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11. 发明申请

WO2011088330A9 HIGH QUALITY EMISSION CONTROL COATINGS, EMISSION CONTROL GLAZINGS, AND PRODUCTION METHODS 审中-公开
公开(公告)号：WO2011088330A9
公开(公告)日：2011-07-21
申请号：PCT/US2011/021314
申请日：2011-01-14
申请人： CARDINAL CG COMPANY , MYLI, Kari, B. , PFAFF, Gary, L. , VANCE, Greg , HARTIG, Klaus
发明人： MYLI, Kari, B. , PFAFF, Gary, L. , VANCE, Greg , HARTIG, Klaus
IPC分类号： E06B3/66 , C03C17/34 , B32B17/10
摘要： The invention relates to a method for forming a liquid radiation curable resin capable of curing into a solid upon irradiation comprising at least one thermally sensitive visual effect initiator. The liquid radiation curable resin is capable of curing into three-dimensional articles having selective visual effects. The resulting three-dimensional articles possess excellent color and/or transparency stability and excellent mechanical properties.

12. 发明申请

WO2007070249A2 SPUTTERING TARGETS AND METHODS FOR DEPOSITING FILM CONTAINING TIN AND NIOBIUM 审中-公开
标题翻译：用于沉积含有金属和铌的薄膜的溅射靶和方法
公开(公告)号：WO2007070249A2
公开(公告)日：2007-06-21
申请号：PCT/US2006/045689
申请日：2006-11-29
申请人： CARDINAL CG COMPANY , HARTIG, Klaus
发明人： HARTIG, Klaus
IPC分类号： H01J37/34 , C23C14/35 , C23C14/34 , C23C4/12 , C03C17/06
CPC分类号： C23C4/08 , C03C17/09 , C03C17/245 , C03C17/36 , C03C17/366 , C03C17/3681 , C03C17/40 , C03C2217/211 , C03C2217/218 , C03C2217/23 , C03C2217/24 , C03C2218/154 , C23C4/06 , C23C4/134 , C23C14/3414 , C23C14/3457
摘要： Sputtering targets and sputtering methods for depositing a film that includes tin and niobium. Substrates bearing coatings comprising tin and niobium, for example, low-emissivity coatings including blocker films comprising tin and niobium, or solar control coatings (e.g., conductive oxide coatings) including tin and niobium methods of manufacturing sputtering targets comprising tin and niobium.
摘要翻译：用于沉积包括锡和铌的膜的溅射靶和溅射方法。包含锡和铌的衬底承载涂层，例如低辐射涂层，包括包含锡和铌的阻挡膜，或包括锡和铌的太阳能控制涂层（例如，导电氧化物涂层）的方法，其制造包含锡和铌的溅射靶。

13. 发明申请

WO2007044814A1 METHODS AND EQUIPMENT FOR DEPOSITING HIGH QUALITY REFLECTIVE COATINGS 审中-公开
标题翻译：沉积高品质反射涂层的方法和设备
公开(公告)号：WO2007044814A1
公开(公告)日：2007-04-19
申请号：PCT/US2006/039735
申请日：2006-10-11
申请人： CARDINAL CG COMPANY , HARTIG, Klaus
发明人： HARTIG, Klaus
IPC分类号： C03C17/36 , C03C17/00 , C23C14/56
CPC分类号： E06B3/6715 , C03C17/36 , C03C17/3613 , C03C17/3626 , C03C17/3639 , C03C17/3644 , C03C17/3652 , C03C17/366 , C03C17/3681 , C03C2217/211 , C03C2217/216 , C03C2217/78 , C03C2218/153 , C03C2218/154 , C23C14/568 , E06B9/24 , E06B2009/2417 , Y10T428/24612 , Y10T428/24942 , Y10T428/2495 , Y10T428/24975 , Y10T428/31504
摘要： Methods and equipment for depositing coatings on glass and other substrates. In some embodiments, methods and equipment are provided for depositing reflective thin film coatings, such as low-emissivity coatings that are particularly reflective of infrared radiation, optionally by a downward coating operation. In some embodiments, such a downward coating operation is coupled with an upward coating operation used to deposit another coating.
摘要翻译：在玻璃和其他基材上沉积涂层的方法和设备。在一些实施例中，提供了用于沉积反射薄膜涂层的方法和设备，所述反射薄膜涂层，例如特别反射红外辐射的低发射率涂层，任选地通过向下涂覆操作。在一些实施例中，这种向下涂覆操作与用于沉积另一涂层的向上涂覆操作相结合。

14. 发明申请

WO2006105419A1 HAZE-RESISTANT LOW-EMISSIVITY COATINGS 审中-公开
标题翻译：耐高温低电感涂层
公开(公告)号：WO2006105419A1
公开(公告)日：2006-10-05
申请号：PCT/US2006/011973
申请日：2006-03-30
申请人： CARDINAL CG COMPANY , HARTIG, Klaus , KRISKO, Annette, J.
发明人： HARTIG, Klaus , KRISKO, Annette, J.
IPC分类号： B32B15/00
CPC分类号： C03C17/36 , C03C17/3639 , C03C17/3652 , C03C17/366 , C03C17/3681 , C03C17/3686 , C03C17/3694 , C03C2218/154 , C23C14/086 , Y10T428/12549
摘要： A substrate bearing a low-emissivity coating, the coating comprising two infrared-reflective layers separated by a middle coat, the middle coat comprising two zinc tin oxide film regions separated by a tin oxide film region.
摘要翻译：一种具有低发射率涂层的基底，该涂层包括由中间涂层隔开的两个红外线反射层，该中间涂层包含由氧化锡膜区域隔开的两个氧化锌锡氧化物区域。

15. 发明申请

WO2006076345A2 REDUCED MAINTENANCE SPUTTERING CHAMBERS 审中-公开
标题翻译：减少维护喷雾器
公开(公告)号：WO2006076345A2
公开(公告)日：2006-07-20
申请号：PCT/US2006/000795
申请日：2006-01-11
申请人： CARDINAL CG COMPANY , HARTIG, Klaus
发明人： HARTIG, Klaus
IPC分类号： H01J37/34
CPC分类号： H01J37/32871 , C23C14/352 , C23C14/564 , H01J37/32477 , H01J37/3405 , H01J37/3455
摘要： Improved sputtering chambers for sputtering thin coatings onto substrates. One sputtering chamber includes spall shields which are disposed inwardly and upwardly toward the chamber interior and toward the sputtering targets, and which can aid in the retention of overcoated sputtering material which may otherwise fall onto substrates to be coated. Another sputtering chamber includes targets having magnets which are turned inwardly relative to vertical and toward each other. The inward rotation of the magnets can serve to deposit more material toward the open bottom center of the chamber, and less toward the side walls of the chamber. Yet another sputtering chamber includes a third target disposed between and upward of the lower two targets so as to shield a portion of the sputtering chamber interior from material sputtered from the first and second targets. Some chambers have the three targets forming a triangle, for example, an isosceles or equilateral triangle, hi one chamber having such a triangular configuration of sputtering targets, the first and second targets form the base of an isosceles triangle and have their magnets oriented inwardly relative to vertical and towards each other. The sputtering chambers provided can either reduce the amount of overcoat sputtering material deposited onto the interior of the chamber and/or aid in retention of overcoat sputtering material which would otherwise fall onto substrates to be coated.
摘要翻译：改进的溅射室，用于将薄涂层溅射到基板上。一个溅射室包括防护罩，其被设置成向内并向上朝向室内部并且朝向溅射靶，并且其可以有助于保留外涂的溅射材料，否则其可能落在待涂覆的基板上。另一个溅射室包括具有相对于垂直和彼此向内转动的磁体的靶。磁体的向内旋转可用于将更多的材料沉积到腔室的敞开的底部中心，并且朝向腔室的侧壁较少。又一个溅射室包括设置在下两个靶之间和之上的第三靶，以便将溅射室内的一部分与第一和第二靶溅射的材料进行屏蔽。一些室具有形成三角形的三个目标，例如等腰或等边三角形。在具有这种溅射靶的三角形构造的一个室中，第一和第二靶形成等腰三角形的基部并使其磁体向内相对朝向彼此。所提供的溅射室可以减少沉积在室内部的外涂层溅射材料的量和/或有助于保留外涂层溅射材料，否则这些溅射材料会落在待涂覆的基板上。

16. 发明申请

WO2004061151A1 COATER HAVING SUBSTRATE CLEANING DEVICE AND COATING DEPOSITION METHODS EMPLOYING SUCH COATER 审中-公开
标题翻译：具有衬底清洁装置的涂层和使用这种涂层的涂布沉积方法
公开(公告)号：WO2004061151A1
公开(公告)日：2004-07-22
申请号：PCT/US2003/041511
申请日：2003-12-31
申请人： CARDINAL CG COMPANY , HARTIG, Klaus
发明人： HARTIG, Klaus
IPC分类号： C23C14/10
CPC分类号： C23C14/562 , C03C17/002 , C03C23/0075 , C03C2218/31 , C23C14/022 , C23C14/568
摘要： A coater having a substrate cleaning device is disclosed. Also disclosed are methods of processing substrates in a coater equipped with a substrate cleaning device. The substrate cleaning device comprises an ion gun (i.e., an ion source) that is positioned beneath a path of substrate travel (e.g., beneath a substrate support) extending through the coater and that is adapted for treating a bottom major surface of a substrate. Certain embodiments involve an upward coating apparatus that is further along the path of substrate travel than the substrate cleaning device. In some embodiments of this nature, the upward coating apparatus is configured for depositing a photocatalytic coating upwardly onto the bottom major surface of the substrate. Certain embodiments of the invention involve a downward coating apparatus, wherein the substrate cleaning device is further along the path of substrate travel than the downward coating apparatus. Some embodiments of this nature also involve an upward coating apparatus that is further along the path of substrate travel than the substrate cleaning device.
摘要翻译：公开了一种具有基板清洁装置的涂布机。还公开了在装有基板清洁装置的涂布机中处理基板的方法。衬底清洁装置包括位于衬底行进路径（例如，衬底支撑件下方）下方的离子枪（即离子源），其延伸穿过涂布机，并适于处理衬底的底部主表面。某些实施例涉及一种向上涂层装置，其进一步沿着衬底移动的路径而不是衬底清洗装置。在这种性质的一些实施例中，向上涂覆装置被配置用于将光催化涂层向上沉积到基底的底部主表面上。本发明的某些实施例涉及一种向下涂覆装置，其中基底清洗装置进一步沿着基底行程的路径而不是向下涂覆装置。这种性质的一些实施方案还涉及向上涂覆装置，其进一步沿衬底移动的路径比衬底清洗装置。

17. 发明申请

WO2003074442A1 THIN FILM COATING HAVING TRANSPARENT BASE LAYER 审中-公开
标题翻译：具有透明基层的薄膜涂层
公开(公告)号：WO2003074442A1
公开(公告)日：2003-09-12
申请号：PCT/US2003/006168
申请日：2003-02-28
申请人： CARDINAL CG COMPANY , HARTIG, Klaus , KRISKO, Annette, J.
发明人： HARTIG, Klaus , KRISKO, Annette, J.
IPC分类号： C03C17/36
CPC分类号： C03C17/36 , C03C17/3618 , C03C17/3626 , C03C17/3639 , C03C17/3644 , C03C17/3652 , C03C17/366 , C03C2217/78
摘要： The invention provides thin film coatings that have a transparent base layer. For example, the invention provides low-emissivity coatings with a transparent base layer. In certain embodiments, a silicon dioxide base layer is used. Methods of producing thin film coatings having a transparent base layer are provided as well. In one embodiment, sputter deposition is utilized to produce these coatings.
摘要翻译：本发明提供具有透明基底层的薄膜涂层。例如，本发明提供具有透明基底层的低发射率涂层。在某些实施方案中，使用二氧化硅基底层。还提供了具有透明基底层的薄膜涂层的制造方法。在一个实施例中，利用溅射沉积来生产这些涂层。

18. 发明申请

WO2002022517A1 HYDROPHILIC SURFACES CARRYING TEMPORARY PROTECTIVE COVERS 审中-公开
标题翻译：承载临时保护套的水泥表面
公开(公告)号：WO2002022517A1
公开(公告)日：2002-03-21
申请号：PCT/US2001/028728
申请日：2001-09-11
申请人： CARDINAL CG COMPANY , O'SHAUGHNESSY, Roger , KRISKO, Annette, J. , HARTIG, Klaus
发明人： O'SHAUGHNESSY, Roger , KRISKO, Annette, J. , HARTIG, Klaus
IPC分类号： C03C17/34
CPC分类号： C03C17/245 , C03C17/3417 , C03C2217/216 , C03C2217/229 , C03C2218/154 , C03C2218/355
摘要： A substrate carrying a temporary protective cover and related methods of producing and processing substrates are described. In one embodiment, a substrate bears a hydrophilic coating carrying a temporary protective cover that protects the hydrophilic coating against contamination but that can readily be readily removed from the hydrophilic coating by washing with a given washing fluid.
摘要翻译：描述了携带临时保护盖的基板和相关的基板的制造和处理方法。在一个实施方案中，基底承载亲水性涂层，其携带临时保护盖，其保护亲水性涂层免受污染，但是通过用给定的洗涤液洗涤可容易地从亲水涂层中除去。

19. 发明申请

WO2009036263A2 LOW-MAINTENANCE COATING TECHNOLOGY 审中-公开
标题翻译：低维护涂层技术
公开(公告)号：WO2009036263A2
公开(公告)日：2009-03-19
申请号：PCT/US2008/076157
申请日：2008-09-12
申请人： CARDINAL CG COMPANY , MYLI, Kari , KRISKO, Annette , GERMAN, John , HARTIG, Klaus
发明人： MYLI, Kari , KRISKO, Annette , GERMAN, John , HARTIG, Klaus
IPC分类号： C03C17/245 , C03C17/34 , C23C14/08 , C23C14/34
CPC分类号： C03C17/2456 , C03C17/002 , C03C17/3411 , C03C2217/212 , C03C2217/219 , C03C2217/23 , C03C2217/71 , C03C2217/91 , C03C2218/154 , C23C14/024 , C23C14/083 , C23C14/3464 , C23C14/352 , Y10T428/261 , Y10T428/265 , Y10T428/31678
摘要： The invention provides a substrate bearing a low-maintenance coating. In some embodiments, the coating includes a low-maintenance film that includes a thickness of film comprising titania, wherein only part of that thickness includes tungsten. The thickness includes an inner portion and an outer portion, the outer portion being the part that includes tungsten. The invention also provides methods and equipment for depositing such coatings.
摘要翻译：本发明提供了一种承载低维护涂层的基材。在一些实施例中，涂层包括低维护膜，其包括含二氧化钛的膜的厚度，其中该厚度的仅一部分包括钨。厚度包括内部和外部，外部是包括钨的部分。本发明还提供了用于沉积这种涂层的方法和设备。

20. 发明申请

WO2008014332A3 METHODS AND APPARATUSES FOR DIRECTING AN ION BEAM SOURCE 审中-公开
公开(公告)号：WO2008014332A3
公开(公告)日：2008-01-31
申请号：PCT/US2007/074341
申请日：2007-07-25
申请人： CARDINAL CG COMPANY , GENERAL PLASMA, INC. , GERMAN, John , HARTIG, Klaus , MADOCKS, John, E.
发明人： GERMAN, John , HARTIG, Klaus , MADOCKS, John, E.
IPC分类号： H01J27/14 , H01J37/08 , C23C14/22 , C23C14/56
摘要： A method and apparatus for directing an ion beam toward a surface of a substrate is disclosed. Certain embodiments of the invention relate generally to ion beam sources adapted to direct ion beams toward a surface of a substrate at an oblique angle of incidence relative to the surface. Certain embodiments of the invention are adapted to direct two ion beam portions toward a substrate surface, the ion beam portions having substantially equal throw distances. Preferred embodiments of the invention may be useful in etching applications, where the angle of incidence and throw distance of two ion beam portions are well suited for etching the surface of a substrate.

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