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11. 发明专利

JP2014192178A Underlayer film forming composition for imprint and pattern forming method 有权
标题翻译：底片成膜组合物用于印刷和图案形成方法
公开(公告)号：JP2014192178A
公开(公告)日：2014-10-06
申请号：JP2013063380
申请日：2013-03-26
申请人： Fujifilm Corp , 富士フイルム株式会社
发明人： KITAGAWA HIROTAKA , ENOMOTO YUICHIRO
IPC分类号： H01L21/027 , B29C59/02 , C08F8/00 , C08G59/32
CPC分类号： C09D151/08 , B29C59/005 , B29K2063/00 , B29K2096/02 , C09D151/003 , G03F7/0002 , G03F7/038 , G03F7/0388 , G03F7/11
摘要： PROBLEM TO BE SOLVED: To provide an underlayer forming composition for imprint capable of forming an underlayer film improved in surface flatness and adhesion.SOLUTION: A surface of a substrate 1 is coated with an underlayer forming composition 2 containing resin having an ethylenic unsaturated group and a cyclic ether group selected from an oxiranyl group and an oxetanyl group and a weight-average molecular weight of 1000 or more, and a solvent. A surface of the underlayer forming composition is coated with a curable composition 3 for imprint, and a mold is applied to a surface of the curable composition. After the surface is irradiated with light, the mold is exfoliated. Etching is then performed along a pattern formed by the curable composition for imprint, and the curable composition 3 for imprint and the underlayer forming composition 2 are exfoliated, thereby forming a substrate having a required pattern.
摘要翻译：要解决的问题：提供能够形成下层膜的印刷用底层形成用组合物，其改善了表面平坦性和粘合性。溶胶：基材1的表面涂布有含有烯属不饱和基团的树脂的底层形成组合物2，选自环氧乙烷基和氧杂环丁烷基，重均分子量为1000以上的环状醚基和溶剂。用形成印模的可固化组合物3涂覆下层形成组合物的表面，并将模具施加到可固化组合物的表面上。用光照射表面后，模具脱落。然后沿着由用于压印的可固化组合物形成的图案进行蚀刻，并且用于压印的可固化组合物3和下层形成组合物2被剥离，从而形成具有所需图案的基材。

12. 发明专利

JP2014090133A Curable composition for imprint, pattern forming method, and pattern 有权
标题翻译：用于印刷，图案形成方法和图案的可固化组合物
公开(公告)号：JP2014090133A
公开(公告)日：2014-05-15
申请号：JP2012240442
申请日：2012-10-31
申请人： Fujifilm Corp , 富士フイルム株式会社
发明人： GOTO YUICHIRO , DAIMATSU TEI , ENOMOTO YUICHIRO , KITAGAWA HIROTAKA
IPC分类号： H01L21/027 , B29C59/02 , C08F2/44 , C08F2/50
CPC分类号： G03F7/0752 , G03F7/0002 , G03F7/0388
摘要： PROBLEM TO BE SOLVED: To provide a curable composition for imprint, capable of reducing mold release strength while maintaining pattern transfer performance.SOLUTION: A curable composition for imprinting contains (A) a polyfunctional polymerizable compound, (B) a photopolymerization initiator, and (C) an additive that has a structure selected from among the following structures (1) and a structure selected from among the following structures (2). (1) includes a polyalkylene oxide structure, a polyalkylene glycol ether structure, a polyalkylene glycol ester structure, an amine structure, a phosphoric acid ester group, a sulfonyl group and a sulfuric acid ester group. (2) includes an alkyl structure having 15 or more carbon atoms, an alicyclic structure, a urethane structure and a silicone structure.
摘要翻译：要解决的问题：提供一种能够在保持图案转印性能的同时降低剥离强度的压印用固化性组合物。解决方案：用于压印的可固化组合物含有（A）多官能可聚合化合物，（B）光聚合引发剂和（ C）具有选自以下结构（1）和选自以下结构（2）中的结构的结构的添加剂。（1）包括聚环氧烷结构，聚亚烷基二醇醚结构，聚亚烷基二醇酯结构，胺结构，磷酸酯基，磺酰基和硫酸酯基。（2）包括具有15个或更多个碳原子的烷基结构，脂环结构，氨基甲酸酯结构和硅氧烷结构。

13. 发明专利

JP2014024322A Lower layer film-forming composition for imprint, and method of pattern formation 有权
标题翻译：下层薄膜成型组合物及其形成方法
公开(公告)号：JP2014024322A
公开(公告)日：2014-02-06
申请号：JP2013063881
申请日：2013-03-26
申请人： Fujifilm Corp , 富士フイルム株式会社
发明人： KITAGAWA HIROTAKA , HATTORI AKIKO , ENOMOTO YUICHIRO
IPC分类号： B29C59/02 , C08F8/00 , C08F290/12 , H01L21/027
CPC分类号： C08F220/32 , B29C59/005 , B29K2033/12 , C08F220/18 , C08F220/28 , C08F2220/281 , C08F2220/325 , G03F7/0002 , H01L21/02356
摘要： PROBLEM TO BE SOLVED: To provide a lower layer film-forming composition for imprint capable of forming a lower layer film having small surface roughness and flatness.SOLUTION: A lower layer film-forming composition for imprint contains: a (meth)acrylic resin (A) comprising an ethylenically unsaturated group (P) and a nonionic hydrophilic group (Q) and having a weight average molecular weight of 1,000 or more; and a solvent (B). Here, the rein (A) has an acid value of less than 1.0 mmol/g. A lower layer film-forming composition contains: a (meth)acrylic resin (A2) comprising an ethylenically unsaturated group (P) and a cyclic substituent group (Q2) having a carbonyl group in a ring structure; and a solvent (B). Here, the resin (A) has an acid value of less than 1.0 mmol/g.
摘要翻译：要解决的问题：提供能够形成具有小表面粗糙度和平坦度的下层膜的压印用下层成膜组合物。解决方案：用于压印的下层成膜组合物包含：（甲基）丙烯酸树脂（ A）包含烯键式不饱和基团（P）和非离子亲水基团（Q），重均分子量为1,000以上; 和溶剂（B）。这里，（A）的酸值小于1.0mmol / g。下层成膜组合物含有：具有环状结构中具有羰基的烯键式不饱和基团（P）和环状取代基（Q2）的（甲基）丙烯酸树脂（A2）和溶剂（B）。这里，树脂（A）的酸值小于1.0mmol / g。

14. 发明专利

JP2013074015A Curable composition for imprint, method for forming pattern, and pattern 有权
标题翻译：用于印刷的可固化组合物，形成图案的方法和图案
公开(公告)号：JP2013074015A
公开(公告)日：2013-04-22
申请号：JP2011210530
申请日：2011-09-27
申请人： Fujifilm Corp , 富士フイルム株式会社
发明人： ENOMOTO YUICHIRO , KODAMA KUNIHIKO , TARUYA SHINJI
IPC分类号： H01L21/027 , B29C59/02 , C08F2/44
CPC分类号： C09D11/38 , B41J11/0015 , B41J11/002 , C08F2/44 , C08F2/50 , C08L33/00 , C09D11/101 , C09D11/30 , C09D133/16 , C09D183/06 , G03F7/0046 , G03F7/0048 , G03F7/027 , Y10T428/24802
摘要： PROBLEM TO BE SOLVED: To provide a curable composition for imprint, improved in surface roughness of a cured film.SOLUTION: A curable composition for imprint contains: (A) a polymerizable compound; (B) a polymerization initiator; and (C) a nonpolymerizable compound. The curable composition for imprint contains, as the nonpolymerizable compound (C), (C1) at least one kind of surfactants containing 20 mass% or more of fluorine atoms and (C2) at least one kind of polymers containing 3 mass% or more and less than 20 mass% of fluorine atoms and/or 5 mass% or more and less than 40 mass% of silicon atoms and having a weight average molecular weight (Mw) of 1,000-100,000.
摘要翻译：要解决的问题：提供用于压印的可固化组合物，提高固化膜的表面粗糙度。解决方案：用于压印的可固化组合物包含：（A）可聚合化合物; （B）聚合引发剂; 和（C）不可聚合的化合物。作为不可聚合化合物（C），（C1）含有20质量％以上的氟原子的表面活性剂和（C2）至少1种含有3质量％以上的聚合物的表面活性剂，小于20质量％的氟原子和/或5质量％以上且小于40质量％的硅原子，其重均分子量（Mw）为1,000〜10000000。版权所有（C）2013，JPO＆INPIT

15. 发明专利

JP2012169462A Production method of curable composition for imprint 有权
标题翻译：可固化组合物的生产方法
公开(公告)号：JP2012169462A
公开(公告)日：2012-09-06
申请号：JP2011029436
申请日：2011-02-15
申请人： Fujifilm Corp , 富士フイルム株式会社
发明人： ENOMOTO YUICHIRO , KODAMA KUNIHIKO , TARUYA SHINJI
IPC分类号： H01L21/027 , B29C59/02 , C08F2/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , G03F7/16
摘要： PROBLEM TO BE SOLVED: To provide a curable composition for imprint which reduces peeling of pattern effectively while ensuring excellent coating properties and temporal stability.SOLUTION: In the production method of a curable composition containing (A) a polymerizable monomer, (B) a polymerization initiator, and (C) a solvent, one kind of liquid (D) containing at least one kind of compound out of a group consisting of the polymerizable monomer (A) and the polymerization initiator (B) is prepared, the liquid (D) is passed through a filter, and then the solvent (C) is added. Alternatively, two kinds or more of liquids (D) containing at least one kind of compound out of a group consisting of the polymerizable monomer (A) and the polymerization initiator (B) are prepared, and respective liquids (D) are passed through a filter and mixed before the solvent (C) is added.
摘要翻译：要解决的问题：提供用于压印的可固化组合物，其有效地减少图案的剥离，同时确保优异的涂布性能和时间稳定性。解决方案：在含有（A）可聚合单体，（B）聚合引发剂和（C））溶剂的可固化组合物的制备方法中，一种含有至少一种化合物的液体（D）由可聚合单体（A）和聚合引发剂（B）组成的组中，使液体（D）通过过滤器，然后加入溶剂（C）。或者，制备两种以上含有由聚合性单体（A）和聚合引发剂（B）构成的组中的至少一种化合物的液体（D）），使各液体（D）通过过滤并加入溶剂（C）。版权所有（C）2012，JPO＆INPIT

16. 发明专利

JP2011215333A Pattern forming method and resist composition 有权
标题翻译：图案形成方法和阻力组成
公开(公告)号：JP2011215333A
公开(公告)日：2011-10-27
申请号：JP2010082701
申请日：2010-03-31
申请人： Fujifilm Corp , 富士フイルム株式会社
发明人： KAMIMURA SATOSHI , TARUYA SHINJI , IWATO KAORU , KATAOKA SHOHEI , MIZUTANI KAZUYOSHI , DOBASHI TORU , ENOMOTO YUICHIRO , FUJII KANA , KATO KEITA
IPC分类号： G03F7/038 , G03F7/004 , G03F7/32 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a pattern forming method for forming a pattern having a small number of development defects, and to provide a resist composition.SOLUTION: The pattern forming method includes (A) forming a film using the resist composition, (B) exposing the film, and (C) developing the exposed film using developing solution containing an organic solvent. The resist composition contains resin containing a repeating unit having a group that is decomposed by action of acid to generate an alcoholic hydroxy group, and a solvent containing at least one of the following component (S1) and component (S2). The component (S1) is propylene glycol monochrome alkyl ether carboxylate. The component (S2) is at least one selected from a group including propylene glycol monochrome alkyl ether, lactate, acetic acid ester, alkoxy propionic acid ester, chain ketone, cyclic ketone, lactone, and alkylene carbonate.
摘要翻译：要解决的问题：提供一种用于形成具有少量显影缺陷的图案的图案形成方法，并提供抗蚀剂组合物。解决方案：图案形成方法包括（A）使用抗蚀剂组合物形成膜（B ）曝光，和（C）使用含有机溶剂的显影溶液显影曝光的薄膜。抗蚀剂组合物含有含有具有通过酸作用分解的基团的重复单元以产生醇羟基的树脂，和含有至少一种以下组分（S1）和组分（S2）的溶剂。组分（S1）是丙二醇单烷基醚羧酸酯。组分（S2）是选自丙二醇单烷基醚，乳酸，乙酸酯，烷氧基丙酸酯，链酮，环酮，内酯和碳酸亚烷基中的至少一种。

17. 发明专利

JP2011203644A Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the same 有权
标题翻译：丙酰胺或辐射敏感性树脂组合物及其形成图案的方法
公开(公告)号：JP2011203644A
公开(公告)日：2011-10-13
申请号：JP2010072840
申请日：2010-03-26
申请人： Fujifilm Corp , 富士フイルム株式会社
发明人： KATAOKA SHOHEI , IWATO KAORU , KAMIMURA SATOSHI , DOBASHI TORU , ENOMOTO YUICHIRO , FUJII KANA , MIZUTANI KAZUYOSHI , TARUYA SHINJI , KATO KEITA
IPC分类号： G03F7/004 , C08F220/28 , G03F7/038 , G03F7/039 , H01L21/027
CPC分类号： G03F7/30 , C08F220/28 , C08F232/08 , G03F7/0045 , G03F7/0382 , G03F7/039 , G03F7/0397 , G03F7/0758 , G03F7/2041 , G03F7/325 , Y10T428/24802
摘要： PROBLEM TO BE SOLVED: To provide an actinic-ray- or radiation-sensitive resin composition excellent in etching resistivity and the stability during a post-exposure delay (PED) period, and to provide a method of forming a pattern using the same.SOLUTION: The actinic-ray- or radiation-sensitive resin composition contains: a resin containing a repeating unit containing a group that is decomposed when acted on by an acid to thereby produce an alcoholic hydroxyl group; and a compound that generates an acid of pKa≥-1.5 when exposed to actinic rays or radiation.
摘要翻译：要解决的问题：提供蚀刻电阻率和曝光延迟（PED）期间的稳定性优异的光化射线或辐射敏感性树脂组合物，并提供使用其形成图案的方法。：光化学射线或辐射敏感性树脂组合物含有：含有重复单元的树脂，该重复单元含有当被酸作用时分解的基团，从而产生醇羟基; 以及当暴露于光化射线或辐射时产生pKa≥-1.5的酸的化合物。

18. 发明专利

JP2011123469A Method of forming pattern using actinic-ray- or radiation sensitive resin composition, and pattern 有权
标题翻译：使用丙酰胺或辐射敏感性树脂组合物形成图案的方法和图案
公开(公告)号：JP2011123469A
公开(公告)日：2011-06-23
申请号：JP2010123542
申请日：2010-05-28
申请人： Fujifilm Corp , 富士フイルム株式会社
发明人： ENOMOTO YUICHIRO , TARUYA SHINJI , SHIBUYA AKINORI , YAMAGUCHI SHUHEI
IPC分类号： G03F7/004 , C08F20/28 , G03F7/038 , G03F7/039 , G03F7/32 , H01L21/027
CPC分类号： C08F20/28 , G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/095 , G03F7/325
摘要： PROBLEM TO BE SOLVED: To provide an actinic-ray- or radiation sensitive resin composition superior in line width roughness (LWR), depth of focus (DOP) and pattern profile, so as to more stably form a high-precision minute pattern for manufacturing a highly integrated high-precision electronic device, and to provide a method of forming a pattern using the same. SOLUTION: The method of forming a pattern includes: a step of applying the actinic-ray- or radiation sensitive resin composition on a substrate so as to form a film; a step of selectively exposing the film through a mask; and a step of developing the exposed film with the use of a developer containing an organic solvent, wherein the actinic-ray- or radiation sensitive resin composition contains: a resin (A) whose polarity is increased by the action of an acid so that the solubility of the resin in the developer containing an organic solvent is decreased; a photoacid generator (B) that, when exposed to actinic rays or radiation, generates an acid containing a fluorine atom; and a solvent (C), and wherein the photoacid generator (B) is contained in the composition in a ratio of 8-20 mass% based on the total solids of the composition. COPYRIGHT: (C)2011,JPO&INPIT
摘要翻译：要解决的问题：为了提供优异的线宽粗糙度（LWR），焦深（DOP）和图案轮廓优异的光化射线或辐射敏感性树脂组合物，以便更稳定地形成高精度分数用于制造高度集成的高精度电子器件的图案，并提供使用其形成图案的方法。解决方案：形成图案的方法包括：将光化学射线或辐射敏感性树脂组合物施加到基底上以形成膜的步骤; 通过掩模选择性地曝光所述膜的步骤; 以及使用包含有机溶剂的显影剂显影所述曝光膜的步骤，其中所述光化学射线或辐射敏感性树脂组合物含有：通过酸的作用极性增加的树脂（A），使得树脂在含有机溶剂的显影剂中的溶解度降低; 光生酸剂（B），当暴露于光化射线或辐射时，产生含有氟原子的酸; 和溶剂（C），其中组合物中的光酸产生剂（B）的含量相对于组合物的总固体为8〜20质量％。版权所有（C）2011，JPO＆INPIT

19. 发明专利

JP2012175071A Curable composition for imprint and method of manufacturing the same 审中-公开
标题翻译：用于印刷的可固化组合物及其制造方法
公开(公告)号：JP2012175071A
公开(公告)日：2012-09-10
申请号：JP2011038730
申请日：2011-02-24
申请人： Fujifilm Corp , 富士フイルム株式会社
发明人： ENOMOTO YUICHIRO , KODAMA KUNIHIKO , TARUYA SHINJI
IPC分类号： H01L21/027 , B29C59/02 , C08F2/46 , G11B5/84 , G11B7/26
摘要： PROBLEM TO BE SOLVED: To provide a curable composition for imprint which can effectively suppress defects in cure patterns.SOLUTION: The curable composition for imprint contains (A) a polymerizable monomer and (B) a polymerization initiator, and the dissolved gas amount is less than 150 ppm in a liquid at one atmosphere pressure and 25°C.

20. 发明专利

JP2012094821A Method of producing curable composition for imprint 有权
标题翻译：生产可固化组合物印花的方法
公开(公告)号：JP2012094821A
公开(公告)日：2012-05-17
申请号：JP2011180798
申请日：2011-08-22
申请人： Fujifilm Corp , 富士フイルム株式会社
发明人： ENOMOTO YUICHIRO , KODAMA KUNIHIKO , TARUYA SHINJI
IPC分类号： H01L21/027 , B29C59/02
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , G03F7/0046 , G03F7/027 , G03F7/0755 , G03F7/16
摘要： PROBLEM TO BE SOLVED: To provide a method of producing a curable composition for imprint having excellent pattern transfer properties.SOLUTION: The method of producing a curable composition for imprint includes a step for passing a curable composition containing (A) a polymerizable monomer and (B) a polymerization initiator through a first filter having an effective filtering area of 200 cmor more.

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