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11. 发明专利

DE69840931D1 未知
公开(公告)号：DE69840931D1
公开(公告)日：2009-08-06
申请号：DE69840931
申请日：1998-07-31
申请人： CYMER INC
发明人： SANDSTROM RICHARD L , DAS PALASH P , FOMENKOV IGOR V , BESAUCELE HERVE A , OZARSKI ROBERT G
IPC分类号： G03F7/20 , H01L21/027 , H01S3/225
摘要： A first laser light intensity detector is positioned within a stepper or scanner proximate to a reticle so that attenuation due to stepper optics has already occurred prior to the laser light impinging upon the light intensity detector. Preferably, the first light intensity detector is mounted as closed to the wafer as practical. A second light intensity detector is located at the output of the laser. The light intensity detected from the outputs of the first and second light intensity detectors, in conjunction, forms part of a feedback mechanism which adjusts the light output of the laser, during wafer fabrication, so that the light intensity detected by the first light intensity detector is an optimum value.

12. 发明专利

AU6030099A Diffraction grating and fabrication technique for same 未知
$Diffraction grating and fabrication technique for same$
公开(公告)号：AU6030099A
公开(公告)日：2000-04-03
申请号：AU6030099
申请日：1999-09-08
申请人： CYMER INC
发明人： OZARSKI ROBERT G , CROWLEY JOHN L
IPC分类号： G02B5/18 , G03F7/20
摘要： Large, high quality diffraction gratings having carefully formed blazing angles and defect free reflective surfaces can be fabricated on specially oriented substrates using photolithographic or micromachining techniques. By selecting a single crystal substrate whose surface is at a known angle with respect to certain crystallographic planes of the substrate, anisotropic etching of the substrate can achieve diffraction grating grooves with reflective surfaces corresponding to the to specific crystallographic planes. The angle between the surface of the substrate and the specific crystallographic planes determines the blazing angle of the diffraction grating. Thus, large, high quality diffraction gratings can be fabricated for use in, for example, laser systems, or for use as master gratings in the manufacture of replica gratings.

13. 发明专利

AU4827099A Multiplexer for laser lithography 未知
公开(公告)号：AU4827099A
公开(公告)日：2000-02-01
申请号：AU4827099
申请日：1999-06-22
申请人： CYMER INC
发明人： OZARSKI ROBERT G , ERSHOV ALEXANDER I
IPC分类号： G02B26/08 , G03F7/20 , H01L21/027
摘要： A laser lithography system in which two or more lasers provide laser illumination for two or more lithography exposure tools through a laser beam multiplexer. The mulitplexer contain several mirror devices each having a multi-reflectance mirror with surfaces of different reflectance and an adjusting mechanism for positioning one of the surfaces to intersect a laser beam from at least one of the lasers and direct a portion of it to at least one of the exposure tools.

14. 发明专利

AU2779999A Laser chamber with minimized acoustic and shock wave disturbances 未知
公开(公告)号：AU2779999A
公开(公告)日：1999-09-20
申请号：AU2779999
申请日：1999-02-22
申请人： CYMER INC
发明人： JUHASZ TIBOR , UJAZDOWSKI RICHARD C , BESAUCELE HERVE A , OZARSKI ROBERT G , AZZOLA JAMES H
IPC分类号： H01S3/038 , H01S3/032 , H01S3/036 , H01S3/225 , H01S3/22
摘要： A laser chamber has angled reflectors that reflect acoustic and shock waves away from the laser discharge area to minimize acoustic and shock wave disturbances. The angled reflector may have different configurations to assist in the dissipation of the acoustic and shock waves. For example, the angled reflector may have a modulated reflective surface, such as having grooves or holes defined within the surface. Further, the angled reflector may have a reflective surface with acoustic and shock wave absorbing properties. The reflective surface with absorbent properties may be a felt metal or have multiple layered porous surfaces. In addition, the walls of the laser chamber may be modulated to assist in the dissipation of the acoustic waves and shock waves through absorption, scattering, and by generating interference within the reflected waves. Multiple layered porous surfaces may be used along the walls to absorb and scatter incident waves. The walls of the laser chamber may also be covered with an acoustic and shock wave absorbing material, such as felt metal. In other embodiments, the walls of the laser chamber are modulated with grooves, such as triangular or rectangular horizontal grooves, which scatter incident waves and generate interference within reflected waves.

15. 发明专利

AU8763998A Laser-illuminated stepper or scanner with energy sensor feedback 未知
公开(公告)号：AU8763998A
公开(公告)日：1999-03-01
申请号：AU8763998
申请日：1998-07-31
申请人： CYMER INC
发明人： SANDSTROM RICHARD L , DAS PALASH P , FOMENKOV IGOR V , BESAUCELE HERVE A , OZARSKI ROBERT G
IPC分类号： G03F7/20 , G03F7/22 , H01L21/027 , H01S3/03 , H01S3/036 , H01S3/08 , H01S3/104 , H01S3/134 , H01S3/225 , G03B27/42 , G03B27/54 , G03B27/60 , G03B27/72 , H01S3/10 , H01S3/18

16. 发明公开

EP1095304A4 MULTIPLEXER FOR LASER LITHOGRAPHY 审中-公开
标题翻译： MULTIPLEXERFÜRLASER-LITHOGRAPHE
公开(公告)号：EP1095304A4
公开(公告)日：2005-05-04
申请号：EP99931850
申请日：1999-06-22
申请人： CYMER INC
发明人： OZARSKI ROBERT G , ERSHOV ALEXANDER I
IPC分类号： G02B26/08 , G03F7/20 , H01L21/027
CPC分类号： G03F7/7005 , G03F7/70991
摘要： A laser lithography system in which two or more lasers provide laser illumination for two or more lithography exposure tools (11-13) through a laser beam multiplexer (72). The multiplexer (72) contains several mirror devices (41-63) each having a multi-refletance mirror with surfaces of different reflectance and an adjusting mechanism for positioning one of the surfaces to intersect a laser beam from at least one of the lasers and direct a portion of it to at least one of the exposure tools (11-13).
摘要翻译：激光光刻系统，其中两个或更多个激光器通过激光束多路复用器为两个或更多个光刻曝光工具提供激光照明。多路复用器包含多个反射镜装置，每个反射镜具有具有不同反射率的表面的多反射镜，以及用于将一个表面定位成与来自至少一个激光器的激光束相交并将其一部分引导至至少一个的调整机构的曝光工具。

17. 发明公开

EP1119784A4 DIFFRACTION GRATING AND FABRICATION TECHNIQUE FOR SAME 审中-公开
标题翻译：衍射和方法对于同
公开(公告)号：EP1119784A4
公开(公告)日：2008-10-01
申请号：EP99969153
申请日：1999-09-08
申请人： CYMER INC
发明人： OZARSKI ROBERT G , CROWLEY JOHN L
IPC分类号： G02B5/18 , G03F7/20
CPC分类号： G03F7/70025 , G02B5/1852 , G02B5/1861
摘要： Large, high quality diffraction gratings having carefully formed blazing angles and defect free reflective surfaces can be fabricated on specially oriented substrates using photolithographic or micromachining techniques. By selecting a single crystal substrate whose surface is at a known angle with respect to certain crystallographic planes of the substrate, anisotropic etching of the substrate can achieve diffraction grating grooves with reflective surfaces corresponding to the specific crystallographic planes. The angle between the surface of the substrate and the specific crystallographic planes determines the blazing angle of the diffraction grating. Thus, large, high quality diffraction gratings can be fabricated for use in, for example, laser systems, or for use as master gratings in the manufacture of replica gratings.

18. 发明公开

EP1060542A4 LASER CHAMBER WITH MINIMIZED ACOUSTIC AND SHOCK WAVE DISTURBANCES 有权
标题翻译： LASERKAMMER MIT VERRINGERTENSTÖRUNGENDURCH AKUSTISCHE WELLEN UND SCHOCKWELLEN
公开(公告)号：EP1060542A4
公开(公告)日：2005-11-09
申请号：EP99908340
申请日：1999-02-22
申请人： CYMER INC
发明人： JUHASZ TIBOR , UJAZDOWSKI RICHARD C , BESAUCELE HERVE A , OZARSKI ROBERT G , AZZOLA JAMES H
IPC分类号： H01S3/038 , H01S3/032 , H01S3/036 , H01S3/225
CPC分类号： H01S3/036
摘要： A laser chamber has angled reflectors that reflect acoustic and shock waves away from the laser discharge area to minimize acoustic and shock wave disturbances. The angled reflector may have different configurations to assist in the dissipation of the acoustic and shock waves. For example, the angled reflector may have a modulated reflective surface, such as having grooves or holes defined within the surface. Further, the angled reflector may have a reflective surface with acoustic and shock wave absorbing properties. The reflective surface with absorbent properties may be a felt metal or have multiple layered porous surfaces. In addition, the walls of the laser chamber may be modulated to assist in the dissipation of the acoustic waves and shock waves through absorption, scattering, and by generating interference within the reflected waves. Multiple layered porous surfaces may be used along the walls to absorb and scatter incident waves. The walls of the laser chamber may also be covered with an acoustic and shock wave absorbing material, such as felt metal. In other embodiments, the walls of the laser chamber are modulated with grooves, such as triangular or rectangular horizontal grooves, which scatter incident waves and generate interference within reflected waves.
摘要翻译：激光室具有倾斜的反射器，其反射离开激光放电区域的声波和冲击波，以最小化声波和冲击波干扰。成角度的反射器可以具有不同的构造以辅助声波和冲击波的消散。例如，成角度的反射器可以具有调制的反射表面，例如在表面内限定有凹槽或孔。此外，成角度的反射器可以具有具有声波和冲击波吸收特性的反射表面。具有吸收性能的反射表面可以是毡状金属或具有多层多孔表面。此外，可以调制激光室的壁，以通过吸收，散射和在反射波内产生干涉来帮助消除声波和冲击波。沿着壁可以使用多层多孔表面来吸收和散射入射波。激光室的壁也可以用诸如毛毡金属的声波和冲击波吸收材料覆盖。在其他实施例中，激光室的壁用诸如三角形或矩形水平凹槽的凹槽来调制，这些凹槽散射入射波并在反射波内产生干涉。

19. 发明公开

EP1060543A4 RELIABLE, MODULAR, PRODUCTION QUALITY NARROW-BAND KrF EXCIMER LASER 有权
标题翻译： RELIABLE MODULAR，窄带KrF准分子激光器生产质量
公开(公告)号：EP1060543A4
公开(公告)日：2005-09-28
申请号：EP99938017
申请日：1999-02-16
申请人： CYMER INC
发明人： KNOWLES DAVID S , AZZOLA JAMES H , BESAUCELE HERVE A , DAS PALASH P , ERSHOV ALEXANDER I , JUHASZ TIBOR , NESS RICHARD M , OZARSKI ROBERT G , PARTLO WILLIAM N , ROTHWEIL DANIEL A , SANDSTROM RICHARD L , UJAZDOWSKI RICHARD C , WATSON TOM A , FOMENKOV IGOR V
IPC分类号： G03F7/20 , H01S3/03 , H01S3/036 , H01S3/08 , H01S3/097 , H01S3/1055 , H01S3/134 , H01S3/139 , H01S3/225 , H01S3/22
CPC分类号： G03F7/70358 , G03F7/70025 , G03F7/70041 , G03F7/70558 , G03F7/70575 , H01S3/03 , H01S3/036 , H01S3/08009 , H01S3/1055 , H01S3/134 , H01S3/1392 , H01S3/225 , H01S3/2251 , H01S3/2256
摘要： A reliable, modular, production quality narrow-band KrF excimer laser capable of producing 10 mJ laser pulses at 1000 Hz with a bandwith of about 0.6 pm or less. The present invention is especially suited to long-term round-the-clock operation in the lithographic production of integrated circuits. Improvements over prior art lasers include a single upstream preionizer tube (56) and acoustic baffles. A preferred embodiment includes reduced fluorine concentration, an anode support bar shaped to reduce aerodynamic reaction forces on blower bearings, a modified pulse power system providing faster pulse rise time, an output coupler (65) with substantially increased reflectivity, a line narrowing module with CaF prism beam expanders, a more accurate wavemeter, a laser computer controller programmed with new and improved pulse energy control algorithm.

20. 发明公开

EP1010040A4 LASER-ILLUMINATED STEPPER OR SCANNER WITH ENERGY SENSOR FEEDBACK 失效
标题翻译： LASERLICHTBELEUCHTETER STEPPER ODER SCANNER MIT ENERGISENSOR FEEDBACK
公开(公告)号：EP1010040A4
公开(公告)日：2005-09-14
申请号：EP98939150
申请日：1998-07-31
申请人： CYMER INC
发明人： SANDSTROM RICHARD L , DAS PALASH P , FOMENKOV IGOR V , BESAUCELE HERVE A , OZARSKI ROBERT G
IPC分类号： G03F7/20 , G03F7/22 , H01L21/027 , H01S3/03 , H01S3/036 , H01S3/08 , H01S3/104 , H01S3/134 , H01S3/225
CPC分类号： G03F7/70025 , G03F7/70041 , G03F7/70358 , G03F7/70558 , G03F7/70575 , H01S3/03 , H01S3/036 , H01S3/08009 , H01S3/134 , H01S3/225 , H01S3/2251 , H01S3/2256
摘要： A laser-illuminated wafer-exposing system such as a stepper (20) or scanner having a first light intensity detector (44) located within the exposing system near a mask (36) and second light intensity detector (46) located near the output of the laser (12). A feedback control system (14) controls the output of the laser based on signals detected by at least one of the detectors. The feedback control system includes a processor programmed with an algorithm which is used to control the laser discharge voltage in order to provide light pulses having desired intensity at the mask with the laser operating in a burst mode. The algorithm utilizes at least the following parameters; a previously measured pulse energy, a calculated energy error, a calculated dose error, a value for the rate of change of pulse energy with voltage, and at least one reference voltage. In a preferred embodiment the algorithm uses the pulse energy measured with the light intensity detector located near the mark to provide the feedback control and uses the light intensity detector at the output of the laser to assure that the output of the laser is maintained within a predetermined range.
摘要翻译：激光照射的晶片曝光系统，例如步进器（20）或扫描器，其具有位于靠近掩模（36）的曝光系统内的第一光强度检测器（44）和位于靠近输出端的第二光强度检测器激光器（12）。反馈控制系统（14）基于由至少一个检测器检测到的信号来控制激光器的输出。反馈控制系统包括用算法编程的处理器，该算法用于控制激光放电电压，以在激光器以突发模式工作的情况下在掩模处提供具有期望强度的光脉冲。该算法至少使用以下参数; 先前测量的脉冲能量，计算的能量误差，计算的剂量误差，脉冲能量随电压的变化率的值和至少一个参考电压。在优选实施例中，算法使用位于标记附近的光强度检测器测量的脉冲能量来提供反馈控制，并且在激光器的输出处使用光强度检测器，以确保激光器的输出保持在预定的范围。

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