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11. 发明申请

WO2005053566A1 ASSISTANT FOR IMPLANT STENT AND USING METHOD THEREOF 审中-公开
标题翻译：植入植入物及其方法
公开(公告)号：WO2005053566A1
公开(公告)日：2005-06-16
申请号：PCT/KR2004/000147
申请日：2004-01-28
申请人： KIM, Jong-Pil
发明人： KIM, Jong-Pil
IPC分类号： A61C8/00
CPC分类号： A61C1/084
摘要： The present invention relates to an assistant for implant stent and using method thereof, and provide the assistant for implant stent comprises, a plate-shaped supporting part; and a guiding part which is extended from the center portion of said supporting part, and in which a drill connecting hole is formed to communicate, wherein the assistant is inserted from the upper part of the implant stent. And, the present invention also provides a method for using the assistant for implant stent comprising the steps of: making plaster cast of mouth, and mounting; making a stent based on the manufactured plaster cast; boring a hole on the center of the stent; incising gingiva of a patient; setting the manufactured stent; checking the location of hole bored on stent and marking on the upper end of alveolar bone; selecting an assistant accorded with the marking on alveolar bone and setting it in the hole of stent; and drilling after inserting a drill through the drill connecting hole of the assistant for stent. According to the present invention, when the alveolar bone of a patient is bored, because the metallic assistant for stent can support a drill stably, precise boring is conducted. Specially, when the location of alveolar bone is missed, by the drill connecting hole formed to be inclined, stable and rapid boring is conducted. And, because the boring depth is confirmed precisely and easily, the operation period decreases sharply.
摘要翻译：本发明涉及一种用于植入支架的助剂及其使用方法，并提供了用于植入支架的助剂，包括：板状支撑部分; 以及从所述支撑部分的中心部分延伸并且其中形成钻孔连接孔以连通的引导部分，其中所述助手从所述植入物支架的上部插入。而且，本发明还提供一种使用该植入物支架助剂的方法，其特征在于包括以下步骤：制作石膏膏和安装; 根据制造的石膏铸造制成支架; 在支架中心钻孔; 切开患者的牙龈; 设置制造的支架; 检查支架钻孔位置，牙槽骨上端标记; 选择符合牙槽骨标记的助手，将其置于支架的孔中; 在将钻头穿过支架助手的钻孔连接孔后钻孔。根据本发明，当患者的牙槽骨无孔时，由于支架的金属助手能够稳定地支撑钻头，因此进行精确的钻孔。特别地，当牙槽骨的位置错过时，通过形成为倾斜的钻孔连接孔进行稳定且快速的钻孔。而且，由于钻孔的深度精确而容易地确定，所以运转时间急剧下降。

12. 发明申请

WO2005027668A1 CIGARETTE IGNITION DEVICE THAT DOES NOT NEED MATCH 审中-公开
标题翻译：香烟点火装置，不需要匹配
公开(公告)号：WO2005027668A1
公开(公告)日：2005-03-31
申请号：PCT/KR2003/001950
申请日：2003-09-24
申请人： KIM, Jong Pil
发明人： KIM, Jong Pil
IPC分类号： A24D1/08
CPC分类号： A24D1/08
摘要： The present invention provides a cigarette ignition device that does not require a match, so that a smoker can light his cigarettes without using a match or a lighter. The present invention provides a cigarette ignition device 8 comprising of a secondary ignition substance 5 wherein the said secondary ignition device 5 has hollow inner space; the said secondary ignition substance 5 comprise of in its hollow space the primary ignition substance 4, and a striking pad 2. An ignition thread :1 is wrapped around the bended side of the striking pad 2 and taped to the filter 12 of a cigarette. By pulling on the ignition thread 1, the striking pad 2 is moved and by friction causes the primary ignition substance 4 to be lighted, which in turn causes the secondary ignition substance to be lighted, and in this matter a cigarette is lighted.
摘要翻译：本发明提供一种不需要匹配的香烟点火装置，使得吸烟者可以在不使用火柴或打火机的情况下点燃他的香烟。本发明提供一种包括二次点火物质5的香烟点火装置8，其中所述二次点火装置5具有中空的内部空间; 所述二次点火物质5在其中空空间中包括初级点燃物质4和击打垫2.点火线1缠绕在击打垫2的弯曲侧并且贴在香烟的过滤器12上。通过拉动点火线1，撞击垫2被移动，并且由于摩擦使得初级点火物质4被点亮，这又导致二次点燃物质被点亮，并且在这种情况下，香烟被点亮。

13. 发明申请

WO2005014824A1 CAEV-BASED VECTOR SYSTEMS 审中-公开
标题翻译：基于CAEV的矢量系统
公开(公告)号：WO2005014824A1
公开(公告)日：2005-02-17
申请号：PCT/KR2004/002030
申请日：2004-08-12
申请人： VECTORCORE A CO., LTD. , KIM, Yeon-Soo , KIM, Jong-pil , LEE, Sukyung
发明人： KIM, Yeon-Soo , KIM, Jong-pil , LEE, Sukyung
IPC分类号： C12N15/63
CPC分类号： C12N15/86 , C12N2740/16043
摘要： This invention relates to caprine arthritis encephalitis virus-based vectors and vector systems that are useful in the delivery of nucleic acids to both non-dividing and dividing cells. Methods for delivering nucleic acids to both non-dividing and dividing cells using the vector systems are also disclosed.
摘要翻译：本发明涉及可用于向不分裂细胞和分裂细胞递送核酸的基于山羊关节炎脑炎病毒的载体和载体系统。还公开了使用载体系统将核酸递送至非分裂细胞和分裂细胞的方法。

14. 发明申请

WO2008013407A1 CERIUM OXIDE POWDER, METHOD FOR PREPARING THE SAME, AND CMP SLURRY COMPRISING THE SAME 审中-公开
标题翻译：氧化铝粉末，其制备方法和包括其的CMP浆料
公开(公告)号：WO2008013407A1
公开(公告)日：2008-01-31
申请号：PCT/KR2007/003579
申请日：2007-07-26
申请人： LG CHEM, LTD. , OH, Myoung-Hwan , CHO, Seung-Beom , NHO, Jun-Seok , KIM, Jong-Pil , KIM, Jang-Yul
发明人： OH, Myoung-Hwan , CHO, Seung-Beom , NHO, Jun-Seok , KIM, Jong-Pil , KIM, Jang-Yul
IPC分类号： C09K3/14
CPC分类号： C04B35/6261 , B82Y30/00 , C01F17/0043 , C01P2002/72 , C01P2004/03 , C01P2004/20 , C01P2004/22 , C01P2004/24 , C01P2004/64 , C04B35/6263 , C04B35/62675 , C04B35/632 , C04B2235/3227 , C04B2235/3229 , C04B2235/5445 , C04B2235/5481 , C04B2235/76 , C09G1/02 , C09K3/1463 , H01L21/31053
摘要： Disclosed is cerium oxide powder for a CMP abrasive, which can improve polishing selectivity of a silicon oxide layer to a silicon nitride layer and/or within-wafer non- uniformity (WIWNU) during chemical mechanical polishing in a semiconductor fabricating process. More particularly, the cerium oxide powder is obtained by using cerium carbonate having a hexagonal crystal structure as a precursor. Also, CMP slurry comprising the cerium oxide powder as an abrasive, and a shallow trench isolation method for a semiconductor device using the CMP slurry as polishing slurry are disclosed.
摘要翻译：公开了用于CMP研磨剂的氧化铈粉末，其可以在半导体制造工艺中的化学机械抛光期间改善氧化硅层与氮化硅层的抛光选择性和/或晶片内不均匀性（WIWNU）。更具体地说，通过使用具有六方晶系结构的碳酸铈作为前体来获得二氧化铈粉末。此外，公开了包含作为研磨剂的氧化铈粉末的CMP浆料和使用CMP浆料作为研磨浆料的半导体器件的浅沟槽隔离方法。

15. 发明申请

WO2007067003A1 ADJUVANT FOR CONTROLLING POLISHING SELECTIVITY AND CHEMICAL MECHANICAL POLISHING SLURRY COMPRISING THE SAME 审中-公开
标题翻译：用于控制抛光选择性和化学机械抛光浆料的添加剂
公开(公告)号：WO2007067003A1
公开(公告)日：2007-06-14
申请号：PCT/KR2006/005317
申请日：2006-12-08
申请人： LG CHEM, LTD. , LEE, Jung-Hee , KIM, Jong-Pil , YI, Gi-Ra , MOON, Kwang-Ik , KO, Chang-Bum , JANG, Soon-Ho , CHO, Seung-Beom , HONG, Young-Jun
发明人： LEE, Jung-Hee , KIM, Jong-Pil , YI, Gi-Ra , MOON, Kwang-Ik , KO, Chang-Bum , JANG, Soon-Ho , CHO, Seung-Beom , HONG, Young-Jun
IPC分类号： C09K3/14
CPC分类号： C09G1/02 , C09K3/1409 , C09K3/1463 , H01L21/31053
摘要： Disclosed is an adjuvant for controlling polishing selectivity when polishing a cationically charged material simultaneously with an anionically charged material. CMP slurry comprising the adjuvant is also disclosed. The adjuvant comprises: (a) a polyelectrolyte that forms an adsorption layer on the cationically charged material in order to increase the polishing selectivity of the anionically charged material; (b) a basic material; and (c) a fluorine-based compound. when the adjuvant for controlling polishing selectivity of CMP slurry according to the present invention is applied to a CMP process, it is possible to increase the polishing selectivity of a silicon oxide layer, to obtain a uniform particle size of CMP slurry, to stabilize variations in viscosity under an external force and to minimize generation of microscratches during a polishing process. Therefore, the adjuvant for CMP slurry according to the present invention can improve reliability and productivity during the fabrication of very large scale integrated semiconductors.
摘要翻译：公开了用于在与阴离子充电材料同时研磨阳离子充电材料时控制抛光选择性的佐剂。还公开了包含佐剂的CMP浆料。助剂包括：（a）在阳离子充电材料上形成吸附层的聚电解质，以增加阴离子充电材料的抛光选择性; （b）基本材料; 和（c）氟系化合物。当将用于控制根据本发明的CMP浆料的抛光选择性的佐剂应用于CMP工艺时，可以增加氧化硅层的抛光选择性，以获得CMP浆料的均匀粒度，以稳定化在外力下的粘度并且在抛光过程中最小化微细纹的产生。因此，根据本发明的用于CMP浆料的助剂可以在制造非常大规模的集成半导体期间提高可靠性和生产率。

16. 发明申请

WO2006011764A1 CERIUM OXIDE POWDER AND PROCESS FOR PRODUCING THE SAME 审中-公开
标题翻译：氧化铈粉及其制造方法
公开(公告)号：WO2006011764A1
公开(公告)日：2006-02-02
申请号：PCT/KR2005/002459
申请日：2005-07-28
申请人： LG CHEM, LTD. , NHO, Jun-seok , KIM, Jang-yul , OH, Myoung-hwan , KIM, Jong-pil , CHO, Seung-beom
发明人： NHO, Jun-seok , KIM, Jang-yul , OH, Myoung-hwan , KIM, Jong-pil , CHO, Seung-beom
IPC分类号： C01F17/00
CPC分类号： C01F17/0043 , C01P2004/03 , C01P2004/32 , C09K3/1409 , C09K3/1463
摘要： The present invention relates to cerium oxide powder and a process for producing the same. The cerium oxide powder of the invention, which is produced by mixing a cerium source such as cerium oxide, cerium hydroxide and cerium carbonate with an alkali metal compound, as flux, and performing high temperature treatment, may have a variety particle size while having spherical shape.
摘要翻译：本发明涉及二氧化铈粉末及其制造方法。通过将铈氧化铈，碳酸铈等铈源与碱金属化合物混合，作为助熔剂进行高温处理而制造的本发明的氧化铈粉末，可以具有各种粒径，同时具有球状形状。

17. 发明申请

WO2005053567A1 ASSISTANT FOR IMPLANT STENT 审中-公开
标题翻译：植入支架助手
公开(公告)号：WO2005053567A1
公开(公告)日：2005-06-16
申请号：PCT/KR2004/003158
申请日：2004-12-02
申请人： KIM, Jong-Pil
发明人： KIM, Jong-Pil
IPC分类号： A61C8/00
CPC分类号： A61C1/084
摘要： The present invention relates to an assistant for implant stent. The assistant for implant stent of the present invention comprises a body with a predetermined length and a drill insertion hole bored through the body from a top surface to a bottom surface thereof. The body comprises a support portion with a predetermined thickness and a sectional area greater than that of the body. The support portion is formed on the top surface of the body.
摘要翻译：本发明涉及一种用于植入支架的助剂。本发明的植入物支架用辅助件包括具有预定长度的主体和从其顶表面到底表面穿过主体钻孔的钻孔插入孔。主体包括具有预定厚度并且截面积大于主体的支撑部分。支撑部分形成在主体的顶表面上。

18. 发明申请

WO2006080796A8 CERIUM OXIDE ABRASIVE AND SLURRY CONTAINING THE SAME 审中-公开
标题翻译：氧化铈磨料和含有这种磨料的浆料
公开(公告)号：WO2006080796A8
公开(公告)日：2006-12-14
申请号：PCT/KR2006000271
申请日：2006-01-24
申请人： LG CHEMICAL LTD , NHO JUN-SEOK , OH MYOUNG-HWAN , KIM JANG-YUL , KIM JONG-PIL , CHO SEUNG-BEOM
发明人： NHO JUN-SEOK , OH MYOUNG-HWAN , KIM JANG-YUL , KIM JONG-PIL , CHO SEUNG-BEOM
IPC分类号： C09K3/14 , B24B37/00 , B82Y10/00 , B82Y30/00 , B82Y99/00 , C01F17/00 , H01L21/304
CPC分类号： B82Y30/00 , C01F17/0043 , C01P2004/03 , C01P2004/04 , C01P2004/62 , C01P2004/64 , C01P2006/12 , C09K3/1409 , C09K3/1463
摘要： Disclosed are a cerium oxide abrasive for selectively polishing various SiO2 films and SiO2-Si3N4 films; and a slurry containing the same. The cerium oxide abrasive and the polishing slurry of the present invention have a high polishing rate and are also free from microscratches in a polished surface upon polishing since polycrystalline cerium oxide having a mean crystalline particle size of 5 nm or less is synthesized by using hexagonal cerium carbonate having a hexagonal crystal structure as a raw material of cerium.
摘要翻译：公开了用于选择性抛光各种SiO 2膜和SiO 2 -Si 3 N 4膜的氧化铈研磨剂; 和含有它的浆液。由于本发明的氧化铈研磨剂和研磨剂的研磨速度快，研磨后的研磨面上也没有微划痕，因为平均结晶粒径为5nm以下的多晶氧化铈通过使用六方铈作为铈原料的具有六方晶结构的碳酸盐。

19. 发明申请

WO2005074333A1 APPARATUS OF GENERATING GLOW PLASMA ON A WIDE SURFACE UNDER ATMOSPHERIC PRESSURE 审中-公开
标题翻译：在大气压力下在宽面上产生玻璃等离子体的装置
公开(公告)号：WO2005074333A1
公开(公告)日：2005-08-11
申请号：PCT/KR2005/000223
申请日：2005-01-27
申请人： CHANGJO ENGINEERING CO., LTD. , KIM, Kyung Soo , CHO, Jung Hee , KIM, Jong Pil , KANG, Bang Kwon , KIM, Jeong Woo , JIN, Kyung Bok , LEE, Woo Young
发明人： KIM, Kyung Soo , CHO, Jung Hee , KIM, Jong Pil , KANG, Bang Kwon , KIM, Jeong Woo , JIN, Kyung Bok , LEE, Woo Young
IPC分类号： H05H1/46
CPC分类号： H05H1/2406 , H05H2001/2431
摘要： A plasma generation apparatus includes a cylindrical power electrode, a dielectric layer cover the circumference of the power electrode, an auxiliary plasma (AP) earth electrode, a gas flow portion for providing a reaction gas, and a power controller controlling RF power supplied to the power electrode, and auxiliary plasma is maintained between the power electrode and the AP earth electrode while the apparatus operates. The apparatus can generate plasma at low temperature under atmospheric pressure and provide stable plasma using auxiliary plasma. Particularly, even if highfrequency power whose power supply is not stable is used, auxiliary plasma functions as stable plasma source, thereby generating glow plasma uniformly applied to wide area.
摘要翻译：等离子体产生装置包括圆柱形电力电极，覆盖电力电极周围的电介质层，辅助等离子体（AP）接地电极，用于提供反应气体的气体流动部分，以及控制提供给反应气体的RF电力的功率控制器电力电极和辅助等离子体保持在电力电极和AP接地电极之间，同时装置工作。该装置可在大气压下在低温下产生等离子体，并使用辅助等离子体提供稳定的等离子体。特别地，即使使用供电不稳定的高频功率，辅助等离子体作为稳定的等离子体源起作用，从而产生均匀地施加到广域的辉光等离子体。

20. 发明申请

WO2012165919A9 POLYMER RESIN-COPPER COMPLEX, AND PREPARATION METHOD THEREOF 审中-公开
标题翻译：聚合物树脂复合物及其制备方法
公开(公告)号：WO2012165919A9
公开(公告)日：2013-05-16
申请号：PCT/KR2012004372
申请日：2012-06-01
申请人： TAESUNG POLITECH CO LTD , KOREA BASIC SCIENCE INST , JEONG EUH-DUCK , HAN HYUN-JU , HWANG BO-RAM , JIN JONG-SUNG , HA MYOUNG-GYU , KIM HYUN-GYU , HONG TAE-EUN , HONG KYONG-SOO , KIM JONG-PIL , BAE JONG-SEONG , JUNG HONG-DAE , LEE SU-JONG
发明人： JEONG EUH-DUCK , HAN HYUN-JU , HWANG BO-RAM , JIN JONG-SUNG , HA MYOUNG-GYU , KIM HYUN-GYU , HONG TAE-EUN , HONG KYONG-SOO , KIM JONG-PIL , BAE JONG-SEONG , JUNG HONG-DAE , LEE SU-JONG
IPC分类号： B32B15/08 , B32B15/20 , C23C28/00
CPC分类号： C23C28/30
摘要： The present invention relates to a polymer resin-copper complex which comprises i) copper, ii) nickel formed on the copper, and iii) a polymer resin which is treated with a triazine thiol-based derivative and then coupled to the nickel; and the result of X-ray photoelectron spectroscopy (XPS) analysis of the complex is that Ni content is less than 5% of the total content, which includes NiO and Ni2O3. According to the present invention, the complex improves the adhesive force between a metal and a resin, and as for tensile strength, even after thermal shock tensile strength is maintained. In addition, by using nickel and a triazing thiol-based derivative and utilizing methods, such as pretreatment, appropriate surface roughening, heat treatment, surface coating and the like, to increase binding force to a resin, it is possible to provide a metal-resin complex with excellent binding force between a metal and a resin.
摘要翻译：本发明涉及一种聚合物树脂 - 铜络合物，它包括：i）铜，ii）在铜上形成的镍，和iii）用三嗪硫醇基衍生物处理然后与镍偶合的聚合物树脂; 复合物的X射线光电子能谱（XPS）分析结果表明，Ni含量小于总含量的5％，包括NiO和Ni2O3。根据本发明，复合物改善了金属和树脂之间的粘合力，以及拉伸强度，即使在热冲击后仍保持拉伸强度。此外，通过使用镍和三聚硫醇基衍生物，并且利用预处理，适当的表面粗糙化，热处理，表面涂覆等方法，增加对树脂的结合力，可以提供金属 - 树脂复合物，具有优异的金属和树脂之间的结合力。

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