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11. 发明专利

DE60127212T2 未知
公开(公告)号：DE60127212T2
公开(公告)日：2007-12-20
申请号：DE60127212
申请日：2001-08-31
申请人： KONINKL PHILIPS ELECTRONICS NV , ASML NETHERLANDS BV
发明人： BANINE VADIM YEVGENYEVICH , JONKERS JEROEN
IPC分类号： G03F7/20 , G03F7/22 , H01L21/027
摘要： A lithographic projection apparatus comprising a radiation system for supplying a projection beam of radiation, a mask table for holding a mask, a substrate table for holding a substrate and a projection system for imaging an irradiated portion of the mask onto a target portion of the substrate. Either or both of the radiation system and the projection system is supplied with an inert gas at a pressure of from 0.1 to 10 Pa in order to suppress contamination, for example by hydrocarbon molecules, of any optical components in the system(s).

12. 发明专利

SG109523A1 LITHOGRAPHIC PROJECTION APPARATUS AND REFLECTOR ASSEMBLY FOR USE IN SAID APPARATUS 未知
公开(公告)号：SG109523A1
公开(公告)日：2005-03-30
申请号：SG200304826
申请日：2003-08-13
申请人： ASML NETHERLANDS BV
发明人： BAKKER LEVINUS PIETER , JONKERS JEROEN , SCHUURMANS FRANK JEROEN PIETER , VISSER HUGO MATTIEU
IPC分类号： G21K1/06 , G03F7/20 , G21K5/00 , G21K5/02 , H01L21/027
摘要： A lithographic projection apparatus includes a reflector assembly, the reflector assembly includes a first and a second reflector extending in a direction of an optical axis, the first and second reflector each having a reflective surface, a backing surface and an entry section at respectively a first and a second distance from the optical axis, the first distance being larger than the second distance, rays deriving from a point on the optical axis being cut off by the entry sections of the first and second reflectors and being reflected on the reflective surface of the first reflector and defining a high radiation intensity zone and a low radiation intensity zone between the reflectors; a radial support member configured to support the reflectors extending in the low radiation intensity zone, wherein the radial support member creates a shade in a downstream direction of the optical axis and a virtual shade in an upstream direction of the optical axis; and a structure placed in the virtual shade.

13. 发明专利

DE60127050T2 未知
公开(公告)号：DE60127050T2
公开(公告)日：2007-12-13
申请号：DE60127050
申请日：2001-08-31
申请人： KONINKL PHILIPS ELECTRONICS NV , ASML NETHERLANDS BV
发明人： BANINE VADIM YEVGENYEVICH , JONKERS JEROEN
IPC分类号： G03F7/20 , H01L21/027
摘要： A lithographic projection apparatus comprising a radiation system (LA,Ex,IL) for supplying a projection beam (PB) of electromagnetic radiation in the extreme ultraviolet (EUV) range, a support structure (MT) for supporting patterning means (MA), the patterning means serving to pattern the projection beam according to a desired pattern, a substrate table (WT) for holding a substrate (W) and a projection system (PL) for projecting the patterned beam onto a target portion (C) of the substrate. A space (3) within the apparatus, which space contains a mirror (CM), is supplied with a hydrocarbon gas which forms a protective cap layer on the mirror surface. The partial pressure of the hydrocarbon gas in the space is controlled in response to variations in the background pressure in the space and/or in the reflectivity of the mirror, such that the thickness of the cap layer on the mirror remains within an acceptable range. The partial pressure of hydrocarbon may be increased in order to sputter away the cap layer and/or, if extra multilayers are provided on the mirror, the top layer(s) of the mirror, thus providing a clean mirror surface. The hydrocarbon used may be an alcohol, in which case the cap layer formed is self-terminating.

14. 发明专利

DE60127050D1 未知
公开(公告)号：DE60127050D1
公开(公告)日：2007-04-19
申请号：DE60127050
申请日：2001-08-31
申请人： KONINKL PHILIPS ELECTRONICS NV , ASML NETHERLANDS BV
发明人： BANINE VADIM YEVGENYEVICH , JONKERS JEROEN
IPC分类号： G03F7/20 , H01L21/027
摘要： A lithographic projection apparatus comprising a radiation system (LA,Ex,IL) for supplying a projection beam (PB) of electromagnetic radiation in the extreme ultraviolet (EUV) range, a support structure (MT) for supporting patterning means (MA), the patterning means serving to pattern the projection beam according to a desired pattern, a substrate table (WT) for holding a substrate (W) and a projection system (PL) for projecting the patterned beam onto a target portion (C) of the substrate. A space (3) within the apparatus, which space contains a mirror (CM), is supplied with a hydrocarbon gas which forms a protective cap layer on the mirror surface. The partial pressure of the hydrocarbon gas in the space is controlled in response to variations in the background pressure in the space and/or in the reflectivity of the mirror, such that the thickness of the cap layer on the mirror remains within an acceptable range. The partial pressure of hydrocarbon may be increased in order to sputter away the cap layer and/or, if extra multilayers are provided on the mirror, the top layer(s) of the mirror, thus providing a clean mirror surface. The hydrocarbon used may be an alcohol, in which case the cap layer formed is self-terminating.

15. 发明专利

SG120919A1 Lithographic apparatus and device manufacturing method 未知
公开(公告)号：SG120919A1
公开(公告)日：2006-04-26
申请号：SG200301500
申请日：2003-03-26
申请人： ASML NETHERLANDS BV
发明人： BAKKER LEVINUS PIETER , JONKERS JEROEN , DIJSSELDONK VAN ANTONIUS JOHAN , DIERICHS MARCEL MATHIJS THEODO
IPC分类号： G21K1/04 , G03F7/20 , G21K5/00 , G21K5/02 , H01L21/027 , H05G2/00
摘要： Controlled aperture for providing an opening through a barrier separating two parts of the apparatus to enable a pulse of radiation to be radiated from one part of the apparatus to the other. The controlled aperture closes the opening between the pulses of radiation to minimize the gas flow between the first and second parts.

16. 发明专利

DE60231698D1 未知
公开(公告)号：DE60231698D1
公开(公告)日：2009-05-07
申请号：DE60231698
申请日：2002-12-27
申请人： ASML NETHERLANDS BV
发明人： BAKKER LEON , JONKERS JEROEN , VISSER HUGO MATTHIEU
IPC分类号： G03F7/20 , H01L21/027
摘要： A lithographic apparatus includes a first space containing a plasma source and also containing a source gas which may have a high absorption of radiation at the wavelength of the projection beam of the apparatus, this gas being restricted from entering the remainder of the lithographic system by a second space containing a buffer gas having a low absorption at the wavelength of the projection beam of the apparatus. The pressure of the buffer gas is lower than or equal to that of the source gas.

17. 发明专利

SG128452A1 Lithographic apparatus and device manufacturing method 未知
公开(公告)号：SG128452A1
公开(公告)日：2007-01-30
申请号：SG200307481
申请日：2003-12-12
申请人： ASML NETHERLANDS BV
发明人： BEEK VAN MICHAEL CORNELIS , BAKKER LEVINUS PIETER , BISSCHOPS THEODURUS HUBERTUS J , JONKERS JEROEN , KROON MARK , WOLTERS ROBERTUS ADRIANUS MARI , MAAS ADRIANUS JOHANNES HENRICU
IPC分类号： H01L21/027 , B08B7/00 , G03F7/00 , G03F7/20
摘要： The use of a downstream radical source 10 to produce a beam 7 of radicals for cleaning contaminants from a surface 8.

18. 发明专利

SG103902A1 LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 未知
公开(公告)号：SG103902A1
公开(公告)日：2004-05-26
申请号：SG200207821
申请日：2002-12-26
申请人： ASML NETHERLANDS BV
发明人： BAKKER LEON , JONKERS JEROEN , VISSER HUGO MATTHIEU
IPC分类号： G03F7/20 , H01L21/027
摘要： A lithographic apparatus includes a first space containing a plasma source and also containing a source gas which may have a high absorption of radiation at the wavelength of the projection beam of the apparatus, this gas being restricted from entering the remainder of the lithographic system by a second space containing a buffer gas having a low absorption at the wavelength of the projection beam of the apparatus. The pressure of the buffer gas is lower than or equal to that of the source gas.

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