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11. 发明申请

US20090122429A1 Self-correcting optical elements for high-thermal-load optical systems 有权
标题翻译：用于高热负荷光学系统的自校正光学元件
公开(公告)号：US20090122429A1
公开(公告)日：2009-05-14
申请号：US11983615
申请日：2007-11-09
申请人： Douglas C. Watson , Alton H. Phillips
发明人： Douglas C. Watson , Alton H. Phillips
IPC分类号： G02B7/185
CPC分类号： G02B7/028 , G02B7/008 , G02B7/181
摘要： Mirrors and other optical elements are disclosed that include a body defining an optical surface (typically a reflective surface) and an opposing second surface. The body has a coefficient of thermal expansion (CTE). The optical element includes a correcting portion (e.g., a layer) attached to the second surface and having a CTE that, during heating of the optical element, imparts a bending moment to the body that at least partially offsets a change in curvature of the optical surface caused by heating. The body can be internally cooled. The body and correcting portion desirably are made of respective thermally conductive materials that can vary only slightly in CTE. The body desirably has a lower CTE than the correcting portion, and the correcting portion can be tuned according a variable property of the body and/or reflective surface. The body and correcting portion desirably function cooperatively in a thermally bimetallic-like manner.
摘要翻译：公开了镜子和其它光学元件，其包括限定光学表面（通常为反射表面）和相对的第二表面的主体。身体有一个热膨胀系数（CTE）。光学元件包括附接到第二表面并具有CTE的校正部分（例如，层），该CTE在光学元件的加热期间向本体施加弯曲力矩，该弯曲力矩至少部分地抵消光学元件的曲率变化加热引起的表面。身体可以内部冷却。主体和校正部分期望地由可在CTE中稍微变化的相应导热材料制成。身体期望地具有比校正部分更低的CTE，并且校正部分可以根据身体和/或反射表面的可变特性进行调节。身体和校正部分期望地以热双金属样的方式协同地起作用。

12. 发明授权

US06880942B2 Adaptive optic with discrete actuators for continuous deformation of a deformable mirror system 失效
标题翻译：具有离散致动器的自适应光学器件用于可变形反射镜系统的连续变形
公开(公告)号：US06880942B2
公开(公告)日：2005-04-19
申请号：US10460644
申请日：2003-06-13
申请人： Andrew J. Hazelton , W. Thomas Novak , Alton H. Phillips , Douglas C. Watson
发明人： Andrew J. Hazelton , W. Thomas Novak , Alton H. Phillips , Douglas C. Watson
IPC分类号： G02B26/08 , G03F7/20 , G02B5/08
CPC分类号： G03F7/70266 , G02B26/0825
摘要： Adaptive optical elements for use in high precision lithography exposure are provided with an array of discrete actuators to provide highly stable and repeatable correction of the shape of an optical element to an accuracy of a small fraction of a very short wavelength of light in the EUV range of 1 to 50 nanometers, responsive to a metrology source and sensor arrangement. The actuators are matched to the deformation characteristics of the adaptive optical elements. Preferably, the actuators provide both positive and negative force for outward and/or inward deflection continuously over the surface of the mirror. The surface of the optical element may thus be accurately, controllably and repeatably deformed to within an allowable deformation limit to optimize optical performance of an optical system for high precision lithography exposure.
摘要翻译：用于高精度光刻曝光的自适应光学元件设置有离散致动器的阵列，以提供高度稳定且可重复的光学元件形状的校正，使其在EUV范围内的非常短波长的光的一小部分的精度 1至50纳米，响应于测量源和传感器布置。致动器与自适应光学元件的变形特性相匹配。优选地，致动器在反射镜的表面上连续地向外和/或向内偏转提供正的和负的力。因此，光学元件的表面因此可以精确地，可控地和可重复地变形到允许的变形极限内，以优化用于高精度光刻曝光的光学系统的光学性能。

13. 发明授权

US09323157B2 Mirror assembly for an exposure apparatus 有权
标题翻译：用于曝光设备的镜组件
公开(公告)号：US09323157B2
公开(公告)日：2016-04-26
申请号：US14116634
申请日：2012-06-13
申请人： Alton H. Phillips , Douglas C. Watson , Lorri L. Watson
发明人： Alton H. Phillips , Douglas C. Watson
IPC分类号： G03B27/54 , G03F7/20 , G02B7/18
CPC分类号： G03F7/7015 , G02B7/1815
摘要： A mirror assembly (332) for directing a beam (28) from an illumination source (26) to a reticle (36) includes a mirror (352) and a back plate (350). The mirror (352) includes a mirror body (352A) that defines a reflective first surface (352B) that directs the beam (28), a mirror mounting region (370), a mirror perimeter region (372) that encircles the mirror mounting region (370), and mirror slot (374) that separates the mirror perimeter region (372) from the mirror mounting region (370). The back plate (350) retains and engages the mirror mounting region (370) of the mirror (352) with the mirror perimeter region (372) spaced apart from the back plate (350). Further, the mirror body (352A) can include a second surface (352C) that is substantially opposite the first surface (352B), and the mirror mounting region (370) extends between the second surface (352C) to near the first surface (352B). Further, the mirror slot (374) extends from the second surface (352C) to near the first surface (352B).
摘要翻译：用于将光束（28）从照明源（26）引导到掩模版（36）的反射镜组件（332）包括反射镜（352）和背板（350）。反射镜（352）包括：镜体（352A），其限定引导光束（28）的反射第一表面（352B）;反射镜安装区域（370）;镜面周边区域（372），其包围反射镜安装区域（370）和将反射镜周边区域（372）与反射镜安装区域（370）分离的反射镜槽（374）。背板（350）将反射镜（352）的反射镜安装区域（370）保持并与反射镜周边区域（372）与后板（350）间隔开。此外，镜体（352A）可以包括与第一表面（352B）大致相对的第二表面（352C），并且镜安装区域（370）在第二表面（352C）之间延伸到第一表面（352B）附近）。此外，镜槽（374）从第二表面（352C）延伸到第一表面（352B）附近。

14. 发明授权

US09304385B2 Exposure method and device manufacturing method including selective deformation of a mask 有权
标题翻译：包括掩模选择性变形的曝光方法和装置制造方法
公开(公告)号：US09304385B2
公开(公告)日：2016-04-05
申请号：US12560760
申请日：2009-09-16
申请人： Alton H. Phillips , Douglas C. Watson , Hiromitsu Yoshimoto , Yusaku Uehara
发明人： Alton H. Phillips , Douglas C. Watson , Hiromitsu Yoshimoto , Yusaku Uehara
IPC分类号： G03B27/32 , G03F1/00 , G03F7/20
CPC分类号： G03B27/32 , G03F1/144 , G03F1/50 , G03F7/70783 , G03F7/70875
摘要： An exposure method that uses a substrate (M) held by a holding member (28) to perform exposure processing, comprising a holding process, which holds a prescribed region (AR3) of the substrate as the holding region by means of the holding member, and a deformation process, which selectively deforms one side of the holding region of the substrate held by the holding process with respect to the other side. According to the present invention, a prescribed region of the substrate is held as a holding region by means of a holding member, and one side of the holding region of said held substrate is selectively deformed with respect to the other side, so it is possible to selectively eliminate the nonlinear deformation components attributable to holding of the substrate with respect to one side from among the two sides of the substrate using the holding region as a reference. Since it is possible to put the pattern projected via the substrate into a linearly correctable status, it is possible to reduce warping of the pattern.
摘要翻译：一种使用由保持构件（28）保持的基板（M）进行曝光处理的曝光方法，包括通过保持构件保持基板的规定区域（AR3）作为保持区域的保持工序，以及变形过程，其选择性地使通过保持过程保持的基板的保持区域的一侧相对于另一侧变形。根据本发明，通过保持构件将衬底的规定区域保持为保持区域，并且所述保持衬底的保持区域的一侧相对于另一侧选择性地变形，因此可能以使用保持区域作为基准来选择性地消除归因于基板相对于基板的两侧之间的一侧的保持的非线性变形分量。由于可以将通过基板投射的图案置于线性可校正状态，可以减少图案的翘曲。

15. 发明申请

US20100097588A1 EXPOSURE METHOD, DEVICE MANUFACTURING METHOD, AND MASK 有权
标题翻译：曝光方法，装置制造方法和掩模
公开(公告)号：US20100097588A1
公开(公告)日：2010-04-22
申请号：US12560760
申请日：2009-09-16
申请人： Alton H. Phillips , Douglas C. Watson , Hiromitsu Yoshimoto , Yusaku Uehara
发明人： Alton H. Phillips , Douglas C. Watson , Hiromitsu Yoshimoto , Yusaku Uehara
IPC分类号： G03B27/42 , G03B27/32 , G03F1/00
CPC分类号： G03B27/32 , G03F1/144 , G03F1/50 , G03F7/70783 , G03F7/70875
摘要： An exposure method that uses a substrate (M) held by a holding member (28) to perform exposure processing, comprising a holding process, which holds a prescribed region (AR3) of the substrate as the holding region by means of the holding member, and a deformation process, which selectively deforms one side of the holding region of the substrate held by the holding process with respect to the other side. According to the present invention, a prescribed region of the substrate is held as a holding region by means of a holding member, and one side of the holding region of said held substrate is selectively deformed with respect to the other side, so it is possible to selectively eliminate the nonlinear deformation components attributable to holding of the substrate with respect to one side from among the two sides of the substrate using the holding region as a reference. Since it is possible to put the pattern projected via the substrate into a linearly correctable status, it is possible to reduce warping of the pattern.
摘要翻译：一种使用由保持构件（28）保持的基板（M）进行曝光处理的曝光方法，包括通过保持构件保持基板的规定区域（AR3）作为保持区域的保持工序，以及变形过程，其选择性地使通过保持过程保持的基板的保持区域的一侧相对于另一侧变形。根据本发明，通过保持构件将衬底的规定区域保持为保持区域，并且所述保持衬底的保持区域的一侧相对于另一侧选择性地变形，因此可能以使用保持区域作为基准来选择性地消除归因于基板相对于基板的两侧之间的一侧的保持的非线性变形分量。由于可以将通过基板投射的图案置于线性可校正状态，可以减少图案的翘曲。

16. 发明申请

US20090122428A1 Reflective optical elements exhibiting multimetallic-like self-correction of distortions caused by heating 审中-公开
标题翻译：反射光学元件表现出由加热引起的变形的多金属状自校正
公开(公告)号：US20090122428A1
公开(公告)日：2009-05-14
申请号：US11983611
申请日：2007-11-09
申请人： Alton H. Phillips , Douglas C. Watson
发明人： Alton H. Phillips , Douglas C. Watson
IPC分类号： G02B7/185
CPC分类号： G02B7/181 , G02B7/008 , G02B7/028
摘要： Optical elements are disclosed that exhibit “multimetallic”-like self corrections of thermally induced distortions. An exemplary optical element includes first and second portions. The first portion has a first coefficient of thermal expansion (CTE), an obverse surface, and a reverse surface. A second portion is bonded to the reverse surface. The second portion has a second CTE different from the first CTE to form an optical element exhibiting a thermally multimetallic-like change in curvature of the obverse surface accompanying a temperature change of the optical element. The second portion has a thermal-response property in a first direction that is different from a thermal-response property in a second direction. Thus, aberrations such as astigma-type aberrations can be readily self-corrected.
摘要翻译：公开了表现出热诱导失真的“多金属”状自校正的光学元件。示例性的光学元件包括第一和第二部分。第一部分具有第一热膨胀系数（CTE），正面和反面。第二部分结合到反面。第二部分具有与第一CTE不同的第二CTE，以形成随着光学元件的温度变化而呈现正面的热多金属样变化的光学元件。第二部分在第一方向上具有与第二方向上的热响应特性不同的热响应特性。因此，诸如散光像差的像差可以容易地自校正。

17. 发明申请

US20090033895A1 Lithography apparatus with flexibly supported optical system 审中-公开
标题翻译：平版印刷设备，灵活支持光学系统
公开(公告)号：US20090033895A1
公开(公告)日：2009-02-05
申请号：US11882027
申请日：2007-07-30
申请人： Michael B. Binnard , Douglas C. Watson , Alton H. Phillips , Scott Coakley
发明人： Michael B. Binnard , Douglas C. Watson , Alton H. Phillips , Scott Coakley
IPC分类号： G03B27/42
CPC分类号： G03F7/709 , G03F7/70833
摘要： A lithography apparatus includes a projection optical system that projects an image of a pattern, a first support member, a second support member that is flexibly coupled to the first support member by a first flexible coupling device such that the second support member is suspended from the first support member, and a second flexible coupling device that flexibly couples the projection optical system to the second support structure. This arrangement is capable of improving the vibration characteristics of the projection optical system.
摘要翻译：光刻设备包括投影光学系统，其投影图案的图像，第一支撑构件和第二支撑构件，第二支撑构件通过第一柔性联接装置柔性地联接到第一支撑构件，使得第二支撑构件从第一支撑构件和将投影光学系统柔性地耦合到第二支撑结构的第二柔性耦合装置。这种布置能够改善投影光学系统的振动特性。

18. 发明申请

US20090027639A1 EUV Reticle Handling System and Method 有权
标题翻译： EUV光栅处理系统和方法
公开(公告)号：US20090027639A1
公开(公告)日：2009-01-29
申请号：US12242050
申请日：2008-09-30
申请人： Alton H. Phillips , Michael R. Sogard , Douglas C. Watson
发明人： Alton H. Phillips , Michael R. Sogard , Douglas C. Watson
IPC分类号： G03B27/52
CPC分类号： G03F7/70741
摘要： An enclosure for protecting at least a pattern side and an opposing side of a reticle is disclosed. The enclosure includes a first and second part that form an enclosure around a reticle to be protected during handling, inspection, storage, and transport. The enclosure in conjunction with a heater and heat sink provides thermophoretic protection of an enclosed reticle.
摘要翻译：公开了用于保护掩模版的至少一个图案侧和相对侧的外壳。外壳包括第一和第二部分，其在处理，检查，存储和运输期间形成围绕保护的掩模版的外壳。外壳与加热器和散热器一起提供封闭的掩模版的热泳保护。

19. 发明申请

US20080285004A1 Monolithic, Non-Contact Six Degree-of-Freedom Stage Apparatus 审中-公开
标题翻译：单片，非接触式六自由度舞台装置
公开(公告)号：US20080285004A1
公开(公告)日：2008-11-20
申请号：US11750545
申请日：2007-05-18
申请人： Michael B. Binnard , Yoichi Arai , Douglas C. Watson , Alton H. Phillips
发明人： Michael B. Binnard , Yoichi Arai , Douglas C. Watson , Alton H. Phillips
IPC分类号： G03B27/58 , G03B27/62
CPC分类号： G03F7/709 , G03F7/70725 , G03F7/70758 , G03F7/70766 , G03F7/70816
摘要： Methods and apparatus for controlling a stage assembly in up to six degrees of freedom using actuators which each allow for forces to be generated in a horizontal direction and a vertical direction are disclosed. According to one aspect of the present invention, a stage apparatus includes a stage assembly and a first stator arrangement. The stage assembly includes a first magnet arrangement of an actuator assembly, and the first stator arrangement is part of the actuator assembly. The first magnet arrangement cooperates with the first stator arrangement to allow the stage assembly to move relative to a first horizontal axis as well as a vertical axis.
摘要翻译：公开了使用致动器在多达六个自由度中控制台组件的方法和装置，每个致动器允许在水平方向和垂直方向上产生力。根据本发明的一个方面，舞台装置包括舞台组件和第一定子装置。舞台组件包括致动器组件的第一磁体布置，并且第一定子布置是致动器组件的一部分。第一磁体装置与第一定子装置配合以允许载物台组件相对于第一水平轴线和垂直轴线移动。

20. 发明申请

US20070267995A1 Six Degree-of-Freedom Stage Apparatus 审中-公开
标题翻译：六自由度舞台装置
公开(公告)号：US20070267995A1
公开(公告)日：2007-11-22
申请号：US11750604
申请日：2007-05-18
申请人： Michael B. Binnard , Yoichi Arai , Douglas C. Watson , Alton H. Phillips , Scott Coakley
发明人： Michael B. Binnard , Yoichi Arai , Douglas C. Watson , Alton H. Phillips , Scott Coakley
IPC分类号： B64C17/06
CPC分类号： G03F7/70716 , G03F7/70766
摘要： Methods and apparatus for providing a fine stage with up to six degrees of freedom are disclosed. According to one aspect of the present invention, a stage apparatus includes a first stage assembly, a second stage assembly, and a countermass arrangement. The first stage assembly including a first component of a first actuator, and supports a second actuator arrangement. The second stage assembly is supported over the first stage assembly such that the second actuator arrangement drives the second stage assembly along a vertical axis. The countermass arrangement includes a second component of the first actuator. The first component cooperates with the second component to allow the first stage assembly to move relative to a first horizontal axis. The countermass arrangement absorbs reaction forces associated with the first and second stage assemblies.
摘要翻译：公开了提供高达六个自由度的精细台阶的方法和装置。根据本发明的一个方面，一种舞台装置包括第一舞台组件，第二舞台组件和反对质量装置。第一级组件包括第一致动器的第一部件，并且支撑第二致动器装置。第二级组件被支撑在第一级组件上，使得第二致动器装置沿着垂直轴驱动第二级组件。反对质量布置包括第一致动器的第二部件。第一部件与第二部件配合以允许第一级组件相对于第一水平轴线移动。反作用装置吸收与第一和第二级组件相关联的反作用力。

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