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11. 发明申请

WO2009011439A1 OPTICAL FILTER 审中-公开
标题翻译：光学过滤器
公开(公告)号：WO2009011439A1
公开(公告)日：2009-01-22
申请号：PCT/JP2008/063081
申请日：2008-07-14
申请人： CANON KABUSHIKI KAISHA , YAMADA, Tomohiro , OGINO, Masaya , INAO, Yasuhisa
发明人： YAMADA, Tomohiro , OGINO, Masaya , INAO, Yasuhisa
IPC分类号： G02B5/18 , G02B5/20
CPC分类号： G02B5/223 , G02B5/008 , G02B5/201 , G02B5/204 , H01L27/1462 , H01L27/14621
摘要： An optical filter that transmits light of the visible light region includes a dielectric substrate; a dielectric layer that is formed on a surface of the dielectric substrate; and a first metal structure group in which a plurality of first metal structures are arranged two-dimensionally in an isolated state in the in-plane direction of the dielectric substrate, that is provided between the dielectric substrate and the dielectric layer, comprising: the first metal structures having first and second lengths in first and second directions orthogonal to each other, which lengths are equal to or less than a first wavelength in the visible light region; and a transmittance of the first wavelength being reduced or a reflectance being increased by surface plasmons induced on a surface of the first metal structures by resonance between light incident on the dielectric substrate or the dielectric layer and the first metal structures.
摘要翻译：透射可见光区域的光的滤光器包括电介质基片; 介电层，其形成在所述电介质基板的表面上; 以及设置在所述电介质基板和所述电介质层之间的所述电介质基板的面内方向上以隔离状态二维地配置多个所述第一金属结构体的第一金属结构体，所述第一金属结构体包括：所述第一金属结构体，金属结构在第一和第二方向上具有彼此正交的第一和第二长度，该长度等于或小于可见光区域中的第一波长; 并且通过入射到电介质基板或电介质层上的光与第一金属结构之间的共振，在第一金属结构的表面上引起的表面等离子体激元的第一波长的透射率减小或反射率增加。

12. 发明公开

EP2193355A2 LOCALIZED SURFACE PLASMON RESONANCE SENSOR AND METHOD OF DETECTING A TARGET SUBSTANCE USING SAID SENSOR 审中-公开
标题翻译：对局部等离子共振基于传感器和表面检测方法的靶物质使用这种传感器
公开(公告)号：EP2193355A2
公开(公告)日：2010-06-09
申请号：EP08833197.0
申请日：2008-09-25
申请人： Canon Kabushiki Kaisha
发明人： HANDA, Yoichiro , YAMADA, Tomohiro
IPC分类号： G01N21/55
CPC分类号： G01N21/554 , B82Y15/00 , B82Y20/00
摘要： A target substance-detecting apparatus for detecting a target substance in an analyte comprises a detecting device (1001) having a substrate (1002) and metal structures (1003) capable of causing a plasmon resonance arranged thereon, an illumination optical system for illuminating an incident light (1008) containing a polarization component (1101) polarized in a first direction (1102) onto the detecting device to cross the arranged metal structures, a light-receiving device for receiving light containing the polarization component polarized in the first direction and transmitted through or reflected by the detecting device, and an arithmetic unit for calculating on signals from the light-receiving device to analyze a characteristic of the analyte; the metal structures arranged at first intervals (1104) not more than 1/10 of a plasmon resonance wavelength in lines in the first direction (1102) and at second intervals (1105) not less than 1/4 of the plasmon resonance wavelength and not more than the wavelength in lines parallel in a second direction (1103).

13. 发明公开

EP1642174A2 EXPOSURE METHOD AND APPARATUS, EXPOSURE MASK, AND DEVICE MANUFACTURING METHOD 有权
标题翻译：曝光的方法和设备，曝光掩膜和方法
公开(公告)号：EP1642174A2
公开(公告)日：2006-04-05
申请号：EP04746752.7
申请日：2004-06-24
申请人： CANON KABUSHIKI KAISHA
发明人： KURODA, Ryo , MIZUTANI, Natsuhiko , YAMADA, Tomohiro
IPC分类号： G03F7/20 , G03F1/14
CPC分类号： G03F7/70325 , B82Y10/00 , G03F1/50 , G03F7/2014
摘要： Disclosed is an exposure method and apparatus, an exposure mask and a device manufacturing method, wherein a first surface of a light blocking member having a plurality of openings formed in a mutually adjoining relation is placed at an exposure object side, and light is projected to the light blocking member from its second surface side so that exposure of the exposure object is carried out on the basis of near field light leaking from the openings. For exposure, interference is caused between surface plasmon polariton waves passing respectively through adjacent openings and going around to the first surface side, and, on the basis of it, a portion having a decreased light intensity is produced in the exposure object so that the exposure is carried out by use of the decreased light intensity portion.

14. 发明公开

EP2387731A1 OPTICAL ELEMENT 有权
标题翻译：光学元件
公开(公告)号：EP2387731A1
公开(公告)日：2011-11-23
申请号：EP10716637.3
申请日：2010-01-13
申请人： Canon Kabushiki Kaisha
发明人： OIGAWA, Makoto , YAMADA, Tomohiro
IPC分类号： G02B5/30 , G02B27/28 , H04N9/31
CPC分类号： G02B27/283 , G02B5/1809 , G02B5/3058 , H04N9/3105 , H04N9/3167 , H04N9/3197
摘要： An optical element includes a substrate including a first surface and metal structure group including a plurality of metal structures, the metal structures being arranged on the first surface in a two-dimensionally isolated manner. Light is incident on the metal structure group in an oblique manner with respect to the normal of the first surface from the metal-structure-group side or the substrate side, so that a polarization state of light that passes through the metal structure group and a polarization state of light that is reflected by the metal structure group differ from each other in accordance with a wavelength range.
摘要翻译：一种光学元件，包括具有第一表面的基板和包括多个金属结构的金属结构组，所述金属结构以二维隔离的方式布置在第一表面上。光从金属结构组侧或基板侧以相对于第一表面的法线倾斜的方式入射到金属结构组上，使得穿过金属结构组和光的偏振状态由金属结构组反射的光的偏振状态根据波长范围彼此不同。

15. 发明授权

EP1642174B1 EXPOSURE METHOD AND APPARATUS, EXPOSURE MASK, AND DEVICE MANUFACTURING METHOD 有权
标题翻译：曝光的方法和设备，曝光掩膜和方法
公开(公告)号：EP1642174B1
公开(公告)日：2008-09-17
申请号：EP04746752.7
申请日：2004-06-24
申请人： CANON KABUSHIKI KAISHA
发明人： KURODA, Ryo , MIZUTANI, Natsuhiko , YAMADA, Tomohiro
IPC分类号： G03F7/20 , G03F1/14
CPC分类号： G03F7/70325 , B82Y10/00 , G03F1/50 , G03F7/2014
摘要： Disclosed is an exposure method and apparatus, an exposure mask and a device manufacturing method, wherein a first surface of a light blocking member having a plurality of openings formed in a mutually adjoining relation is placed at an exposure object side, and light is projected to the light blocking member from its second surface side so that exposure of the exposure object is carried out on the basis of near field light leaking from the openings. For exposure, interference is caused between surface plasmon polariton waves passing respectively through adjacent openings and going around to the first surface side, and, on the basis of it, a portion having a decreased light intensity is produced in the exposure object so that the exposure is carried out by use of the decreased light intensity portion.

16. 发明公开

EP1991891A1 METHOD FOR DESIGNING LIGHT TRANSMISSION DEVICE, OPTICAL ELEMENT AND SENSOR 审中-公开
标题翻译：法草案，光发送装置，光学元件与传感器
公开(公告)号：EP1991891A1
公开(公告)日：2008-11-19
申请号：EP07737720.8
申请日：2007-02-26
申请人： Canon Kabushiki Kaisha
发明人： OGINO, Masaya , YAMADA, Tomohiro , NISHIUMA, Satoru , MIZUTANI, Natsuhiko , KURODA, Ryo
IPC分类号： G02B5/20 , G02B5/18
CPC分类号： G02B5/008 , G02B5/204
摘要： The present invention provides a method for designing a light transmission device, which adjusts a wavelength region of a spectrum of transmitted light without expanding a width of a transmission spectrum and without lowering the transmittance. The method for designing a light transmission device having a metal thin film, and a rectangular aperture which is formed in a plane of the metal thin film, has a long side and a short side and makes light pass therethrough, wherein the short side has a dimension smaller than a wavelength of incident light, and the long side is determined to have such a dimension that a peak wavelength at which the transmittance of light passing through the rectangular aperture is maximal can be a predetermined value.

17. 发明授权

EP2387731B1 OPTICAL ELEMENT 有权
标题翻译：光学元件
公开(公告)号：EP2387731B1
公开(公告)日：2014-05-21
申请号：EP10716637.3
申请日：2010-01-13
申请人： Canon Kabushiki Kaisha
发明人： OIGAWA, Makoto , YAMADA, Tomohiro
IPC分类号： G02B5/30 , G02B27/28 , H04N9/31
CPC分类号： G02B27/283 , G02B5/1809 , G02B5/3058 , H04N9/3105 , H04N9/3167 , H04N9/3197

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