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11. 发明授权

US08785010B2 Glass substrate for a magnetic disk and magnetic disk 有权
标题翻译：用于磁盘和磁盘的玻璃基板
公开(公告)号：US08785010B2
公开(公告)日：2014-07-22
申请号：US13120320
申请日：2009-09-29
申请人： Shinji Eda , Hideki Isono , Takashi Maeda , Hiroshi Tsuchiya , Yoshinori Marumo
发明人： Shinji Eda , Hideki Isono , Takashi Maeda , Hiroshi Tsuchiya , Yoshinori Marumo
IPC分类号： B32B3/26 , B24B7/00 , C03C21/00 , C03C23/00 , G11B5/84
CPC分类号： C03C23/009 , C03C19/00 , C03C21/008 , C03C23/0075 , C03C2204/08 , C09G1/02 , G11B5/7315 , G11B5/8404 , G11B5/8408
摘要： Provided are a magnetic disk substrate and a method of manufacturing the same, wherein the magnetic disk substrate has very few defects present on its surface with an arithmetic mean roughness (Ra) at a level in the vicinity of 0.1 nm and thus is suitable as a substrate for a magnetic disk with high recording density. The magnetic disk glass substrate is such that the arithmetic mean roughness (Ra) of the main surface of the glass substrate measured using an atomic force microscope with a resolution of 256×256 pixels in a 2 μm×2 μm square is 0.12 nm or less and the number of defects detected to have a size of 0.1 μm to 0.6 μm in plan view and a depth of 0.5 nm to 2 nm is less than 10 per 24 cm2, wherein the defects are each detected using a shift in wavelength between incident light and reflected light upon irradiating and scanning helium neon laser light with a wavelength of 632 nm on the main surface of the glass substrate.
摘要翻译：提供一种磁盘基板及其制造方法，其中，磁盘基板的表面上存在极少的缺陷，算术平均粗糙度（Ra）在0.1nm附近，因此适合作为具有高记录密度的磁盘的基板。磁盘玻璃基板使用原子力显微镜在2μm×2μm的正方形中以256×256像素的分辨率测量的玻璃基板的主面的算术平均粗糙度（Ra）为0.12nm以下并且在平面图中检测为具有0.1μm至0.6μm的尺寸和0.5nm至2nm的深度的缺陷的数量小于每24cm 2的10个，其中每个使用入射光之间的波长偏移检测缺陷并在玻璃基板的主表面上照射和扫描波长为632nm的氦氖激光的反射光。

12. 发明申请

US20100104743A1 METHOD OF MANUFACTURING A GLASS SUBSTRATE FOR MAGNETIC DISK 有权
标题翻译：制造用于磁盘的玻璃基板的方法
公开(公告)号：US20100104743A1
公开(公告)日：2010-04-29
申请号：US12650853
申请日：2009-12-31
申请人： Yoshinori MARUMO
发明人： Yoshinori MARUMO
IPC分类号： G11B5/84 , B24B1/00
CPC分类号： B08B3/12 , B08B3/08 , C03C23/0075 , C03C2218/31 , G11B5/8404 , Y10T29/49037 , Y10T29/49043 , Y10T29/49048 , Y10T29/49126 , Y10T29/49128 , Y10T29/4913
摘要： In a manufacturing method of a glass substrate for a magnetic disk including a cleaning process of the glass substrate, the cleaning process includes a process of contacting the glass substrate with a cleaning solution containing a compound, such as thioglycolic acid or a thioglycolic acid derivative, having a thiol group as a functional group.
摘要翻译：在包括玻璃基板的清洗工序的磁盘用玻璃基板的制造方法中，清洗工序包括使玻璃基板与含有化合物如巯基乙酸或巯基乙酸衍生物的清洗液接触的工序，具有巯基作为官能团。

13. 发明授权

US07314575B2 Manufacturing method of glass substrate for magnetic disk, and manufacturing method of magnetic disk 有权
标题翻译：磁盘用玻璃基板的制造方法以及磁盘的制造方法
公开(公告)号：US07314575B2
公开(公告)日：2008-01-01
申请号：US11237868
申请日：2005-09-29
申请人： Yoshinori Marumo , Intanon Sitalaphruek
发明人： Yoshinori Marumo , Intanon Sitalaphruek
IPC分类号： B44C1/22
CPC分类号： C03C23/0075 , C03C15/00 , C03C15/02 , C03C19/00 , G11B5/7315 , G11B5/8404
摘要： A method for manufacturing a glass substrate for a magnetic disk comprises mirror surface polishing and cleaning of a glass substrate, wherein polishing agent of which the principal component is rare-earth oxide with content of fluorine 5% by weight or less, is supplied to the glass substrate, the surface of the glass substrate is subjected to mirror surface polishing by relatively moving the polishing cloth and the glass substrate, then this glass substrate is brought into contact with a cleaning solution including ascorbic acid, fluorine ion, and sulfuric acid of 3% by weight or more, and the polishing agent is dissolved and removed. The concentration of the ascorbic acid included in the cleaning solution is 0.1% by weight or more, and the content of the fluorine ion is 1 ppm to 40 ppm. At least a magnetic layer is formed on the obtained glass substrate to manufacture a magnetic disk.
摘要翻译：一种用于制造磁盘用玻璃基板的方法，其特征在于，对所述玻璃基板进行镜面研磨和清洗，将主成分为含氟量为5重量％以下的稀土类氧化物的研磨剂供给到玻璃基板，通过相对移动抛光布和玻璃基板对玻璃基板的表面进行镜面抛光，然后使该玻璃基板与包含抗坏血酸，氟离子和硫酸的清洗溶液接触3 重量％以上，并且研磨剂溶解并除去。清洗液中含有的抗坏血酸的浓度为0.1重量％以上，氟离子的含量为1〜40ppm。在获得的玻璃基板上形成至少一层磁性层以制造磁盘。

14. 发明申请

US20050196523A1 Electroless plating method and apparatus, and computer storage medium storing program for controlling same 审中-公开
标题翻译：化学镀方法和装置，以及用于控制其的计算机存储介质存储程序
公开(公告)号：US20050196523A1
公开(公告)日：2005-09-08
申请号：US11100393
申请日：2005-04-07
申请人： Yoshinori Marumo
发明人： Yoshinori Marumo
IPC分类号： B05D1/00 , C23C18/16 , C23C18/31 , C25D5/02 , H01L21/288
CPC分类号： B05D1/00 , C23C18/1676 , C25D5/02 , H01L21/288
摘要： In an electroless plating method and apparatus, an electroless plating solution is supplied onto a substrate, a reaction acceleration condition is applied to the electroless plating solution to accelerate a reaction, and a coating is formed on the substrate by using the electroless plating solution to which the reaction acceleration condition has been applied. Further, In an electroless plating method and apparatus, a first coating is formed on a substrate by using a first electroless plating solution at a first coating formation rate, and a second coating is formed on the substrate, on which the first coating has been formed, by using a second electroless plating solution at a second coating formation rate higher than the first coating formation rate. The methods allow a coating to be formed in a recess portion, uniformly.
摘要翻译：在化学镀方法和装置中，将化学镀溶液供应到基板上，将反应加速条件施加到化学镀溶液以加速反应，并且通过使用化学镀溶液在基板上形成涂层反应加速条件已被应用。此外，在化学镀方法和装置中，通过以第一涂布形成速率使用第一化学镀溶液在基板上形成第一涂层，并且在其上形成有第一涂层的基板上形成第二涂层通过以高于第一涂层形成速率的第二涂布形成速率使用第二化学镀溶液。该方法允许在凹部中均匀地形成涂层。

15. 发明申请

US20050013928A1 Electroless plating pre-treatment solution and electroles plating method 有权
标题翻译：无电镀预处理液和电镀电镀法
公开(公告)号：US20050013928A1
公开(公告)日：2005-01-20
申请号：US10882340
申请日：2004-07-02
申请人： Yoshinori Marumo
发明人： Yoshinori Marumo
IPC分类号： C23C18/18 , C23C18/16 , C23C18/31 , C23C18/48 , H01L21/288 , H01L21/768 , H05K3/42 , B05D3/04
CPC分类号： H01L21/76843 , C23C18/1607 , C23C18/165 , C23C18/1803 , C23C18/1827 , C23C18/1834 , C23C18/31 , H01L21/288 , H01L21/76849 , H01L21/76873 , H01L21/76877 , H05K3/422
摘要： An electroless plating pre-treatment solution is an aqueous solution in which at least one selected from the group consisting of sulfonic acid having two or more characteristic groups, derivatives of the sulfonic, and salts of the sulfonic acid is included.
摘要翻译：无电解电镀预处理溶液是其中包含选自具有两个或更多个特征基团的磺酸，磺酸衍生物和磺酸盐中的至少一种的水溶液。

16. 发明授权

US06607650B1 Method of forming a plated layer to a predetermined thickness 失效
标题翻译：将镀层形成为预定厚度的方法
公开(公告)号：US06607650B1
公开(公告)日：2003-08-19
申请号：US09665576
申请日：2000-09-18
申请人： Takayuki Niuya , Michihiro Ono , Hideto Goto , Kyungho Park , Yoshinori Marumo , Katsusuke Shimizu
发明人： Takayuki Niuya , Michihiro Ono , Hideto Goto , Kyungho Park , Yoshinori Marumo , Katsusuke Shimizu
IPC分类号： C25D548
CPC分类号： H01L21/76877 , C25D5/18 , C25D7/123 , C25D17/001 , H01L21/2885 , H01L21/7684 , H01L2924/0002 , H01L2924/00
摘要： The object of the present invention is to provide a plating method capable of planarization process of high quality in comparison with the conventional plating method and also provide a plating device and a plating system adopting the plating method of the invention. In the plating method and device, an object 10 to be processed and an electrode plate 20 are dipped in a solution including objective metal ions and a forward current is supplied between the object and the electrode plate to educe a metal on the surface of the object. After forming a plating film on the object excessively, a backward current is supplied between the object 10 and the electrode 20 to uniformly remove at least part of superfluous plating film.
摘要翻译：本发明的目的是提供一种与传统的镀覆方法相比能够进行高质量平坦化处理的电镀方法，并且还提供了采用本发明的电镀方法的电镀装置和电镀系统。在电镀方法和装置中，将待处理物体10和电极板20浸入包含目标金属离子的溶液中，并且在物体和电极板之间提供正向电流以在物体的表面上还原金属。在物体上过度地形成镀膜之后，在物体10和电极20之间提供反向电流，以均匀地去除至少一部分多余的镀膜。

17. 发明授权

US08763428B2 Method for producing glass substrate for magnetic disk and method for manufacturing magnetic disk 有权
标题翻译：制造磁盘用玻璃基板的方法及磁盘制造方法
公开(公告)号：US08763428B2
公开(公告)日：2014-07-01
申请号：US12088851
申请日：2007-03-16
申请人： Toshio Takizawa , Takumi Koshimizu , Yoshinori Marumo , Masahiro Katagiri
发明人： Toshio Takizawa , Takumi Koshimizu , Yoshinori Marumo , Masahiro Katagiri
IPC分类号： C03C19/00 , B24B7/24
CPC分类号： B24B7/241 , C03C19/00 , C03C23/0075 , G11B5/8404
摘要： When mirror polishing is performed on a glass substrate by bringing a polishing pad into contact with the surface of the glass substrate while supplying a polishing liquid containing polishing grains to the substrate surface, the pH of the polishing liquid is maintained within a certain range or the agglomeration degree or dispersion degree of the polishing liquid is controlled. Consequently, an adequate mirror polishing rate can be maintained and there can be obtained a glass substrate having a good end shape.
摘要翻译：当在玻璃基板上进行镜面抛光时，通过使抛光垫与玻璃基板的表面接触，同时向衬底表面供给包含抛光颗粒的抛光液体，将抛光液的pH保持在一定范围内或控制研磨液的附聚度或分散度。因此，可以保持足够的镜面研磨速度，并且可以获得具有良好端部形状的玻璃基板。

18. 发明授权

US06848457B2 Liquid treatment equipment, liquid treatment method, semiconductor device manufacturing method, and semiconductor device manufacturing equipment 失效
标题翻译：液体处理设备，液体处理方法，半导体器件制造方法和半导体器件制造设备
公开(公告)号：US06848457B2
公开(公告)日：2005-02-01
申请号：US09849347
申请日：2001-05-07
申请人： Yoshinori Marumo , Yoshinori Kato , Hiroshi Sato , Kyungho Park
发明人： Yoshinori Marumo , Yoshinori Kato , Hiroshi Sato , Kyungho Park
IPC分类号： C25D21/18 , H01L21/00 , H01L21/288 , B08B3/04
CPC分类号： H01L21/67167 , C25D21/18 , H01L21/2885 , H01L21/67051 , H01L21/6715 , H01L21/67178 , H01L21/6723 , Y10S134/902
摘要： Providing liquid treatment equipment capable of largely reducing a frequency of discarding a treatment solution as a whole and capable of implementing smooth and high quality liquid treatment with less manufacturing burden. Equipment comprises a treatment solution bath capable of accommodating a treatment solution for implementing liquid treatment to a substrate to treat, a treatment solution circulating system circulating the accommodated treatment solution between the outside of the treatment solution bath, and a product removal unit removing a reaction product due to the liquid treatment contained in the circulated treatment solution. By circulating the accommodated treatment solution between the outside of the treatment solution bath, reaction products contained in the circulated treatment solution are removed by means of the product removal unit. Thereby, a chemical change substance and a decomposition product remaining in a treatment solution can be removed, resulting in preventing a treatment solution from deteriorating.
摘要翻译：提供液体处理设备能够大大降低整体处理溶液的排放频率，能够以较少的制造负担实现平稳高质量的液体处理。设备包括能够容纳用于对基板进行液体处理的处理溶液的处理溶液浴，以处理在处理溶液浴的外部之间循环所容纳的处理溶液的处理溶液循环系统和去除反应产物的产物去除单元由于循环处理溶液中所含的液体处理。通过将处理溶液的外部循环容纳的处理液，通过产品除去单元除去循环处理液中所含的反应产物。因此，可以除去残留在处理溶液中的化学变化物质和分解产物，从而防止处理溶液劣化。

19. 发明申请

US20060070980A1 Manufacturing method of glass substrate for magnetic disk, and manufacturing method of magnetic disk 有权
标题翻译：磁盘用玻璃基板的制造方法以及磁盘的制造方法
公开(公告)号：US20060070980A1
公开(公告)日：2006-04-06
申请号：US11237868
申请日：2005-09-29
申请人： Yoshinori Marumo , Intanon Sitalaphruek
发明人： Yoshinori Marumo , Intanon Sitalaphruek
IPC分类号： C03C15/00
CPC分类号： C03C23/0075 , C03C15/00 , C03C15/02 , C03C19/00 , G11B5/7315 , G11B5/8404
摘要： A method for manufacturing a glass substrate for a magnetic disk comprises mirror surface polishing and cleaning of a glass substrate, wherein polishing agent of which the principal component is rare-earth oxide with content of fluorine 5% by weight or less, is supplied to the glass substrate, the surface of the glass substrate is subjected to mirror surface polishing by relatively moving the polishing cloth and the glass substrate, then this glass substrate is brought into contact with a cleaning solution including ascorbic acid, fluorine ion, and sulfuric acid of 3% by weight or more, and the polishing agent is dissolved and removed. The concentration of the ascorbic acid included in the cleaning solution is 0.1% by weight or more, and the content of the fluorine ion is 1 ppm to 40 ppm. At least a magnetic layer is formed on the obtained glass substrate to manufacture a magnetic disk.
摘要翻译：一种用于制造磁盘用玻璃基板的方法，其特征在于，对所述玻璃基板进行镜面研磨和清洗，将主成分为含氟量为5重量％以下的稀土类氧化物的研磨剂供给到玻璃基板，通过相对移动抛光布和玻璃基板对玻璃基板的表面进行镜面抛光，然后使该玻璃基板与包含抗坏血酸，氟离子和硫酸的清洗溶液接触3 重量％以上，并且研磨剂溶解并除去。清洗液中含有的抗坏血酸的浓度为0.1重量％以上，氟离子的含量为1〜40ppm。在获得的玻璃基板上形成至少一层磁性层以制造磁盘。

20. 发明授权

US06752855B2 Solution treatment system and solution treatment method 失效
标题翻译：固溶处理系统和固溶处理方法
公开(公告)号：US06752855B2
公开(公告)日：2004-06-22
申请号：US10158217
申请日：2002-05-31
申请人： Yoshinori Marumo
发明人： Yoshinori Marumo
IPC分类号： B01D1900
CPC分类号： B01D19/0052
摘要： A plating system comprises: a plating unit which plates a water; a plating solution storage tank which stores a plating solution; and a plating solution supply system which supplies the plating solution in the plating solution storage tank to the plating unit. A dissolved oxygen removing unit which removes dissolved oxygen from the plating solution flowing in the plating solution supply system is provided in the middle of the plating solution supply system.
摘要翻译：电镀系统包括：电镀单元，其对水进行平板化; 存储电镀液的电镀液储存槽; 以及电镀液供给系统，其将电镀液储存槽内的电镀液供给到电镀单元。在电镀液供给系统的中间设置有从电镀液供给系统流动的电镀液中除去溶解氧的溶解氧除去单元。

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