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11. 发明授权

US07084227B2 Photosensitive polymer and chemically amplified photoresist composition containing the same 失效
标题翻译：光敏聚合物和含有其的化学放大光致抗蚀剂组合物
公开(公告)号：US07084227B2
公开(公告)日：2006-08-01
申请号：US10925983
申请日：2004-08-26
申请人： Dong-won Jung , Sang-jun Choi , Si-hyeung Lee , Sook Lee
发明人： Dong-won Jung , Sang-jun Choi , Si-hyeung Lee , Sook Lee
IPC分类号： C08F10/00
CPC分类号： G03F7/0395
摘要： The photosensitive polymer includes a first monomer which is norbornene ester having C1 to C12 aliphatic alcohol as a substituent, and a second monomer which is maleic anhydride. A chemically amplified photoresist composition, containing the photosensitive polymer, has an improved etching resistance and adhesion to underlying layer materials, and exhibits wettability to developing solutions.
摘要翻译：感光性高分子包含作为取代基具有C 1〜C 12脂肪族醇的降冰片烯的第一单体和作为马来酸酐的第二单体。含有光敏聚合物的化学放大光致抗蚀剂组合物具有改善的抗蚀刻性和对下层材料的粘附性，并且显示出对显影溶液的润湿性。

12. 发明申请

US20100311058A1 METHOD FOR DETECTING NUCLEIC ACIDS BY SIMULTANEOUS ISOTHERMAL AMPLIFICATION OF NUCLEIC ACIDS AND SIGNAL PROBE 审中-公开
标题翻译：通过同位素放射核酸和信号探针检测核酸的方法
公开(公告)号：US20100311058A1
公开(公告)日：2010-12-09
申请号：US12745544
申请日：2008-04-24
申请人： Min Hwan Kim , Sook Lee , Un Ok Kim , Ji Won Jeong , Joo Hee Lee
发明人： Min Hwan Kim , Sook Lee , Un Ok Kim , Ji Won Jeong , Joo Hee Lee
IPC分类号： C12Q1/68 , C12P19/34
CPC分类号： C12Q1/6853 , C12Q2531/119 , C12Q2525/121 , C12Q2525/161
摘要： The present invention relates to a method for detecting target nucleic acids by simultaneous isothermal amplification of the target nucleic acids and a signal probe 5 using an external primer set, a DNA-RNA-DNA hybrid primer set and a DNA-RNA-DNA hybrid signal probe. The method according to the present invention can be used to amplify target nucleic acids in a sample, rapid and exact manner without the risk of contamination compared to the conventional methods such as PCR, and it can simultaneously amplify target nucleic acid and a signal probe, so that it can 0 be applied to various genome projects, detection and identification of a pathogen, detection of gene modification producing a predetermined phenotype, detection of hereditary diseases or determination of sensibility to diseases, and estimation of gene expression. Thus, it is useful for molecular biological studies and disease diagnosis.
摘要翻译：本发明涉及通过使用外部引物组，DNA-RNA-DNA杂交引物组和DNA-RNA-DNA混合信号同时等温扩增靶核酸和信号探针5来检测靶核酸的方法探测。根据本发明的方法可以用于与常规方法如PCR相比以快速和准确的方式扩增靶核酸而没有污染的风险，并且可以同时扩增靶核酸和信号探针，从而可以将其应用于各种基因组项目，病原体的检测和鉴定，产生预定表型的基因修饰的检测，遗传性疾病的检测或疾病的敏感性的测定以及基因表达的估计。因此，它对分子生物学研究和疾病诊断有用。

13. 发明申请

US20060147835A1 Chemically amplified photoresists and related methods 审中-公开
标题翻译：化学放大光刻胶及相关方法
公开(公告)号：US20060147835A1
公开(公告)日：2006-07-06
申请号：US11293125
申请日：2005-12-05
申请人： Sook Lee , Min-jeong Oh , Suk-joo Lee
发明人： Sook Lee , Min-jeong Oh , Suk-joo Lee
IPC分类号： G03C1/76
CPC分类号： G03F7/0392 , G03F7/0045 , G03F7/38
摘要： A chemically-amplified photoresist composition includes a polymer resin, a photo acid generator (PAG), and a thermal acid generator (TAG), where a thermal deprotection temperature of the polymer resin is greater than an acid generation temperature of the TAG. The photoresist composition may be utilized in a photolithography process which includes subjecting a layer of the photoresist composition to photon exposure which causes the PAG to decompose into acid, subjecting the photon-exposed layer of the photo resist composition to a heat treatment which causes the TAG to decompose into acid, and subjecting the heat-treated layer of photoreist composition to a post-exposure bake (PEB) at a temperature which is greater than the temperature of the heat treatment.
摘要翻译：化学增幅光致抗蚀剂组合物包括聚合物树脂，光酸产生剂（PAG）和热酸产生剂（TAG），其中聚合物树脂的热去保护温度大于TAG的酸生成温度。光致抗蚀剂组合物可以用于光刻工艺中，该方法包括使光致抗蚀剂组合物的一层经受光子曝光，导致PAG分解成酸，将光致抗蚀剂组合物的光子曝光层进行热处理，这导致TAG 分解成酸，并将光热组合物的热处理层在大于热处理温度的温度下经受曝光后烘烤（PEB）。

14. 发明授权

US06893793B2 Photosensitive polymer and chemically amplified photoresist composition containing the same 失效
标题翻译：光敏聚合物和含有其的化学放大光致抗蚀剂组合物
公开(公告)号：US06893793B2
公开(公告)日：2005-05-17
申请号：US10383770
申请日：2003-03-10
申请人： Dong-won Jung , Sang-jun Choi , Si-hyeung Lee , Sook Lee
发明人： Dong-won Jung , Sang-jun Choi , Si-hyeung Lee , Sook Lee
IPC分类号： C08F220/18 , C08F222/06 , C08F232/04 , G03F7/004 , G03F7/039 , H01L21/027
CPC分类号： G03F7/0395 , G03F7/0397 , Y10S430/106 , Y10S430/115 , Y10S430/122
摘要： The photosensitive polymer includes a first monomer which is norbornene ester having C1 to C12 aliphatic alcohol as a substituent, and a second monomer which is maleic anhydride. A chemically amplified photoresist composition, containing the photosensitive polymer, has an improved etching resistance and adhesion to underlying layer materials, and exhibits wettability to developing solutions.
摘要翻译：感光性高分子包含作为取代基具有C 1〜C 12脂肪族醇的降冰片烯的第一单体和作为马来酸酐的第二单体。含有光敏聚合物的化学放大光致抗蚀剂组合物具有改进的抗蚀刻性和对下层材料的粘附性，并且显示出对显影液的润湿性。

15. 发明授权

US06593441B2 Photosensitive polymer and chemically amplified photoresist composition containing the same 失效
公开(公告)号：US06593441B2
公开(公告)日：2003-07-15
申请号：US10218637
申请日：2002-08-15
申请人： Dong-won Jung , Sang-jun Choi , Si-hyeung Lee , Sook Lee
发明人： Dong-won Jung , Sang-jun Choi , Si-hyeung Lee , Sook Lee
IPC分类号： C08F3600
CPC分类号： G03F7/0395 , G03F7/0397 , Y10S430/106 , Y10S430/115 , Y10S430/122
摘要： The photosensitive polymer includes a first monomer which is norbornene ester having C1 to C12 aliphatic alcohol as a substituent, and a second monomer which is maleic anhydride. A chemically amplified photoresist composition, containing the photosensitive polymer, has an improved etching resistance and adhesion to underlying layer materials, and exhibits wettability to developing solutions.

16. 发明申请

US20050019693A1 Photosensitive polymer and chemically amplified photoresist composition containing the same 失效
标题翻译：光敏聚合物和含有其的化学放大光致抗蚀剂组合物
公开(公告)号：US20050019693A1
公开(公告)日：2005-01-27
申请号：US10925983
申请日：2004-08-26
申请人： Dong-won Jung , Sang-jun Choi , Si-hyeung Lee , Sook Lee
发明人： Dong-won Jung , Sang-jun Choi , Si-hyeung Lee , Sook Lee
IPC分类号： G03F7/039 , G03C1/76
CPC分类号： G03F7/0395
摘要： The photosensitive polymer includes a first monomer which is norbornene ester having C1 to C12 aliphatic alcohol as a substituent, and a second monomer which is maleic anhydride. A chemically amplified photoresist composition, containing the photosensitive polymer, has an improved etching resistance and adhesion to underlying layer materials, and exhibits wettability to developing solutions.
摘要翻译：感光性高分子包含作为取代基具有C1〜C12脂肪族醇的降冰片酯的第一单体和作为马来酸酐的第二单体。含有光敏聚合物的化学放大光致抗蚀剂组合物具有改进的抗蚀刻性和对下层材料的粘附性，并且显示出对显影液的润湿性。

17. 发明授权

US06472120B1 Photosensitive polymer and chemically amplified photoresist composition containing the same 失效
公开(公告)号：US06472120B1
公开(公告)日：2002-10-29
申请号：US09628499
申请日：2000-07-28
申请人： Dong-won Jung , Sang-jun Choi , Si-hyeung Lee , Sook Lee
发明人： Dong-won Jung , Sang-jun Choi , Si-hyeung Lee , Sook Lee
IPC分类号： G03F7004
CPC分类号： G03F7/0395 , G03F7/0397 , Y10S430/106 , Y10S430/115 , Y10S430/122
摘要： The photosensitive polymer includes a first monomer which is norbornene ester having C1 to C12 aliphatic alcohol as a substituent, and a second monomer which is maleic anhydride. A chemically amplified photoresist composition, containing the photosensitive polymer, has an improved etching resistance and adhesion to underlying layer materials, and exhibits wettability to developing solutions.

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