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11. 发明申请

US20100099342A1 PAD CONDITIONER AUTO DISK CHANGE 审中-公开
标题翻译： PAD控制器自动盘更改
公开(公告)号：US20100099342A1
公开(公告)日：2010-04-22
申请号：US12255442
申请日：2008-10-21
申请人： Hung Chih Chen , Steven M. Zuniga , Donald J.K. Olgado
发明人： Hung Chih Chen , Steven M. Zuniga , Donald J.K. Olgado
IPC分类号： B24D9/08
CPC分类号： B24B53/017
摘要： A method and apparatus for replacing a polishing pad conditioning disk is a chemical mechanical polishing system is provided. The apparatus comprises a disk load/unload station for unloading used conditioning disks from a pad conditioning assembly and loading unused conditioning disks onto the pad conditioning assembly, on or more disk storage stations for storing both used and unused conditioning disks, and a central robot having a range of motion sufficient for transferring both used an unused conditioning disks between the disk load/unload station and the one or more disk storage stations. Embodiments described herein reduce the length of system interruption by eliminating the need to safety lock out the system for the replacement of polishing pad conditioning disks.
摘要翻译：一种用于更换抛光垫调节盘的方法和装置是提供化学机械抛光系统。该装置包括用于从衬垫调节组件卸载使用的调节盘并将未使用的调节盘装载到衬垫调节组件上的多个盘装载/卸载站，用于存储使用和未使用的调节盘的两个或多个盘存储站，以及一个中央机器人，足够的运动范围，用于在盘装载/卸载站和一个或多个盘存储站之间使用未使用的调节盘。本文所描述的实施例通过消除安全锁定系统来更换抛光垫调节盘来减少系统中断的长度。

12. 发明申请

US20090036036A1 APPARATUS AND METHODS FOR CONDITIONING A POLISHING PAD 审中-公开
标题翻译：用于调节抛光垫的装置和方法
公开(公告)号：US20090036036A1
公开(公告)日：2009-02-05
申请号：US12245759
申请日：2008-10-05
申请人： Roy C. Nangoy , Shou-Sung Chang , Donald J.K. Olgado , Hung Chih Chen , Gerald John Alonzo
发明人： Roy C. Nangoy , Shou-Sung Chang , Donald J.K. Olgado , Hung Chih Chen , Gerald John Alonzo
IPC分类号： B24B53/02
CPC分类号： B24B53/017 , B24B53/005 , B24B53/12
摘要： Apparatus and methods for conditioning a polishing pad are provided. An apparatus includes a base, an arm adapted to support a conditioning disk; and a drive mechanism coupled between the arm and the conditioning disk, wherein the drive mechanism is adapted to directly rotate the conditioning disk relative to the arm. Numerous other aspects are disclosed.
摘要翻译：提供了用于调节抛光垫的装置和方法。一种装置包括底座，适于支撑调节盘的臂; 以及联接在所述臂和所述调节盘之间的驱动机构，其中所述驱动机构适于相对于所述臂直接旋转所述调节盘。公开了许多其他方面。

13. 发明申请

US20090029629A1 METHODS AND APPARATUS FOR POLISHING AN EDGE OF A SUBSTRATE 审中-公开
标题翻译：用于抛光衬底边缘的方法和装置
公开(公告)号：US20090029629A1
公开(公告)日：2009-01-29
申请号：US12239726
申请日：2008-09-26
申请人： Ho Seon Shin , Gary C. Ettinger , Donald J.K. Olgado , Erik C. Wasinger , Sen-Hou Ko , Charles I. Dodds , Yufei Chen , Wei-Yung Hsu
发明人： Ho Seon Shin , Gary C. Ettinger , Donald J.K. Olgado , Erik C. Wasinger , Sen-Hou Ko , Charles I. Dodds , Yufei Chen , Wei-Yung Hsu
IPC分类号： B24B49/00
CPC分类号： B24B9/065 , B24B21/002 , B24B41/067 , B24B49/16 , B24B57/02
摘要： Methods for polishing an edge of a substrate are provided. The invention includes rotating a substrate against a polishing film so as to remove material from the edge of the substrate; and detecting an amount of force exerted in pressing the polishing film against the substrate. Numerous other aspects are provided.
摘要翻译：提供了抛光衬底边缘的方法。本发明包括将衬底旋转抵靠抛光膜，以便从衬底的边缘去除材料; 并且检测在将抛光膜压在基板上时施加的力的量。提供了许多其他方面。

14. 发明申请

US20080155852A1 MULTIPLE SUBSTRATE VAPOR DRYING SYSTEMS AND METHODS 审中-公开
标题翻译：多基底蒸汽干燥系统及方法
公开(公告)号：US20080155852A1
公开(公告)日：2008-07-03
申请号：US11967533
申请日：2007-12-31
申请人： DONALD J.K. OLGADO , Simon Yavelberg , Edwin Velaquez , Hui Chen , Sheshraj L. Tulshibagwale , Ho Seon Shin
发明人： DONALD J.K. OLGADO , Simon Yavelberg , Edwin Velaquez , Hui Chen , Sheshraj L. Tulshibagwale , Ho Seon Shin
IPC分类号： F26B25/08 , F26B3/04
CPC分类号： H01L21/67034 , H01L21/67028
摘要： Embodiments of the present invention generally relate to an apparatus and methods for rinsing and drying substrates that include multiple rinsing and drying modules. Methods for arranging drying modules to enable high-throughput rinsing and drying of multiple substrates are also provided. In one embodiment a system for drying semiconductor substrates is provided. The system comprises a housing, a first drying module positioned within the housing, and a second drying module positioned adjacent the first drying module within the housing, wherein the first and second drying modules are oriented approximately vertically within the housing.
摘要翻译：本发明的实施方案一般涉及用于冲洗和干燥包括多个漂洗和干燥模块的基材的设备和方法。还提供了用于布置干燥模块以实现多个基板的高通量冲洗和干燥的方法。在一个实施例中，提供了一种用于干燥半导体衬底的系统。所述系统包括壳体，位于所述壳体内的第一干燥模块和邻近所述壳体内的所述第一干燥模块定位的第二干燥模块，其中所述第一和第二干燥模块在所述壳体内大致垂直定向。

15. 发明申请

US20120234229A1 SUBSTRATE SUPPORT ASSEMBLY FOR THIN FILM DEPOSITION SYSTEMS 审中-公开
标题翻译：薄膜沉积系统的基板支撑组件
公开(公告)号：US20120234229A1
公开(公告)日：2012-09-20
申请号：US13419247
申请日：2012-03-13
申请人： Tuan Anh NGUYEN , Donald J.K. Olgado , David H. Quach
发明人： Tuan Anh NGUYEN , Donald J.K. Olgado , David H. Quach
IPC分类号： C30B25/12 , B23Q3/00
CPC分类号： C30B25/12 , C23C16/4583
摘要： Substrate support assemblies and deposition chambers employing such support assemblies to improve temperature uniformity during film depositions, such as epitaxial growths of group-V material stacks for LEDs. In one embodiment, the support assembly includes a first component having a first thermal resistance and a top surface upon which the substrate is to be disposed at a first location. The support assembly further includes a second component to be disposed over the first component and cover a second location of the susceptor while the substrate is disposed over the first location and having a second thermal resistance to insulate regions of the susceptor adjacent to the substrate by an amount approximating that of the substrate during a deposition process. In embodiments, the second component is removable from the first component and supports the substrate in absence of the first component during transfer of the substrate between multiple deposition systems.
摘要翻译：使用这种支撑组件的衬底支撑组件和沉积室改善膜沉积期间的温度均匀性，例如用于LED的V族材料堆叠的外延生长。在一个实施例中，支撑组件包括具有第一热阻的第一部件和顶部表面，基板将被放置在第一位置。所述支撑组件还包括第二部件，所述第二部件设置在所述第一部件上并且覆盖所述基座的第二位置，同时所述基板设置在所述第一位置上并且具有第二热阻，以使所述基座的邻近所述基板的区域绝缘在沉积过程中的量与基底的量近似。在实施例中，第二部件可从第一部件移除并且在多个沉积系统之间的衬底传送期间不存在第一部件时支撑衬底。

16. 发明申请

US20120227665A1 APPARATUS FOR MONITORING AND CONTROLLING SUBSTRATE TEMPERATURE 审中-公开
标题翻译：用于监测和控制基板温度的装置
公开(公告)号：US20120227665A1
公开(公告)日：2012-09-13
申请号：US13406058
申请日：2012-02-27
申请人： OMER OZGUN , Didier P. Florin , Donald J.K. Olgado
发明人： OMER OZGUN , Didier P. Florin , Donald J.K. Olgado
IPC分类号： B05C11/00 , H05B3/68
CPC分类号： C23C16/45565 , C23C16/4411 , C23C16/45572 , C23C16/4584 , C23C16/481 , C23C16/52
摘要： A system and methods for heating substrates during high temperature processing is provided. The system uses multiple temperature inputs of the backside of a substrate carrier and known parameters within the processing chamber to estimate the temperature of substrates being processed on the substrate carrier. Temperature readings of the substrate carrier taken from above the processing volume may be used to correct any drift that may occur with respect to temperature readings taken from below the substrate carrier. Temperature readings of heat exchanging fluid flowing through a showerhead assembly may be used to estimate the temperature of the surface of the showerhead, which may be used in the estimation of the temperature of the substrates being processed. The system then uses the estimated temperature to control the amount of power supplied to a plurality of heat sources configured to heat the substrates from below the substrate carrier.
摘要翻译：提供了一种在高温处理过程中加热基板的系统和方法。该系统使用衬底载体的背侧的多个温度输入和处理室内的已知参数来估计在衬底载体上正在处理的衬底的温度。可以使用从处理体积以上获取的衬底载体的温度读数来校正可能发生的相对于从衬底载体下方读取的温度读数的漂移。可以使用流过喷头组件的热交换流体的温度读数来估计喷头表面的温度，这可以用于估计待处理的基底的温度。然后，系统使用估计的温度来控制供应给配置为从衬底载体下方加热衬底的多个热源的功率量。

17. 发明申请

US20120108081A1 APPARATUS HAVING IMPROVED SUBSTRATE TEMPERATURE UNIFORMITY USING DIRECT HEATING METHODS 审中-公开
标题翻译：使用直接加热方法改善基板温度均匀性的装置
公开(公告)号：US20120108081A1
公开(公告)日：2012-05-03
申请号：US13282914
申请日：2011-10-27
申请人： Donald J.K. OLGADO , Tuan Anh (Mike) Nguyen , Alain Duboust
发明人： Donald J.K. OLGADO , Tuan Anh (Mike) Nguyen , Alain Duboust
IPC分类号： H01L21/26 , F27D11/12
CPC分类号： H01L21/67115 , H01L21/68764 , H01L21/68771
摘要： Embodiments of the present invention generally relate to an apparatus and methods for uniformly heating substrates in a processing chamber. In one embodiment, an apparatus generally includes a substrate supporting structure that is able to help minimize the temperature variation across each of the substrates during thermal processing. In one configuration, a substrate supporting structure is adapted to selectively support a substrate carrier to control the heat lost from regions of each of the substrates disposed on the substrate carrier. The substrate supporting structure is thus configured to provide a uniform temperature profile across each of the plurality of substrates during processing.
摘要翻译：本发明的实施例一般涉及用于在处理室中均匀加热基板的装置和方法。在一个实施例中，设备通常包括基板支撑结构，其能够帮助最小化热处理期间每个基板的温度变化。在一种配置中，衬底支撑结构适于选择性地支撑衬底载体以控制从布置在衬底载体上的每个衬底的区域中损失的热量。因此，衬底支撑结构被构造成在处理期间提供跨越多个衬底中的每一个的均匀的温度分布。

18. 发明申请

US20120064698A1 MULTIPLE SECTION SHOWERHEAD ASSEMBLY 审中-公开
标题翻译：多部分淋浴组件
公开(公告)号：US20120064698A1
公开(公告)日：2012-03-15
申请号：US13217078
申请日：2011-08-24
申请人： DONALD J.K. OLGADO
发明人： DONALD J.K. OLGADO
IPC分类号： H01L21/20 , C23C16/455
CPC分类号： C23C16/45565 , C23C16/45574 , C23C16/45576
摘要： Embodiments of the present invention generally provide a method and apparatus that may be utilized for deposition of Group III-nitride films using MOCVD and/or HVPE hardware. In one embodiment, the apparatus is a showerhead assembly made of multiple sections that are isolated from one another and attached to a top plate. Each showerhead section has separate inlets and passages for delivering separate processing gases into a processing volume of a processing chamber without mixing the gases prior to entering the processing volume. In one embodiment, each showerhead section includes a temperature control manifold for flowing a cooling fluid through the respective showerhead section. By providing multiple, isolated showerhead sections, manufacturing complexity and costs are significantly reduced as compared to conventionally manufacturing the entire showerhead from a single block or stack of plates.
摘要翻译：本发明的实施方案通常提供可用于使用MOCVD和/或HVPE硬件沉积III族氮化物膜的方法和装置。在一个实施例中，该装置是由彼此隔离并附接到顶板的多个部分制成的喷头组件。每个喷头部分具有单独的入口和通道，用于将不同的处理气体输送到处理室的处理容积中，而不会在进入处理容积之前混合气体。在一个实施例中，每个喷头部分包括用于使冷却流体流过相应的喷头部分的温度控制歧管。通过提供多个隔离的淋浴头部分，与从单个块或堆叠的板块传统地制造整个喷头相比，制造复杂性和成本显着降低。

19. 发明申请

US20110129732A1 COMPRESSED POWDER 3D BATTERY ELECTRODE MANUFACTURING 审中-公开
标题翻译：压缩粉末3D电池电极制造
公开(公告)号：US20110129732A1
公开(公告)日：2011-06-02
申请号：US12839051
申请日：2010-07-19
申请人： Robert Z. Bachrach , Sergey D. Lopatin , Connie P. Wang , Donald J.K. Olgado
发明人： Robert Z. Bachrach , Sergey D. Lopatin , Connie P. Wang , Donald J.K. Olgado
IPC分类号： H01M4/70 , H01M4/485 , H01M4/52 , H01M4/58 , H01M4/505 , H01M4/38 , H01M4/583 , B05C13/00 , B05C11/00 , B05B5/025 , B05B7/16 , B05B7/20 , B05C1/08 , B05C5/00
CPC分类号： H01M4/70 , H01M4/134 , H01M4/139 , H01M4/485 , H01M4/505 , H01M4/525 , H01M4/5825 , H01M4/587 , H01M4/661
摘要： Embodiments of the invention contemplate forming an electrochemical device and device components, such as a battery cell or supercapacitor, using thin-film or layer deposition processes and other related methods for forming the same. In one embodiment, a battery bi-layer cell is provided. The battery bi-layer cell comprises an anode structure comprising a conductive collector substrate, a plurality of pockets formed on the conductive collector substrate by conductive microstructures comprising a plurality of columnar projections, and an anodically active powder deposited in and over the plurality of pockets, an insulative separator layer formed over the plurality of pockets, and a cathode structure joined over the insulative separator.
摘要翻译：本发明的实施方案考虑使用薄膜或层沉积工艺和其它相关方法形成电化学装置和器件组件，例如电池单元或超级电容器。在一个实施例中，提供电池双层电池。电池双层电池包括阳极结构，其包括导电收集器基板，通过包括多个柱状突起的导电微结构形成在导电收集器基板上的多个凹穴以及沉积在多个凹穴中和之上的阳极活性粉末，形成在所述多个凹穴上的绝缘分离层，以及连接在所述绝缘分离器上的阴极结构。

20. 发明申请

US20110045170A1 IN-SITU DEPOSITION OF BATTERY ACTIVE LITHIUM MATERIALS BY THERMAL SPRAYING 有权
标题翻译：电喷活性锂离子电池原位沉积
公开(公告)号：US20110045170A1
公开(公告)日：2011-02-24
申请号：US12862265
申请日：2010-08-24
申请人： Quanyuan Shang , Lu Yang , Karl M. Brown , Donald J.K. Olgado , Victor Pebenito , Hooman Bolandi , Tetsuya Ishikawa , Robert Z. Bachrach , Liang-Yuh Chen
发明人： Quanyuan Shang , Lu Yang , Karl M. Brown , Donald J.K. Olgado , Victor Pebenito , Hooman Bolandi , Tetsuya Ishikawa , Robert Z. Bachrach , Liang-Yuh Chen
IPC分类号： B05D5/12 , B05C11/06
CPC分类号： H01M4/0419 , H01M4/1391
摘要： A method and apparatus for forming an electrochemical layer of a thin film battery is provided. A precursor mixture comprising electrochemically active precursor particles dispersed in a carrying medium is provided to a processing chamber and thermally treated using a combustible gas mixture also provided to the chamber. The precursor is converted to nanocrystals by the thermal energy, and the nanocrystals are deposited on a substrate. A second precursor may be blended with the nanocrystals as they deposit on the surface to enhance adhesion and conductivity.
摘要翻译：提供一种用于形成薄膜电池的电化学层的方法和装置。将包含分散在载运介质中的电化学活性前体颗粒的前体混合物提供到处理室，并使用也提供给室的可燃气体混合物进行热处理。通过热能将前体转化成纳米晶体，并将纳米晶体沉积在基底上。当第二前体沉积在表面上以增强粘附性和导电性时，可与纳米晶体共混。

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