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11. 发明申请

WO2017098292A1 SYSTEM CONFIGURED FOR SPUTTER DEPOSITION ON A SUBSTRATE, SHIELDING DEVICE FOR A SPUTTER DEPOSITION CHAMBER, AND METHOD FOR PROVIDING AN ELECTRICAL SHIELDING IN A SPUTTER DEPOSITION CHAMBER 审中-公开
标题翻译：配置用于基板上的溅射沉积的系统，用于溅射沉积室的屏蔽装置以及用于在溅射沉积室中提供电屏蔽的方法
公开(公告)号：WO2017098292A1
公开(公告)日：2017-06-15
申请号：PCT/IB2015/002317
申请日：2015-12-09
申请人： APPLIED MATERIALS, INC. , ZILBAUER, Thomas Werner , HENKEL, Uwe , THIEL, Johannes , EL ZAAR, Kamal , KELLER, Stefan
发明人： ZILBAUER, Thomas Werner , HENKEL, Uwe , THIEL, Johannes , EL ZAAR, Kamal , KELLER, Stefan
IPC分类号： C23C14/34 , C23C14/54
CPC分类号： C23C14/3471 , H01J37/32477 , H01J37/32605 , H01J37/32651
摘要： The present disclosure provides a system (100) configured for sputter deposition on a substrate (10). The system (100) includes a sputter deposition chamber (110) having a processing zone (112), one or more sputter deposition sources (120) arranged at a first side of the processing zone (112), and a shielding device (130) arranged at a second side of the processing zone (112), wherein the shielding device (130) includes a frame assembly (132) mounted to the sputter deposition chamber (110) and one or more conductive sheets (134) detachably mounted on the frame assembly (132), wherein the one or more conductive sheets (134) provide a surface (136) arranged along the processing zone (112).
摘要翻译：本公开提供了一种配置用于在衬底（10）上溅射沉积的系统（100）。系统（100）包括具有处理区（112）的溅射沉积室（110），布置在处理区（112）的第一侧的一个或多个溅射沉积源（120），以及屏蔽装置（130），所述屏蔽装置（130）包括安装到所述溅射沉积室（110）的框架组件（132）以及可拆卸地安装在所述框架（112）上的一个或多个导电片（134）组件（132），其中所述一个或多个导电片（134）提供沿着所述处理区（112）布置的表面（136）。

12. 发明申请

WO2017005291A1 DEPOSITION SOURCE FOR SPUTTER DEPOSITION, DEPOSITION APPARATUS AND METHOD OF ASSEMBLING THE SOURCE 审中-公开
标题翻译：溅射沉积沉积源，沉积装置和组装源的方法
公开(公告)号：WO2017005291A1
公开(公告)日：2017-01-12
申请号：PCT/EP2015/065369
申请日：2015-07-06
申请人： APPLIED MATERIALS, INC. , KELLER, Stefan , ZILBAUER, Thomas Werner , HELLMICH, Anke
发明人： KELLER, Stefan , ZILBAUER, Thomas Werner , HELLMICH, Anke
IPC分类号： H01J37/34 , C23C14/35
CPC分类号： H01J37/3408 , C23C14/35 , H01J37/3444 , H01J37/3461 , H01J37/347
摘要： A deposition source (100) for sputter deposition in a vacuum chamber is described. The deposition source includes a target (110) for providing a material to be deposited during the sputter deposition; an RF power supply (120) for providing RF power to the target (110); a magnetron (130); a power connector assembly (140) connecting the RF power supply (120) with the target (110); a RF power return path assembly (166) for providing a return path from the target to the RF power supply, wherein the power connector assembly (140) and/or the return path assembly (166) has an asymmetric inductive and/or capacitive mass; and a plate (150) arranged at a side (132A, 132B) of the magnetron (130) for compensating the asymmetric inductive and/or capacitive mass.
摘要翻译：描述了用于在真空室中溅射沉积的沉积源（100）。沉积源包括用于在溅射沉积期间提供要沉积的材料的靶（110）; 用于向所述目标（110）提供RF功率的RF电源（120）; 磁控管（130）; 电源连接器组件（140），其将所述RF电源（120）与所述目标（110）连接; 用于提供从所述目标到所述RF电源的返回路径的RF功率返回路径组件（166），其中所述电源连接器组件（140）和/或所述返回路径组件（166）具有不对称的感应和/或电容质量 ; 以及布置在所述磁控管（130）的侧面（132A，132B）处以补偿所述不对称感应和/或电容质量的板（150）。

13. 发明申请

WO2013143615A1 TRANSPARENT BODY FOR USE IN A TOUCH PANEL AND ITS MANUFACTURING METHOD AND APPARATUS 审中-公开
标题翻译：用于触控面板的透明体及其制造方法和装置
公开(公告)号：WO2013143615A1
公开(公告)日：2013-10-03
申请号：PCT/EP2012/055869
申请日：2012-03-30
申请人： APPLIED MATERIALS, INC. , GRILLMAYER, Jürgen , ZILBAUER, Thomas Werner
发明人： GRILLMAYER, Jürgen , ZILBAUER, Thomas Werner
IPC分类号： G06F3/041 , H01J37/34
CPC分类号： G02B1/116 , C23C14/35 , C23C14/352 , G02B1/105 , G02B1/14 , G06F3/041 , G06F2203/04103 , H01J37/3405 , H01J37/3414 , H01J37/3429 , H01J2237/332
摘要： A process for manufacturing a transparent body for use in a touch screen panel is provided. The process includes: depositing a first transparent layer stack (12) over a transparent substrate (14), wherein said first transparent layer stack (12) includes at least a first dielectric film (16) with a first refractive index, and a second dielectric film (18) with a second refractive index different from the first refractive index, providing a structured transparent conductive film (22) in a manner such that the first transparent layer stack (12) and the transparent conductive film (22) are disposed over the substrate (14) in this order, and wherein the structured transparent conductive film has a sheet resistance of 100 Ohm/square or below, and depositing a second transparent layer stack over the transparent conductive film, wherein said second transparent layer stack includes at least a third dielectric film with a third refractive index, and a fourth dielectric film or a transparent adhesive with a fourth refractive index, wherein the first transparent layer stack, the structured transparent conductive film and the second transparent layer stack are provided in this order.
摘要翻译：提供一种用于制造用于触摸屏面板的透明体的方法。该方法包括：在透明衬底（14）上沉积第一透明层堆叠（12），其中所述第一透明层叠层（12）至少包括具有第一折射率的第一介电膜（16）和第二介电层提供具有不同于第一折射率的第二折射率的膜（18），以使得第一透明层堆叠（12）和透明导电膜（22）设置在第一折射率之上的方式提供结构化的透明导电膜（22）基板（14），并且其中所述结构化透明导电膜的薄层电阻为100欧姆/平方或以下，并且在所述透明导电膜上沉积第二透明层叠层，其中所述第二透明层堆叠包括至少一个具有第三折射率的第三介电膜，以及具有第四折射率的第四介电膜或透明粘合剂，其中所述第一透明层堆叠，所述结构该透明导电膜和第二透明层叠层依次设置。

14. 发明申请

WO2023020709A1 METHOD OF DEPOSITING MATERIAL ON A SUBSTRATE, AND SYSTEM CONFIGURED FOR DEPOSITING MATERIAL ON A SUBSTRATE WITH FACING SPUTTER TARGETS 审中-公开
公开(公告)号：WO2023020709A1
公开(公告)日：2023-02-23
申请号：PCT/EP2021/078814
申请日：2021-10-18
申请人： APPLIED MATERIALS, INC. , MALMS, Christopher , ZILBAUER, Thomas Werner
发明人： MALMS, Christopher , ZILBAUER, Thomas Werner
IPC分类号： H01J37/34 , C23C14/35
摘要： A method of depositing material includes sputtering from a first rotary target having a first magnet assembly having a first plasma confinement and with an aperture plate and sputtering simultaneously from a second rotary target having a second magnet assembly having a second plasma confinement and with the aperture plate. The first plasma confinement faces the second rotary target and the second plasma confinement faces the first rotary target. The first plasma confinement and the second plasma confinement providing a plasma region between the first rotary target and the second rotary target have a center line perpendicular to a substrate surface of the substrate, the aperture plate having body with a shielding portion configured to shield a region between the plasma region and the substrate at least at the center line.

15. 发明申请

WO2022223096A1 SPUTTER DEPOSITION SOURCE, MAGNETRON SPUTTER CATHODE, AND METHOD OF DEPOSITING A MATERIAL ON A SUBSTRATE 审中-公开
公开(公告)号：WO2022223096A1
公开(公告)日：2022-10-27
申请号：PCT/EP2021/060108
申请日：2021-04-19
申请人： APPLIED MATERIALS, INC. , ZILBAUER, Thomas Werner , LOPP, Andreas
发明人： ZILBAUER, Thomas Werner , LOPP, Andreas
IPC分类号： H01J37/34 , C23C14/35
摘要： A sputter deposition source (200) for depositing a material on a substrate (10) is described. The sputter deposition source includes an array (210) of magnetron sputter cathodes arranged in a row for coating the substrate (10) in a deposition area (30) on a front side of the array (210). At least one magnetron sputter cathode (100) of the array (210) includes a first rotary target (110) rotatable around a first rotation axis (A1); and a first magnet assembly (120) arranged in the first rotary target (110) and configured to provide a closed plasma racetrack (P) on a surface of the first rotary target that extends along the first rotation axis (A1) on a first side and on a second side of the at least one magnetron sputter cathode (100). Further described is a magnetron sputter cathode for a sputter deposition source and a method of depositing a material on a substrate.

16. 发明申请

WO2022194377A1 METHOD OF DEPOSITING MATERIAL ON A SUBSTRATE 审中-公开
公开(公告)号：WO2022194377A1
公开(公告)日：2022-09-22
申请号：PCT/EP2021/056964
申请日：2021-03-18
申请人： APPLIED MATERIALS, INC. , ZILBAUER, Thomas Werner , HELLMICH, Anke , BENDER, Marcus , CHOI, Soo Young , HINTERSCHUSTER, Reiner , MUNDORF, Christoph
发明人： ZILBAUER, Thomas Werner , HELLMICH, Anke , BENDER, Marcus , CHOI, Soo Young , HINTERSCHUSTER, Reiner , MUNDORF, Christoph
IPC分类号： C23C14/35 , C23C14/56 , C23C14/34 , H01J37/34
摘要： A method of depositing at least one material on a substrate is described. The method includes a first deposition including: sputtering from a first and a second rotary target through an aperture, the aperture being adjustable and having less than a first size. The first rotary target has a first magnet assembly providing a plasma confinement in a first direction facing the second rotary target. The second rotary target has a second magnet assembly providing a plasma confinement in a second direction facing the first rotary target. The first direction and the second direction deviate from being parallel to a substrate plane of the substrate by an angle of less than a first value. The method includes a second deposition on top of the first deposition. The second deposition includes: sputtering from the first and the second rotary target through the aperture, the aperture having at least a second size, the second size being larger than the first size. The first magnet assembly provides a plasma confinement in a third direction. The second magnet assembly provides a plasma confinement in a fourth direction. At least one of the third or the fourth direction deviate from being parallel to the substrate plane by an angle of at least a second value, the second value being larger than the first value.

17. 发明申请

WO2017005290A1 CARRIER FOR SUPPORTING AT LEAST ONE SUBSTRATE DURING A SPUTTER DEPOSITION PROCESS, APPARATUS FOR SPUTTER DEPOSITION ON AT LEAST ONE SUBSTRATE, AND METHOD FOR SPUTTER DEPOSITION ON AT LEAST ONE SUBSTRATE 审中-公开
标题翻译：用于在溅射沉积过程中支持至少一个基底的载体，用于至少一个基底上的溅射沉积的装置，以及用于至少一个基板上的溅射沉积的方法
公开(公告)号：WO2017005290A1
公开(公告)日：2017-01-12
申请号：PCT/EP2015/065366
申请日：2015-07-06
申请人： APPLIED MATERIALS, INC. , KELLER, Stefan , BRÜNING, Andre , SCHÜSSLER, Uwe , ZILBAUER, Thomas Werner , BANGERT, Stefan
发明人： KELLER, Stefan , BRÜNING, Andre , SCHÜSSLER, Uwe , ZILBAUER, Thomas Werner , BANGERT, Stefan
IPC分类号： C23C14/50 , C23C14/56 , H01J37/32 , C23C14/34
CPC分类号： C23C14/50 , C23C14/34 , C23C14/562 , C23C14/564 , H01J37/32715 , H01J37/34 , H01M10/052 , H01M10/0562
摘要： A carrier (100) for supporting at least one substrate during a sputter deposition process is provided. The carrier (100) includes a carrier body (102) and an insulating portion provided at the carrier body (102). The insulating portion provides a surface (103) of an electrically insulating material, wherein the surface (103) is configured to face one or more sputter deposition sources during the sputter deposition process.
摘要翻译：提供了一种用于在溅射沉积工艺期间支撑至少一个基板的载体（100）。载体（100）包括载体（102）和设置在载体（102）上的绝缘部分。绝缘部分提供电绝缘材料的表面（103），其中表面（103）构造成在溅射沉积过程期间面向一个或多个溅射沉积源。

18. 发明申请

WO2015014411A1 HOLDING ARRANGEMENT FOR SUBSTRATES 审中-公开
标题翻译：基板保持布置
公开(公告)号：WO2015014411A1
公开(公告)日：2015-02-05
申请号：PCT/EP2013/066294
申请日：2013-08-02
申请人： APPLIED MATERIALS, INC. , BRÜNING, Andre , HINTERSCHUSTER, Reiner , WOLF, Hans Georg , ZILBAUER, Thomas Werner
发明人： BRÜNING, Andre , HINTERSCHUSTER, Reiner , WOLF, Hans Georg , ZILBAUER, Thomas Werner
IPC分类号： C23C14/50 , C03C17/00 , B65G49/06 , C23C16/458
CPC分类号： C23C16/4585 , C23C14/50 , C23C16/4587
摘要： A holding arrangement (10) for holding a substrate (20) during vacuum layer deposition is provided. The holding arrangement (10) includes a frame (30) having two or more frame elements (31, 32, 33, 34), the frame elements (31, 32, 33, 34) forming an aperture opening, and elastic means (40) configured to provide a clamping force acting against portions of the substrate edges for clamping the substrate (20) at said substrate edges.
摘要翻译：提供了一种用于在真空层沉积期间保持基板（20）的保持装置（10）。保持装置（10）包括具有两个或多个框架元件（31,32,33,34）的框架（30），形成开口的框架元件（31,32,33,34）和弹性装置（40 ），其被配置成提供作用于所述基板边缘的部分的夹紧力，以将所述基板（20）夹持在所述基板边缘。

19. 发明申请

WO2013143614A1 TRANSPARENT BODY FOR USE IN A TOUCH SCREEN PANEL MANUFACTURING METHOD AND SYSTEM 审中-公开
标题翻译：用于触摸屏面板制造方法和系统的透明体
公开(公告)号：WO2013143614A1
公开(公告)日：2013-10-03
申请号：PCT/EP2012/055867
申请日：2012-03-30
申请人： APPLIED MATERIALS, INC. , ZILBAUER, Thomas Werner , GRILLMAYER, Jürgen
发明人： ZILBAUER, Thomas Werner , GRILLMAYER, Jürgen
IPC分类号： G06F3/041
CPC分类号： H05K3/0091 , C23C14/35 , G06F3/041 , G06F2203/04103 , H01J37/3405 , H01J37/3426 , H05K1/0274 , H05K1/0306 , H05K1/0313 , H05K1/0393 , H05K2201/0108 , H05K2201/2054
摘要： A process for manufacturing a transparent body for use in a touch screen panel is provided. The process includes: depositing a first transparent layer stack (12) over a transparent substrate (14), wherein said first transparent layer stack (12) includes at least a first dielectric film (16) with a first refractive index, and a second dielectric film (18) with a second refractive index different from the second the first refractive index; providing a structured transparent conductive film (22) in a manner such that the first transparent layer stack (12) and the transparent conductive film (22) are disposed over the substrate (14) in this order, and wherein the structured transparent conductive film has a sheet resistance of 100 Ohm/square or below; and providing a transparent adhesive onto the structured transparent conductive film configured for attaching the layer stack to the touch screen panel.
摘要翻译：提供了用于制造用于触摸屏面板的透明体的工艺。该方法包括：在透明衬底（14）上方沉积第一透明层堆叠（12），其中所述第一透明层堆叠（12）至少包括具有第一折射率的第一介电膜（16）和第二介电膜具有与所述第一折射率的第二折射率不同的第二折射率的膜（18）以这样的方式提供结构化的透明导电膜（22），使得第一透明层叠层（12）和透明导电膜（22）以该顺序设置在基板（14）上方，并且其中结构化的透明导电膜 100欧姆/平方或以下的薄层电阻; 以及将透明粘合剂提供到结构化透明导电膜上，该结构化透明导电膜被配置用于将层堆叠附接到触摸屏面板。

20. 发明公开

EP3320125A1 CARRIER FOR SUPPORTING AT LEAST ONE SUBSTRATE DURING A SPUTTER DEPOSITION PROCESS, APPARATUS FOR SPUTTER DEPOSITION ON AT LEAST ONE SUBSTRATE, AND METHOD FOR SPUTTER DEPOSITION ON AT LEAST ONE SUBSTRATE 审中-公开
标题翻译：用于在至少一个基板上支撑至少一个基板的载体，用于至少一个基板上的溅射沉积的设备以及用于在至少一个基板上溅射沉积的方法
公开(公告)号：EP3320125A1
公开(公告)日：2018-05-16
申请号：EP15739534.4
申请日：2015-07-06
申请人： Applied Materials, Inc.
发明人： KELLER, Stefan , BRÜNING, Andre , SCHÜßLER, Uwe , ZILBAUER, Thomas Werner , BANGERT, Stefan
IPC分类号： C23C14/50 , C23C14/56 , H01J37/32 , C23C14/34
CPC分类号： C23C14/50 , C23C14/34 , C23C14/562 , C23C14/564 , H01J37/32715 , H01J37/34 , H01M10/052 , H01M10/0562
摘要： A carrier for supporting at least one substrate during a sputter deposition process is provided. The carrier includes a carrier body and an insulating portion provided at the carrier body. The insulating portion provides a surface of an electrically insulating material, wherein the surface is configured to face one or more sputter deposition sources during the sputter deposition process.

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