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11. 发明申请

US20120306137A1 PARALLEL SINGLE SUBSTRATE PROCESSING SYSTEM 有权
标题翻译：平行单基板加工系统
公开(公告)号：US20120306137A1
公开(公告)日：2012-12-06
申请号：US13488343
申请日：2012-06-04
申请人： Arthur Keigler , Freeman Fisher , Daniel L. Goodman , Jonathan Haynes
发明人： Arthur Keigler , Freeman Fisher , Daniel L. Goodman , Jonathan Haynes
IPC分类号： B23Q1/25
CPC分类号： H01L21/67757 , H01L21/67028 , H01L21/67034 , H01L21/67051 , H01L21/67057 , H01L21/67173 , H01L21/6776 , H01L21/67781 , H01L21/68 , H01L21/68707
摘要： A system for fluid processing substrate surfaces arrayed in a fluid having a process section with a frame having a plurality of process elements to process the substrate surfaces without contacting the substrate surfaces. A substrate holder assembly having a holder frame and a number of substrate holders, each of which is coupled to the holder frame and is configured for holding a substrate so that each substrate holder holds a different substrate for transport as a unit with the substrate holder assembly to and from the process section. The substrate holder assembly and each substrate holder are removably coupled to the process section frame, and the substrate holders of the substrate holder assembly are movable relative to the holder frame and positionable in repeatable alignment with respect to a predetermined feature of the process section and independent of positioning of the holder frame with respect to the process section.
摘要翻译：一种用于流体处理衬底表面的系统，其布置在具有工艺部分的流体中，所述工艺部分具有框架，所述框架具有多个处理元件，以处理所述衬底表面而不接触所述衬底表面。一种衬底保持器组件，其具有保持器框架和多个衬底保持器，每个衬底保持器联接到保持器框架并且构造成用于保持衬底，使得每个衬底保持器保持不同的衬底以作为与衬底保持器组件往返于过程部分。衬底保持器组件和每个衬底保持器可移除地联接到处理部分框架，并且衬底保持器组件的衬底保持器相对于保持器框架可移动并且可相对于工艺段的预定特征可重复地对准并且独立地保持框架相对于处理部分的定位。

12. 发明申请

US20120325275A1 SUBSTRATE HOLDER 有权
标题翻译：基板支架
公开(公告)号：US20120325275A1
公开(公告)日：2012-12-27
申请号：US13356252
申请日：2012-01-23
申请人： Daniel Goodman , Arthur Keigler , David G. Guarnaccia
发明人： Daniel Goodman , Arthur Keigler , David G. Guarnaccia
IPC分类号： B08B3/00 , B23Q3/06 , B23B31/12 , F26B11/02 , B23B31/14
CPC分类号： B23B31/14 , B23B31/1261 , F26B5/08 , H01L21/68728 , Y10T279/18 , Y10T279/247
摘要： A rotary chuck adapted to hold a substrate. The rotary chuck has a rotatable chuck portion and an edge grip having a movable grip member movably mounted to the rotatable chuck portion, the moveable grip member being substantially free moving so that rotation of the rotating chuck portion causes the moveable grip member to move in a plane substantially aligned with a surface of the substrate to engage the substrate in a engaged position. A resilient element is coupled to the moveable grip member, the resilient member biasing the grip member to a disengaged position.
摘要翻译：适于保持基板的旋转卡盘。旋转卡盘具有可旋转卡盘部分和边缘把手，其具有可移动地安装到可旋转卡盘部分的可移动抓握构件，可移动抓握构件基本上自由移动，使得旋转卡盘部分的旋转导致可移动抓握构件在平面基本上与衬底的表面对准，以将衬底接合在接合位置。弹性元件联接到可移动握持构件，弹性构件将把手构件偏置到脱离位置。

13. 发明申请

US20130048610A1 EDGE BEVEL REMOVAL APPARATUS AND METHOD 有权
标题翻译：边缘去除装置和方法
公开(公告)号：US20130048610A1
公开(公告)日：2013-02-28
申请号：US13595785
申请日：2012-08-27
申请人： Daniel GOODMAN , Arthur Keigler , Terry McElroy , Gary Boulet
发明人： Daniel GOODMAN , Arthur Keigler , Terry McElroy , Gary Boulet
IPC分类号： B44C1/22
CPC分类号： B44C1/22 , H01L21/02087 , H01L21/6708 , H01L21/6719 , Y10S134/902
摘要： A substrate edge bevel etch module for etching a material from a peripheral edge of a substrate with an etchant is described. The substrate edge bevel etch module includes a rotatable substrate holder having a support for a substrate, and a surface tension etch applicator comprising a wetted etching surface opposing a substrate surface proximate an edge of the substrate when the surface tension etch applicator is located proximate to the edge of the substrate. The surface tension etch applicator further includes an etchant dispensing portion, proximate the wetted etching surface, which dispenses an etchant in a region between the wetted etching surface and the substrate surface and wet at least a portion of the wetted etching surface and the substrate surface. A spacing between the wetted etching surface and the substrate surface is selected to retain the etchant using surface tension forces and form a meniscus there between.
摘要翻译：描述了用于用蚀刻剂从衬底的周边边缘蚀刻材料的衬底边缘斜面蚀刻模块。衬底边缘斜面蚀刻模块包括具有用于衬底的支撑件的可旋转衬底保持器，以及表面张力蚀刻施加器，当表面张力蚀刻施加器位于靠近衬底边缘时，该表面张力蚀刻施加器包括与靠近衬底的边缘的衬底表面相对的润湿蚀刻表面衬底的边缘。表面张力蚀刻施加器还包括蚀刻剂分配部分，靠近润湿的蚀刻表面，其在润湿的蚀刻表面和基底表面之间的区域中分配蚀刻剂，并湿润至少一部分润湿的蚀刻表面和基底表面。润湿的蚀刻表面和基底表面之间的间距被选择以使用表面张力保持蚀刻剂，并在其间形成弯液面。

14. 发明申请

US20110240481A1 SEED LAYER DEPOSITION IN MICROSCALE FEATURES 有权
标题翻译：微粒特征中的种子层沉积
公开(公告)号：US20110240481A1
公开(公告)日：2011-10-06
申请号：US12755198
申请日：2010-04-06
申请人： Arthur Keigler , Johannes Chiu , Zhenqiu Liu , Daniel Goodman
发明人： Arthur Keigler , Johannes Chiu , Zhenqiu Liu , Daniel Goodman
IPC分类号： C25D5/02 , C25D17/00
CPC分类号： C25D7/123 , C25D17/001 , H01L21/2885 , H01L21/76873 , H01L21/76898 , H01L2221/1089
摘要： A method and system for coating the interior surfaces of microscale hole features fabricated into the substantially planar surface of a work piece. The method comprises providing a work piece with a barrier metal coating that is substantially continuous and uniform both along the planar surface of the work piece and the inner surfaces of the microscale hole features wherein said barrier metal coating is applied by a substantially surface reaction limited process. The workpiece is provided with a coating, on the planar surface of the work piece, of a thick metal layer anchored to the barrier metal coat and disposed to provide substantially uniform electrical conduction capability to the microscale features located throughout and across the workpiece. An electrical contact path is provided to the electrically conductive coating at the perimeter of the work piece. The workpiece is immersed in a chemical bath, causing said chemical bath to fully contact the interior surfaces of the microscale hole features, said chemical bath containing metal ions suitable for electrodeposition. An electric potential is applied at the perimeter of the work piece to cause electrodeposition of metal ions onto all surfaces of the work piece including the interior surfaces of the microscale hole features to a predetermined finish coating in one step.
摘要翻译：一种用于涂覆微孔孔特征的内表面的方法和系统，其制造成工件的基本平坦的表面。该方法包括提供具有阻挡金属涂层的工件，所述阻挡金属涂层沿着工件的平坦表面和微孔特征的内表面基本上连续且均匀，其中所述阻挡金属涂层通过基本上表面反应限制的工艺。工件在工件的平坦表面上设置有锚固到阻挡金属涂层的厚金属层并且设置成为位于整个和跨过工件的微尺度特征提供基本均匀的导电能力的涂层。在工件周边处的导电涂层上提供电接触路径。将工件浸入化学浴中，使所述化学浴与微孔特征的内表面完全接触，所述化学浴含有适合于电沉积的金属离子。在工件的周边施加电势，使金属离子在工件的所有表面上电沉积，包括微孔孔特征的内表面到一个步骤中的预定的涂层。

15. 发明授权

US09714474B2 Seed layer deposition in microscale features 有权
公开(公告)号：US09714474B2
公开(公告)日：2017-07-25
申请号：US12755198
申请日：2010-04-06
申请人： Arthur Keigler , Johannes Chiu , Zhenqiu Liu , Daniel Goodman
发明人： Arthur Keigler , Johannes Chiu , Zhenqiu Liu , Daniel Goodman
IPC分类号： C25D7/12 , H01L21/288 , H01L21/768 , C25D17/00
CPC分类号： C25D7/123 , C25D17/001 , H01L21/2885 , H01L21/76873 , H01L21/76898 , H01L2221/1089
摘要： A method and system for coating the interior surfaces of microscale hole features fabricated into the substantially planar surface of a work piece. The method comprises providing a work piece with a barrier metal coating that is substantially continuous and uniform both along the planar surface of the work piece and the inner surfaces of the microscale hole features wherein said barrier metal coating is applied by a substantially surface reaction limited process. The workpiece is provided with a coating, on the planar surface of the work piece, of a thick metal layer anchored to the barrier metal coat and disposed to provide substantially uniform electrical conduction capability to the microscale features located throughout and across the workpiece. An electrical contact path is provided to the electrically conductive coating at the perimeter of the work piece. The workpiece is immersed in a chemical bath, causing said chemical bath to fully contact the interior surfaces of the microscale hole features, said chemical bath containing metal ions suitable for electrodeposition. An electric potential is applied at the perimeter of the work piece to cause electrodeposition of metal ions onto all surfaces of the work piece including the interior surfaces of the microscale hole features to a predetermined finish coating in one step.

16. 发明授权

US09421617B2 Substrate holder 有权
标题翻译：基板支架
公开(公告)号：US09421617B2
公开(公告)日：2016-08-23
申请号：US13356252
申请日：2012-01-23
申请人： Daniel Goodman , Arthur Keigler , David G. Guarnaccia
发明人： Daniel Goodman , Arthur Keigler , David G. Guarnaccia
IPC分类号： B23B31/14 , H01L21/687 , F26B5/08 , B23B31/12
CPC分类号： B23B31/14 , B23B31/1261 , F26B5/08 , H01L21/68728 , Y10T279/18 , Y10T279/247
摘要： A rotary chuck adapted to hold a substrate. The rotary chuck has a rotatable chuck portion and an edge grip having a movable grip member movably mounted to the rotatable chuck portion, the moveable grip member being substantially free moving so that rotation of the rotating chuck portion causes the moveable grip member to move in a plane substantially aligned with a surface of the substrate to engage the substrate in a engaged position. A resilient element is coupled to the moveable grip member, the resilient member biasing the grip member to a disengaged position.
摘要翻译：适于保持基板的旋转卡盘。旋转卡盘具有可旋转卡盘部分和边缘把手，其具有可移动地安装到可旋转卡盘部分的可移动抓握构件，可移动抓握构件基本上自由移动，使得旋转卡盘部分的旋转导致可移动抓握构件在平面基本上与衬底的表面对准，以将衬底接合在接合位置。弹性元件联接到可移动握持构件，弹性构件将把手构件偏置到脱离位置。

17. 发明授权

US08420981B2 Apparatus for thermal processing with micro-environment 失效
标题翻译：微环境热处理设备
公开(公告)号：US08420981B2
公开(公告)日：2013-04-16
申请号：US12590852
申请日：2009-11-13
申请人： Daniel Goodman , Arthur Keigler , David G. Guarnaccia , Matthew R. Jeffers
发明人： Daniel Goodman , Arthur Keigler , David G. Guarnaccia , Matthew R. Jeffers
IPC分类号： H01L21/477 , F27D11/00
CPC分类号： H01L21/6719 , H01L21/67109
摘要： A substrate thermal processing system. The system has at least one substrate holding module having a housing configured for holding an isolated environment therein. A substrate heater is located in the housing and has a substrate heating surface. A substrate cooler is located in the housing and having a substrate cooling surface. A gas feed opening into the housing and feeding inert or reducing gas into the housing when the substrate is heated by the heating surface. A gas restrictor is within the housing restricting the fed gas between the substrate heating surface and a surrounding atmospheric region substantially surrounding the substrate heating surface in the housing and forming an aperture through which the fed gas communicates with the atmospheric region.
摘要翻译：基板热处理系统。该系统具有至少一个基板保持模块，该模块具有用于在其中保持隔离环境的壳体。衬底加热器位于壳体中并且具有衬底加热表面。衬底冷却器位于壳体中并且具有衬底冷却表面。当基板被加热表面加热时，气体进入开口并进入惰性气体或还原气体进入壳体。气体限制器在壳体内部，限制基板加热表面和基本上围绕壳体中的基板加热表面的周围大气区域之间的进料气体，并形成进料气体与大气区域连通的孔。

18. 发明授权

US08858755B2 Edge bevel removal apparatus and method 有权
标题翻译：边缘斜角去除装置及方法
公开(公告)号：US08858755B2
公开(公告)日：2014-10-14
申请号：US13595785
申请日：2012-08-27
申请人： Daniel Goodman , Arthur Keigler , Terry McElroy , Gary Boulet
发明人： Daniel Goodman , Arthur Keigler , Terry McElroy , Gary Boulet
IPC分类号： B44C1/22 , H01L21/67 , H01L21/02
CPC分类号： B44C1/22 , H01L21/02087 , H01L21/6708 , H01L21/6719 , Y10S134/902
摘要： A substrate edge bevel etch module for etching a material from a peripheral edge of a substrate with an etchant is described. The substrate edge bevel etch module includes a rotatable substrate holder having a support for a substrate, and a surface tension etch applicator comprising a wetted etching surface opposing a substrate surface proximate an edge of the substrate when the surface tension etch applicator is located proximate to the edge of the substrate. The surface tension etch applicator further includes an etchant dispensing portion, proximate the wetted etching surface, which dispenses an etchant in a region between the wetted etching surface and the substrate surface and wet at least a portion of the wetted etching surface and the substrate surface. A spacing between the wetted etching surface and the substrate surface is selected to retain the etchant using surface tension forces and form a meniscus there between.
摘要翻译：描述了用于用蚀刻剂从衬底的周边边缘蚀刻材料的衬底边缘斜面蚀刻模块。衬底边缘斜面蚀刻模块包括具有用于衬底的支撑件的可旋转衬底保持器，以及表面张力蚀刻施加器，当表面张力蚀刻施加器位于靠近衬底边缘时，该表面张力蚀刻施加器包括与靠近衬底的边缘的衬底表面相对的润湿蚀刻表面衬底的边缘。表面张力蚀刻施加器还包括蚀刻剂分配部分，靠近润湿的蚀刻表面，其在润湿的蚀刻表面和基底表面之间的区域中分配蚀刻剂，并湿润至少一部分润湿的蚀刻表面和基底表面。润湿的蚀刻表面和基底表面之间的间距被选择以使用表面张力保持蚀刻剂，并在其间形成弯液面。

19. 发明申请

US20130011225A1 SUBSTRATE LOADER AND UNLOADER HAVING A BERNOULLI SUPPORT 有权
标题翻译：具有BERNOULLI支持的基座装载机和卸载器
公开(公告)号：US20130011225A1
公开(公告)日：2013-01-10
申请号：US13279405
申请日：2011-10-24
申请人： Daniel Goodman , Arthur Keigler , Freman Fisher , David G. Guarnaccia
发明人： Daniel Goodman , Arthur Keigler , Freman Fisher , David G. Guarnaccia
IPC分类号： B25J15/06
CPC分类号： H01L21/67092 , H01L21/6838 , H01L21/68764 , H01L21/68785
摘要： A substrate chuck comprising a frame forming a support adapted to support an adhering surface thereon and a Bernoulli chuck surface coupled to the frame and adapted to support the substrate, the Bernoulli chuck surface being axially moveable relative to the support. The Bernoulli chuck surface has a first position adjacent the substrate with the substrate coupled to the adhering surface and wherein the Bernoulli chuck surface is moveable from the first position to a second position separating the substrate from the adhering surface without contact between the substrate and the Bernoulli chuck surface.
摘要翻译：一种基板卡盘，其包括形成支撑件的框架，所述支架适于支撑其上的粘合表面，以及联接到所述框架并适于支撑所述基板的伯努利卡盘表面，所述伯努利卡盘表面相对于所述支撑件可轴向移动。伯努利卡盘表面具有与衬底相邻的第一位置，衬底与粘合表面相连，并且其中伯努利卡盘表面可从第一位置移动到第二位置，从而将衬底与粘附表面分离，而基板和伯努利卡盘表面。

20. 发明授权

US09147588B2 Substrate processing pallet with cooling 有权
标题翻译：基板加工托盘带冷却
公开(公告)号：US09147588B2
公开(公告)日：2015-09-29
申请号：US11716538
申请日：2007-03-09
申请人： Daniel Goodman , Arthur Keigler , Stephen Golovato , David Felsenthal
发明人： Daniel Goodman , Arthur Keigler , Stephen Golovato , David Felsenthal
IPC分类号： H01L21/00 , B05C11/00 , H01L21/67 , H01L21/677 , H01L21/683
CPC分类号： H01L21/67103 , H01L21/67109 , H01L21/67703 , H01L21/6831
摘要： A substrate processing pallet can cool a substrate. A substrate processing pallet can include a base member; an interface pad attachable to the base member, the interface pad having substantially the same coefficient of thermal expansion as the base member and adapted to facilitate cooling of the substrate; and a surface of the base member having features for aligning a substrate on the interface pad. A substrate processing pallet can also include a base member; an interface pad attachable to the base member; an electrostatic chuck for gripping the substrate during processing; an energy storage system for storing energy to sustain the electrostatic chuck at sufficient charge to sustain grip the substrate during processing; and a conduit for transporting gas to a backside of the substrate to facilitate cooling of the substrate.
摘要翻译：基板处理托盘可以冷却基板。基板处理托盘可以包括基部构件; 接口垫，其可附接到所述基底构件，所述界面垫具有与所述基底构件基本上相同的热膨胀系数并且适于促进所述衬底的冷却; 并且所述基底构件的表面具有用于使所述界面垫上的衬底对准的特征。基板处理托盘还可以包括基部构件; 可附接到基座构件的接口垫; 用于在加工期间夹持基板的静电卡盘; 能量存储系统，用于存储能量以在足够的电荷下维持静电卡盘，以在加工期间保持夹持基板; 以及用于将气体输送到衬底的背面以便于冷却衬底的导管。

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