在于包括微光刻工具的照明系统的系统，所述照明系统包括具有多个元件的第一部件。在系统操作期间，元件将来自光源的源的辐射直接引向投影物镜的物平面处的弧形物场，并且至少一个元件具有与弧不同的弯曲形状对象字段的形状。

12. 发明授权

US08937708B2 Illumination optics for microlithography 有权
标题翻译：用于微光刻的照明光学器件
公开(公告)号：US08937708B2
公开(公告)日：2015-01-20
申请号：US12789772
申请日：2010-05-28
申请人： Martin Endres , Ralf Stuetzle , Jens Ossmann
发明人： Martin Endres , Ralf Stuetzle , Jens Ossmann
IPC分类号： G03B27/54 , G03B27/72 , G03F7/20
CPC分类号： G03F7/702 , G03F7/70075 , G03F7/70083 , G03F7/70191
摘要： An illumination optics for microlithography includes an optical assembly for guiding illumination light to an object field to be illuminated in an object plane. The illumination optics can divide an illumination light radiation bundle into a plurality of radiation sub-bundles which are assigned to different illumination angles of the object field illumination. The illumination optics is configured so that at least some of the radiation sub-bundles are superimposed in a superposition plane which is spaced from the object plane and which is not imaged into the object plane in which superposition takes place. This superposition is such that edges of the superimposed radiation sub-bundles coincide at least partially. In some embodiments, a field intensity setting device includes a plurality of adjacent individual diaphragms which at least attenuate illumination light when exposed thereon. These individual diaphragms are insertable into an illumination light radiation bundle in a direction parallel to an object displacement direction. All individual diaphragms of the field intensity setting device are insertable into the illumination light radiation bundle from one and the same side.
摘要翻译：用于微光刻的照明光学器件包括用于将照明光引导到在物平面中被照明的物场的光学组件。照明光学器件可以将照明光辐射束划分成被分配给物场照明的不同照明角度的多个辐射子束。照明光学器件被配置为使得至少一些辐射子束被叠加在与物平面间隔开并且不被成像到发生叠加的物平面中的叠加平面中。这种叠加使得叠加的辐射子束的边缘至少部分地重合。在一些实施例中，场强度设置装置包括多个相邻的单独膜片，其在暴露于其上时至少衰减照明光。这些单独的隔膜可以在与物体位移方向平行的方向上插入到照明光辐射束中。场强设定装置的各个隔膜均可从同一侧插入照明光辐射束。

13. 发明申请

US20120300185A1 CATOPTRIC ILLUMINATION SYSTEM FOR MICROLITHOGRAPHY TOOL 有权
标题翻译：用于微型工具的电子照明系统
公开(公告)号：US20120300185A1
公开(公告)日：2012-11-29
申请号：US13562515
申请日：2012-07-31
申请人： Jens Ossmann , Martin Endres , Ralf Stuetzle
发明人： Jens Ossmann , Martin Endres , Ralf Stuetzle
IPC分类号： G03B27/54
CPC分类号： G03F7/702 , G03F7/70075 , G03F7/70083
摘要： In general, in one aspect, the invention features a system that includes an illumination system of a microlithography tool, the illumination system including a first component having a plurality of elements. During operation of the system, the elements direct radiation from a source along an optical path to an arc-shaped object field at an object plane of a projection objective, and at least one of the elements has a curved shape that is different from the arc-shape of the object field.
摘要翻译：通常，在一个方面，本发明的特征在于包括微光刻工具的照明系统的系统，所述照明系统包括具有多个元件的第一部件。在系统操作期间，元件将来自光源的源的辐射直接引向投影物镜的物平面处的弧形物场，并且至少一个元件具有与弧不同的弯曲形状对象字段的形状。

14. 发明申请

US20090323044A1 CATOPTRIC ILLUMINATION SYSTEM FOR MICROLITHOGRAPHY TOOL 有权
标题翻译：用于微型工具的电子照明系统
公开(公告)号：US20090323044A1
公开(公告)日：2009-12-31
申请号：US12533513
申请日：2009-07-31
申请人： Jens Ossmann , Martin Endres , Ralf Stuetzle
发明人： Jens Ossmann , Martin Endres , Ralf Stuetzle
IPC分类号： G03B27/72 , G21K5/00
CPC分类号： G03F7/702 , G03F7/70075 , G03F7/70083
摘要： In general, in one aspect, the invention features a system that includes an illumination system of a microlithography tool, the illumination system including a first component having a plurality of elements. During operation of the system, the elements direct radiation from a source along an optical path to an arc-shaped object field at an object plane of a projection objective, and at least one of the elements has a curved shape that is different from the arc-shape of the object field.
摘要翻译：通常，在一个方面，本发明的特征在于包括微光刻工具的照明系统的系统，所述照明系统包括具有多个元件的第一部件。在系统操作期间，元件将来自光源的源的辐射直接引向投影物镜的物平面处的弧形物场，并且至少一个元件具有与弧不同的弯曲形状对象字段的形状。

15. 发明申请

US20090091731A1 ILLUMINATION OPTICAL SYSTEM FOR MICROLITHOGRAPHY 有权
标题翻译：用于微光学的照明光学系统
公开(公告)号：US20090091731A1
公开(公告)日：2009-04-09
申请号：US12233914
申请日：2008-09-19
申请人： Jens Ossmann , Martin Endres , Ralf Stuetzle
发明人： Jens Ossmann , Martin Endres , Ralf Stuetzle
IPC分类号： G03B27/70 , G02B5/09 , G03B27/54
CPC分类号： G03F7/70083 , G03F7/70075
摘要： The disclosure relates to illumination optical systems for microlithography, such as EUV-microlithography, as well as related systems, components and methods.
摘要翻译：本公开涉及用于微光刻的照明光学系统，例如EUV-微光刻，以及相关系统，部件和方法。

16. 发明申请

US20120274917A1 IMAGING OPTICS 审中-公开
标题翻译：成像光学
公开(公告)号：US20120274917A1
公开(公告)日：2012-11-01
申请号：US13482794
申请日：2012-05-29
申请人： Hans-Juergen Mann , Martin Endres , David Shafer , Berndt Warm , Alois Herkommer
发明人： Hans-Juergen Mann , Martin Endres , David Shafer , Berndt Warm , Alois Herkommer
IPC分类号： G03B27/70 , G03B27/32 , G02B17/06
CPC分类号： G03F7/70233 , G02B17/0652 , G03F7/702 , G03F7/70275
摘要： An imaging optics is provided for lithographic projection exposure for guiding a bundle of imaging light with a wavelength shorter than 193 nm via a plurality of mirrors for beam-splitter-free imaging of a reflective object in an object field in an object plane into an image field in an image plane. An object field point has a central ray angle which is smaller than 3°. At least one of the mirrors is a near-field mirror. The imaging optics which can allow for high-quality imaging of a reflective object.
摘要翻译：提供了一种用于光刻投影曝光的成像光学装置，用于通过多个反射镜引导波长短于193nm的成像光束，用于在物体平面中的物体场中的反射物体成像成图像场中的图像平面。物体场点具有小于3°的中心射线角度。至少一个镜子是近场镜。成像光学元件可以允许反射物体的高质量成像。

17. 发明授权

US09304400B2 Illumination system for EUV microlithography 有权
标题翻译： EUV微光刻照明系统
公开(公告)号：US09304400B2
公开(公告)日：2016-04-05
申请号：US13038453
申请日：2011-03-02
申请人： Michael Layh , Ralf Stuetzle , Damian Fiolka , Martin Endres , Holger Weigand
发明人： Michael Layh , Ralf Stuetzle , Damian Fiolka , Martin Endres , Holger Weigand
IPC分类号： G03B27/54 , G03F7/20 , G02B17/06 , G02B27/00
CPC分类号： G03F7/70083 , G02B17/0605 , G02B17/0647 , G02B27/0043 , G03F7/70033 , G03F7/70075
摘要： An illumination system for EUV microlithography includes an EUV light source which generates EUV illumination light with an etendue that is higher than 0.01 mm2. The EUV light source generates a sequence of EUV light pulses having a pulse sequence frequency. An illumination optics of the illumination system is used to guide the illumination light from the light source to an object field. At least one optical modulation component of the illumination system is preferably modulatable synchronously with the pulse sequence frequency. The result is an illumination system where a homogeneity of an object field illumination is improved.
摘要翻译：用于EUV微光刻的照明系统包括产生具有高于0.01mm 2的光密度的EUV照明光的EUV光源。 EUV光源产生具有脉冲序列频率的EUV光脉冲序列。照明系统的照明光学器件用于将来自光源的照明光引导到物场。照明系统的至少一个光调制部件优选地可以与脉冲序列频率同步地进行调制。其结果是改善了物场照明的均匀性的照明系统。

18. 发明申请

US20110177463A1 ILLUMINATION SYSTEM FOR EUV MICROLITHOGRAPHY 有权
标题翻译： EUV微观照明系统
公开(公告)号：US20110177463A1
公开(公告)日：2011-07-21
申请号：US13038453
申请日：2011-03-02
申请人： Michael Layh , Ralf Stuetzle , Damian Fiolka , Martin Endres , Holger Weigand
发明人： Michael Layh , Ralf Stuetzle , Damian Fiolka , Martin Endres , Holger Weigand
IPC分类号： G03F7/20 , G21K5/00
CPC分类号： G03F7/70083 , G02B17/0605 , G02B17/0647 , G02B27/0043 , G03F7/70033 , G03F7/70075
摘要： An illumination system for EUV microlithography includes an EUV light source which generates EUV illumination light with an etendue that is higher than 0.01 mm2. The EUV light source generates a sequence of EUV light pulses having a pulse sequence frequency. An illumination optics of the illumination system is used to guide the illumination light from the light source to an object field. At least one optical modulation component of the illumination system is preferably modulatable synchronously with the pulse sequence frequency. The result is an illumination system where a homogeneity of an object field illumination is improved.
摘要翻译：用于EUV微光刻的照明系统包括产生具有高于0.01mm 2的光密度的EUV照明光的EUV光源。 EUV光源产生具有脉冲序列频率的EUV光脉冲序列。照明系统的照明光学器件用于将来自光源的照明光引导到物场。照明系统的至少一个光调制部件优选地可以与脉冲序列频率同步地进行调制。其结果是改善了物场照明的均匀性的照明系统。

19. 发明授权

US07586113B2 EUV illumination system 有权
标题翻译： EUV照明系统
公开(公告)号：US07586113B2
公开(公告)日：2009-09-08
申请号：US11755334
申请日：2007-05-30
申请人： Martin Endres , Jens Ossmann
发明人： Martin Endres , Jens Ossmann
IPC分类号： A61N5/00 , G21G5/00
CPC分类号： G02B17/0892 , G02B17/0804 , G02B17/082 , G02B17/0836 , G03F7/702
摘要： An illumination system is used to illuminate a specified illumination field of an object surface with EUV radiation. The illumination system has an EUV source and a collector to concentrate the EUV radiation in the direction of an optical axis. A first optical element is provided to generate secondary light sources, and a second optical element is provided at the location of these secondary light sources, the second optical element being part of an optical device which includes further optical elements, and which images the first optical element into an image plane into the illumination field. Between the collector and the illumination field, a maximum of five reflecting optical elements are arranged. These optical elements reflect the main beam either grazingly or steeply. The optical axis, projected onto an illumination main plane, is deflected by more than 30° between a source axis portion and a field axis portion. In a first variant of the illumination system, at least an axis portion between at least two of the reflecting optical elements is inclined relative to the illumination main plane. In a second variant of the illumination system, the optical device, in addition to the second optical element includes precisely three further optical elements, i.e. a third optical element, a fourth optical element and a fifth optical element. In this second variant, the optical axis meets the third, fourth and fifth optical elements at an angle of incidence which is greater than 70°. This construction variants make possible either an increase of the EUV throughput of the illumination system for a given size, or a reduction of the size of the illumination system and thus of the associated projection exposure system for a given EUV throughput.
摘要翻译：照明系统用于用EUV辐射照射物体表面的指定照明场。照明系统具有EUV源和收集器以将EUV辐射集中在光轴的方向上。提供第一光学元件以产生二次光源，并且在这些次级光源的位置处提供第二光学元件，第二光学元件是包括另外的光学元件的光学器件的一部分，并且其将第一光学元件元素进入图像平面进入照明场。在收集器和照明场之间，最多设置五个反射光学元件。这些光学元件既可以粗略地或者陡峭地反射主光束。投射到照明主平面上的光轴在源轴部分和场轴部分之间偏转大于30°。在照明系统的第一变型中，至少两个反射光学元件之间的至少一个轴部分相对于照明主平面倾斜。在照明系统的第二变型中，除了第二光学元件之外，光学器件精确地包括三个另外的光学元件，即第三光学元件，第四光学元件和第五光学元件。在该第二变型中，光轴以大于70°的入射角与第三，第四和第五光学元件相遇。这种构造变型使给定尺寸的照明系统的EUV吞吐量增加，或者对于给定的EUV吞吐量，照明系统的大小以及相关联的投影曝光系统的减小成为可能。

20. 发明申请

US20090041182A1 ILLUMINATION SYSTEM FOR EUV LITHOGRAPHY 审中-公开
标题翻译： EUV光刻照明系统
公开(公告)号：US20090041182A1
公开(公告)日：2009-02-12
申请号：US12235277
申请日：2008-09-22
申请人： Martin Endres , Jens Ossmann
发明人： Martin Endres , Jens Ossmann
IPC分类号： G21K5/00
CPC分类号： G02B26/0833 , G02B5/09 , G02B17/06 , G03F7/70075 , G03F7/70116
摘要： The disclosure relates to an illumination system for EUV lithography, as well as related elements, systems and methods. In some embodiments, an illumination system includes a first optical element and a second optical element. The first optical element can include a plurality of first facet elements configured so that, when impinged by respective partial beams of radiation, the plurality of first facet elements produce secondary light sources. The second optical element can include a second optical element including a plurality of second facet elements. Each of the plurality of second facet elements can be assigned to at least one of the plurality of first facet elements. The plurality of second facet elements can be configured to be impinged by the radiation via the first optical element.
摘要翻译：本公开涉及用于EUV光刻的照明系统以及相关元件，系统和方法。在一些实施例中，照明系统包括第一光学元件和第二光学元件。第一光学元件可以包括多个第一小面元件，其被配置为使得当被相应的部分辐射束撞击时，多个第一小面元件产生次级光源。第二光学元件可以包括包括多个第二小面元件的第二光学元件。多个第二小面元件中的每一个可以被分配给多个第一小面元件中的至少一个。多个第二小面元件可被配置为经由第一光学元件被辐射照射。

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