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11. 发明授权

US6009095A Digital PB exchanger with multi-processor control system using asynchronous transfer mode 失效
标题翻译：数字PB交换机采用多处理器控制系统采用异步传输模式
公开(公告)号：US6009095A
公开(公告)日：1999-12-28
申请号：US657769
申请日：1996-05-31
申请人： Yoshio Honma
发明人： Yoshio Honma
IPC分类号： H04Q3/545 , H04L12/70 , H04Q3/00 , H04Q3/58 , H04Q11/04 , H04L12/56
CPC分类号： H04Q11/0478 , H04L2012/5671 , H04L2012/5672
摘要： The present invention provides a Digital PB exchanger with a Multi-processor control system by using an ATM for a plurality of Digital PB exchangers with a single processor control system to multiplex PCM voice data and communication data between processors. The Digital PB exchanger consists of a Processor unit, a Time division switch, a subscriber circuit, a trunk circuit, a telephone terminal and the like. A PCM voice signal and data from the Time division switch 21 are connected to the ATM switch 5 via the ATM interface circuit 31 so that communication of the audio signal can be made possible. Furthermore, when data is transmitted from one processor to another processor, the data from the processor is multiplexed with the audio signal by the ATM interface circuit and is transmitted to other ATM interface circuits.
摘要翻译：本发明提供一种具有多处理器控制系统的数字PB交换机，其通过使用具有单个处理器控制系统的多个数字PB交换机的ATM来复用PCM语音数据和处理器之间的通信数据。数字PB交换机由处理器单元，时分交换机，用户电路，中继电路，电话终端等构成。来自时分开关21的PCM语音信号和数据经由ATM接口电路31连接到ATM交换机5，使得音频信号的通信成为可能。此外，当数据从一个处理器发送到另一个处理器时，来自处理器的数据由ATM接口电路与音频信号多路复用，并被发送到其他ATM接口电路。

12. 发明授权

US5827878A Pharmaceutical composition for the treatment of leukemia containing 9-cis-retinoic acid-.alpha.-tocopherol ester 失效
公开(公告)号：US5827878A
公开(公告)日：1998-10-27
申请号：US884040
申请日：1997-06-27
申请人： Makoto Makishima , Yasuhiro Kanatani , Yoshio Honma , Kohei Inomata , Takao Kishiye
发明人： Makoto Makishima , Yasuhiro Kanatani , Yoshio Honma , Kohei Inomata , Takao Kishiye
IPC分类号： A61K31/355 , A61K31/59
CPC分类号： A61K31/355 , A61K31/59
摘要： 9-Cis-retinoic acid-.alpha.-tocopherol esters, pharmaceutical compositions containing the same and use of the same as a medicine for the treatment of leukemia, in particular, the remission of leukemia are provided and a combined use of a 9-cis-retinoic acid-.alpha.-tocopherol ester and either 1.alpha.,25-dihydroxyvitamin D.sub.3 or 9-cis-retinoic acid exhibits a synergistic effect in the treatment of leukemia without any side effects caused by 1.alpha.,25-dihydroxyvitamin D.sub.3 or 9-cis-retinoic acid.

13. 发明授权

US08038898B2 Abrasive liquid for metal and method for polishing 有权
标题翻译：金属研磨液和抛光方法
公开(公告)号：US08038898B2
公开(公告)日：2011-10-18
申请号：US10995494
申请日：2004-11-24
申请人： Takeshi Uchida , Jun Matsuzawa , Tetsuya Hoshino , Yasuo Kamigata , Hiroki Terazaki , Yoshio Honma , Seiichi Kondoh
发明人： Takeshi Uchida , Jun Matsuzawa , Tetsuya Hoshino , Yasuo Kamigata , Hiroki Terazaki , Yoshio Honma , Seiichi Kondoh
IPC分类号： H01L21/302
CPC分类号： C09G1/02 , C23F3/00 , C23F3/06 , H01L21/3212
摘要： An abrasive liquid for a metal comprising (1) an oxidizing agent for a metal, (2) a dissolving agent for an oxidized metal, (3) a first protecting film-forming agent such as an amino acid or an azole which adsorbs physically on the surface of the metal and/or forms a chemical bond, to thereby form a protecting film, (4) a second protecting film-forming agent such as polyacrylic acid, polyamido acid or a salt thereof which assists the first protecting film-forming agent in forming a protecting film and (5) water; and a method for polishing.
摘要翻译：一种用于金属的研磨液，包括（1）金属氧化剂，（2）氧化金属的溶解剂，（3）第一保护膜形成剂，例如氨基酸或唑，物理上吸附金属的表面和/或形成化学键，从而形成保护膜，（4）辅助第一保护膜形成剂的第二保护膜形成剂如聚丙烯酸，聚酰胺或其盐形成保护膜和（5）水; 和抛光方法。

14. 发明申请

US20070167017A1 Materials for polishing liquid for metal, polishing liquid for metal, method for preparation thereof and polishing method using the same 有权
标题翻译：金属抛光液用金属，金属研磨液，其制造方法以及使用其的研磨方法
公开(公告)号：US20070167017A1
公开(公告)日：2007-07-19
申请号：US11715843
申请日：2007-03-09
申请人： Takeshi Uchida , Tetsuya Hoshino , Hiroki Terazaki , Yasuo Kamigata , Naoyuki Koyama , Yoshio Honma , Seiichi Kondoh
发明人： Takeshi Uchida , Tetsuya Hoshino , Hiroki Terazaki , Yasuo Kamigata , Naoyuki Koyama , Yoshio Honma , Seiichi Kondoh
IPC分类号： H01L21/461 , C09K13/00
CPC分类号： C09G1/04 , C09G1/02 , C09K13/00 , C23F3/00 , C23F3/04 , C23F3/06 , H01L21/3212
摘要： Provided are a metal-polishing liquid that comprises an oxidizing agent, an oxidized-metal etchant, a protective film-forming agent, a dissolution promoter for the protective film-forming agent, and water; a method for producing it; and a polishing method of using it. Also provided are materials for the metal-polishing liquid, which include an oxidized-metal etchant, a protective film-forming agent, and a dissolution promoter for the protective film-forming agent.
摘要翻译：提供一种金属抛光液体，其包含氧化剂，氧化金属蚀刻剂，保护膜形成剂，保护膜形成剂的溶解促进剂和水; 一种生产它的方法; 和使用它的抛光方法。还提供了金属抛光液的材料，其包括氧化金属蚀刻剂，保护膜形成剂和用于保护膜形成剂的溶解促进剂。

15. 发明授权

US06420269B2 Cerium oxide abrasive for polishing insulating films formed on substrate and methods for using the same 失效
标题翻译：用于研磨在基材上形成的绝缘膜的氧化铈研磨剂及其使用方法
公开(公告)号：US06420269B2
公开(公告)日：2002-07-16
申请号：US08930916
申请日：1997-12-30
申请人： Jun Matsuzawa , Yasushi Kurata , Kiyohito Tanno , Yoshio Honma
发明人： Jun Matsuzawa , Yasushi Kurata , Kiyohito Tanno , Yoshio Honma
IPC分类号： H01L21302
CPC分类号： C09K3/1463 , C01F17/0043 , C01P2006/12 , H01L2224/32245 , H01L2224/4826 , H01L2224/73215 , H01L2924/12044 , H01L2924/181 , H01L2924/00 , H01L2924/00012
摘要： The invention relates to an abrasive containing a slurry of the cerium oxide grains dispersed in water. The Cerium oxide grains are obtained by adding hydrogen peroxide to an aqueous dispersion of cerium carbonate. The Cerium oxide grains are obtained by oxidizing a precipitate, which is formed through addition of ammonium hydrogencarbonate to an aqueous solution of cerium nitrate, with hydrogen peroxide. The Cerium oxide grains are obtained by neutralizing or alkallfying an aqueous solution of cerium ammonium nitrate.
摘要翻译：本发明涉及含有分散在水中的氧化铈颗粒的浆料的磨料。通过向碳酸铈的水分散液中加入过氧化氢来获得氧化铈颗粒。通过将通过将碳酸氢铵加入到硝酸铈水溶液中形成的沉淀物与过氧化氢氧化来获得氧化铈颗粒。氧化铈颗粒通过中和硝酸铈铵水溶液而得到。

16. 发明授权

US08226849B2 Materials for polishing liquid for metal, polishing liquid for metal, method for preparation thereof and polishing method using the same 有权
标题翻译：金属抛光液用金属，金属研磨液，其制造方法以及使用其的研磨方法
公开(公告)号：US08226849B2
公开(公告)日：2012-07-24
申请号：US11435092
申请日：2006-05-17
申请人： Takeshi Uchida , Tetsuya Hoshino , Hiroki Terazaki , Yasuo Kamigata , Naoyuki Koyama , Yoshio Honma , Seiichi Kondoh
发明人： Takeshi Uchida , Tetsuya Hoshino , Hiroki Terazaki , Yasuo Kamigata , Naoyuki Koyama , Yoshio Honma , Seiichi Kondoh
IPC分类号： C09K13/00
CPC分类号： C09G1/04 , C09G1/02 , C09K13/00 , C23F3/00 , C23F3/04 , C23F3/06 , H01L21/3212
摘要： Provided are a metal-polishing liquid that comprises an oxidizing agent, an oxidized-metal etchant, a protective film-forming agent, a dissolution promoter for the protective film-forming agent, and water; a method for producing it; and a polishing method of using it. Also provided are materials for the metal-polishing liquid, which include an oxidized-metal etchant, a protective film-forming agent, and a dissolution promoter for the protective film-forming agent.
摘要翻译：提供一种金属抛光液体，其包含氧化剂，氧化金属蚀刻剂，保护膜形成剂，保护膜形成剂的溶解促进剂和水; 一种生产它的方法; 和使用它的抛光方法。还提供了金属抛光液的材料，其包括氧化金属蚀刻剂，保护膜形成剂和用于保护膜形成剂的溶解促进剂。

17. 发明授权

US07799686B2 Materials for polishing liquid for metal, polishing liquid for metal, method for preparation thereof and polishing method using the same 有权
标题翻译：金属抛光液用金属，金属研磨液，其制造方法以及使用其的研磨方法
公开(公告)号：US07799686B2
公开(公告)日：2010-09-21
申请号：US11715843
申请日：2007-03-09
申请人： Takeshi Uchida , Tetsuya Hoshino , Hiroki Terazaki , Yasuo Kamigata , Naoyuki Koyama , Yoshio Honma , Seiichi Kondoh
发明人： Takeshi Uchida , Tetsuya Hoshino , Hiroki Terazaki , Yasuo Kamigata , Naoyuki Koyama , Yoshio Honma , Seiichi Kondoh
IPC分类号： H01L21/00
CPC分类号： C09G1/04 , C09G1/02 , C09K13/00 , C23F3/00 , C23F3/04 , C23F3/06 , H01L21/3212
摘要： Provided are a metal-polishing liquid that comprises an oxidizing agent, an oxidized-metal etchant, a protective film-forming agent, a dissolution promoter for the protective film-forming agent, and water; a method for producing it; and a polishing method of using it. Also provided are materials for the metal-polishing liquid, which include an oxidized-metal etchant, a protective film-forming agent, and a dissolution promoter for the protective film-forming agent.
摘要翻译：提供一种金属抛光液体，其包含氧化剂，氧化金属蚀刻剂，保护膜形成剂，保护膜形成剂的溶解促进剂和水; 一种生产它的方法; 和使用它的抛光方法。还提供了金属抛光液的材料，其包括氧化金属蚀刻剂，保护膜形成剂和用于保护膜形成剂的溶解促进剂。

18. 发明授权

US07250369B1 Materials for polishing liquid for metal, polishing liquid for metal, method for preparation thereof and polishing method using the same 失效
公开(公告)号：US07250369B1
公开(公告)日：2007-07-31
申请号：US09869347
申请日：1999-12-28
申请人： Takeshi Uchida , Tetsuya Hoshino , Hiroki Terazaki , Yasuo Kamigata , Naoyuki Koyama , Yoshio Honma , Seiichi Kondoh
发明人： Takeshi Uchida , Tetsuya Hoshino , Hiroki Terazaki , Yasuo Kamigata , Naoyuki Koyama , Yoshio Honma , Seiichi Kondoh
IPC分类号： H01L21/00
CPC分类号： C09G1/04 , C09G1/02 , C09K13/00 , C23F3/00 , C23F3/04 , C23F3/06 , H01L21/3212
摘要： Provided are a metal-polishing liquid that comprises an oxidizing agent, an oxidized-metal etchant, a protective film-forming agent, a dissolution promoter for the protective film-forming agent, and water; a method for producing it; and a polishing method of using it. Also provided are materials for the metal-polishing liquid, which include an oxidized-metal etchant, a protective film-forming agent, and a dissolution promoter for the protective film-forming agent.

19. 发明申请

US20060216939A1 Materials for polishing liquid for metal, polishing liquid for metal, method for preparation thereof and polishing method using the same 有权
标题翻译：金属抛光液用金属，金属研磨液，其制造方法以及使用其的研磨方法
公开(公告)号：US20060216939A1
公开(公告)日：2006-09-28
申请号：US11435092
申请日：2006-05-17
申请人： Takeshi Uchida , Tetsuya Hoshino , Hiroki Terazaki , Yasuo Kamigata , Naoyuki Koyama , Yoshio Honma , Seiichi Kondoh
发明人： Takeshi Uchida , Tetsuya Hoshino , Hiroki Terazaki , Yasuo Kamigata , Naoyuki Koyama , Yoshio Honma , Seiichi Kondoh
IPC分类号： H01L21/461 , C09K13/00
CPC分类号： C09G1/04 , C09G1/02 , C09K13/00 , C23F3/00 , C23F3/04 , C23F3/06 , H01L21/3212
摘要： Provided are a metal-polishing liquid that comprises an oxidizing agent, an oxidized-metal etchant, a protective film-forming agent, a dissolution promoter for the protective film-forming agent, and water; a method for producing it; and a polishing method of using it. Also provided are materials for the metal-polishing liquid, which include an oxidized-metal etchant, a protective film-forming agent, and a dissolution promoter for the protective film-forming agent.
摘要翻译：提供一种金属抛光液体，其包含氧化剂，氧化金属蚀刻剂，保护膜形成剂，保护膜形成剂的溶解促进剂和水; 一种生产它的方法; 和使用它的抛光方法。还提供了金属抛光液的材料，其包括氧化金属蚀刻剂，保护膜形成剂和用于保护膜形成剂的溶解促进剂。

20. 发明授权

US06896825B1 Abrasive liquid for metal and method for polishing 有权
标题翻译：金属研磨液和抛光方法
公开(公告)号：US06896825B1
公开(公告)日：2005-05-24
申请号：US09763891
申请日：1999-08-31
申请人： Takeshi Uchida , Jun Matsuzawa , Tetsuya Hoshino , Yasuo Kamigata , Hiroki Terazaki , Yoshio Honma , Seiichi Kondoh
发明人： Takeshi Uchida , Jun Matsuzawa , Tetsuya Hoshino , Yasuo Kamigata , Hiroki Terazaki , Yoshio Honma , Seiichi Kondoh
IPC分类号： C09G1/02 , C23F3/00 , C23F3/06 , H01L21/321 , C09K13/00 , C09K13/06 , H01L21/302
CPC分类号： C09G1/02 , C23F3/00 , C23F3/06 , H01L21/3212
摘要： An abrasive liquid for a metal comprising (1) an oxidizing agent for a metal, (2) a dissolving agent for an oxidized metal, (3) a first protecting film-forming agent such as an amino acid or an azole which adsorbs physically on the surface of the metal and/or forms a chemical bond, to thereby form a protecting film, (4) a second protecting film-forming agent such as polyacrylic acid, polyamido acid or a salt thereof which assists the first protecting film-forming agent in forming a protecting film and (5) water; and a method for polishing.
摘要翻译：一种用于金属的研磨液，包括（1）金属氧化剂，（2）氧化金属的溶解剂，（3）第一保护膜形成剂，例如氨基酸或唑，物理上吸附金属的表面和/或形成化学键，从而形成保护膜，（4）辅助第一保护膜形成剂的第二保护膜形成剂如聚丙烯酸，聚酰胺或其盐形成保护膜和（5）水; 和抛光方法。

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