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161. 发明授权

EP1443126B1 SILICON MONOXIDE VAPOR DEPOSITION MATERIAL AND METHOD FOR PREPARATION THEREOF 有权
标题翻译：材料一氧化硅的汽分离及其制造方法
公开(公告)号：EP1443126B1
公开(公告)日：2008-05-07
申请号：EP02765557.0
申请日：2002-09-13
申请人： OSAKA Titanium Technologies Co., Ltd.
发明人： NISHIOKA, Kazuo
IPC分类号： C23C14/24 , C01B33/113
CPC分类号： C23C14/24 , C23C14/10 , C23C14/225
摘要： In a method for preparing a silicon monoxide vapor deposition material wherein a mixture of a silicon powder and a silicon dioxide powder is heated and reacted in a raw material chamber under vacuum to generate a silicon monoxide gas and silicon monoxide is precipitated on a precipitation substrate in a precipitation chamber provided above the raw material chamber, an improvement which comprises using, as the precipitation substrate, a cylindrical body wherein a circumference wall is inclined from the perpendicular by 1 to 45 degrees and the inner diameter of the upper end thereof is smaller than that of the lower end, and effecting the precipitation under a vacuum of 7 Pa to 40 Pa. The method allows the preparation of a silicon monoxide vapor deposition material exhibiting a weight reduction rate in the rattler test a rattler value of 1.0 % or less and being reduced in the occurrence of the splash phenomenon during the formation of a silicon monoxide vapor deposition film.

162. 发明公开

EP1861924A1 PIEZOELECTRIC THIN FILM RESONATOR 有权
标题翻译：压电薄膜谐振器及其制造方法
公开(公告)号：EP1861924A1
公开(公告)日：2007-12-05
申请号：EP06717125.6
申请日：2006-03-23
申请人： RADI MEDICAL SYSTEMS AB
发明人： KATARDJIEV, Ilia , WINGQVIST, Gunilla , BJURSTRÖM, Johan
IPC分类号： H03H3/02 , H01L41/24
CPC分类号： H01L41/316 , C23C14/0617 , C23C14/086 , C23C14/225 , H03H3/02
摘要： A method of producing a polycrystalline film of a metal compound, AlN or ZnO, on a substrate with a non-zero mean tilt of the c-axis relative to the surface normal of the substrate, is disclosed. The method comprises deposition of crystallites of said compound onto the substrate that has a suitable surface for crystal growth with tilted c-axis relative to the surface normal by operating a deposition system designed for sputtering of metal atoms from a target, in a gas mixture of inert gas and nitrogen or oxygen, respectively, at a process pressure such that the mean free path of sputtered metal atoms is comparable or larger than the target to substrate distance, the geometry of the deposition system being such that there exists at least one arbitrary area on the substrate where the distribution of the depositing flux is asymmetric relative to the surface normal at that area. A piezoelectric shear wave resonator comprising the polycrystalline film, especially for use in a liquid medium for mass loading and/or viscosity measurements and/or pressure measurements, and particularly for use as a biosensor or a pressure sensor, is also described

163. 发明公开

EP1761212A2 POROUS COATINGS FOR BIOMEDICAL IMPLANTS 审中-公开
标题翻译：多孔涂层的生物医学植入物
公开(公告)号：EP1761212A2
公开(公告)日：2007-03-14
申请号：EP05763826.4
申请日：2005-06-28
申请人： Isoflux, Inc.
发明人： GLOCKER, David, A. , ROMACH, Mark, M.
IPC分类号： A61F2/28 , B05D1/06
CPC分类号： C23C14/225 , A61F2/30767 , A61F2002/30929 , A61F2002/3098 , A61F2310/00407 , A61F2310/00449 , A61F2310/00485 , A61F2310/00497 , A61F2310/00544 , A61F2310/0088 , A61F2310/0097 , A61L27/306
摘要： A medical implant has a microscopically rough outer coating that serves to bond the implant to animal tissue. The coating is applied to the implant by physical vapor deposition. The coating preferable is applied via a generally oblique coating flux or a low energy coating flux. In some embodiments, the coating has pores. The pores can contain a drug, which can diffuse over a period of time. The coating may be partially nonporous to protect the implant from corrosion. The coating can have an outer porous layer that can bond with animal tissue easily.

164. 发明公开

EP1735847A2 BIAXIALLY-TEXTURED FILM DEPOSITION FOR SUPERCONDUCTOR COATED TAPES 有权
标题翻译：双轴结构的膜沉积超导体涂层带
公开(公告)号：EP1735847A2
公开(公告)日：2006-12-27
申请号：EP05856601.9
申请日：2005-04-08
申请人： Superpower, Inc.
发明人： XIONG, Xuming , SELVAMANICKAM, Venkat
IPC分类号： H01L39/24
CPC分类号： C23C14/30 , C23C14/08 , C23C14/225 , C23C14/48 , H01L39/2461 , Y10S428/93 , Y10S505/73
摘要： Methods for depositing, at a very high deposition rate, a biaxially-textured film on a continuously moving metal tape substrate are disclosed. These methods comprise: depositing a film on the substrate with a deposition flux having an oblique incident angle of about 5° to about 80° from the substrate normal, while simultaneously bombarding the deposited film using an ion beam at an ion beam incident angle arranged along either a best ion texture direction of the film or along a second best ion texture direction of the film, thereby forming the biaxially-textured film wherein a deposition flux incident plane is arranged parallel to a direction along which the biaxially-textured film has a fast in-plane growth rate. Superconducting articles comprising a substrate, a biaxially-textured film deposited on said substrate by said methods above; and superconducting layer disposed on the biaxially-textured film are also disclosed.

165. 发明公开

EP1670966A1 VAPOUR DEPOSITION METHOD 有权
标题翻译： DAMPFABSCHEIDUNGSVERFAHREN
公开(公告)号：EP1670966A1
公开(公告)日：2006-06-21
申请号：EP04768789.2
申请日：2004-10-08
申请人： THE UNIVERSITY OF SOUTHAMPTON
发明人： Guerin, Samuel , Hayden, Brian Elliott
IPC分类号： C23C14/04 , B01J19/00 , C23C16/04
CPC分类号： C23C14/225 , C23C14/044
摘要： In a vapour deposition method which can be used to deposit mixtures of materials in progressively varying amounts on a substrate (1) and which can be used for a variety of purposes, but is of especial value in combinatorial chemistry, the path of the vaporised material from the source (3) to the substrate (1) is partially interrupted by a mask (5), the positioning of the mask in a plane parallel to the plane defined by the substrate (1) being such that the material is deposited on the substrate (1) in a thickness which increases substantially continuously in a direction along the substrate (1).

166. 发明公开

EP1577417A1 Multi-component deposition 有权
标题翻译：多组分沉积
公开(公告)号：EP1577417A1
公开(公告)日：2005-09-21
申请号：EP05251682.0
申请日：2005-03-18
申请人： UNITED TECHNOLOGIES CORPORATION
发明人： Belousov, Igor V. , Kuzmichev, Anatoly I. , Biber, Vladimir , Memmen, Robert L.
IPC分类号： C23C14/32 , C23C14/34 , F01D5/00
CPC分类号： C23C14/16 , B23P6/007 , C23C14/22 , C23C14/225 , C23C14/32 , C23C14/54 , C23C14/548 , F01D5/005 , F05D2230/313 , F05D2230/80 , H01J37/32935 , H01J37/34 , H01J2237/3137
摘要： Ion-enhanced physical vapor deposition is augmented by sputtering to deposit multi-component materials. The process may be used to deposit coatings and repair material on Ti alloy turbine engine parts. The physical vapor deposition may be ion-enhanced electron beam physical vapor deposition. An apparatus for carrying out the process comprises a source 112 for material to be deposited and one or more sputter targets 220.

167. 发明公开

EP1119017A2 Vault shaped target and high-field magnetron 审中-公开
标题翻译： GewölbtesTarget和Magnetron mit starkem Feld
公开(公告)号：EP1119017A2
公开(公告)日：2001-07-25
申请号：EP01300337.1
申请日：2001-01-16
申请人： APPLIED MATERIALS, INC.
发明人： Gopalraja, Parburam , Fu, Jianming , Chen, Fusen , Dixit, Girish , Xu, Zheng , Athreya, Sankaram , Wang, Wei D. , Sinha, Ashok K.
IPC分类号： H01J37/34
CPC分类号： H01L21/76844 , C23C14/046 , C23C14/165 , C23C14/185 , C23C14/225 , C23C14/35 , H01J37/3405 , H01J37/342 , H01J37/3423 , H01J37/3452 , H01J37/3455 , H01J37/3458 , H01L21/2855 , H01L21/76805 , H01L21/76843 , H01L21/76862 , H01L21/76865 , H01L21/76873 , H01L2221/1089
摘要： The disclosure relates to a target and magnetron for a plasma sputter reactor (10). The target (12) has an annular vault (18) facing the wafer (20) to be sputter coated. Various types of magnetic means positioned around the vault create a magnetic field supporting a plasma extending over a large volume of the vault. Preferably, the magnetron (14) includes annular magnets (32) of opposed polarities disposed behind the two vault sidewalls (22, 24) and a small closed unbalanced magnetron of nested magnets (30) of opposed polarities scanned along the vault roof. An integrated copper via filling process with the inventive reactor or other reactor includes a first step of highly ionized sputter deposition of copper, which can optionally be used to remove the barrier layer at the bottom of the via, a second step of more neutral, lower-energy sputter deposition of copper to complete the seed layer, and a third step of electroplating copper into the hole to complete the metallization. The first two steps can be also used with barrier metals.
摘要翻译：本公开涉及用于等离子体溅射反应器（10）的靶和磁控管。目标（12）具有面向要被溅射涂覆的晶片（20）的环形拱顶（18）。位于拱顶周围的各种类型的磁性装置产生一个支撑等离子体的磁场，该等离子体延伸在大容积的拱顶上。优选地，磁控管（14）包括设置在两个拱顶侧壁（22,24）后面的相对极性的环形磁体（32）和沿着拱顶顶部扫描的具有相对极性的嵌套磁体（30）的小闭合不平衡磁控管。与本发明的反应器或其他反应器的集成铜通孔填充方法包括铜的高度离子化溅射沉积的第一步骤，其可任选地用于去除通孔底部的阻挡层，第二步更中性，更低能够充分地溅射沉积铜以完成种子层，以及将铜电镀到孔中以完成金属化的第三步骤。前两个步骤也可以与阻隔金属一起使用。

168. 发明公开

EP1027172A1 PROTECTIVE OVERCOAT FOR REPLICATED DIFFRACTION GRATINGS 有权
标题翻译： SCHUTZÜBERZUGFÜRWIEDERHOLTES BEUGUNGSGITTER
公开(公告)号：EP1027172A1
公开(公告)日：2000-08-16
申请号：EP98939909.2
申请日：1998-08-11
申请人： Cymer, Inc.
发明人： MORTON, Richard, G.
IPC分类号： B05D5/06 , C23C14/24 , C23C14/46 , G02B5/18
CPC分类号： H01S3/225 , C23C14/0694 , C23C14/16 , C23C14/225 , C23C14/24 , G02B1/105 , G02B1/14 , G02B5/1838 , G02B5/1847 , G02B5/1852 , G02B5/1861 , G03F7/70025 , G03F7/70041 , G03F7/70558 , G03F7/70575 , H01S3/03
摘要： An overcoat protected diffraction grating. A replica grating having a thin aluminum reflective grating surface is produced by replication of a master grating or a submaster grating. The thin aluminum reflective surface may be craked or have relatively thick grain boundaries containing oxides and hydroxides of aluminum and typically is also naturally coated with an aluminum oxide film. The grating is subsequently recoated in a vacuum chamber with a thin, pure, dense aluminum overcoat and then also in the vacuum the aluminun overcoat is coated with a thin film of MgF2. The grating is especially suited for use for wavelength selection in an ArF laser operating producing an ultraviolet laser beam at a wavelength of about 193 nm. The oxygen free aluminum overcoat prevents the ultraviolet light from causing damage by stimulating chemical reactions in grating materials under the aluminum grating surface or in the aluminum overcoat oxide film. The MgF2 additionally prevents oxidation on the surface of the aluminum overcoat.
摘要翻译：外涂保护衍射光栅。具有薄铝反射光栅表面的复制光栅通过主光栅或子光栅的复制产生。薄的铝反射表面可能是破裂的或具有含有氧化物和铝的氢氧化物的相对较厚的晶界，并且通常也自然地涂覆有氧化铝膜。随后在具有薄的，纯的，致密的铝外涂层的真空室中重新涂覆光栅，然后在真空中，铝外涂层涂覆有MgF 2的薄膜。该光栅特别适用于在大约193nm波长下产生紫外激光束的ArF激光器中进行波长选择。无氧铝外套防止紫外线通过在铝光栅表面或氧化铝膜下的光栅材料中刺激化学反应而引起损伤。 MgF2另外防止铝外套的表面氧化。

169. 发明授权

EP0598660B1 Vitrage à propriétés de transmission variant avec l'incidence 失效
标题翻译：有与光的入射变化传输特性窗玻璃
公开(公告)号：EP0598660B1
公开(公告)日：1998-01-07
申请号：EP93402782.2
申请日：1993-11-16
申请人： SAINT-GOBAIN VITRAGE
发明人： Macquart, Philippe , Bernard, Claude
IPC分类号： C03C17/09 , C03C17/06 , C23C14/18
CPC分类号： C23C14/225 , C03C17/06 , C03C17/09 , C03C17/245 , C03C17/36 , C03C17/3605 , C03C17/3642 , C03C2217/21 , C03C2217/25 , C03C2217/27 , C03C2218/154 , C23C14/35

170. 发明公开

EP0645468A1 Crystal-oriented thin film manufacturing apparatus 失效
标题翻译： Vorrichtung zur Herstellung eines kristallorientiertenDünnfilms。
公开(公告)号：EP0645468A1
公开(公告)日：1995-03-29
申请号：EP94307036.7
申请日：1994-09-27
申请人： MITUBA ELECTRIC MFG. CO., LTD. , NATIONAL RESEARCH INSTITUTE FOR METALS
发明人： Fukutomi, Masao Nat. Research Inst. for Metals , Aoki, Shigeki Nat. Research Inst. for Metals , Komori, Kazunori Nat. Research Inst. for Metals , Asano, Toshihisa Nat. Research Inst. for Metals , Tanaka, Yoshiaki Nat. Research Inst. for Metals , Maeda, Hiroshi Nat. Research Inst. for Metals
IPC分类号： C23C14/34 , C23C14/08
CPC分类号： C23C14/345 , C23C14/083 , C23C14/225 , C23C14/34 , C23C14/50 , C30B23/002
摘要： A substrate electrode (1) having a plurality of substrate holders (2) capable of causing a substrate to tilt by an arbitrary angle ϑ relative to the horizontal plane is provided. A plurality of auxiliary electrodes (3) are arranged substantially vertically below the substrate electrode and between the substrate electrode (1) and a target (4). The substrate electrode (1) and the auxiliary electrodes (3) are electrically insulated from the target (4). Bias voltage applied to the substrate electrode (1) and the auxiliary electrodes (3) causes the plasma boundary (5) between the cathode dark space and the negative glow to form a cathodic plasma space having a parabolic section, thus forming a crystal-oriented thin film on the substrate surface.
摘要翻译：提供了具有能够使基板相对于水平面倾斜任意角度θ的多个基板保持件（2）的基板电极（1）。多个辅助电极（3）基本上垂直地设置在基板电极下方以及基板电极（1）和目标（4）之间。基板电极（1）和辅助电极（3）与靶（4）电绝缘。施加到基板电极（1）和辅助电极（3）的偏压使阴极暗区和负辉光之间的等离子体边界（5）形成具有抛物面的阴极等离子体空间，从而形成晶体取向薄膜在基材表面上。

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