专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

11. 发明授权

US09150758B2 Polishing composition, polishing method using same, and method for producing semiconductor device 有权
标题翻译：抛光组合物，使用其的研磨方法，以及半导体装置的制造方法
公开(公告)号：US09150758B2
公开(公告)日：2015-10-06
申请号：US14007272
申请日：2012-03-28
申请人： Anne Miller , Chiaki Saito , Kanako Fukuda
发明人： Anne Miller , Chiaki Saito , Kanako Fukuda
IPC分类号： H01L21/302 , H01L21/461 , B44C1/22 , C23F1/00 , C03C15/00 , C03C25/68 , C09G1/02 , H01L21/304 , H01L21/321 , B24B37/04 , C09K3/14 , H01L21/306 , H01L21/768 , C09G1/00 , C09G1/04
CPC分类号： C09G1/02 , B24B37/044 , C09G1/00 , C09G1/04 , C09K3/1409 , C09K3/1463 , H01L21/304 , H01L21/30625 , H01L21/3212 , H01L21/461 , H01L21/7684
摘要： The polishing composition of the present invention contains an oxidizing agent and a scratch-reducing agent represented by general formula (1) or (2) below. In the formulas, X1 and X2 are each independently a hydrogen atom, a hydroxyl group, a carboxyl group, a phosphate group, an alkyl group, an aryl group, an alkyl polyamine group, an alkyl polyphosphate group, an alkyl polycarboxylate group, an alkyl polyaminopolyphosphate group, or an alkyl polyaminopolycarboxylate group.
摘要翻译：本发明的研磨用组合物含有下述通式（1）或（2）表示的氧化剂和刮擦还原剂。在式中，X 1和X 2各自独立地为氢原子，羟基，羧基，磷酸基，烷基，芳基，烷基多胺基，多磷酸烷基酯，多羧酸烷基酯基，烷基聚氨基多磷酸盐基团或烷基聚氨基多羧酸盐基团。

12. 发明申请

US20140141612A1 POLISHING COMPOSITION, POLISHING METHOD USING SAME, AND METHOD FOR PRODUCING SEMICONDUCTOR DEVICE 有权
标题翻译：抛光组合物，使用其的抛光方法以及生产半导体器件的方法
公开(公告)号：US20140141612A1
公开(公告)日：2014-05-22
申请号：US14007272
申请日：2012-03-28
申请人： Anne Miller , Chiaki Saito , Kanako Fukuda
发明人： Anne Miller , Chiaki Saito , Kanako Fukuda
IPC分类号： C09G1/02 , H01L21/768 , H01L21/306
CPC分类号： C09G1/02 , B24B37/044 , C09G1/00 , C09G1/04 , C09K3/1409 , C09K3/1463 , H01L21/304 , H01L21/30625 , H01L21/3212 , H01L21/461 , H01L21/7684
摘要： The polishing composition of the present invention contains an oxidizing agent and a scratch-reducing agent represented by general formula (1) or (2) below. In the formulas, X1 and X2 are each independently a hydrogen atom, a hydroxyl group, a carboxyl group, a phosphate group, an alkyl group, an aryl group, an alkyl polyamine group, an alkyl polyphosphate group, an alkyl polycarboxylate group, an alkyl polyaminopolyphosphate group, or an alkyl polyaminopolycarboxylate group.
摘要翻译：本发明的研磨用组合物含有下述通式（1）或（2）表示的氧化剂和刮擦还原剂。在式中，X 1和X 2各自独立地为氢原子，羟基，羧基，磷酸基，烷基，芳基，烷基多胺基，多磷酸烷基酯，多羧酸烷基酯基，烷基聚氨基多磷酸盐基团或烷基聚氨基多羧酸盐基团。

13. 发明授权

US5695585A Method for welding bags to rings 失效
标题翻译：将袋子焊接到环的方法
公开(公告)号：US5695585A
公开(公告)日：1997-12-09
申请号：US463737
申请日：1995-06-05
申请人： Adam Kruczynski , Anne Miller
发明人： Adam Kruczynski , Anne Miller
IPC分类号： A61F6/04 , B29C65/00 , B29C65/02 , B29C65/18 , B29C65/20 , B29C65/74 , B29C65/78 , B29L22/00 , B31B19/90
CPC分类号： B29C65/02 , B29C65/18 , B29C65/749 , B29C65/78 , B29C66/534 , B29C66/632 , B29C65/7847 , B29C66/8324 , B29C66/83241 , B29K2075/00 , B29L2031/7128 , B29L2031/7538 , B31B2219/90 , Y10T156/1002 , Y10T156/1028 , Y10T156/1031 , Y10T156/108 , Y10T156/1744 , Y10T156/1776
摘要： An apparatus for welding a reinforcing member to a bag-like device or contraceptive device is disclosed. The apparatus includes at least one hollow mandrel. The hollow mandrel has an outer surface with an annular groove for holding the reinforcing member. The apparatus has a means for applying a closed end of the bag-like device into the hollow mandrel and an open end of the bag-like device over the hollow mandrel at the outer surface with the annular groove for holding the reinforcing member. The apparatus also includes a welding device for welding the reinforcing member to the bag-like device. A method for welding the reinforcing member to a bag-like device is also disclosed.
摘要翻译：公开了一种用于将加强构件焊接到袋状装置或避孕装置的装置。该装置包括至少一个中空心轴。中空心轴具有外表面，其具有用于保持加强构件的环形槽。该装置具有用于将袋状装置的封闭端部施加到中空心轴中的装置，以及在外表面处的中空心轴上的袋状装置的开口端，其中环形槽用于保持加强构件。该装置还包括用于将加强构件焊接到袋状装置的焊接装置。还公开了一种将加强构件焊接到袋状装置的方法。

14. 发明申请

US20050003637A1 Damascene fabrication with electrochemical layer removal 有权
标题翻译：大马士革制造与电化学层去除
公开(公告)号：US20050003637A1
公开(公告)日：2005-01-06
申请号：US10602488
申请日：2003-06-23
申请人： Tatyana Andryushchenko , Anne Miller
发明人： Tatyana Andryushchenko , Anne Miller
IPC分类号： C25D17/10 , C25F3/02 , C25F5/00 , H01L21/4763
CPC分类号： C25F5/00 , C25F3/02
摘要： The present application discloses process comprising providing a wafer, the wafer comprising an inter-layer dielectric (ILD) having a feature therein, an under-layer deposited on the ILD, and a barrier layer deposited on the under-layer, and a conductive layer deposited in the feature, placing the wafer in an electrolyte, such that at least the barrier layer is immersed in the electrolyte, and applying an electrical potential between the electrode and the wafer. Also disclosed is an apparatus comprising a vessel having an electrolyte therein, a first electrode at least partially immersed in the electrolyte, the first electrode comprising a wafer comprising an inter-layer dielectric (ILD) having a feature therein, an under-layer deposited on the ILD layer, a barrier layer deposited on the under-layer and a conductive layer deposited in the feature, a second electrode at least partially immersed in the electrolyte, and a potential source for applying a potential difference between the first and second electrodes. Other embodiments are also disclosed and claimed.
摘要翻译：本申请公开了包括提供晶片的方法，晶片包括其中具有特征的层间电介质（ILD），沉积在ILD上的底层和沉积在下层上的阻挡层，以及导电层沉积在特征中，将晶片放置在电解质中，使得至少阻挡层浸入电解质中，并在电极和晶片之间施加电位。还公开了一种包括其中具有电解质的容器的装置，至少部分地浸入电解质中的第一电极，第一电极包括包含其中具有特征的层间电介质（ILD）的晶片，下层沉积在 ILD层，沉积在底层上的阻挡层和沉积在特征中的导电层，至少部分浸入电解质中的第二电极和用于施加第一和第二电极之间的电位差的电位源。还公开并要求保护其他实施例。

15. 发明授权

US4778088A Garment carrier 失效
标题翻译：服装承运人
公开(公告)号：US4778088A
公开(公告)日：1988-10-18
申请号：US61459
申请日：1987-06-15
申请人： Anne Miller
发明人： Anne Miller
IPC分类号： A47G25/14 , A47G25/48 , A47G25/18
CPC分类号： A47G25/14 , A47G25/48
摘要： A garment carrier which is particularly suited for holding scarves, mufflers, gloves and the like. The garment carrier of the present invention includes a hanger adapted to be hung on a conventional closet bar. At least one set of rings having a plurality of different size rings are secured to each other so that the rings increase in diameter from one end and to the other end of the set. The smallest ring is then attached to the hanger so that the set of rings depends downwardly from the hanger. Each ring forms an opening which is designed to receive a garment, such as a scarf, muffler or the like therethrough. In addition, preferably spring loaded clips are also secured to and depend downwardly from the hanger and are adapted to hold gloves, hats and the like.

16. 发明授权

US4642816A Eye protector 失效
标题翻译：眼保护器
公开(公告)号：US4642816A
公开(公告)日：1987-02-17
申请号：US818044
申请日：1986-01-13
申请人： Anne Miller
发明人： Anne Miller
IPC分类号： A61F9/04 , A61F9/00
CPC分类号： A61F9/04
摘要： An eye protector having a body with an upper edge, a lower edge and an arcuate portion extending between the upper and lower edges. The body is dimensioned to fit over the eye so that, in doing so, the upper edge is positioned closely adjacent and above the eye while the lower edge is positioned closely adjacent and below the eye. The body is constructed so that the weight of the body between a midline extending across the arcuate section and the top edge of the body is greater than the remainder of the body. In addition, a plurality of spaced ridges extend outwardly from the anterior surface of the arcuate section which form cooling fins to cool the body.
摘要翻译：一种眼保护器，具有具有上边缘的主体，下边缘和在上边缘和下边缘之间延伸的弓形部分。身体的尺寸设计成适合于眼睛，使得在这样做时，上边缘定位成紧邻眼睛并且在眼睛之上，而下边缘位于眼睛附近和下方。身体被构造成使得身体在穿过弓形部分的中线和身体的顶部边缘之间的重量大于身体的其余部分。此外，多个间隔开的脊从弓形部分的前表面向外延伸，形成冷却翅片以冷却身体。

17. 发明申请

US20070247712A1 Optical elements having reverse dispersion 审中-公开
标题翻译：具有反向色散的光学元件
公开(公告)号：US20070247712A1
公开(公告)日：2007-10-25
申请号：US11408666
申请日：2006-04-21
申请人： YuanQiao Rao , Anne Miller
发明人： YuanQiao Rao , Anne Miller
IPC分类号： G02B5/30
CPC分类号： G02B5/3083 , G02F1/133634 , G02F2001/133637
摘要： This invention relates to an optical element comprising a first component having a birefringence dispersion of D1>1, and a second component having a birefringence dispersion of D2>1 and a maximum peak absorption at a wavelength less than 400 nm, wherein the birefringence ratio at any wavelength of the first and second component is Δn1/Δn2
摘要翻译：本发明涉及一种光学元件，其包括具有D1> 1的双折射色散的第一成分和具有D2> 1的双折射色散和在波长小于400nm的最大峰值吸收的第二成分，其中双折射率在第一和第二分量的任何波长是Deltan1 / Deltan2 <0，并且其中光学元件具有D <1的反向双折射色散。

18. 发明申请

US20070152252A1 Reducing aluminum dissolution in high pH solutions 审中-公开
标题翻译：在高pH值溶液中降低铝的溶解度
公开(公告)号：US20070152252A1
公开(公告)日：2007-07-05
申请号：US11322885
申请日：2005-12-30
申请人： Mark Buehler , Anne Miller , Tatyana Andryushchenko
发明人： Mark Buehler , Anne Miller , Tatyana Andryushchenko
IPC分类号： H01L21/8242 , H01L21/461
CPC分类号： H01L21/02074 , H01L21/28079 , H01L21/28185 , H01L21/28194 , H01L21/321 , H01L29/517 , H01L29/66545
摘要： A method for reducing the dissolution of aluminum gate electrodes in a high pH clean chemistry comprises modifying the high pH clean chemistry to include a silanol-based chemical. The silanol-based chemical causes a protective layer to form on a top surface of the aluminum gate electrode. The protective layer substantially reduces or prevents corrosion that occurs due to the high pH level of the clean chemistry. The protective layer is formed by the silanol-based chemical bonding to the aluminum gate electrode through a hydrolysis reaction, thereby forming a silanol-based protective layer.
摘要翻译：一种用于在高pH清洁化学品中减少铝栅电极的溶解的方法包括改变高pH清洁化学物质以包括基于硅烷醇的化学品。基于硅烷醇的化学品导致在铝栅电极的顶表面上形成保护层。保护层基本上减少或防止由于清洁化学品的高pH值而发生的腐蚀。通过水解反应，通过与铝栅电极的硅烷醇类化学键合形成保护层，由此形成硅烷醇类保护层。

19. 发明申请

US20070004209A1 Slurry for chemical mechanical polishing of aluminum 失效
标题翻译：用于铝化学机械抛光的浆料
公开(公告)号：US20070004209A1
公开(公告)日：2007-01-04
申请号：US11172093
申请日：2005-06-29
申请人： Allen Feller , Anne Miller
发明人： Allen Feller , Anne Miller
IPC分类号： H01L21/4763 , H01L21/461
CPC分类号： C23F3/03 , C09G1/02 , H01L21/3212
摘要： Described herein are embodiments of a slurry used for the chemical mechanical polishing a substrate that includes aluminum or an aluminum alloy features having a width of less than 1 um. The slurry includes a precipitated silica abrasive having a diameter of less than or equal to 100 nm and a chelating buffer system comprising citric acid and oxalic acid to provide a pH of the slurry in the approximate range of 1.5 and 4.0.
摘要翻译：这里描述的是用于化学机械抛光包括铝或具有小于1μm的宽度的铝合金特征的基材的浆料的实施方案。浆液包括直径小于或等于100nm的沉淀二氧化硅磨料和包含柠檬酸和草酸的螯合缓冲体系，以提供约1.5和4.0的浆料的pH值。

20. 发明申请

US20060046523A1 Facilitating removal of sacrificial layers to form replacement metal gates 审中-公开
标题翻译：有助于去除牺牲层以形成更换金属门
公开(公告)号：US20060046523A1
公开(公告)日：2006-03-02
申请号：US10925458
申请日：2004-08-25
申请人： Jack Kavalieros , Justin Brask , Mark Doczy , Chris Barns , Matthew Metz , Suman Datta , Robert Chau , Matt Prince , Anne Miller , Mark Buehler
发明人： Jack Kavalieros , Justin Brask , Mark Doczy , Chris Barns , Matthew Metz , Suman Datta , Robert Chau , Matt Prince , Anne Miller , Mark Buehler
IPC分类号： H01L21/76
CPC分类号： H01L29/517 , H01L21/28079 , H01L21/28185 , H01L21/28194 , H01L21/823842 , H01L29/495 , H01L29/66545
摘要： Replacement metal gates may be formed by removing a polysilicon layer from a gate structure. The gate structure may be formed by patterning the polysilicon layer and depositing a spacer layer over the gate structure such that the spacer layer has a first polish rate. The spacer layer is then etched to form a sidewall spacer. An interlayer dielectric is applied over the gate structure with the sidewall spacer. The interlayer dielectric has a second polish rate higher than the first polish rate. In one embodiment, the interlayer dielectric has a lower polish rate than that of oxide.
摘要翻译：可以通过从栅极结构去除多晶硅层来形成替代金属栅极。栅极结构可以通过图案化多晶硅层并在栅极结构上沉积间隔层形成，使得间隔层具有第一抛光速率。然后对间隔层进行蚀刻以形成侧壁间隔物。在栅极结构上用侧壁间隔物施加层间电介质。层间电介质具有比第一抛光速率高的第二抛光速率。在一个实施例中，层间电介质具有比氧化物更低的抛光速率。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式