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11. 发明申请

WO2015110154A1 ROLLER FOR SPREADING OF A FLEXIBLE SUBSTRATE, APPARATUS FOR PROCESSING A FLEXIBLE SUBSTRATE AND METHOD OF OPERATING THEREOF 审中-公开
标题翻译：用于扩展柔性基板的滚子，用于处理柔性基板的装置及其操作方法
公开(公告)号：WO2015110154A1
公开(公告)日：2015-07-30
申请号：PCT/EP2014/051260
申请日：2014-01-22
申请人： APPLIED MATERIALS, INC. , SAUER, Andreas , RIES, Florian , DEPPISCH, Thomas
发明人： SAUER, Andreas , RIES, Florian , DEPPISCH, Thomas
IPC分类号： C23C14/50 , C23C14/56 , C23C16/54
CPC分类号： C23C14/562 , C23C14/24 , C23C14/34 , C23C14/50 , C23C14/541 , C23C14/568 , C23C16/463 , C23C16/505 , C23C16/52 , C23C16/545
摘要： A processing apparatus for processing a flexible substrate in a vacuum chamber is described. The processing apparatus includes a processing drum for processing the flexible substrate while being guided on the processing drum, a roller arrangement having one or more rollers configured to contact the flexible substrate along a portion of one or more circumferences of the one or more rollers before the flexible substrate is guided on the processing drum, wherein the combined length of contact along one or more portions of the one or more circumferences of the one or more rollers is 270 mm or above, and wherein an individual length of contact along each of the one or more portions of the one or more circumferences of the one or more rollers is 500 mm or below, and a temperature adjustment element adjusting the temperature of the one or more rollers.
摘要翻译：描述了一种在真空室中处理柔性基板的处理装置。处理装置包括处理滚筒，用于在处理滚筒上被引导时处理柔性基板;滚筒装置，其具有一个或多个辊子，该滚筒装置构造成沿着一个或多个滚筒的一个或多个圆周的一部分接触柔性基板柔性基底在处理滚筒上被引导，其中沿一个或多个滚子的一个或多个圆周的一个或多个部分的组合接触长度为270mm或更大，并且其中沿着一个或多个滚筒中的每一个的单独的接触长度一个或多个辊的一个或多个圆周的多个部分或更多部分为500mm以下，以及调节一个或多个辊的温度的温度调节元件。

12. 发明申请

WO2019154490A1 DEPOSITION APPARATUS, METHOD OF COATING A FLEXIBLE SUBSTRATE AND FLEXIBLE SUBSTRATE HAVING A COATING 审中-公开
公开(公告)号：WO2019154490A1
公开(公告)日：2019-08-15
申请号：PCT/EP2018/053075
申请日：2018-02-07
申请人： APPLIED MATERIALS, INC. , DEPPISCH, Thomas , KURUNCZI, Peter
发明人： DEPPISCH, Thomas , KURUNCZI, Peter
IPC分类号： C23C14/56 , C23C14/58 , C23C14/35 , C23C14/02 , C23C16/54 , C23C16/56 , C23C16/02 , H01J37/32 , H01J37/08 , H05H1/00
CPC分类号： C23C14/562 , C23C14/022 , C23C14/35 , C23C14/5833 , C23C16/0245 , C23C16/545 , C23C16/56 , H01J37/08 , H01J37/317 , H01J37/32357 , H01J37/32366 , H01J37/32422 , H01J37/32513 , H01J37/32568 , H01J37/3277 , H01J37/32899 , H01J2237/004 , H01J2237/31 , H01J2237/3132 , H05H1/00
摘要： A deposition apparatus (100, 101) for coating a substrate (10, 10b) is described. The deposition apparatus includes a first spool chamber (110) housing a storage spool (112) for providing the flexible substrate (10), a deposition chamber (120) arranged downstream from the first spool chamber (110), and a second spool chamber (150) arranged downstream from the deposition chamber (120) and housing a wind-up spool (152) for winding the flexible substrate (10) thereon after deposition. The deposition chamber (120) includes a coating drum (122) for guiding the flexible substrate past a plurality of deposition units (121) including at least one deposition unit (124) having a graphite target (125). Further, the deposition apparatus (100) includes a treatment device (160) configured to treat the flexible substrate, upstream or downstream from the at least one deposition unit. The treatment device (160a, 160b, 160c) comprises a linear ion source (161), which comprises a power source (176) electrically connected to an extraction electrode (168) and to ground potential, wherein the power source (176) is adapted for operation at a frequency in the range from about 1 kHz to about 500 kHz.

13. 发明申请

WO2017207053A1 GUIDING DEVICES AND WEB COATING PROCESS 审中-公开
标题翻译：指导设备和网涂工艺
公开(公告)号：WO2017207053A1
公开(公告)日：2017-12-07
申请号：PCT/EP2016/062539
申请日：2016-06-02
申请人： APPLIED MATERIALS, INC. , METT, Valerius , DEPPISCH, Thomas , WHITE, John M. , HEIN, Stefan , BUSCHBECK, Wolfgang
发明人： METT, Valerius , DEPPISCH, Thomas , WHITE, John M. , HEIN, Stefan , BUSCHBECK, Wolfgang
IPC分类号： C23C14/56 , B65H23/00
CPC分类号： C23C14/562 , B65H20/14 , B65H2406/361 , B65H2801/87
摘要： A roller device (100) for guiding a web (200) and for controlling the temperature of the web (200) in contact with the roller device in a web coating process under vacuum conditions is described. The roller device includes a curved surface (101) of the roller device (100) for contacting the web (200), wherein the curved surface (101) includes a web guiding region (103). The roller device further includes a group of gas outlets (104) in the curved surface (101) and a gas distribution system (105) for selectively providing the gas flow to a first subgroup of gas outlets (104) and for selectively preventing the gas from flowing to a second subgroup of the gas outlets (104). The roller device further includes a driving unit (110) for rotating the curved surface (101), wherein the curved surface (101) is adapted for inducing a movement of the web (200) upon rotation of the curved surface.
摘要翻译：描述了用于在真空条件下在幅材涂布工艺中引导幅材（200）并且用于控制幅材（200）与辊子设备接触的温度的辊子装置（100）。滚轮装置包括用于接触腹板（200）的滚轮装置（100）的弯曲表面（101），其中弯曲表面（101）包括腹板引导区域（103）。该滚轮装置还包括在弯曲表面（101）中的一组气体出口（104）和用于选择性地将气流提供给第一组气体出口（104）并用于选择性地防止气体从流动到气体出口（104）的第二子组。所述滚轮装置还包括用于旋转所述弯曲表面（101）的驱动单元（110），其中所述弯曲表面（101）适于在所述弯曲表面旋转时引起所述腹板（200）的移动。

14. 发明申请

WO2017054889A1 METHOD AND APPARATUS FOR MANUFACTURING A FLEXIBLE LAYER STACK AND FLEXIBLE LAYER STACK 审中-公开
标题翻译：用于制造柔性层堆叠和柔性层堆叠的方法和装置
公开(公告)号：WO2017054889A1
公开(公告)日：2017-04-06
申请号：PCT/EP2015/072864
申请日：2015-10-02
申请人： APPLIED MATERIALS, INC. , DEPPISCH, Thomas
发明人： DEPPISCH, Thomas
IPC分类号： C23C14/00 , C23C14/56 , H01M4/38
CPC分类号： C23C14/0005 , C23C14/562 , H01M4/1395 , H01M4/382 , H01M4/661 , H01M10/052 , H01M2004/021 , H01M2004/027
摘要： The present disclosure provides a method for manufacturing a flexible layer stack (100). The method includes: providing (310) a flexible substrate (101); depositing (320) a first layer (110) including a first material over the flexible substrate (101); depositing (330) a second layer (120) including a second material over the first layer (110); and removing (340) the flexible substrate (101).
摘要翻译：本公开提供了一种用于制造柔性层堆叠（100）的方法。该方法包括：提供（310）柔性基底（101）; 在所述柔性基板（101）上沉积（320）包括第一材料的第一层（110）; 在第一层（110）上沉积（330）包括第二材料的第二层（120）; 以及去除（340）柔性基板（101）。

15. 发明申请

WO2015055828A1 ROLLER DEVICE FOR VACUUM DEPOSITION ARRANGEMENT, VACUUM DEPOSITION ARRANGEMENT WITH ROLLER AND METHOD FOR OPERATING A ROLLER 审中-公开
标题翻译：用于真空沉积装置的滚筒装置，带滚筒的真空沉积装置和操作滚筒的方法
公开(公告)号：WO2015055828A1
公开(公告)日：2015-04-23
申请号：PCT/EP2014/072346
申请日：2014-10-17
申请人： APPLIED MATERIALS, INC. , SAUER, Andreas , HENRICH, Jürgen , DEPPISCH, Thomas , WAGNER, Dirk
发明人： SAUER, Andreas , HENRICH, Jürgen , DEPPISCH, Thomas , WAGNER, Dirk
IPC分类号： C23C16/46 , C23C16/48 , C23C16/54
CPC分类号： B05D1/60 , B05C1/003 , C23C16/46 , C23C16/481 , C23C16/54 , H01L21/67739
摘要： A deposition arrangement (100; 600) for depositing a material on a substrate (110; 640) is described. The deposition arrangement includes a vacuum chamber (120); a roller device (200; 300; 400; 500; 604) within the vacuum chamber (120); and an electrical heating device (61; 220; 320; 420; 520) within the roller device (200; 300; 400; 500; 604), wherein the heating device comprises a first end (250) and a second end (260), and wherein the heating device is held at the first end and at the second end. Also, a method for heating a substrate in a vacuum deposition arrangement is described.
摘要翻译：描述了用于在衬底（110; 640）上沉积材料的沉积装置（100; 600）。沉积装置包括真空室（120）; 真空室（120）内的辊装置（200; 300; 400; 500; 604）; 以及在所述辊装置（200; 300; 400; 500; 604）内的电加热装置（61; 220; 320; 420; 520），其中所述加热装置包括第一端（250）和第二端（260），并且其中所述加热装置保持在所述第一端和所述第二端。另外，描述了一种在真空沉积装置中加热衬底的方法。

16. 发明申请

WO2013079108A1 CLOSED LOOP CONTROL 审中-公开
标题翻译：闭环控制
公开(公告)号：WO2013079108A1
公开(公告)日：2013-06-06
申请号：PCT/EP2011/071425
申请日：2011-11-30
申请人： APPLIED MATERIALS, INC. , DEPPISCH, Thomas , HELLE, Franz-Josef , ENGLERT, Manfred , HERMANNS, Uwe
发明人： DEPPISCH, Thomas , HELLE, Franz-Josef , ENGLERT, Manfred , HERMANNS, Uwe
IPC分类号： C23C14/00 , C23C14/56 , H01J37/34
CPC分类号： C23C14/0042 , C23C14/0036 , C23C14/0094 , C23C14/56 , C23C14/562 , H01J37/32935 , H01J37/34 , H01J2237/332
摘要： A method of controlling a reactive deposition process and a corresponding assembly and/or apparatus are described. The method includes providing power to a cathode with a power supply, providing a voltage set point to the power supply, receiving a power value correlating the power provided to the cathode, and controlling a flow of a process gas in dependence of the power value to provide a closed loop control for the power value.
摘要翻译：描述了控制反应性沉积工艺的方法和相应的组件和/或设备。该方法包括：通过电源为阴极提供电力，向电源提供电压设定点，接收与提供给阴极的功率相关的功率值，以及根据功率值控制工艺气体的流量为功率值提供闭环控制。

17. 发明申请

WO2022083857A1 DRUM DEVICE FOR USE IN A WEB COATING PROCESS, WEB COATING APPARATUS AND METHOD FOR CONTROLLING THE TEMPERATURE OF A WEB IN A WEB COATING PROCESS 审中-公开
公开(公告)号：WO2022083857A1
公开(公告)日：2022-04-28
申请号：PCT/EP2020/079646
申请日：2020-10-21
申请人： APPLIED MATERIALS, INC. , HOFFMANN, Gerd , DIETER, Torsten Bruno , DEPPISCH, Thomas , TRASSL, Roland
发明人： HOFFMANN, Gerd , DIETER, Torsten Bruno , DEPPISCH, Thomas , TRASSL, Roland
IPC分类号： C23C14/56 , C23C14/54 , B65H18/10 , C23C16/54 , C23C16/52
摘要： A drum device (10) for guiding a web (12) in a web coating process under vacuum conditions, a web coating apparatus (14) comprising a vacuum chamber (16) including the drum device (10), and a method for controlling the temperature of a web (12) in a web coating process under vacuum conditions. The drum device (10) comprises: - a rotatable drum (100) with a web facing surface (102) comprising a first web facing surface portion (104); - a gas distribution system (400) for providing a gas flow (115) including a gas composition into an interspace between the web (12) and the first web facing surface portion (104) denoted as a first interspace (110), the gas composition comprising a gas and/or a vapor of a liquid; and - a temperature adjusting system (300) adapted for controlling the temperature of the first web facing surface portion (104) such that the gas composition is cooled in a manner that the gas and/or the liquid changes the aggregate state, thus forming a non-gaseous cushion (116) in the first interspace (110).

18. 发明申请

WO2019105533A1 DEPOSITION APPARATUS FOR COATING A FLEXIBLE SUBSTRATE, METHOD OF COATING A FLEXIBLE SUBSTRATE AND FLEXIBLE SUBSTRATE HAVING A COATING 审中-公开
公开(公告)号：WO2019105533A1
公开(公告)日：2019-06-06
申请号：PCT/EP2017/080692
申请日：2017-11-28
申请人： APPLIED MATERIALS, INC. , KURTHEN, Christof , HEIN, Stefan , KUKLA, Reiner , MORRISON, Neil , DEPPISCH, Thomas , LORENZ, Stefan , HABERKORN, Edgar
发明人： KURTHEN, Christof , HEIN, Stefan , KUKLA, Reiner , MORRISON, Neil , DEPPISCH, Thomas , LORENZ, Stefan , HABERKORN, Edgar
IPC分类号： C23C14/06 , C23C14/34 , C23C14/56
摘要： A deposition apparatus (100) for coating a flexible substrate (10) is described. The deposition apparatus comprises a first spool chamber (110) housing a storage spool (112) for providing the flexible substrate (10), a deposition chamber (120) arranged downstream from the first spool chamber (110), and a second spool chamber (150) arranged downstream from the deposition chamber (120) and housing a wind-up spool (152) for winding the flexible substrate (10) thereon after deposition. The deposition chamber (120) comprises a coating drum (122) for guiding the flexible substrate past a plurality of deposition units (121) including at least one deposition unit (124) having a graphite target (125). The coating drum is connected to a device (140) for applying an electrical potential to the coating drum.

19. 发明申请

WO2019057273A1 METHOD OF FORMING ALUMINA FOR A ELECTROCHEMICAL CELL USING A PLASMA IONISING PROCESS 审中-公开
公开(公告)号：WO2019057273A1
公开(公告)日：2019-03-28
申请号：PCT/EP2017/073780
申请日：2017-09-20
申请人： APPLIED MATERIALS, INC. , TRASSL, Roland , DIETER, Torsten Bruno , DEPPISCH, Thomas , HERLE, Subramanya , ZHAO, Kent
发明人： TRASSL, Roland , DIETER, Torsten Bruno , DEPPISCH, Thomas , HERLE, Subramanya , ZHAO, Kent
IPC分类号： H01M2/14 , C23C14/00 , C23C14/24 , C23C16/448 , H01M4/04 , H01M4/139 , H01M10/052 , C23C14/22 , C23C14/32 , C23C14/56
摘要： An evaporation source (102) for forming a ceramic layer of a component of an electrochemical energy storage device is provided. The evaporation source (102) includes a material source configured to evaporate a material, a gas supply configured to supply process gas, and a plasma source (108) configured to at least partially ionize the process gas, the ceramic layer (52) being formed by at least the evaporated material and the at least partially ionized process gas.

20. 发明申请

WO2015124207A1 APPARATUS AND METHOD FOR THIN-FILM PROCESSING APPLICATIONS 审中-公开
标题翻译：薄膜加工应用的装置和方法
公开(公告)号：WO2015124207A1
公开(公告)日：2015-08-27
申请号：PCT/EP2014/053460
申请日：2014-02-21
申请人： APPLIED MATERIALS, INC. , DEPPISCH, Thomas
发明人： DEPPISCH, Thomas
IPC分类号： C23C14/56 , C23C14/58
CPC分类号： C23C14/5873 , C23C14/24 , C23C14/562 , C23C16/50 , C23C16/56 , H01J37/32082 , H01J2237/3321 , H01J2237/335
摘要： According to the present disclosure, a flexible substrate coating apparatus is provided. The flexible substrate coating apparatus includes a vacuum process chamber for processing a flexible substrate. The vacuum process chamber includes one or more deposition units and a cleaning unit positioned directly downstream of the one or more deposition units. In another aspect, a method for depositing a thin-film on a flexible substrate is provided. The method for depositing a thin-film on a flexible substrate includes vacuum coating of the flexible substrate, thereby depositing one or more layers on the flexible substrate, and cleaning the flexible substrate directly downstream of the coating.
摘要翻译：根据本公开，提供了柔性基板涂布装置。柔性基板涂布装置包括用于处理柔性基板的真空处理室。真空处理室包括一个或多个沉积单元和位于该一个或多个沉积单元的直接下游的清洁单元。另一方面，提供了一种在柔性基板上沉积薄膜的方法。用于在柔性基板上沉积薄膜的方法包括真空涂覆柔性基底，从而在柔性基底上沉积一层或多层，以及直接在涂层的下游清洁柔性基底。

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