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    • 11. 发明授权
    • Flat panel display using silicon light-emitting device
    • 平板显示器采用硅发光器件
    • US07462982B2
    • 2008-12-09
    • US10752560
    • 2004-01-08
    • Byoung-lyong ChoiEun-kyung LeeJun-young Kim
    • Byoung-lyong ChoiEun-kyung LeeJun-young Kim
    • H01L33/00
    • H01L27/156
    • A flat panel display is provided. The flat panel display includes a silicon light-emitting device panel having a two-dimensional array of silicon light-emitting devices formed on an n- or p-type silicon-based substrate, and a fluorescent layer formed on the front surface of the silicon light-emitting device panel and emitting visible light after being excited by light emitted from the silicon light-emitting devices, wherein each of the silicon light-emitting devices comprises: a doping region formed on a surface of the substrate in such a way that the substrate is doped with a predetermined dopant of the opposite type to the substrate to a depth so that recombination of electron-hole pairs by quantum confinement effect at a p-n junction leads to light emission; and electrodes patterned on the substrate to allow the silicon light-emitting devices to emit light according to an image signal. The flat panel display includes the low-priced silicon light-emitting device panel having a two dimensional array of the silicon light-emitting devices formed on the inexpensive silicon-based substrate through series semiconductor manufacture processes. Therefore, the flat panel display can be manufactured at low cost. Furthermore, unlike a plasma display panel, a high voltage or a gas sealing process for discharge is not required, thereby increasing stability and reliability.
    • 提供平板显示器。 平板显示器包括具有形成在n型或p型硅基衬底上的硅发光器件的二维阵列的硅发光器件面板和形成在硅的前表面上的荧光层 发光器件面板,并且在从所述硅发光器件发射的光激发之后发射可见光,其中每个所述硅发光器件包括:在所述衬底的表面上形成的掺杂区域, 衬底以与衬底相反的类型的预定掺杂剂掺杂到深度,使得通过在pn结处的量子限制效应的电子 - 空穴对的复合导致发光; 以及在基板上图案化的电极,以允许硅发光器件根据图像信号发光。 平板显示器包括具有通过串联半导体制造工艺在便宜的硅基基板上形成的硅发光器件的二维阵列的低价硅发光器件面板。 因此,可以以低成本制造平板显示器。 此外,与等离子体显示面板不同,不需要用于放电的高电压或气体密封处理,从而提高稳定性和可靠性。
    • 14. 发明授权
    • Silicon light-receiving device
    • 硅光接收装置
    • US07253491B2
    • 2007-08-07
    • US10502765
    • 2002-10-16
    • Eun-Kyung LeeByoung-Lyong ChoiJun-Young Kim
    • Eun-Kyung LeeByoung-Lyong ChoiJun-Young Kim
    • H01L31/06H01L27/14H01L31/00
    • H01L31/028H01L31/035281H01L31/068H01L31/103Y02E10/547
    • A silicon light-receiving device is provided. In the device, a substrate is based on n-type or p-type silicon. A doped region is ultra-shallowly doped with the opposite type dopant to the dopant type of the substrate on one side of the substrate so that a photoelectric conversion effect for light in a wavelength range of 100-1100 nm is generated by a quantum confinement effect in the p-n junction with the substrate. First and second electrodes are formed on the substrate so as to be electrically connected to the doped region. Due to the ultra-shallow doped region on the silicon substrate, a quantum confinement effect is generated in the p-n junction. Even though silicon is used as a semiconductor material, the quantum efficiency of the silicon light-receiving device is far higher than that of a conventional solar cell, owing to the quantum confinement effect. The silicon light-receiving device can also be formed to absorb light in a particular or large wavelength band, and used as a solar cell.
    • 提供硅光接收装置。 在该器件中,衬底基于n型或p型硅。 掺杂区域在衬底的一侧上与衬底的掺杂剂类型相反的掺杂剂超浅掺杂,使得通过量子限制效应产生在100-1100nm的波长范围内的光的光电转换效应 在与基板的pn结中。 第一和第二电极形成在衬底上,以便与掺杂区电连接。 由于硅衬底上的超浅掺杂区域,在p-n结中产生量子限制效应。 即使使用硅作为半导体材料,由于量子限制效应,硅光接收装置的量子效率远远高于常规太阳能电池的量子效率。 硅光接收装置也可以形成为吸收特定或大波长带中的光,并用作太阳能电池。
    • 18. 发明授权
    • Light emitting and/or detecting device and method of manufacturing the same
    • 发光和/或检测装置及其制造方法
    • US07112862B2
    • 2006-09-26
    • US10965203
    • 2004-10-15
    • Eun-kyung LeeByoung-lyong ChoiJun-young Kim
    • Eun-kyung LeeByoung-lyong ChoiJun-young Kim
    • H01L31/00
    • H01L31/107H01L31/105H01L33/34
    • A light emitting and detecting device and a method of manufacturing the same are provided. The method includes forming an insulating layer on a substrate doped with an n-type dopant or a p-type dopant, and removing a portion of the insulating layer to expose a predetermined area of the substrate; forming a doping layer doped with an opposite dopant to the dopant of the substrate by applying a dopant on the exposed area of the substrate and heat treating the substrate to create a light conversion effect in a p-n junction between the substrate and the doping layer; and forming first and second electrodes on the substrate to electrically connect the doping layer. Thus, it is possible to control the diffusion depth of the doping layer with opposite dopant to the substrate in the substrate.
    • 提供一种发光和检测装置及其制造方法。 该方法包括在掺杂有n型掺杂剂或p型掺杂剂的衬底上形成绝缘层,以及去除绝缘层的一部分以暴露衬底的预定区域; 通过在所述衬底的所述暴露区域上施加掺杂剂并对所述衬底进行热处理以在所述衬底和所述掺杂层之间的p-n结中产生光转换效应,从而在衬底的掺杂剂上形成掺杂有相反掺杂剂的掺杂层; 以及在所述衬底上形成第一和第二电极以电连接所述掺杂层。 因此,可以将衬底中与衬底相反的掺杂剂的掺杂层的扩散深度控制。