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11. 发明授权

US08263511B2 High purity fused silica with low absolute refractive index 有权
$High purity fused silica with low absolute refractive index$
标题翻译：具有低绝对折射率的高纯度熔融石英
公开(公告)号：US08263511B2
公开(公告)日：2012-09-11
申请号：US12644563
申请日：2009-12-22
申请人： Carlos Duran , Richard Michael Fiacco , Kenneth Edward Hrdina , Daniel Raymond Sempolinski
发明人： Carlos Duran , Richard Michael Fiacco , Kenneth Edward Hrdina , Daniel Raymond Sempolinski
IPC分类号： C03C3/06 , C03B25/00
CPC分类号： C03B25/02 , C03B19/1453 , C03B2201/03 , C03B2201/04 , C03C3/06 , C03C2201/22 , C03C2201/23
摘要： A fused silica glass article having a low absolute refractive index and low concentrations of hydroxyl groups, halogens, and metal having a low absolute refractive index. The glass article contains less than about 10 ppm protium-containing and deuterium-containing hydroxyl groups by weight and less than about 20 ppm halogens by weight. The silica glass article also has an absolute refractive index (ARI) less than or equal to 1.560820. In one embodiment, the ARI of the fused silica article is achieved by lowering the fictive temperature of the fused silica. A method of lowering the fictive temperature is also described.
摘要翻译：具有低绝对折射率和低浓度羟基，卤素和具有低绝对折射率的金属的熔融石英玻璃制品。玻璃制品含有重量少于约10ppm含氘羟基和重量小于约20ppm的卤素。石英玻璃制品的绝对折射率（ARI）也小于或等于1.560820。在一个实施方案中，熔融二氧化硅制品的ARI通过降低熔融二氧化硅的假想温度来实现。还描述了降低虚构温度的方法。

12. 发明申请

US20110207593A1 Expansivity in Low Expansion Silica-Titania Glasses 审中-公开
标题翻译：低膨胀二氧化硅 - 二氧化钛玻璃的膨胀性
公开(公告)号：US20110207593A1
公开(公告)日：2011-08-25
申请号：US13028516
申请日：2011-02-16
申请人： Carlos Duran , Kenneth Edward Hrdina , John Edward Maxon
发明人： Carlos Duran , Kenneth Edward Hrdina , John Edward Maxon
IPC分类号： C03C3/06 , C03C3/076 , C03B19/06 , C03B25/00
CPC分类号： C03B19/1407 , C03B19/1453 , C03B2201/23 , C03B2201/42 , C03C3/06 , C03C3/076 , C03C2201/20
摘要： This disclosure is directed to tailoring and improving the expansivity of low thermal expansion silica-titania glass through changes in the [OH] content and fictive temperature of the glasses. The [OH] concentration in the glass can be in the range of 600-2500 ppm. The fictive temperature, TF is less than 900° C.
摘要翻译：本发明旨在通过玻璃的[OH]含量和假想温度的变化来定制和改善低热膨胀二氧化硅 - 二氧化钛玻璃的膨胀性。玻璃中的[OH]浓度可以在600-2500ppm的范围内。假想温度，TF低于900℃

13. 发明申请

US20110092354A1 SYNTHETIC SILICA GLASS WITH UNIFORM FICTIVE TEMPERATURE 有权
标题翻译：合成二氧化硅玻璃具有均匀的温度
公开(公告)号：US20110092354A1
公开(公告)日：2011-04-21
申请号：US12902238
申请日：2010-10-12
申请人： Carlos Duran , Kenneth Edward Hrdina , Ulrich Wilhelm Heinz Neukirch
发明人： Carlos Duran , Kenneth Edward Hrdina , Ulrich Wilhelm Heinz Neukirch
IPC分类号： C03C3/04 , C03B25/00
CPC分类号： C03B25/02 , C03B19/1453 , C03B2201/07 , C03B2201/075 , C03B2201/22 , C03B2201/23
摘要： A method of making a silica glass having a uniform fictive temperature. The glass article is heated at a target fictive temperature, or heated or cooled at a rate that is less than the rate of change of the fictive temperature, for a time that is sufficient to allow the fictive temperature of the glass to come within 3° C. of the target fictive temperature. The silica glass is then cooled from the target fictive temperature to a temperature below the strain point of the glass at a cooling rate that is greater than the relaxation rate of the glass at the target fictive temperature. The silica glass has a fictive temperature that varies by less than 3° C. after the annealing step. A silica glass made by the method is also described.
摘要翻译：制造具有均匀的假想温度的二氧化硅玻璃的方法。将玻璃制品在目标假想温度下加热，或以低于假想温度变化率的速率加热或冷却一段足以使玻璃的假想温度达到3°的时间 C.目标虚构温度。然后将二氧化硅玻璃从目标假想温度冷却至低于玻璃应变点的温度，其冷却速率大于目标假想温度下玻璃的松弛率。二氧化硅玻璃具有在退火步骤之后变化小于3℃的假想温度。还描述了通过该方法制备的二氧化硅玻璃。

14. 发明授权

US08261578B2 Hydrogen loading of near net shape optics 有权
标题翻译：近净形状光学器件的氢负荷
公开(公告)号：US08261578B2
公开(公告)日：2012-09-11
申请号：US12258703
申请日：2008-10-27
申请人： Kenneth Edward Hrdina , Michael A Mueller , Susan Schiefelbein
发明人： Kenneth Edward Hrdina , Michael A Mueller , Susan Schiefelbein
IPC分类号： C03C15/00 , C03C3/06 , C03B19/06 , C03B37/018
CPC分类号： C03B19/1453 , C03B32/00 , C03B2201/21 , C03C3/06 , C03C2201/21 , Y10T428/249921
摘要： A method of making a fused silica article that is loaded with hydrogen. A fused silica glass near net shape part is provided and is loaded with a molecular hydrogen in a range from about 0.1×1017 molecules/cm3 up to about 1×1019 molecules/cm3. The thinner shape of the near net shape part enables the shape to be loaded more quickly than previous methods. A fused silica article loaded with hydrogen using the method is also described.
摘要翻译：制备负载氢的熔融二氧化硅制品的方法。提供了近净形状部分的熔融二氧化硅玻璃，并加载了约0.1×10 17分子/ cm 3至约1×10 19分子/ cm 3范围内的分子氢。近净形状部分的形状更薄，能够使形状比以前的方法更快地加载。还描述了使用该方法加载氢的熔融二氧化硅制品。

15. 发明授权

US08021755B2 Low thermal expansion glass for EUVL applications 有权
标题翻译：用于EUVL应用的低热膨胀玻璃
公开(公告)号：US08021755B2
公开(公告)日：2011-09-20
申请号：US12862965
申请日：2010-08-25
申请人： Kenneth Edward Hrdina , Michael A Mueller , Barbara L Stainbrook
发明人： Kenneth Edward Hrdina , Michael A Mueller , Barbara L Stainbrook
IPC分类号： B32B17/06
CPC分类号： C03C3/076 , C03C4/0085 , C03C17/02 , C03C23/007 , Y10T428/24355 , Y10T428/2495
摘要： A low thermal expansion glass includes a base glass material having a front surface, a back surface, and a thickness and a glass coating material applied on at least the front surface of the base glass material. The base glass material consists essentially 10 wt % to 20 wt % titania and 80 wt % to 90 wt % silica. The glass coating material also consists essentially of titania and silica, but the total amount of titania in the glass coating material is lower than the total amount of titania in the base glass material. A silica-titania glass element suitable for extreme ultraviolet lithography applications consists of 12 wt % to 20 wt % titania and 80 wt % to 88 wt % silica and has a coefficient of thermal expansion of essentially 0 ΔL/L in a temperature range of −20° C. to +100° C.
摘要翻译：低热膨胀玻璃包括具有前表面，后表面和厚度的基底玻璃材料，以及施加在基底玻璃材料的至少前表面上的玻璃涂层材料。基础玻璃材料基本上由10重量％至20重量％的二氧化钛和80重量％至90重量％的二氧化硅组成。玻璃涂层材料也基本上由二氧化钛和二氧化硅组成，但玻璃涂层材料中二氧化钛的总量低于基础玻璃材料中二氧化钛的总量。适用于极紫外光刻应用的二氧化硅 - 二氧化钛玻璃元件由12重量％至20重量％的二氧化钛和80重量％至88重量％的二氧化硅组成，并且在温度范围内的热膨胀系数基本为0＆Dgr; L / L -20°C至+ 100°C

16. 发明申请

US20110207592A1 Low Expansivity, High Transmission Titania Doped Silica Glass 有权
标题翻译：低膨胀率，高透射率二氧化钛掺杂二氧化硅玻璃
公开(公告)号：US20110207592A1
公开(公告)日：2011-08-25
申请号：US13028472
申请日：2011-02-16
申请人： Carlos Duran , Kenneth Edward Hrdina , Michael A. Mueller
发明人： Carlos Duran , Kenneth Edward Hrdina , Michael A. Mueller
IPC分类号： C03C3/06
CPC分类号： C03C3/06 , B82Y10/00 , B82Y40/00 , C03B19/1407 , C03B19/1415 , C03B19/1453 , C03B2201/21 , C03B2201/23 , C03B2201/42 , C03C4/0071 , C03C4/0085 , C03C2201/21 , C03C2201/23 , C03C2201/42 , C03C2203/40 , C03C2203/52 , G03F1/60 , G03F7/0002 , G03F7/70958
摘要： In one embodiment the present disclosure is directed to a silica-titania glass with an internal transmission of >90%/cm at wavelengths from 340 nm to 840 nm. In another embodiment the internal transmission is >93%/cm at wavelengths from 340 nm to 840 nm. In a further embodiment the internal transmission is >95%/cm at wavelengths from 340 nm to 840 nm. In another embodiment the disclosure is directed to a silica-titania glass with an overall transmission through an optic made of the glass is >84% at wavelengths from 340 nm to 840 nm. In another embodiment overall transmission through an optic made of the glass is >86% at wavelengths from 340 nm to 840 nm. In a further embodiment the overall transmission through an optic made of the glass is >88% at wavelengths from 330 nm to 840 nm. In a further embodiment the silica-titania glass has a Ti+3 concentration level [Ti3+] less than 3 ppm by weight.
摘要翻译：在一个实施方案中，本公开涉及在340nm至840nm的波长下具有> 90％/ cm 3的内透射率的二氧化硅 - 二氧化钛玻璃。在另一个实施例中，在340nm至840nm的波长下，内透射率> 93％/ cm。在另一个实施方案中，在340nm至840nm的波长下，内透射率> 95％/ cm。在另一个实施方案中，本公开涉及一种二氧化硅 - 二氧化钛玻璃，其透射率通过玻璃制成的光学器件在340nm至840nm的波长处为> 84％。在另一个实施例中，通过由玻璃制成的光学器件的整个透射在340nm至840nm的波长处为> 86％。在另一实施例中，通过由玻璃制成的光学器件的整体透射在330nm至840nm的波长处为> 88％。在另一个实施方案中，二氧化硅 - 二氧化钛玻璃具有小于3ppm重量的Ti + 3浓度水平[Ti 3+]。

17. 发明申请

US20090143213A1 LOW EXPANSION GLASS MATERIAL HAVING LOW EXPANSIVITY GRADIENT 有权
标题翻译：低膨胀玻璃材料具有低膨胀梯度
公开(公告)号：US20090143213A1
公开(公告)日：2009-06-04
申请号：US12277611
申请日：2008-11-25
申请人： Kenneth Edward Hrdina , Robert Sabia
发明人： Kenneth Edward Hrdina , Robert Sabia
IPC分类号： C03C3/04
CPC分类号： C03C3/06 , C03B19/1407 , C03B19/143 , C03B19/1484 , C03B2201/42 , C03C2201/42 , C03C2203/40
摘要： A low expansion glass substrate includes titania and silica and has a thermal expansivity with an average gradient less than 1 ppb/° C./° C. in a temperature range of 19° C. to 25° C.
摘要翻译：低膨胀玻璃基板包括二氧化钛和二氧化硅，并且在19℃至25℃的温度范围内具有平均梯度小于1ppb /℃/℃的热膨胀性。

18. 发明申请

US20090110899A1 HYDROGEN LOADING OF NEAR NET SHAPE OPTICS 有权
标题翻译：近似网格形状的氢化装置
公开(公告)号：US20090110899A1
公开(公告)日：2009-04-30
申请号：US12258703
申请日：2008-10-27
申请人： Kenneth Edward Hrdina , Michael A. Mueller , Susan Schiefelbein
发明人： Kenneth Edward Hrdina , Michael A. Mueller , Susan Schiefelbein
IPC分类号： B32B5/00 , C01B3/02
CPC分类号： C03B19/1453 , C03B32/00 , C03B2201/21 , C03C3/06 , C03C2201/21 , Y10T428/249921
摘要： A method of making a fused silica article that is loaded with hydrogen. A fused silica glass near net shape part is provided and is loaded with a molecular hydrogen in a range from about 0.1×1017 molecules/cm3 up to about 1×1019 molecules/cm3. The thinner shape of the near net shape part enables the shape to be loaded more quickly than previous methods. A fused silica article loaded with hydrogen using the method is also described.
摘要翻译：制备负载氢的熔融二氧化硅制品的方法。提供靠近净形状部分的熔融石英玻璃，并加载约0.1×10 17分子/ cm 3至多约1×1019分子/ cm 3的分子氢。近净形状部分的形状更薄，能够使形状比以前的方法更快地加载。还描述了使用该方法加载氢的熔融二氧化硅制品。

19. 发明授权

US08596094B2 Synthetic silica glass with uniform fictive temperature 有权
标题翻译：具有均匀假想温度的合成石英玻璃
公开(公告)号：US08596094B2
公开(公告)日：2013-12-03
申请号：US12902238
申请日：2010-10-12
申请人： Carlos Duran , Kenneth Edward Hrdina , Ulrich Wilhelm Heinz Neukirch
发明人： Carlos Duran , Kenneth Edward Hrdina , Ulrich Wilhelm Heinz Neukirch
IPC分类号： C03B13/00 , C03B15/00 , C03B19/00 , C03B25/00 , C03C3/06
CPC分类号： C03B25/02 , C03B19/1453 , C03B2201/07 , C03B2201/075 , C03B2201/22 , C03B2201/23
摘要： A method of making a silica glass having a uniform fictive temperature. The glass article is heated at a target fictive temperature, or heated or cooled at a rate that is less than the rate of change of the fictive temperature, for a time that is sufficient to allow the fictive temperature of the glass to come within 3° C. of the target fictive temperature. The silica glass is then cooled from the target fictive temperature to a temperature below the strain point of the glass at a cooling rate that is greater than the relaxation rate of the glass at the target fictive temperature. The silica glass has a fictive temperature that varies by less than 3° C. after the annealing step. A silica glass made by the method is also described.
摘要翻译：制造具有均匀的假想温度的二氧化硅玻璃的方法。将玻璃制品在目标假想温度下加热，或以低于假想温度变化率的速率加热或冷却一段足以使玻璃的假想温度达到3°的时间 C.目标虚构温度。然后将二氧化硅玻璃从目标假想温度冷却至低于玻璃应变点的温度，其冷却速率大于目标假想温度下玻璃的松弛率。二氧化硅玻璃具有在退火步骤之后变化小于3℃的假想温度。还描述了通过该方法制备的二氧化硅玻璃。

20. 发明申请

US20120267280A1 VESSEL FOR MOLTEN SEMICONDUCTING MATERIALS AND METHODS OF MAKING THE SAME 审中-公开
标题翻译：用于摩擦半导体材料的容器及其制备方法
公开(公告)号：US20120267280A1
公开(公告)日：2012-10-25
申请号：US13093336
申请日：2011-04-25
申请人： Glen Bennett Cook , Kenneth Edward Hrdina , Christopher Scott Thomas , John Forrest Wight, JR.
发明人： Glen Bennett Cook , Kenneth Edward Hrdina , Christopher Scott Thomas , John Forrest Wight, JR.
IPC分类号： B65D85/00 , B29C39/12
CPC分类号： C30B28/06 , C30B29/06 , C30B35/002
摘要： The disclosure relates to vessels configured to contain molten semiconducting materials. The vessels include a high purity fused silica lining having a base and sidewalls that define an interior volume, and a fused silica backing proximate the external surfaces of the lining
摘要翻译：本公开涉及构造成容纳熔融半导体材料的容器。容器包括具有限定内部容积的基部和侧壁的高纯度熔融石英衬里和靠近衬里的外表面的熔融石英衬垫

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