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    • 16. 发明公开
    • Method for fabricating ferroelectric thin films using a sol-gel technique
    • Herstellung eines ferroelektrischen Films durch ein Sol-Gel-Verfahren
    • EP0939434A1
    • 1999-09-01
    • EP98870038.1
    • 1998-02-25
    • INTERUNIVERSITAIR MICRO-ELEKTRONICA CENTRUM VZWLIMBURGS UNIVERSITAIR CENTRUM
    • Wouters, DirkNorga, GerdMaes, HermanNouwen, RiaMullens, JulesFranco, DirkYperman, JanVan Poucke, Lucien C.
    • H01L21/316H01L21/3205C23C18/12
    • H01L21/31691C23C18/1216C23C18/1225C23C18/1254H01L21/02197H01L28/55
    • A method is disclosed for the formation of ferro-electric films using a multi coating process based on a sol-gel technique. In particular a method is disclosed to fabricate high-quality thickness scaled PZT films of an alkoxide-type liquid chemical PZT precursor solution, preferably a Pb(Zr x Ti 1-x )O 3 precursor solution, using a sol-gel technique. At least two coated layers are deposited, but the precise number of coated layers depends on the desired thickness of the ferro-electric film. According to the method of the invention, the electrical characteristics of the film as formed are not dependent on the number of coated layers. There are a number of properties, characteristic for the method of the present invention, and resulting in said excellent electrical characteristics. In fact said method can comprise a multi coating process wherein a reduced number of coated layers is used but where intermediate crystallization steps are performed. The ferro-electric films formed using this method have excellent electrical characteristics, provided that a crystallization step is only performed if the thickness of the film formed since the last crystallization step is minimum about 40 to 50 nm. Alternatively, the method can comprise a multi coating process wherein no intermediate crystallization steps are used.
    • 公开了一种使用基于溶胶 - 凝胶技术的多涂层方法形成铁电膜的方法。 具体地,公开了使用溶胶 - 凝胶技术制造醇盐型液体化学PZT前体溶液,优选Pb(Zr x Ti 1-x)O 3前体溶液的高质量厚度比例的PZT膜的方法。 沉积至少两层涂层,但涂层的精确数量取决于铁电薄膜的所需厚度。 根据本发明的方法,形成的膜的电特性不依赖于涂层的数量。 本发明的方法具有许多特性,并具有优异的电特性。 事实上,所述方法可以包括多层涂覆方法,其中使用减少数量的涂层,但是进行中间结晶步骤。 使用该方法形成的铁电膜具有优异的电特性,条件是仅当从最后一个结晶步骤形成的膜的厚度最小为约40至50nm时才进行结晶步骤。 或者,该方法可以包括其中不使用中间结晶步骤的多涂层方法。
    • 17. 发明公开
    • A method for measuring electromigration-induced resistance changes
    • Verfahren zum Messen vonWiederstandsänderungendurch Elektromigration
    • EP0907085A1
    • 1999-04-07
    • EP97870149.8
    • 1997-10-03
    • INTERUNIVERSITAIR MICROELEKTRONICA CENTRUM VZWLimburgs Universitair Centrum
    • De Ceuninck, WardDe Schepper, LucVan Olmen, JanGoldoni, Alessandro
    • G01R31/316
    • G01R31/2858
    • A method for measuring resistance changes is disclosed to study electromigration induced failures in conductive patterns. Said method can provide a basis for lifetime predictions based on low value failure criteria, i.e. small resistance changes in said conductive patterns in a limited period of time. Two essentially identical so-called test and reference structures are placed close to each other on the same substrate and submitted to at least one sequence of a stress period and a measurement period. During a stress period, a DC current with a high current density is applied to the test structure thereby enhancing electromigration, while substantially simultaneous an AC current is applied to the reference structure leading to the same amount of power dissipation in said reference structure as the amount of power dissipation in said test structure, introduced by said DC stress current. The method of the present invention makes it possible to distinguish in a very accurate way between resistance changes induced by electromigration and resistance changes induced by other disturbances.
    • 公开了一种用于测量电阻变化的方法,以研究导电图案中的电迁移引起的故障。 所述方法可以提供基于低值失效标准的寿命预测的基础,即在有限的时间段内所述导电图案中的小电阻变化。 两个基本上相同的所谓的测试和参考结构在相同的衬底上彼此靠近放置并且被提交至至少一个应力周期和测量周期的序列。 在应力周期期间,将具有高电流密度的直流电流施加到测试结构,从而增强电迁移,同时基本上同时将AC电流施加到参考结构,导致在所述参考结构中相同量的功率耗散量, 所述测试结构中的功率耗散由所述直流应力电流引入。 本发明的方法使得可以以非常准确的方式区分由电迁移引起的电阻变化和由其它干扰引起的电阻变化。