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    • 12. 发明授权
    • Object persistency
    • 对象持久性
    • US08589621B2
    • 2013-11-19
    • US13192347
    • 2011-07-27
    • Qing F. WangYun Wang
    • Qing F. WangYun Wang
    • G06F12/00G06F13/00G06F13/28
    • G06F9/4493
    • There is provided a method and computer system for object persistency that includes: running a program; storing an object of the program into a random access memory in response to determining that the object is a non-persistent object; and storing the object into a phase change memory in response to determining that the object is a persistent object. The method and computer system of the present disclosure do not need separate persistency layers, such that the programming model is light weighted, the persistency of object data is more simple and fast, and implicit transaction process is supported, thereby a great deal of development and runtime costs are saved.
    • 提供了一种用于对象持久性的方法和计算机系统,包括:运行程序; 响应于确定所述对象是非持久对象,将所述程序的对象存储到随机存取存储器中; 以及响应于确定所述对象是持久对象而将所述对象存储到相变存储器中。 本公开的方法和计算机系统不需要单独的持久层,使得编程模型轻量化,对象数据的持久性更加简单快速,并且支持隐式事务处理,从而大量开发和 保存运行时费用。
    • 13. 发明申请
    • COMBINATORIAL PROCESSING USING MOSAIC SPUTTERING TARGETS
    • 使用MOSAIC溅射目标的组合处理
    • US20130270104A1
    • 2013-10-17
    • US13444100
    • 2012-04-11
    • Hong Sheng YangChi-l LangYun Wang
    • Hong Sheng YangChi-l LangYun Wang
    • C23C14/35
    • C23C14/042C23C14/352C23C14/548
    • Embodiments of the present invention provide methods and apparatuses using sputtering from a mosaic sputtering target for depositing layers onto a substrate, and provide the capability of depositing layers onto site isolated regions of the substrate in a combinatorial manner. A sputtering source is provided including a sputtering target comprising a first region having a first composition, and a second region having a second composition. A selection mechanism is capable of selecting a composition of emitted material from the sputtering source that can range from 0% to 100% of the first composition and from 0% to 100% of the second composition. The selection mechanism can comprise a movable magnetron or a moveable aperture.
    • 本发明的实施方案提供了使用来自马赛克溅射靶的溅射的方法和装置,用于将层沉积到衬底上,并提供以组合方式将层沉积到衬底的位置隔离区上的能力。 提供溅射源,其包括溅射靶,其包括具有第一组成的第一区域和具有第二组成的第二区域。 选择机构能够从溅射源选择发射材料的组成,该组成可以在第一组分的0%至100%和第二组合物的0%至100%的范围内。 选择机构可以包括可移动磁控管或可移动孔。
    • 15. 发明申请
    • ATOMIC LAYER DEPOSITION OF HAFNIUM AND ZIRCONIUM OXIDES FOR MEMORY APPLICATIONS
    • 用于存储器应用的铪和氧化锆的原子层沉积
    • US20130071984A1
    • 2013-03-21
    • US13236481
    • 2011-09-19
    • Yun WangVidyut GopalImran HashimDipankar PramanikTony Chiang
    • Yun WangVidyut GopalImran HashimDipankar PramanikTony Chiang
    • H01L45/00
    • H01L45/146H01L27/2463H01L45/08H01L45/1233H01L45/1616
    • Embodiments of the invention generally relate to nonvolatile memory devices and methods for manufacturing such memory devices. The methods for forming improved memory devices, such as a ReRAM cells, provide optimized, atomic layer deposition (ALD) processes for forming a metal oxide film stack having a metal oxide buffer layer disposed on or over a metal oxide bulk layer. The metal oxide bulk layer contains a metal-rich oxide material and the metal oxide buffer layer contains a metal-poor oxide material. The metal oxide bulk layer is less electrically resistive than the metal oxide buffer layer since the metal oxide bulk layer is less oxidized or more metallic than the metal oxide buffer layer. In one example, the metal oxide bulk layer contains a metal-rich hafnium oxide material and the metal oxide buffer layer contains a metal-poor zirconium oxide material.
    • 本发明的实施例一般涉及用于制造这种存储器件的非易失性存储器件和方法。 用于形成改进的存储器件(例如ReRAM单元)的方法提供优化的原子层沉积(ALD)工艺,用于形成金属氧化物膜堆叠,其具有设置在金属氧化物本体层上或其上的金属氧化物缓冲层。 金属氧化物本体层含有富金属氧化物材料,金属氧化物缓冲层含有贫金属氧化物。 由于金属氧化物本体层比金属氧化物缓冲层氧化较少或更金属,所以金属氧化物本体层的电阻小于金属氧化物缓冲层的电阻。 在一个实例中,金属氧化物本体层含有富金属氧化铪材料,金属氧化物缓冲层含有贫金属氧化锆材料。
    • 17. 发明申请
    • METHOD AND DEVICE OF DIFFERENTIAL CONFOCAL AND INTERFERENCE MEASUREMENT FOR MULTIPLE PARAMETERS OF AN ELEMENT
    • 差分协调的方法和设备和干扰测量对于元素的多个参数
    • US20130010286A1
    • 2013-01-10
    • US13636123
    • 2011-11-09
    • Weiqian ZhaoJiamiao YangLirong QiuYun WangJia Li
    • Weiqian ZhaoJiamiao YangLirong QiuYun WangJia Li
    • G01B11/24G01N21/41G01B11/06G01B11/255G01B11/02
    • G01M11/025G01B11/06G01B11/14G01B11/2441G01B11/255G01M11/0271
    • The present invention relates to the field of optical precision measurement technologies, and in particular, to a method and a device of differential confocal (confocal) and interference measurement for multiple parameters of an element. The core concept of the invention lies in that: the concurrent high-precision measurement of multiple parameters of an element may be realized by measuring the surface curvature radius of an element with spherical surface, the back focal length of a lens, the refractive index of a lens, the thickness of a lens and the axial spaces of an assembled lenses by using a differential confocal (confocal) measuring system and measuring the surface profile of the element by using a figure interference measuring system. In the invention, a differential confocal (confocal) detection system and a figure interference measuring system are combined for the first time, the method covers more measured parameters, and during the measurement of multiple parameters of an element, it is not essential to readjust the optical path or disassemble the test element, thus no damage will be caused on the test element, and the measurement speed will be fast.
    • 本发明涉及光学精密测量技术领域,特别涉及用于元件的多个参数的差分共焦(共焦)和干涉测量的方法和装置。 本发明的核心思想在于:通过测量具有球形表面的元件的表面曲率半径,透镜的后焦距,折射率的折射率,可以实现元件的多个参数的并行高精度测量 通过使用差分共焦(共焦)测量系统,透镜,透镜的厚度和组装的透镜的轴向空间,并通过使用图形干涉测量系统测量元件的表面轮廓。 在本发明中,首次组合了差分共焦(共焦)检测系统和图形干扰测量系统,该方法涵盖更多的测量参数,并且在测量元件的多个参数期间,重要的是不必重新调整 光路或拆卸测试元件,因此不会对测试元件造成损坏,测量速度将会很快。
    • 20. 发明申请
    • ULTRAVIOLET CURING DEVICE FOR LIQUID CRYSTAL PANEL AND CURING METHOD THEREFOR
    • 用于液晶面板的超紫外线固化装置及其固化方法
    • US20120145928A1
    • 2012-06-14
    • US13000153
    • 2010-12-08
    • Yun WangChien-pang LeeYu-wu HuangBing-jei Liao
    • Yun WangChien-pang LeeYu-wu HuangBing-jei Liao
    • G01J1/08H01J9/26
    • G02F1/1303G02F1/1339
    • The present invention provides an ultraviolet curing device for a liquid crystal panel. The ultraviolet curing device has a sample platform and at least one ultraviolet-curing light source. The sample platform is used for placing a liquid crystal panel thereon. The ultraviolet-curing light source is mounted above the sample platform. The ultraviolet-curing light source has a radiation area smaller than an arrangement area of a sealant of the liquid crystal panel that is waiting to be cured by radiation of ultraviolet lights. The ultraviolet-curing light source moves above the sample platform and a surface of the liquid crystal panel and radiates at least one sealant of the liquid crystal panel under cured. The present invention further provides a corresponding ultraviolet curing method for a liquid crystal panel. The advantage of the present invention is to use movable light source performing a scan-type radiation to replace a fixed light source radiation of existing technology, so as to save the lamp number of ultraviolet-curing light source and thereby reduce manufacturing and maintaining cost on curing equipments and also save power.
    • 本发明提供一种液晶面板用的紫外线固化装置。 紫外线固化装置具有样品台和至少一个紫外线固化光源。 样品平台用于在其上放置液晶面板。 紫外线固化光源安装在样品平台上方。 紫外线固化光源的照射面积小于通过紫外线的照射等待固化的液晶面板的密封剂的配置面积。 紫外线固化光源在样品平台上方和液晶面板的表面移动,并且在固化下辐射至少一个液晶面板的密封剂。 本发明还提供了一种用于液晶面板的相应的紫外线固化方法。 本发明的优点是使用执行扫描型辐射的可移动光源来替代现有技术的固定光源辐射,从而节省了紫外线固化光源的灯数,从而降低了制造和维护成本 固化设备,节省电力。