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11. 发明授权

US06890688B2 Lithographic template and method of formation and use 有权
标题翻译：光刻模板及其形成和使用方法
公开(公告)号：US06890688B2
公开(公告)日：2005-05-10
申请号：US10022489
申请日：2001-12-18
申请人： David P. Mancini , Douglas J. Resnick , Carlton Grant Willson
发明人： David P. Mancini , Douglas J. Resnick , Carlton Grant Willson
IPC分类号： G03F7/00 , G03F7/09 , G03C5/00
CPC分类号： B82Y10/00 , B82Y40/00 , G03F7/0002 , G03F7/0017 , G03F7/093
摘要： This invention relates to a lithographic template, a method of forming the lithographic template and a method for forming devices with the lithographic template. The lithographic template (10, 110, 210) is formed having a substrate (12, 112, 212) and a charge dissipation layer (20, 120, 220), and a patterned imageable relief layer, (16, 116, 216) formed on a surface (14, 114, 214) of the substrate (10, 110, 210) using radiation. The template (10, 110, 210) is used in the fabrication of a semiconductor device (344) for affecting a pattern in the device (344) by positioning (338) the template (10, 11, 210) in close proximity to semiconductor device (344) having a radiation sensitive material (334) formed thereon and applying a pressure (340) to cause the radiation sensitive material to flow into the relief image present on the template (10, 110, 210). Radiation (342) is then applied through the template (10, 110, 210) to cure portions of the radiation sensitive material and define the pattern in the radiation sensitive material. The template (10, 110, 210) is then removed to complete fabrication of semiconductor device (344).
摘要翻译：本发明涉及一种光刻模板，一种形成光刻模板的方法和一种用该光刻模板形成器件的方法。光刻模板（10,110,210）形成为具有衬底（12,112,212）和电荷耗散层（20,120,220），以及形成图案的可成像的浮雕层（16,116,216），形成在使用辐射的衬底（10,110,210）的表面（14,114,214）上。模板（10,110,210）用于制造半导体器件（344），用于通过将模板（10,11,210）定位（338）靠近半导体来影响器件（344）中的图案装置（344），其上形成有辐射敏感材料（334），并施加压力（340）以使得辐射敏感材料流入存在于模板（10,110,210）上的浮雕图像中。辐射（342）然后通过模板（10,110,210）施加以固化辐射敏感材料的部分并且限定辐射敏感材料中的图案。然后去除模板（10,110,210）以完成半导体器件（344）的制造。

12. 发明授权

US06852454B2 Multi-tiered lithographic template and method of formation and use 失效
标题翻译：多层平版印刷板及其形成与使用方法
公开(公告)号：US06852454B2
公开(公告)日：2005-02-08
申请号：US10174464
申请日：2002-06-18
申请人： David P. Mancini , Douglas J. Resnick
发明人： David P. Mancini , Douglas J. Resnick
IPC分类号： G03F7/11 , B81C99/00 , G03F7/00 , H01L21/027 , G03F9/00 , G03C5/00
CPC分类号： B82Y10/00 , B82Y40/00 , G03F7/0002 , G03F7/0017 , G03F7/0035
摘要： This invention relates to semiconductor devices, microelectronic devices, microelectromechanical devices, microfluidic devices, photonic devices, and more particularly to a multi-tiered lithographic template, a method of forming the multi-tiered lithographic template and a method for forming devices with the multi-tiered lithographic template. The multi-tiered lithographic template (10/10′) is formed having a first relief structure and a second relief structure, thereby defining a multi-tiered relief image. The template is used in the fabrication of a semiconductor device (40) for affecting a pattern in device (40) by positioning the template in close proximity to semiconductor device (40) having a radiation sensitive material formed thereon and applying a pressure to cause the radiation sensitive material to flow into the multi-tiered relief image present on the template. Radiation is then applied through the multi-tiered template so as to further cure portions of the radiation sensitive material and further define the pattern in the radiation sensitive material. The multi-tiered template is then removed to complete fabrication of semiconductor device (40).
摘要翻译：本发明涉及半导体器件，微电子器件，微机电器件，微流器件，光子器件，更具体地涉及多层光刻模板，形成多层光刻模板的方法和用于形成具有多层光刻模板的器件的方法，分层光刻模板。多层平版印刷板（10/10'）形成为具有第一浮雕结构和第二浮雕结构，由此限定多层浮雕图像。该模板用于制造用于通过将模板靠近其上形成有辐射敏感材料的半导体器件（40）定位模板来影响器件（40）中的图案并施加压力的半导体器件（40）辐射敏感材料流入模板上存在的多层浮雕图像。然后通过多层模板施加辐射，以便进一步固化辐射敏感材料的部分，并进一步限定辐射敏感材料中的图案。然后去除多层模板以完成半导体器件（40）的制造。

13. 发明授权

US06630746B1 Semiconductor device and method of making the same 有权
标题翻译：半导体器件及其制造方法
公开(公告)号：US06630746B1
公开(公告)日：2003-10-07
申请号：US09566961
申请日：2000-05-09
申请人： David P. Mancini , Douglas J. Resnick , Harland G. Tompkins , Karen E. Moore
发明人： David P. Mancini , Douglas J. Resnick , Harland G. Tompkins , Karen E. Moore
IPC分类号： H01L2348
CPC分类号： G03F9/7076 , G03F9/7069 , H01L2223/54426
摘要： An alignment mark (51) is formed on the surface (64) of a silicon carbide substrate (50). The alignment mark (51) is used to reflect a light signal (72) to determine the proper position for the silicon carbide substrate (50). The materials that are used to form the alignment mark (51) can be used to form an alignment mark on any transparent or semi-transparent substrate and will maintain physical integrity through very high temperature processing steps.
摘要翻译：在碳化硅衬底（50）的表面（64）上形成对准标记（51）。对准标记（51）用于反射光信号（72）以确定碳化硅衬底（50）的适当位置。用于形成对准标记（51）的材料可以用于在任何透明或半透明基材上形成对准标记，并且将通过非常高的温度处理步骤来保持物理完整性。

14. 发明授权

US06562553B2 Lithographic printing method using a low surface energy layer 失效
标题翻译：使用低表面能层的平版印刷方法
公开(公告)号：US06562553B2
公开(公告)日：2003-05-13
申请号：US09881242
申请日：2001-05-10
申请人： David P. Mancini , Douglas J. Resnick
发明人： David P. Mancini , Douglas J. Resnick
IPC分类号： G03F700
CPC分类号： G03F7/115 , G03F1/48 , G03F7/2014
摘要： A method of contact printing on a device using a partially transparent mask (18) having first and second surfaces, comprises the steps of applying a layer of low surface energy polymeric material (22) to the first surface of the mask; placing the first surface (24) of the mask contiguous to the device (10), the layer of low surface energy polymeric material being substantially in contact with the device; and applying radiation (32) to the second surface of the mask for affecting a pattern in the device.
摘要翻译：使用具有第一表面和第二表面的部分透明掩模（18）在装置上进行接触印刷的方法包括以下步骤：将低表面能聚合材料层（22）施加到掩模的第一表面; 将所述掩模的所述第一表面（24）邻近所述装置（10）放置，所述低表面能聚合物材料层基本上与所述装置接触; 以及将辐射（32）施加到所述掩模的第二表面以影响所述装置中的图案。

15. 发明授权

US06368924B1 Amorphous carbon layer for improved adhesion of photoresist and method of fabrication 有权
标题翻译：非晶碳层，用于改善光致抗蚀剂的附着力和制造方法
公开(公告)号：US06368924B1
公开(公告)日：2002-04-09
申请号：US09703208
申请日：2000-10-31
申请人： David P. Mancini , Steven M. Smith , Douglas J. Resnick
发明人： David P. Mancini , Steven M. Smith , Douglas J. Resnick
IPC分类号： H01L21336
CPC分类号： H01L21/0271 , G03F7/09 , G03F7/11 , H01L21/31111 , H01L21/3146
摘要： An improved and novel semiconductor device including an amorphous carbon layer for improved adhesion of photoresist and method of fabrication. The device includes a substrate having a surface, a carbon layer formed on the surface of the substrate, and a resist layer formed on a surface of the carbon layer. The device is formed by providing a substrate having a surface, depositing a carbon layer on the surface of the substrate using plasma enhanced chemical vapor deposition (PECVD) or sputtering, and forming a resist layer on a surface of the carbon layer.
摘要翻译：一种改进且新颖的半导体器件，包括用于改善光致抗蚀剂粘附性的无定形碳层和制造方法。该装置包括具有表面的基板，形成在基板的表面上的碳层和形成在碳层的表面上的抗蚀剂层。该器件通过提供具有表面的衬底，使用等离子体增强化学气相沉积（PECVD）或溅射在衬底的表面上沉积碳层并在碳层的表面上形成抗蚀剂层而形成。

16. 发明授权

US07906274B2 Method of creating a template employing a lift-off process 有权
标题翻译：使用剥离过程创建模板的方法
公开(公告)号：US07906274B2
公开(公告)日：2011-03-15
申请号：US11943907
申请日：2007-11-21
申请人： Gerard M. Schmid , Douglas J. Resnick , Michael N. Miller
发明人： Gerard M. Schmid , Douglas J. Resnick , Michael N. Miller
IPC分类号： G03F7/00 , G03F7/09 , G03F7/26 , G03F7/40
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： A method of forming a lithographic template, the method including, inter alia, creating a multi-layered structure, by forming, on a body, a conducting layer, and forming on the conducting layer, a patterned layer having protrusions and recessions, the recessions exposing portions of the conducting layer; depositing a hard mask material anisotropically on the multi-layered structure covering a top surface of the patterned layer and the portions of the conducting layer; removing the patterned layer by a lift-off process, with the hard mask material remaining on the portions of the conducting layer; positioning a resist pattern on the multi-layered structure to define a region of the multi-layered structure; and selectively removing portions of the multi-layered structure in superimposition with the region using the hard mask material as an etching mask.
摘要翻译：一种形成光刻模板的方法，所述方法尤其包括通过在主体上形成导电层并在导电层上形成具有突起和凹陷的图案层，形成多层结构，所述凹陷暴露导电层的部分; 在覆盖图案化层的顶表面和导电层的部分的多层结构上各向异性地沉积硬掩模材料; 通过剥离过程去除图案层，硬掩模材料残留在导电层的部分上; 将抗蚀剂图案定位在所述多层结构上以限定所述多层结构的区域; 并且使用硬掩模材料作为蚀刻掩模选择性地去除与该区域重叠的多层结构的部分。

17. 发明申请

US20100085555A1 In-Situ Cleaning of an Imprint Lithography Tool 有权
标题翻译：印刷平版印刷工具的原位清洁
公开(公告)号：US20100085555A1
公开(公告)日：2010-04-08
申请号：US12563356
申请日：2009-09-21
申请人： Gerard M. Schmid , Ian Matthew McMackin , Byung-Jin Choi , Douglas J. Resnick
发明人： Gerard M. Schmid , Ian Matthew McMackin , Byung-Jin Choi , Douglas J. Resnick
IPC分类号： G03B27/64 , B08B7/00 , B01J19/12
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , G03F7/70925
摘要： Imprint lithography system may provide for an energy source for solidification of material positioned between a template and a substrate. Additionally, the energy source and/or an additional energy source may be used to clean contaminants from the template and/or the substrate.
摘要翻译：压印光刻系统可以提供用于固化位于模板和衬底之间的材料的能量源。此外，能量源和/或附加能量源可用于从模板和/或基底清洁污染物。

18. 发明申请

US20070243655A1 Self-Aligned Process for Fabricating Imprint Templates Containing Variously Etched Features 有权
标题翻译：用于制造包含各种蚀刻特征的印记模板的自对准过程
公开(公告)号：US20070243655A1
公开(公告)日：2007-10-18
申请号：US11693236
申请日：2007-03-29
申请人： Gerard M. Schmid , Nicholas A. Stacey , Douglas J. Resnick , Ronald D. Voisin , Lawrence J. Myron
发明人： Gerard M. Schmid , Nicholas A. Stacey , Douglas J. Resnick , Ronald D. Voisin , Lawrence J. Myron
IPC分类号： H01L21/467
CPC分类号： G03F7/0005 , B82Y10/00 , B82Y40/00 , G02B3/0012 , G03F7/0002
摘要： A process that enables coplanarization of the structures that have been created in multiple independent etch steps. The various etches are performed independently by selectively exposing only certain patterns to particular etching conditions. After these structures have been created, it is possible that the various structures will exist at different planes/elevations relative to the template surface. The elevations of the various structures may be adjusted independently by selectively exposing “higher” structures to an anisotropic etch that reduces the overall elevation of the structures, while preserving the structural topography.
摘要翻译：能够在多个独立蚀刻步骤中产生的结构共面化的工艺。通过仅选择性地将某些图案暴露于特定的蚀刻条件来独立地执行各种蚀刻。在这些结构已被创建之后，可能各种结构将相对于模板表面存在于不同的平面/高度处。可以通过选择性地将“较高”结构暴露于各向异性蚀刻来独立地调节各种结构的高度，从而降低结构的整体高度，同时保留结构形貌。

19. 发明授权

US6024885A Process for patterning magnetic films 失效
标题翻译：磁性膜图形化处理
公开(公告)号：US6024885A
公开(公告)日：2000-02-15
申请号：US986764
申请日：1997-12-08
申请人： Sandeep Pendharkar , Douglas J. Resnick
发明人： Sandeep Pendharkar , Douglas J. Resnick
IPC分类号： C23F4/00 , G11B5/39 , H01F41/30 , H01F41/34 , H01L21/8246 , H01L27/22 , C23F1/12
CPC分类号： H01F41/34 , B82Y10/00 , B82Y25/00 , B82Y40/00 , C23F4/00 , H01F41/308 , H01L43/12 , G11B2005/3996
摘要： A process of patterning magnetic multilayer films including the steps of successively depositing a plurality of magnetic multilayer films on a supporting substrate, selectively removing portions of the plurality of magnetic multilayer films using a reactive plasma etch including chlorine gas, and passivating in situ, or an adjacent evacuated chamber, remaining portions of the plurality of magnetic multilayer films, i.e. the memory elements, in a post-etch fluorinated plasma.
摘要翻译：一种图案化磁性多层膜的方法，包括以下步骤：在支撑衬底上连续沉积多个磁性多层膜，使用包括氯气的反应性等离子体蚀刻和现场钝化来选择性地去除多个磁性多层膜的部分，相邻的真空室，在蚀刻后的氟化等离子体中的多个磁性多层膜的剩余部分，即存储元件。

20. 发明授权

US5590239A Planar uniform heating surface with additional circumscribing ring 失效
标题翻译：平面均匀加热表面，带附加外接环
公开(公告)号：US5590239A
公开(公告)日：1996-12-31
申请号：US254845
申请日：1994-06-06
申请人： Douglas J. Resnick , William A. Johnson , Kevin D. Cummings , Hector T. H. Chen
发明人： Douglas J. Resnick , William A. Johnson , Kevin D. Cummings , Hector T. H. Chen
IPC分类号： G03F1/22 , G03F7/20 , G21K1/06 , G21K5/04 , H01L21/00 , H05B1/00 , G21K5/00
CPC分类号： H01L21/67103 , G03F1/22 , G03F7/70866 , G21K1/06 , H01J2237/2001
摘要： A uniform heating fixture and method of use is provided. A heat conductive member having a first plane surface, a second surface and a third plane surface is formed. The first plane surface and the third plane surface are parallel and are connected by a second surface. The third plane surface circumscribes and extends away from the first plane surface, thereby enabling uniform heating of an X-ray mask.
摘要翻译：提供均匀的加热夹具和使用方法。形成具有第一平面，第二表面和第三平面的导热构件。第一平面和第三平面平行并通过第二表面连接。第三平面表面限定并远离第一平面，从而能够均匀地加热X射线掩模。

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