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11. 发明申请

WO2009139486A1 OPTICAL TOMOGRAPH 审中-公开
标题翻译：光学TOMOGRAPH
公开(公告)号：WO2009139486A1
公开(公告)日：2009-11-19
申请号：PCT/JP2009/059107
申请日：2009-05-12
申请人： CANON KABUSHIKI KAISHA , FURUSAWA, Kentaro , MIZUTANI, Natsuhiko , KURODA, Ryo
发明人： FURUSAWA, Kentaro , MIZUTANI, Natsuhiko , KURODA, Ryo
IPC分类号： G01B9/02
CPC分类号： G01B9/02014 , G01B9/02004 , G01B9/02069 , G01B9/02091
摘要： An optical tomography imaging a tomogram by using a coherent light by a backscattering light of a measured object and a reflected light of a reference mirror, which has supercontinuum light sources, an optical system having group velocity dispersion connected to the supercontinuum light source, an optical detection element detecting a coherent light by a backscattering light of the measured object and a reflected light of the reference mirror, a timing detection element detecting a timing of each wavelength component in an output light from the optical system having the group velocity dispersion, and a unit sampling a signal from the optical detector by using a timing signal from the timing detection element with a signal from the supercontinuum light source as a trigger, and detecting an optical tomogram signal imaging a tomogram, thereby acquiring an optical tomogram at a higher speed than a conventional SS-OCT.
摘要翻译：光学断层摄影通过使用具有超连续光源的测量对象的反向散射光和参考反射镜的反射光使用相干光来成像断层图像，具有连接到超连续光源的组速度色散的光学系统，光学检测元件通过测量对象的后向散射光和参考反射镜的反射光来检测相干光，定时检测元件，检测来自具有组速度色散的光学系统的输出光中的每个波长分量的定时，以及通过使用来自定时检测元件的来自超连续光源的信号的定时信号作为触发来对来自光学检测器的信号进行采样，并且检测成像断层图像的光学层析图像信号，从而以更高的速度获取光学层析图像常规的SS-OCT。

12. 发明申请

WO2009139481A1 LASER APPARATUS, DRIVING METHOD OF THE SAME AND OPTICAL TOMOGRAPHIC IMAGING APPARATUS 审中-公开
标题翻译：激光装置，其驱动方法和光学成像装置
公开(公告)号：WO2009139481A1
公开(公告)日：2009-11-19
申请号：PCT/JP2009/059102
申请日：2009-05-11
申请人： CANON KABUSHIKI KAISHA , FURUSAWA, Kentaro , MIZUTANI, Natsuhiko , MIYATA, Kazuhide
发明人： FURUSAWA, Kentaro , MIZUTANI, Natsuhiko , MIYATA, Kazuhide
IPC分类号： H01S3/067
CPC分类号： H01S3/06791 , G01B9/02014 , G01B9/02091 , H01S3/06712 , H01S3/06725 , H01S3/1109 , H01S5/0657 , H01S5/1071 , H01S5/146
摘要： The present invention provides a laser apparatus capable of improving a scan speed and achieving a scan rate equal to or more than 1 MHz, and an optical tomographic imaging apparatus using the laser apparatus as a light source. The laser apparatus includes a ring resonator, the ring resonator having a structure in which a first modulator, a normal dispersion region, a second modulator and an anomalous dispersion region are arranged in this order, and in this arrangement, a gain medium is included, and being configured so that modulation with respect to the second modulator can be caused to be phase modulation by periodically superimposing phase modulation on modulation with respect to the first modulator.
摘要翻译：本发明提供能够提高扫描速度并实现1MHz以上的扫描速度的激光装置，以及使用该激光装置作为光源的光学断层图像摄像装置。激光装置包括环形谐振器，环状谐振器具有这样的结构，其中第一调制器，正常色散区域，第二调制器和异常色散区域按此顺序排列，并且在该布置中，包括增益介质，并且被配置为使得相对于第二调制器的调制可以通过相对于第一调制器的调制周期性地叠加相位调制来进行相位调制。

13. 发明申请

WO2008047818A1 NEAR-FIELD EXPOSURE APPARATUS AND NEAR-FIELD EXPOSURE METHOD 审中-公开
标题翻译：近场曝光装置及近场曝光方法
公开(公告)号：WO2008047818A1
公开(公告)日：2008-04-24
申请号：PCT/JP2007/070220
申请日：2007-10-10
申请人： CANON KABUSHIKI KAISHA , INAO, Yasuhisa , ITO, Toshiki , MIZUTANI, Natsuhiko
发明人： INAO, Yasuhisa , ITO, Toshiki , MIZUTANI, Natsuhiko
IPC分类号： G03F9/00
CPC分类号： G03F9/7038 , B82Y10/00 , G03F7/70325 , G03F7/7035 , G03F7/70866 , G03F9/7096 , Y10S430/167
摘要： A near-field exposure apparatus includes a near-field exposure mask (101), a mechanism configured to place a substrate (102) to be exposed, opposed to the near-field exposure mask, a mechanism (107) configured to perform relative alignment of the near-field exposure mask and 'the substrate to be exposed, a mechanism configured to closely contacting the near-field exposure mask and the substrate to be exposed, with each other, a mechanism (109) configured to project exposure light to the near-field exposure mask, and a soft X-ray irradiating device (105) configured to remove static electricity charged in at least one of the near-field exposure mask and the substrate to be exposed, wherein the soft X- ray irradiating device is disposed at a side of the near-field exposure mask remote from the substrate to be exposed.
摘要翻译：近场曝光装置包括近场曝光掩模（101），被配置为将要暴露的基板（102）放置在与近场曝光掩模相对的机构，配置为执行相对对准的机构（107）的近场曝光掩模和“待曝光的基板”，被配置为使近场曝光掩模和待曝光的基板紧密接触的机构彼此相配合，该机构（109）被配置为将曝光光投射到近场曝光掩模和软X射线照射装置（105），其被配置为去除在近场曝光掩模和待曝光的基板中的至少一个中充电的静电，其中所述软X射线照射装置是设置在远离待曝光的基板的近场曝光掩模的一侧。

14. 发明申请

WO2006001520A1 EXPOSURE APPARATUS, EXPOSURE METHOD, AND EXPOSURE MASK 审中-公开
标题翻译：曝光装置，曝光方法和曝光掩模
公开(公告)号：WO2006001520A1
公开(公告)日：2006-01-05
申请号：PCT/JP2005/012166
申请日：2005-06-24
申请人： CANON KABUSHIKI KAISHA , INAO, Yasuhisa , KURODA, Ryo , MIZUTANI, Natsuhiko
发明人： INAO, Yasuhisa , KURODA, Ryo , MIZUTANI, Natsuhiko
IPC分类号： H01L21/027
CPC分类号： G03F7/7035 , B82Y10/00 , G03F1/50 , G03F1/60 , G03F7/2014 , G03F7/70325 , G03F7/70433 , G03F7/70691 , G03F9/703 , G03F9/7053 , G03F9/7088
摘要： Disclosed is an exposure apparatus, an exposure method and an exposure mask, for improved optical lithography. Specifically, in accordance with one preferred form of the invention, the exposure apparatus is arranged to be used with an exposure mask having an elastically deformable holding member and a light blocking film provided on the holding member and being formed with an opening pattern, wherein for exposure the exposure mask is flexed to be brought into contact with an object to be exposed. The exposure apparatus includes a distance detecting system for detecting a distance between the exposure mask before being flexed and the object to be exposed, and a distance controlling system for controlling the distance between the exposure mask before being flexed and the object to be exposed, on the basis of a signal from the distance detecting system.
摘要翻译：公开了一种用于改进的光刻技术的曝光装置，曝光方法和曝光掩模。具体地，根据本发明的一个优选形式，曝光装置被布置成与具有可弹性变形的保持构件和设置在保持构件上并形成有开口图案的遮光膜的曝光掩模一起使用，其中，暴露曝光掩模被弯曲以与待曝光的物体接触。曝光装置包括用于检测在弯曲之前的曝光掩模与待曝光的物体之间的距离的距离检测系统，以及用于控制在弯曲之前的曝光掩模与待曝光的物体之间的距离的距离控制系统，来自距离检测系统的信号的基础。

15. 发明申请

WO2004023211A2 EXPOSURE METHOD, EXPOSURE MASK, AND EXPOSURE APPARATUS 审中-公开
标题翻译：曝光方法，曝光掩模和曝光装置
公开(公告)号：WO2004023211A2
公开(公告)日：2004-03-18
申请号：PCT/JP2003/011357
申请日：2003-09-05
申请人： CANON KABUSHIKI KAISHA
发明人： INAO, Yasuhisa , KURODA, Ryo , MIZUTANI, Natsuhiko
IPC分类号： G03F7/00
CPC分类号： G03F7/7035 , B82Y10/00 , G03F1/50 , G03F7/2014 , G03F7/70325 , G03F7/70566
摘要： An exposure method for exposing a workpiece on the basis of near-field light escaping from an opening of a mask, wherein nonpolarized exposure light from a light source is projected onto an exposure mask having a light blocking film and a plurality of rectangular openings formed in the light blocking film, the openings having a width in a widthwise direction not greater than one-third of the exposure light and having its lengthwise directions extending in two or more directions along the mask surface, so that near-field light escaping from the openings is produced thereby to perform exposure of a pattern on the basis of the openings.
摘要翻译：一种用于基于从掩模的开口逸出的近场光曝光工件的曝光方法，其中来自光源的非偏振曝光光被投影到具有遮光膜的曝光掩模和形成在其中的多个矩形开口所述遮光膜，所述开口宽度方向上宽度不大于所述曝光光的三分之一，并且所述遮光膜的长度方向沿所述掩模表面沿两个或更多个方向延伸，使得近场光从所述开口由此产生基于开口的图案的曝光。

16. 发明公开

EP1642174A2 EXPOSURE METHOD AND APPARATUS, EXPOSURE MASK, AND DEVICE MANUFACTURING METHOD 有权
标题翻译：曝光的方法和设备，曝光掩膜和方法
公开(公告)号：EP1642174A2
公开(公告)日：2006-04-05
申请号：EP04746752.7
申请日：2004-06-24
申请人： CANON KABUSHIKI KAISHA
发明人： KURODA, Ryo , MIZUTANI, Natsuhiko , YAMADA, Tomohiro
IPC分类号： G03F7/20 , G03F1/14
CPC分类号： G03F7/70325 , B82Y10/00 , G03F1/50 , G03F7/2014
摘要： Disclosed is an exposure method and apparatus, an exposure mask and a device manufacturing method, wherein a first surface of a light blocking member having a plurality of openings formed in a mutually adjoining relation is placed at an exposure object side, and light is projected to the light blocking member from its second surface side so that exposure of the exposure object is carried out on the basis of near field light leaking from the openings. For exposure, interference is caused between surface plasmon polariton waves passing respectively through adjacent openings and going around to the first surface side, and, on the basis of it, a portion having a decreased light intensity is produced in the exposure object so that the exposure is carried out by use of the decreased light intensity portion.

17. 发明公开

EP1782456A1 EXPOSURE APPARATUS, EXPOSURE METHOD, AND EXPOSURE MASK 审中-公开
标题翻译：曝光方法
公开(公告)号：EP1782456A1
公开(公告)日：2007-05-09
申请号：EP05755684.7
申请日：2005-06-24
申请人： CANON KABUSHIKI KAISHA
发明人： INAO, Yasuhisa , KURODA, Ryo , MIZUTANI, Natsuhiko
IPC分类号： H01L21/027 , G03F1/14 , G03F7/20
CPC分类号： G03F7/7035 , B82Y10/00 , G03F1/50 , G03F1/60 , G03F7/2014 , G03F7/70325 , G03F7/70433 , G03F7/70691 , G03F9/703 , G03F9/7053 , G03F9/7088
摘要： Disclosed is an exposure apparatus, an exposure method and an exposure mask, for improved optical lithography. Specifically, in accordance with one preferred form of the invention, the exposure apparatus is arranged to be used with an exposure mask having an elastically deformable holding member and a light blocking film provided on the holding member and being formed with an opening pattern, wherein for exposure the exposure mask is flexed to be brought into contact with an object to be exposed. The exposure apparatus includes a distance detecting system for detecting a distance between the exposure mask before being flexed and the object to be exposed, and a distance controlling system for controlling the distance between the exposure mask before being flexed and the object to be exposed, on the basis of a signal from the distance detecting system.

18. 发明公开

EP1991891A1 METHOD FOR DESIGNING LIGHT TRANSMISSION DEVICE, OPTICAL ELEMENT AND SENSOR 审中-公开
标题翻译：法草案，光发送装置，光学元件与传感器
公开(公告)号：EP1991891A1
公开(公告)日：2008-11-19
申请号：EP07737720.8
申请日：2007-02-26
申请人： Canon Kabushiki Kaisha
发明人： OGINO, Masaya , YAMADA, Tomohiro , NISHIUMA, Satoru , MIZUTANI, Natsuhiko , KURODA, Ryo
IPC分类号： G02B5/20 , G02B5/18
CPC分类号： G02B5/008 , G02B5/204
摘要： The present invention provides a method for designing a light transmission device, which adjusts a wavelength region of a spectrum of transmitted light without expanding a width of a transmission spectrum and without lowering the transmittance. The method for designing a light transmission device having a metal thin film, and a rectangular aperture which is formed in a plane of the metal thin film, has a long side and a short side and makes light pass therethrough, wherein the short side has a dimension smaller than a wavelength of incident light, and the long side is determined to have such a dimension that a peak wavelength at which the transmittance of light passing through the rectangular aperture is maximal can be a predetermined value.

19. 发明授权

EP1642174B1 EXPOSURE METHOD AND APPARATUS, EXPOSURE MASK, AND DEVICE MANUFACTURING METHOD 有权
标题翻译：曝光的方法和设备，曝光掩膜和方法
公开(公告)号：EP1642174B1
公开(公告)日：2008-09-17
申请号：EP04746752.7
申请日：2004-06-24
申请人： CANON KABUSHIKI KAISHA
发明人： KURODA, Ryo , MIZUTANI, Natsuhiko , YAMADA, Tomohiro
IPC分类号： G03F7/20 , G03F1/14
CPC分类号： G03F7/70325 , B82Y10/00 , G03F1/50 , G03F7/2014
摘要： Disclosed is an exposure method and apparatus, an exposure mask and a device manufacturing method, wherein a first surface of a light blocking member having a plurality of openings formed in a mutually adjoining relation is placed at an exposure object side, and light is projected to the light blocking member from its second surface side so that exposure of the exposure object is carried out on the basis of near field light leaking from the openings. For exposure, interference is caused between surface plasmon polariton waves passing respectively through adjacent openings and going around to the first surface side, and, on the basis of it, a portion having a decreased light intensity is produced in the exposure object so that the exposure is carried out by use of the decreased light intensity portion.

20. 发明公开

EP1535113A2 EXPOSURE METHOD, EXPOSURE MASK, AND EXPOSURE APPARATUS 审中-公开
标题翻译：曝光方法，曝光掩模和曝光装置
公开(公告)号：EP1535113A2
公开(公告)日：2005-06-01
申请号：EP03794254.7
申请日：2003-09-05
申请人： Canon Kabushiki Kaisha
发明人： INAO, Yasuhisa , KURODA, Ryo , MIZUTANI, Natsuhiko
IPC分类号： G03F1/14
CPC分类号： G03F7/7035 , B82Y10/00 , G03F1/50 , G03F7/2014 , G03F7/70325 , G03F7/70566
摘要： An exposure method for exposing a workpiece on the basis of near-field light escaping from an opening of a mask, wherein nonpolarized exposure light from a light source is projected onto an exposure mask having a light blocking film and a plurality of rectangular openings formed in the light blocking film, the openings having a width in a widthwise direction not greater than one-third of the exposure light and having its lengthwise directions extending in two or more directions along the mask surface, so that near-field light escaping from the openings is produced thereby to perform exposure of a pattern on the basis of the openings.

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