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    • 12. 发明授权
    • Polyurethane adhesive, method for use in bonding, and use of mixture
    • 聚氨酯胶粘剂,粘合方法和混合物的使用
    • US06353078B1
    • 2002-03-05
    • US09463793
    • 2000-01-27
    • Shigeru MurataMasahiko YasudaTetsuya Nakajima
    • Shigeru MurataMasahiko YasudaTetsuya Nakajima
    • C08G1842
    • C09J175/06C08G18/4216C08L2666/36C09J167/02Y10S528/905
    • The present invention provides an adhesive comprising a polyester polyol or polyurethane polyol possessing structural units represented by the following general formula (I) within its molecular structure, and an organic polyisocyanate in which the isocyanate groups may be protected: wherein R1 and R2 are the same or different and each represents lower alkyl. The adhesive of the present invention exhibits an excellent initial adhesion strength; and provides adhered objects that exhibit an excellent permanent adhesion strength, hot water resistance, flexibility, flexibility at a low temperature, and fatigue resistance, and is useful in adhering plastic, metal, and the like. In addition, the present invention provides a method of mixing the aforementioned components and using the mixture for adhesion, and a use of the mixture of the aforementioned components.
    • 本发明提供一种粘合剂,其包含在其分子结构中具有由以下通式(I)表示的结构单元的聚酯多元醇或聚氨酯多元醇,其中异氰酸酯基可被保护的有机多异氰酸酯:其中R1和R2相同 或不同,并且各自表示低级烷基。 本发明的粘合剂表现出优异的初始粘合强度; 并且提供具有优异的永久粘合强度,耐热水性,柔软性,低温柔韧性和耐疲劳性的粘合物,并且可用于粘附塑料,金属等。 此外,本发明提供了混合上述组分并使用该混合物进行粘合的方法,以及上述组分的混合物的用途。
    • 17. 发明授权
    • Measurement method, measurement apparatus, exposure method, and exposure apparatus
    • 测量方法,测量装置,曝光方法和曝光装置
    • US08477310B2
    • 2013-07-02
    • US11587099
    • 2005-04-20
    • Mitsuru KobayashiMasahiko Yasuda
    • Mitsuru KobayashiMasahiko Yasuda
    • G01B11/00
    • G03F9/7046G03F9/7003G03F9/7011G03F9/7019G03F9/7084
    • To perform high-speed and highly accurate measurement by setting desired measuring conditions for each measuring object. In an alignment sensor of exposure apparatus, in the case of performing position measurement for a plurality of sample shots, measurement is performed by changing the measuring conditions, in response to a measuring axis direction, a mark or a layer whereupon a mark to be measured exists. At that time, for the measuring objects to be measured under the same measuring conditions, for example, a position in a Y axis direction and a position in an X axis direction, measurement is continuously performed. When the measuring condition is changed, a baseline value is remeasured. The changeable measuring conditions are wavelength of measuring light, use and selection of a retarder, NA and σ of an optical system, a light quantity of measuring light, illumination shape, signal processing algorithm, etc.
    • 通过设置每个测量对象的所需测量条件来执行高速和高精度的测量。 在曝光装置的对准传感器中,在对多个采样拍摄进行位置测量的情况下,通过根据测量轴方向改变测量条件,进行测量的标记或层,进行测量 存在 此时,对于在相同测量条件下测量的测量对象,例如,Y轴方向的位置和X轴方向的位置,连续进行测量。 当测量条件改变时,将重新测量基准值。 可变测量条件是测量光的波长,延迟器的使用和选择,光学系统的NA和西格玛,测量光的光量,照明形状,信号处理算法等。
    • 18. 发明申请
    • MEASUREMENT METHOD, MEASUREMENT APPARATUS, EXPOSURE METHOD, AND EXPOSURE APPARATUS
    • 测量方法,测量装置,曝光方法和曝光装置
    • US20130027680A1
    • 2013-01-31
    • US13495284
    • 2012-06-13
    • Mitsuru KOBAYASHIMasahiko YASUDA
    • Mitsuru KOBAYASHIMasahiko YASUDA
    • G03B27/54G01B11/14
    • G03F9/7046G03F9/7003G03F9/7011G03F9/7019G03F9/7084
    • To perform high-speed and highly accurate measurement by setting desired measuring conditions for each measuring object. In an alignment sensor of exposure apparatus, in the case of performing position measurement for a plurality of sample shots, measurement is performed by changing the measuring conditions, in response to a measuring axis direction, a mark or a layer whereupon a mark to be measured exists. At that time, for the measuring objects to be measured under the same measuring conditions, for example, a position in a Y axis direction and a position in an X axis direction, measurement is continuously performed. When the measuring condition is changed, a baseline value is remeasured. The changeable measuring conditions are wavelength of measuring light, use and selection of a retarder, NA and σ of an optical system, a light quantity of measuring light, illumination shape, signal processing algorithm, etc.
    • 通过设置每个测量对象的所需测量条件来执行高速和高精度的测量。 在曝光装置的对准传感器中,在对多个采样拍摄进行位置测量的情况下,通过根据测量轴方向改变测量条件,进行测量的标记或层,进行测量 存在 此时,对于在相同测量条件下测量的测量对象,例如,Y轴方向的位置和X轴方向的位置,连续进行测量。 当测量条件改变时,将重新测量基准值。 可变的测量条件是测量光的波长,减速器的使用和选择,NA和&sgr; 的光学系统,光量测量光,照明形状,信号处理算法等。