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11. 发明授权

US06220771B1 Wafer backside protection apparatus 有权
标题翻译：晶片背面保护装置
公开(公告)号：US06220771B1
公开(公告)日：2001-04-24
申请号：US09461349
申请日：1999-12-15
申请人： Fu-Ching Tung , Hong-Ming Chen , Wu-Lang Lin , Chia-Ming Chen , Jen-Rong Huang , Peter L. Mahneke , Janathan Wang
发明人： Fu-Ching Tung , Hong-Ming Chen , Wu-Lang Lin , Chia-Ming Chen , Jen-Rong Huang , Peter L. Mahneke , Janathan Wang
IPC分类号： G03D500
CPC分类号： H01L21/6708 , G03F7/707 , G03F7/70916 , H01L21/67028
摘要： A wafer backside protection apparatus includes a motor, a vacuum chuck, an annular seat and a top cover. The motor has an output shaft upon which the chuck is mounted. The chuck has a front surface to suck and hold a wafer from its backside. The chuck has a backside in which a water guard ring and a plurality of slant bores are formed. The slant bores run from the water guard ring through the wafer front surface. The annular seat is located below the chuck and has two symmetrical slant nozzles projecting toward motor rotating direction for ejecting protection liquid to the water guard ring. Protection liquid may be spun and splashed out through the slant bores to form a protection liquid film between the chuck and the wafer backside due to centrifugal force resulting from chuck and wafer rotation driven by the motor. The protection liquid film may protect wafer backside from chemical erosion and contamination resulting from wafer production process.
摘要翻译：晶片背面保护装置包括电动机，真空吸盘，环形座和顶盖。马达具有输出轴，卡盘安装在该输出轴上。卡盘具有从其背面吸取并保持晶片的前表面。卡盘具有背面，其中形成有防水环和多个倾斜孔。倾斜的孔从防水环穿过晶片正面。环形座位于卡盘下方，并具有朝向马达旋转方向突出的两个对称倾斜喷嘴，用于将防护液喷射到防水环上。保护液体可以通过倾斜孔旋转溅出，由卡盘和由马达驱动的晶片旋转产生的离心力在卡盘和晶片背面之间形成保护液膜。保护液膜可以保护晶片背面免受晶片生产过程中的化学侵蚀和污染。

12. 发明授权

US06622883B1 Door for wafer container having rotatable cammed member and movable links 失效
标题翻译：具有旋转凸轮部件和活动连接件的晶片容器的门
公开(公告)号：US06622883B1
公开(公告)日：2003-09-23
申请号：US09644653
申请日：2000-08-24
申请人： Tzong-Ming Wu , Jen-Rong Huang , Muh-Wang Liang
发明人： Tzong-Ming Wu , Jen-Rong Huang , Muh-Wang Liang
IPC分类号： B65D4528
CPC分类号： H01L21/67373 , Y10T292/0837 , Y10T292/0839
摘要： A Modified door for wafer container, includes a rotatable cammed member, two first links coupled to the rotatable cammed member and vertically aligned and moved in and out of respective first latch holes on the wafer transport module upon rotary motion of the rotatable cammed member, and two second links respectively coupled to the first links and horizontally moved in and out of respective second latch holes on the wafer transport module upon movement of the first links. The links each have a slope adapted to be moved with the respective link over a respective bearing means of the door body to force the door body inwards against the wafer transport module, keeping the wafer transport module well sealed.
摘要翻译：一种用于晶片容器的修改门，包括可旋转的凸轮构件，两个第一连杆，其联接到可旋转的凸轮构件，并且在可旋转的凸轮构件的旋转运动时垂直对准并移入和移出晶片传送模块上的相应的第一闩锁孔;以及两个第二链节分别耦合到第一链节并且在第一链节移动时水平地移入和移出晶片传送模块上的相应的第二闩锁孔。连接件各自具有适于与相应的连杆一起移动到相应的门体的相应轴承装置上的斜面，以将门体向内抵靠晶片传送模块，从而保持晶片传送模块的良好密封。

13. 发明授权

US08944347B2 Deposition nozzle and apparatus for thin film deposition process 有权
标题翻译：沉积喷嘴和薄膜沉积工艺的设备
公开(公告)号：US08944347B2
公开(公告)日：2015-02-03
申请号：US13495889
申请日：2012-06-13
申请人： Jen-Rong Huang
发明人： Jen-Rong Huang
IPC分类号： B05B1/28 , C23C16/455 , C23C16/458 , C23C16/48
CPC分类号： C23C16/45551 , C23C16/45574 , C23C16/4584 , C23C16/482
摘要： A deposition nozzle and a deposition apparatus include a nozzle body, a precursor passageway formed at a central region of the nozzle body for a precursor gas to be sprayed on the substrate such that the precursor gas reacts with a surface of the substrate, an extraction passageway formed in the nozzle body and located at a peripheral side of the precursor passageway, and extracting residues after the precursor gas reacts with the surface of the substrate, and an air curtain passageway formed in the nozzle body and located at a peripheral side of the extraction passageway for isolating gas to be sprayed on the substrate so as to form a closed gas flow field enclosing a process reaction region between a substrate carrier and the deposition nozzle such that the residues after the precursor gas reacts with the surface of the substrate do not leak.
摘要翻译：沉积喷嘴和沉积设备包括喷嘴体，前体通道，形成在喷嘴体的中心区域，用于待喷涂在基板上的前体气体，使得前体气体与基板的表面反应，提取通道形成在喷嘴体中并且位于前体通路的周边，并且在前体气体与基板的表面反应之后提取残留物，以及形成在喷嘴体中并位于提取物的外围侧的气幕通道用于将待喷雾的气体隔离在基板上，以形成封闭的气体流场，其包围基板载体和沉积喷嘴之间的工艺反应区域，使得前体气体与基板表面反应的残留物不会泄漏。

14. 发明授权

US08896135B2 Encapsulation film, package structure utilizing the same, and method for forming the package structure 有权
标题翻译：封装膜，利用其的封装结构以及形成封装结构的方法
公开(公告)号：US08896135B2
公开(公告)日：2014-11-25
申请号：US12984542
申请日：2011-01-04
申请人： Ching-Chiun Wang , Kang-Feng Lee , Feng-Yu Tsai , Ming Horn Zheng , Chih-Yung Huang , Shih-Chin Lin , Jen-Rong Huang
发明人： Ching-Chiun Wang , Kang-Feng Lee , Feng-Yu Tsai , Ming Horn Zheng , Chih-Yung Huang , Shih-Chin Lin , Jen-Rong Huang
IPC分类号： H01L23/28 , H01L21/56 , C08F8/42 , H01L31/048 , H01L33/56
CPC分类号： C08F8/42 , H01L31/0481 , H01L33/56 , Y02E10/50 , C08F216/06
摘要： Disclosed is an encapsulation film. An inorganic oxide film is formed on an organic sealing layer by an atomic layer deposition (ALD) to form the encapsulation film, wherein the organic sealing layer is a polymer containing hydrophilic groups. The organic sealing layer and the inorganic oxide layer have covalent bondings therebetween. The encapsulation film can solve the moisture absorption problem of conventional organic sealing layers, thereby being suitable for use as a package of optoelectronic devices.
摘要翻译：公开了一种封装膜。通过原子层沉积（ALD）在有机密封层上形成无机氧化物膜以形成包封膜，其中有机密封层是含有亲水基团的聚合物。有机密封层和无机氧化物层之间具有共价键。该封装膜可以解决传统的有机密封层的吸湿问题，从而适用于光电器件的封装。

15. 发明申请

US20120032355A1 ENCAPSULATION FILM, PACKAGE STRUCTURE UTILIZING THE SAME, AND METHOD FOR FORMING THE PACKAGE STRUCTURE 有权
标题翻译：封装膜，使用其的包装结构以及形成包装结构的方法
公开(公告)号：US20120032355A1
公开(公告)日：2012-02-09
申请号：US12984542
申请日：2011-01-04
申请人： Ching-Chiun Wang , Kang-Feng Lee , Feng-Yu Tsai , Ming Hom Zheng , Chih-Yung Huang , Shih-Chin Lin , Jen-Rong Huang
发明人： Ching-Chiun Wang , Kang-Feng Lee , Feng-Yu Tsai , Ming Hom Zheng , Chih-Yung Huang , Shih-Chin Lin , Jen-Rong Huang
IPC分类号： H01L23/28 , H01L21/56 , C08F8/42
CPC分类号： C08F8/42 , H01L31/0481 , H01L33/56 , Y02E10/50 , C08F216/06
摘要： Disclosed is an encapsulation film. An inorganic oxide film is formed on an organic sealing layer by an atomic layer deposition (ALD) to form the encapsulation film, wherein the organic sealing layer is a polymer containing hydrophilic groups. The organic sealing layer and the inorganic oxide layer have covalent bondings therebetween. The encapsulation film can solve the moisture absorption problem of conventional organic sealing layers, thereby being suitable for use as a package of optoelectronic devices.
摘要翻译：公开了一种封装膜。通过原子层沉积（ALD）在有机密封层上形成无机氧化物膜以形成包封膜，其中有机密封层是含有亲水基团的聚合物。有机密封层和无机氧化物层之间具有共价键。该封装膜可以解决传统的有机密封层的吸湿问题，从而适用于光电器件的封装。

16. 发明授权

US06653245B2 Method for liquid phase deposition 失效
标题翻译：液相沉积方法
公开(公告)号：US06653245B2
公开(公告)日：2003-11-25
申请号：US09874108
申请日：2001-06-06
申请人： Muh-Wang Liang , Pang-Min Chiang , Chen Max , Jen-Rong Huang , Ching-Fa Yeh
发明人： Muh-Wang Liang , Pang-Min Chiang , Chen Max , Jen-Rong Huang , Ching-Fa Yeh
IPC分类号： H01L2131
CPC分类号： H01L21/67086 , H01L21/316 , Y10T137/4643 , Y10T137/4891 , Y10T137/5386 , Y10T137/5474 , Y10T137/8593 , Y10T307/779
摘要： A method for liquid phase deposition, including the steps of providing at least two raw materials from at least two supply devices of a saturation reaction system into a mixture trough and stirring until saturation occurs, filtering out unnecessary solid-state particles, and providing saturated and filtered liquid into an over-saturation reaction trough of a steady-flow over-saturation loop reaction system and stopping the saturated and filtered liquid when the over-saturation reaction trough is filled and the saturated and filtered liquid over-flows into a liquid level control trough to a pre-determined level. The method also includes the steps of providing a substrate in the over-saturation reaction trough, providing reactants from at least two supply devices into the over-saturation reaction trough, and depositing a thin film onto the substrate when the saturated liquid becomes over-saturated.
摘要翻译：一种用于液相沉积的方法，包括以下步骤：将饱和反应体系的至少两个供应装置的至少两种原料提供到混合物槽中，并搅拌直到饱和发生，过滤不需要的固态颗粒，并提供饱和和过滤液体进入稳流过饱和环路反应系统的过饱和反应槽，当过饱和反应槽填满时停止饱和和过滤的液体，饱和和过滤的液体过量流入液位控制低谷达到预定水平。该方法还包括以下步骤：在过饱和反应槽中提供衬底，将反应物从至少两个供应装置提供到过饱和反应槽中，并且当饱和液体变得过度饱和时，将薄膜沉积到衬底上。

17. 发明授权

US06398033B1 Wafer container with retractable handle 失效
标题翻译：带可伸缩手柄的晶圆容器
公开(公告)号：US06398033B1
公开(公告)日：2002-06-04
申请号：US09645039
申请日：2000-08-24
申请人： Tzong-Ming Wu , Tien-Lu Ho , Jen-Rong Huang
发明人： Tzong-Ming Wu , Tien-Lu Ho , Jen-Rong Huang
IPC分类号： B65D8530
CPC分类号： H01L21/67379 , B65D25/2841 , B65D2519/00293 , B65D2525/288 , Y10T16/464
摘要： A wafer container is constructed to include a shell, a holder frame, two retaining blocks, and a handle. The shell has a coupling unit at the periphery. The retaining blocks are fastened to the holder frame, forming first pivot structure. The handle is provided with second pivot structure adapted for coupling to the first pivot structure for enabling the handle to be turned relative to the holder frame through an angle between the operative position convenient for carrying by hand, and the collapsed, non-operative position to minimize space occupation.
摘要翻译：晶片容器被构造成包括壳体，保持器框架，两个保持块和手柄。外壳在外围有一个耦合单元。保持块被固定到支架框架上，形成第一枢轴结构。手柄设置有适于联接到第一枢转结构的第二枢转结构，用于使手柄能够相对于保持架框架转动，以便于便于携带手术的操作位置之间的角度以及塌缩的非操作位置尽量减少空间占用。

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