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11. 发明授权

US08843860B2 Frame cell for shot layout flexibility 有权
标题翻译：帧单元，用于拍摄布局灵活性
公开(公告)号：US08843860B2
公开(公告)日：2014-09-23
申请号：US13409517
申请日：2012-03-01
申请人： Chin-Ming Lin , Chia-hung Huang , Chi-Ming Yang , Chin-Hsiang Lin , Yung-Cheng Chen , Chih-Wei Lin
发明人： Chin-Ming Lin , Chia-hung Huang , Chi-Ming Yang , Chin-Hsiang Lin , Yung-Cheng Chen , Chih-Wei Lin
IPC分类号： G06F17/50 , G03F7/20
CPC分类号： G03F7/70433
摘要： A method includes establishing an initial shot layout in which a number of shots are arranged in vertically aligned columns and horizontally aligned rows to cover a semiconductor wafer. At least one of a row of shots or a column of shots is shifted relative to an adjacent row or column of shots to establish at least one additional shot layout that differs from the initial shot layout in that shots in the at least one shifted row or column of shots are not aligned with the shots in the adjacent row or column of shots with which they were aligned in the initial shot layout. One of the initial shot layout and the at least one additional shot layout is selected as a final shot layout. The wafer is exposed to light using the final shot layout.
摘要翻译：一种方法包括建立初始照片布局，其中多个照片布置在垂直排列的列和水平排列的行中以覆盖半导体晶片。一排照片或一列照片中的至少一列相对于相邻的行或列发射位移，以建立与至少一个移位行中的拍摄中的初始镜头布局不同的至少一个附加镜头布局，或一列照片不与在初始镜头布局中对齐的相邻行或照片列中的镜头对齐。选择初始镜头布局和至少一个附加镜头布局之一作为最终镜头布局。使用最终镜头布局将晶片曝光。

12. 发明申请

US20140067324A1 QUALITATIVE FAULT DETECTION AND CLASSIFICATION SYSTEM FOR TOOL CONDITION MONITORING AND ASSOCIATED METHODS 有权
标题翻译：用于工具条件监测和相关方法的定性故障检测和分类系统
公开(公告)号：US20140067324A1
公开(公告)日：2014-03-06
申请号：US13603079
申请日：2012-09-04
申请人： Chia-Tong Ho , Po-Feng Tsai , Jung-Chang Chen , Tze-Liang Lee , Jo Fei Wang , Jong-I Mou , Chin-Hsiang Lin
发明人： Chia-Tong Ho , Po-Feng Tsai , Jung-Chang Chen , Tze-Liang Lee , Jo Fei Wang , Jong-I Mou , Chin-Hsiang Lin
IPC分类号： G06F15/00
CPC分类号： G05B19/4065 , G05B2219/37252 , G05B2219/45031
摘要： The present disclosure provides various methods for tool condition monitoring, including systems for implementing such monitoring. An exemplary method includes receiving data associated with a process performed on wafers by an integrated circuit manufacturing process tool; and monitoring a condition of the integrated circuit manufacturing process tool using the data. The monitoring includes evaluating the data based on an abnormality identification criterion, an abnormality filtering criterion, and an abnormality threshold to determine whether the data meets an alarm threshold. The method may further include issuing an alarm when the data meets the alarm threshold.
摘要翻译：本公开提供了用于工具状态监测的各种方法，包括用于实现这种监视的系统。一种示例性方法包括：通过集成电路制造工艺工具接收与在晶片上执行的处理相关联的数据; 以及使用该数据来监视集成电路制造工艺工具的状态。监视包括基于异常识别标准，异常过滤标准和异常阈值来评估数据，以确定数据是否满足报警阈值。该方法还可以包括当数据满足报警阈值时发出报警。

13. 发明授权

US08664622B2 System and method of ion beam source for semiconductor ion implantation 有权
标题翻译：用于半导体离子注入的离子束源的系统和方法
公开(公告)号：US08664622B2
公开(公告)日：2014-03-04
申请号：US13443994
申请日：2012-04-11
申请人： Chih-Hong Hwang , Chun-Lin Chang , Chi-Ming Yang , Chin-Hsiang Lin , Wen-Yu Ku
发明人： Chih-Hong Hwang , Chun-Lin Chang , Chi-Ming Yang , Chin-Hsiang Lin , Wen-Yu Ku
IPC分类号： H01J27/00 , A61N5/00 , G21G5/00
CPC分类号： C23C14/48 , H01J27/08 , H01J37/08 , H01J2237/082 , H01J2237/31701
摘要： An apparatus comprises an ionization chamber for providing ions during a process of ion implantation, and an electron beam source device inside the ionization chamber. The electron beam source device comprises a field emission array having a plurality of emitters for generating electrons in vacuum under an electric field.
摘要翻译：一种装置包括用于在离子注入过程中提供离子的电离室和电离室内的电子束源装置。电子束源装置包括具有多个用于在电场下在真空中产生电子的发射器的场致发射阵列。

14. 发明申请

US20140033159A1 Method of Optimizing Design for Manufacturing (DFM) 有权
标题翻译：优化制造设计的方法（DFM）
公开(公告)号：US20140033159A1
公开(公告)日：2014-01-30
申请号：US13559081
申请日：2012-07-26
申请人： Keuing Hui , Yen-Wei Cheng , Yen-Di Tsen , Jong-I Mou , Chin-Hsiang Lin
发明人： Keuing Hui , Yen-Wei Cheng , Yen-Di Tsen , Jong-I Mou , Chin-Hsiang Lin
IPC分类号： G06F17/50
CPC分类号： G06F17/5068 , G06F2217/12 , Y02P90/265
摘要： The present disclosure describes a method of optimizing a design for manufacture (DFM) simulation. The method includes receiving an integrated circuit (IC) design data having a feature, receiving a process data having a parameter or a plurality of parameters, performing the DFM simulation, and optimizing the DFM simulation. The performing the DFM simulation includes generating a simulation output data using the IC design data and the process data. The optimizing the DFM simulation includes generating a performance index of the parameter or the plurality of parameters by the DFM simulation. The optimizing the DFM simulation includes adjusting the parameter or the plurality of parameters at outer loop, middle loop, and the inner loop. The optimizing the DFM simulation also includes locating a nadir of the performance index of the parameter or the plurality of parameters over a range of the parameter or the plurality of parameters.
摘要翻译：本公开描述了优化用于制造（DFM）仿真的设计的方法。该方法包括接收具有特征的集成电路（IC）设计数据，接收具有参数或多个参数的处理数据，执行DFM仿真和优化DFM仿真。执行DFM模拟包括使用IC设计数据和过程数据生成模拟输出数据。优化DFM模拟包括通过DFM仿真生成参数或多个参数的性能指标。优化DFM模拟包括调整外循环，中间循环和内循环的参数或多个参数。优化DFM模拟还包括在参数或多个参数的范围内定位参数或多个参数的性能指标的最低点。

15. 发明授权

US08605276B2 Enhanced defect scanning 有权
标题翻译：增强缺陷扫描
公开(公告)号：US08605276B2
公开(公告)日：2013-12-10
申请号：US13286617
申请日：2011-11-01
申请人： Chih-Jen Wu , Chen-Ming Huang , Kuan-Chieh Huang , Chi-Yuan Shih , Chin-Hsiang Lin
发明人： Chih-Jen Wu , Chen-Ming Huang , Kuan-Chieh Huang , Chi-Yuan Shih , Chin-Hsiang Lin
IPC分类号： G01N21/00 , G01N21/95
CPC分类号： G01N21/9501 , G01N21/278 , G01N21/94 , G01N2021/8822 , G01N2021/8825
摘要： One of the broader forms of the present disclosure involves a method of enhanced defect inspection. The method includes providing a substrate having defect particles and providing a fluid over the substrate and the defect particles, the fluid having a refractive index greater than air. The method further includes exposing the substrate and the defect particles to incident radiation through the fluid, and detecting, through the fluid, radiation reflected or scattered by the defect particles.
摘要翻译：本公开的更广泛形式之一涉及增强缺陷检查的方法。该方法包括提供具有缺陷颗粒的基底并在基底和缺陷颗粒上提供流体，该流体的折射率大于空气。该方法还包括将衬底和缺陷颗粒暴露于通过流体的入射辐射，以及通过流体检测由缺陷颗粒反射或散射的辐射。

16. 发明申请

US20130322990A1 LOADPORT BRIDGE FOR SEMICONDUCTOR FABRICATION TOOLS 有权
标题翻译：半导体制造工具的负载桥
公开(公告)号：US20130322990A1
公开(公告)日：2013-12-05
申请号：US13486024
申请日：2012-06-01
申请人： Shih-Hung CHEN , Ying XIAO , Chin-Hsiang LIN
发明人： Shih-Hung CHEN , Ying XIAO , Chin-Hsiang LIN
IPC分类号： H01L21/677
CPC分类号： H01L21/6773 , H01L21/67733 , H01L21/67775
摘要： A wafer handling system with apparatus for transporting wafers between semiconductor fabrication tools. In one embodiment, the apparatus is a loadport bridge mechanism including an enclosure having first and second mounting ends, a docking port at each end configured and dimensioned to interface with a loadport of a semiconductor tool, and at least one wafer transport robot operable to transport a wafer between the docking ports. The wafer transport robot hands off or receives a wafer to/from a tool robot at the loadports of a first and second tool. The bridge mechanism allows one or more wafers to be transferred between loadports of different tools on an individual basis without reliance on the FAB's automated material handling system (AMHS) for bulk wafer transport inside a wafer carrier such as a FOUP or others.
摘要翻译：一种具有用于在半导体制造工具之间传输晶片的装置的晶片处理系统。在一个实施例中，该装置是装载端口机构，其包括具有第一和第二安装端的外壳，每个端部处的对接端口被构造和尺寸设计成与半导体工具的承载端口相接合，以及至少一个可运输的晶片传送机械手在对接端口之间的晶片。晶片传送机器人在第一和第二工具的载荷端口移动或接收来自工具机器人的晶片。桥接机构允许一个或多个晶片在不同工具的载荷端口之间单独传输，而不依赖于FAB的自动化材料处理系统（AMHS），用于在诸如FOUP或其它晶片载体之间的体晶片传输。

17. 发明申请

US20130270454A1 SYSTEM AND METHOD OF ION BEAM SOURCE FOR SEMICONDUCTOR ION IMPLANTATION 有权
标题翻译：用于半导体离子植入的离子束源的系统和方法
公开(公告)号：US20130270454A1
公开(公告)日：2013-10-17
申请号：US13443994
申请日：2012-04-11
申请人： Chih-Hong HWANG , Chun-Lin CHANG , Chi-Ming YANG , Chin-Hsiang LIN , Wen-Yu KU
发明人： Chih-Hong HWANG , Chun-Lin CHANG , Chi-Ming YANG , Chin-Hsiang LIN , Wen-Yu KU
IPC分类号： C23C14/48 , H01J27/02
CPC分类号： C23C14/48 , H01J27/08 , H01J37/08 , H01J2237/082 , H01J2237/31701
摘要： An apparatus comprises an ionization chamber for providing ions during a process of ion implantation, and an electron beam source device inside the ionization chamber. The electron beam source device comprises a field emission array having a plurality of emitters for generating electrons in vacuum under an electric field.
摘要翻译：一种装置包括用于在离子注入过程中提供离子的电离室和电离室内的电子束源装置。电子束源装置包括具有多个用于在电场下在真空中产生电子的发射器的场致发射阵列。

18. 发明申请

US20130252175A1 Litho Cluster and Modulization to Enhance Productivity 有权
标题翻译： Litho集群和模块化以提高生产力
公开(公告)号：US20130252175A1
公开(公告)日：2013-09-26
申请号：US13429921
申请日：2012-03-26
申请人： I-Hsiung Huang , Heng-Hsin Liu , Heng-Jen Lee , Chin-Hsiang Lin
发明人： I-Hsiung Huang , Heng-Hsin Liu , Heng-Jen Lee , Chin-Hsiang Lin
IPC分类号： G03F7/20 , H01L21/00
CPC分类号： G03F7/30 , G03F7/16 , G03F7/70991 , H01L21/67225 , H01L21/67745
摘要： The present disclosure relates to a lithographic tool arrangement for semiconductor workpiece processing. The lithographic tool arrangement groups lithographic tools into clusters, and selectively transfers a semiconductor workpiece between a plurality of lithographic tools of a first type in a first cluster to a plurality of lithographic tools of a second type in a second cluster. The selective transfer is achieved though a transfer assembly, which is coupled to a defect scan tool that identifies defects generated in the lithographic tool of the first type. The disclosed lithographic tool arrangement also utilizes shared structural elements such as a housing assembly, and shared functional elements such as gases and chemicals. The lithographic tool arrangement may consist of baking, coating, exposure, and development units configured to provide a modularization of these various components in order to optimize throughput and efficiency for a given lithographic fabrication process.
摘要翻译：本公开涉及一种用于半导体工件加工的平版印刷工具装置。光刻工具装置将光刻工具组合成簇，并且将半导体工件在第一簇中的第一类型的多个光刻工具之间选择性地传输到第二簇中的第二类型的光刻工具。通过转移组件实现选择性转移，转移组件耦合到识别第一类型的光刻工具中产生的缺陷的缺陷扫描工具。所公开的平版印刷工具装置还利用共同的结构元件，例如壳体组件和诸如气体和化学品的共享功能元件。光刻工具装置可以包括被配置成提供这些各种部件的模块化的烘烤，涂覆，曝光和显影单元，以便为给定的光刻制造工艺优化产量和效率。

19. 发明授权

US08541270B2 Finlike structures and methods of making same 有权
公开(公告)号：US08541270B2
公开(公告)日：2013-09-24
申请号：US13269107
申请日：2011-10-07
申请人： Ming-Hsi Yeh , Chi-Ming Yang , Chin-Hsiang Lin
发明人： Ming-Hsi Yeh , Chi-Ming Yang , Chin-Hsiang Lin
IPC分类号： H01L21/336
CPC分类号： H01L29/66818 , H01L29/66795
摘要： Semiconductor materials, particularly III-V materials used to form, e.g., a finlike structure can suffer structural damage during chemical mechanical polishing steps. This damage can be reduced or eliminated by oxidizing the damaged surface of the material and then etching away the oxidized material. The etching step can be accomplished simultaneously with a step of etching back a patterned oxide layers, such as a shallow trench isolation layer.

20. 发明申请

US20130230375A1 AUTOMATED MATERIAL HANDLING SYSTEM AND METHOD FOR SEMICONDUCTOR MANUFACTURING 有权
标题翻译：自动化材料处理系统及半导体制造方法
公开(公告)号：US20130230375A1
公开(公告)日：2013-09-05
申请号：US13409540
申请日：2012-03-01
申请人： Chi-Feng TUNG , Mao-Lin Kao , Hsiang-Yin Shen , Chin-Hsiang Lin
发明人： Chi-Feng TUNG , Mao-Lin Kao , Hsiang-Yin Shen , Chin-Hsiang Lin
IPC分类号： B66F11/00
CPC分类号： H01L21/67706 , H01L21/67727 , H01L21/6773 , H01L21/67733
摘要： A rail transport system and method for a semiconductor fabrication facility (FAB). In one embodiment, the system includes a network of stationary rails and a wheeled vehicle movable on the rails via rolling movement. The vehicle is operable to hold a wafer carrier that stores a plurality of wafers. A cross-floor transport system is provided that may include a vehicle lifter positioned near the network of rails that extends between a first elevation and a second elevation in the FAB. The lifter is configured and operable to receive the vehicle from rails at the first elevation and vertically transport the vehicle to rails at the second elevation without removing the wafer carrier from the wheeled vehicle. In one embodiment, the lifter is configured so that the vehicle may be rolled directly onto and off of the lifter for vertical transport.
摘要翻译：一种用于半导体制造设备（FAB）的轨道运输系统和方法。在一个实施例中，该系统包括固定轨道网络和通过滚动运动可在轨道上移动的轮式车辆。车辆可操作地保持存储多个晶片的晶片载体。提供了一种十字架传送系统，其可以包括定位在轨道网络附近的车辆升降机，其在FAB中在第一高度和第二高度之间延伸。提升器被构造和操作以在第一高度处从轨道接收车辆，并且在第二高度处将车辆垂直地运输到轨道，而不从轮式车辆移除晶片载体。在一个实施例中，升降机被构造成使得车辆可以直接滚动到升降机上并且用于垂直运输。

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