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    • 15. 发明授权
    • Method and system for providing a magnetic recording transducer using a line hard mask
    • 使用线硬掩模提供磁记录传感器的方法和系统
    • US08233248B1
    • 2012-07-31
    • US12560669
    • 2009-09-16
    • Guanxiong LiWei ZhangMing Mao
    • Guanxiong LiWei ZhangMing Mao
    • G11B5/39B44C1/22
    • G11B5/398G01R33/098G11B5/3163G11B5/3932H01L43/12Y10T29/49041Y10T29/49046Y10T29/49052
    • A method and system for fabricating a magnetic transducer is described. The transducer has a device region, a field region, and a magnetoresistive stack. The method and system include providing a hard mask on the magnetoresistive stack. The hard mask is inorganic and includes a sensor portion and a line frame. The sensor portion covers a first portion of the magnetoresistive stack corresponding to a magnetoresistive structure. The line frame covers a second portion of the magnetoresistive stack in the device region. The method and system include defining the magnetoresistive structure in a track width direction using the hard mask and providing at least one hard bias material after the magnetoresistive structure is defined. A first portion of the hard bias material(s) is substantially adjacent to the magnetoresistive structure in the track width direction. The method and system also include removing a second portion of the hard bias material(s).
    • 描述了用于制造磁换能器的方法和系统。 换能器具有器件区域,场区域和磁阻堆叠。 该方法和系统包括在磁阻堆叠上提供硬掩模。 硬掩模是无机的,并且包括传感器部分和线框架。 传感器部分覆盖对应于磁阻结构的磁阻堆叠的第一部分。 线框架覆盖器件区域中的磁阻堆叠的第二部分。 该方法和系统包括使用硬掩模限定磁道宽度方向上的磁阻结构,并且在限定了磁阻结构之后提供至少一种硬偏置材料。 硬偏压材料的第一部分在磁道宽度方向上基本上与磁阻结构相邻。 该方法和系统还包括去除硬偏压材料的第二部分。
    • 19. 发明申请
    • Sputter Deposition System and Methods of Use
    • 溅射沉积系统及其使用方法
    • US20070209926A1
    • 2007-09-13
    • US11558769
    • 2006-11-10
    • Chih-Ling LeeAdrian DevasahayamMing Mao
    • Chih-Ling LeeAdrian DevasahayamMing Mao
    • C23C14/32C23C14/00
    • C23C14/352C23C14/505C23C14/568C23C14/5833
    • The present invention relates a physical vapor deposition (PVD) system. e.g. a planetary system, for forming one or more layers of a coating material on a substrate and for treating, or modifying, the substrate surface, which can include the surface of the substrate or a deposited layer of coating material thereon. The PVD system includes a single vacuum (or process) chamber having an ion source and at least one PVD source of the coating material. The ion source, such as a linear ion source, is configured to emit a beam of energetic particles at a substrate for surface modification of the substrate surface, for example, to provide film densification, etching, cleaning, surface smoothing, and/or oxidation thereof. The PVD source(s) of the coating material deposits one or more layers of coating material(s) on the substrate. The uniformity of substrate surface modification and the thickness uniformity of the deposited layers can be maintained by velocity profiling of the rotating substrate within the vacuum chamber.
    • 本发明涉及物理气相沉积(PVD)系统。 例如 行星系统,用于在衬底上形成一层或多层涂层材料,并用于处理或改性衬底表面,衬底表面可包括衬底的表面或其上的涂层材料的沉积层。 PVD系统包括具有离子源和涂层材料的至少一个PVD源的单个真空(或过程)室。 诸如线性离子源的离子源被配置为在衬底处发射高能粒子束,用于衬底表面的表面改性,例如以提供膜致密化,蚀刻,清洁,表面平滑化和/或氧化 其中。 涂层材料的PVD源在衬底上沉积一层或多层涂层材料。 衬底表面改性的均匀性和沉积层的厚度均匀性可以通过旋转衬底在真空室内的速度分布来保持。