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161. 发明授权

US06477193B2 Extreme repetition rate gas discharge laser with improved blower motor 失效
标题翻译：极端重复率气体放电激光器与改进的鼓风机电机
公开(公告)号：US06477193B2
公开(公告)日：2002-11-05
申请号：US09748316
申请日：2000-12-22
申请人： I. Roger Oliver , William N. Partlo
发明人： I. Roger Oliver , William N. Partlo
IPC分类号： H01S322
CPC分类号： H01S3/225 , G03F7/70025 , G03F7/70041 , G03F7/70333 , G03F7/70483 , G03F7/70575 , G03F7/70933 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/0404 , H01S3/041 , H01S3/097 , H01S3/09702 , H01S3/0971 , H01S3/0975 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/134 , H01S3/22 , H01S3/2207 , H03K3/57 , H03K17/80
摘要： A gas discharge laser capable of operating at pulse rates in the range of 4,000 Hz to 6,000 Hz at pulse energies in the range of 5 mJ to 10 mJ or greater. Important improvements over prior art designs include: (1) a squirrel cage type fan for producing gas velocities through the discharge region of more than 67 m/s and capable of continuous trouble-free operation for several months, (2) a liquid cooled drive motor having a low loss sealing member separating the motor rotor from the motor starter and protecting the motor from the laser gas and a breach detection device for detecting any breach of the sealing member, (3) a heat exchanger system capable of removing in excess of 16 kw of heat energy from the laser gas and (4) a pulse power system capable of providing precisely controlled electrical pulses to the electrodes needed to produce laser pulses at the desired pulse energies in the range of 5 mJ to 10 mJ or greater at pulse repetition rates in the range of 4,000 Hz to 6,000 Hz or greater.
摘要翻译：一种气体放电激光器，能够以5mJ至10mJ或更大的脉冲能量在4000Hz至6,000Hz的脉冲频率下工作。与现有技术设计相比，重要的改进包括：（1）用于通过超过67m / s的排放区域产生气体速度并能够连续无故障运行数月的鼠笼式风扇，（2）液冷驱动电动机具有低损耗密封构件，其将电动机转子与电动机起动器分离并保护电动机免受激光气体的影响;以及用于检测任何泄漏密封构件的泄漏检测装置，（3）能够超过来自激光气体的16kw的热能和（4）脉冲电力系统，其能够在脉冲处产生在5mJ至10mJ或更大的范围内的期望脉冲能量处产生激光脉冲所需的精确控制的电脉冲重复率在4000Hz至6000Hz或更大的范围内。

162. 发明授权

US06452199B1 Plasma focus high energy photon source with blast shield 失效
标题翻译：等离子体聚焦高能光子源与防风罩
公开(公告)号：US06452199B1
公开(公告)日：2002-09-17
申请号：US09442582
申请日：1999-11-18
申请人： William N. Partlo , Igor V. Fomenkov , Daniel L. Birx
发明人： William N. Partlo , Igor V. Fomenkov , Daniel L. Birx
IPC分类号： G21G400
CPC分类号： H05G2/003 , B82Y10/00 , G03F7/70033 , G03F7/70166 , G03F7/70916 , H05G2/005
摘要： A high energy photon source. A pair of plasma pinch electrodes are located in a vacuum chamber. The chamber contains a working gas which includes a noble buffer gas and an active gas chosen to provide a desired spectral line. A pulse power source provides electrical pulses at voltages high enough to create electrical discharges between the electrodes to produce very high temperature, high density plasma pinches in the working gas providing radiation at the spectral line of the active gas. A blast shield positioned just beyond the location of the high density pinch provides a physical barrier which confines the pinch limiting its axial elongation. A small port is provided in the blast shield that permits the radiation but not the plasma to pass through the shield. In a preferred embodiment a surface of the shield facing the plasma is dome-shaped.
摘要翻译：高能光子源。一对等离子体夹紧电极位于真空室中。该室包含工作气体，其包括贵重缓冲气体和被选择用于提供所需光谱线的活性气体。脉冲电源以足够高的电压提供电脉冲，以在电极之间产生放电，以在工作气体中产生非常高温度，高密度的等离子体夹持，从而在活性气体的谱线处提供辐射。位于刚刚超出高密度夹点位置的防爆罩提供了限制其限制其轴向伸长的夹紧的物理屏障。防爆罩中设有一个允许辐射而不是等离子体通过防护罩的小型端口。在优选实施例中，面向等离子体的屏蔽的表面是圆顶形的。

163. 发明授权

US06327286B1 High speed magnetic modulator voltage and temperature timing compensation circuit 有权
标题翻译：高速磁调制器电压和温度定时补偿电路
公开(公告)号：US06327286B1
公开(公告)日：2001-12-04
申请号：US09465427
申请日：1999-12-21
申请人： Richard M. Ness , William N. Partlo , Richard L. Sandstrom , David M. Johns
发明人： Richard M. Ness , William N. Partlo , Richard L. Sandstrom , David M. Johns
IPC分类号： H01S300
CPC分类号： H01S3/038 , H01S3/097 , H03K3/57 , H03K5/131
摘要： An improvement over prior art voltage timing compensation circuits is achieved by incorporating a function generator to provide a more accurate non-linear compensation to pulse timing delay, which is typically a non-linear function of voltage. An improvement over prior art temperature timing compensation circuits is achieved by providing for actual temperature measurements to be made and used to drive the timing compensation circuitry for a more accurate temperature timing compensation than provided by prior art temperature synthesis, while still using a relatively simple compensating circuit. In some embodiments a timing compensation circuit combines both voltage and temperature timing compensation.
摘要翻译：通过结合功能发生器来提供对脉冲定时延迟的更精确的非线性补偿来实现现有技术的电压定时补偿电路的改进，脉冲定时延迟通常是电压的非线性函数。通过提供实际的温度测量来实现对现有技术的温度定时补偿电路的改进，并且用于驱动定时补偿电路以获得比现有技术的温度合成提供的更精确的温度定时补偿，同时仍然使用相对简单的补偿电路。在一些实施例中，定时补偿电路组合电压和温度定时补偿。

164. 发明授权

US6028872A High pulse rate pulse power system with resonant power supply 有权
标题翻译：高脉冲脉冲电源系统具有谐振电源
公开(公告)号：US6028872A
公开(公告)日：2000-02-22
申请号：US211825
申请日：1998-12-15
申请人： William N. Partlo , Daniel L. Birx , Richard M. Ness , Daniel A. Rothweil , Paul C. Melcher , Brett D. Smith
发明人： William N. Partlo , Daniel L. Birx , Richard M. Ness , Daniel A. Rothweil , Paul C. Melcher , Brett D. Smith
IPC分类号： G03F7/20 , H01S3/02 , H01S3/03 , H01S3/036 , H01S3/097 , H01S3/0971 , H01S3/225 , H02M9/02 , H03K3/57 , H03K17/80 , H01S3/00
CPC分类号： G03F7/70025 , G03F7/70041 , G03F7/70558 , G03F7/70575 , H01S3/02 , H01S3/03 , H01S3/036 , H01S3/097 , H01S3/0971 , H01S3/225 , H03K17/80 , H03K3/57 , H01S3/09702
摘要： A high pulse rate pulse power source for supplying controlled high energy electrical pulses at rates of 2000 Hz or greater. The source includes a pulse generating circuit including a charging capacitor, a solid state switch and a current limiting inductor. Pulses generated in the pulse generating circuit are compressed in at least two pulse compression circuits and a step-up pulse transformer increases peak voltage to at least 12,000 volts. A very fast regulated resonant power supply is provided for charging the charging capacitor in less than 400 microseconds and a pulse control system including a programmed processor controls the charging of the charging capacitor to an accuracy of less than about one percent at a rate of at least 2000 charges per second.
摘要翻译：用于以2000Hz或更高的速率提供受控高能电脉冲的高脉冲脉冲电源。源包括一个包括充电电容器，固态开关和限流电感器的脉冲发生电路。在脉冲发生电路中产生的脉冲在至少两个脉冲压缩电路中被压缩，并且升压脉冲变压器将峰值电压增加到至少12000伏特。提供了一种非常快速的调节谐振电源，用于在小于400微秒内对充电电容器充电，并且包括编程处理器的脉冲控制系统以至少的速率控制充电电容器的充电至小于约百分之一的精度 2000次每秒收费。

165. 发明授权

US5383000A Partial coherence varier for microlithographic system 失效
标题翻译：微光刻系统的部分相干变压器
公开(公告)号：US5383000A
公开(公告)日：1995-01-17
申请号：US981051
申请日：1992-11-24
申请人： Paul F. Michaloski , William N. Partlo
发明人： Paul F. Michaloski , William N. Partlo
IPC分类号： G03F7/20 , G03B27/54
CPC分类号： G03F7/70058
摘要： A microlithographic projection imaging system has an illuminator optical system and an objective imaging system, and an adjustable profiler or energy distributor in the illuminator optical system varies the numerical aperture of the illuminator, for varying the partial coherence of the projection imager. The adjustable profiler can be a diffuser, a binary optic, a hologram, or a fly's eye lens that is axially movable in a non-collimated region of the illumination path for imposing a predetermined angular profile on each of a multitude of fragments of the illumination. This changes the distribution of the illumination energy at the pupil of the illuminator and thus varies the numerical aperture and the angular energy profile of the illumination arriving at the objective imaging system, which is also preferably made uniform in spatial intensity by a uniformizer in the illuminator upstream of the pupil.
摘要翻译：微光刻投影成像系统具有照明器光学系统和物镜成像系统，并且照明器光学系统中的可调节分析器或能量分配器改变照明器的数值孔径，以改变投影成像器的部分相干性。可调轮廓仪可以是扩散器，二进制光学元件，全息图或蝇眼透镜，其可在照明路径的非准直区域中轴向移动，以在照明的多个碎片的每一个上施加预定的角度轮廓。这改变了照明器瞳孔处的照明能量的分布，从而改变了到达物镜成像系统的照明的数值孔径和角能量分布，其也优选地通过照明器中的均匀器在空间强度上是均匀的瞳孔上游。

166. 发明授权

US08648999B2 Alignment of light source focus 有权
标题翻译：对准光源焦点
公开(公告)号：US08648999B2
公开(公告)日：2014-02-11
申请号：US12841728
申请日：2010-07-22
申请人： Matthew R. Graham , William N. Partlo , Steven Chang , Robert A. Bergstedt
发明人： Matthew R. Graham , William N. Partlo , Steven Chang , Robert A. Bergstedt
IPC分类号： G01J3/00
CPC分类号： H05G2/008 , G01B11/0608 , G01B11/26 , H05G2/003 , H05G2/005
摘要： An extreme ultraviolet light system includes a steering system that steers and focuses an amplified light beam traveling along a propagation direction to a focal plane near a target location within an extreme ultraviolet light chamber, a detection system including at least one detector positioned to detect an image of a laser beam reflected from at least a portion of a target material within the chamber, a wavefront modification system in the path of the reflected laser beam and between the target location and the detection system, and a controller. The wavefront modification system is configured to modify the wavefront of the reflected laser beam as a function of a target focal plane position along the propagation direction. The controller includes logic for adjusting a location of the focal plane of the amplified light beam relative to the target material based on the detected image of the reflected laser beam.
摘要翻译：一种极紫外光系统包括：转向系统，其将沿着传播方向传播的放大的光束转向并聚焦在远紫外光室内的目标位置附近的焦平面;检测系统，包括至少一个检测器，其被定位成检测图像从室内的目标材料的至少一部分反射的激光束，反射激光束的路径中的目标位置和检测系统之间的波前修正系统以及控制器。波前修改系统被配置为根据沿传播方向的目标焦平面位置来修改反射激光束的波前。控制器包括用于基于所检测的反射激光束的图像来调整放大的光束相对于目标材料的焦平面的位置的逻辑。

167. 发明授权

US08368041B2 System and method for compensating for thermal effects in an EUV light source 有权
标题翻译：用于补偿EUV光源热效应的系统和方法
公开(公告)号：US08368041B2
公开(公告)日：2013-02-05
申请号：US13077958
申请日：2011-03-31
申请人： Matthew R. Graham , Olav Haugan , William N. Partlo
发明人： Matthew R. Graham , Olav Haugan , William N. Partlo
IPC分类号： G21K5/04 , G03B27/42
CPC分类号： H05G2/008 , G02B7/028 , H01S3/005
摘要： A method and apparatus for compensating for thermal effects on the focal spot of a lens used to focus a laser beam on a target material at an irradiation site in a laser produced plasma (LPP) extreme ultraviolet (EUV) light system is disclosed. The EUV energy output of the light system is measured at sample intervals as a proxy for the laser power. The thermal load on the focusing lens is estimated from the measured EUV power, the expected change in the focal length of the lens for the thermal load is calculated, and the lens position is adjusted to compensate for the calculated focal length change. The actual position of the lens may be determined and compared to its desired position, and adjusted to insure that it remains in the desired position.
摘要翻译：公开了一种用于补偿在激光产生的等离子体（UVP）极紫外（EUV）光系统中的照射位置处将激光束聚焦在目标材料上的用于焦点的焦点的热效应的方法和装置。以采样间隔测量光系统的EUV能量输出作为激光功率的代表。根据所测量的EUV功率估计聚焦透镜上的热负荷，计算用于热负荷的透镜焦距的预期变化，并且调节透镜位置以补偿计算的焦距变化。可以确定透镜的实际位置并将其与其期望位置进行比较，并进行调整以确保其保持在期望的位置。

168. 发明授权

US08259764B2 Bandwidth control device 有权
标题翻译：带宽控制装置
公开(公告)号：US08259764B2
公开(公告)日：2012-09-04
申请号：US11472088
申请日：2006-06-21
申请人： Igor V. Fomenkov , William N. Partlo , Daniel J. Reiley , James K. Howey , Stanley C. Aguilar
发明人： Igor V. Fomenkov , William N. Partlo , Daniel J. Reiley , James K. Howey , Stanley C. Aguilar
IPC分类号： H01S3/136
CPC分类号： H01S3/225 , H01S3/03 , H01S3/034 , H01S3/08009 , H01S3/137 , H01S3/2256
摘要： A method and apparatus is disclosed for operating a laser output light beam pulse line narrowing mechanism that may comprise a nominal center wavelength and bandwidth selection optic; a static wavefront compensation mechanism shaping the curvature of the selection optic; an active wavefront compensation mechanism shaping the curvature of the selection optic and operating independently of the static wavefront compensation mechanism. The method and apparatus may comprise the nominal center wavelength and bandwidth selection optic comprises a grating; the static wavefront compensation mechanism applies a pre-selected bending moment to the grating; the active wavefront compensation mechanism applies a separate selected bending moment to the grating responsive to the control of a bending moment controller based on bandwidth feedback from a bandwidth monitor monitoring the bandwidth of the laser output light beam pulses. The active wavefront compensation mechanism may comprise a pneumatic drive mechanism.
摘要翻译：公开了用于操作可以包括标称中心波长和带宽选择光学器件的激光输出光束脉冲线窄化机构的方法和装置; 静态波前补偿机构整形选择光学元件的曲率; 主动波前补偿机构整形选择光学元件的曲率并独立于静态波前补偿机制工作。该方法和装置可以包括标称中心波长和带宽选择光学器件包括光栅; 静态波前补偿机构将预选的弯矩应用于光栅; 主动波前补偿机构响应于基于来自监视激光输出光束脉冲的带宽的带宽监视器的带宽反馈的弯矩控制器的控制，向光栅施加单独的选定弯矩。主动波前补偿机构可以包括气动驱动机构。

169. 发明申请

US20110248191A1 SYSTEMS AND METHODS FOR TARGET MATERIAL DELIVERY PROTECTION IN A LASER PRODUCED PLASMA EUV LIGHT SOURCE 有权
标题翻译：激光生产的等离子体光源的目标物质输送保护的系统和方法
公开(公告)号：US20110248191A1
公开(公告)日：2011-10-13
申请号：US13075500
申请日：2011-03-30
申请人： Igor V. Fomenkov , William N. Partlo
发明人： Igor V. Fomenkov , William N. Partlo
IPC分类号： H05G2/00
CPC分类号： H05G2/008 , H05G2/005 , H05G2/006
摘要： A device is disclosed herein which may comprise a chamber, a source providing a stream of target material droplets delivering target material to an irradiation region in the chamber along a path between a target material release point and the irradiation region, a gas flow in the chamber, at least a portion of the gas flowing in a direction toward the droplet stream, a system producing a laser beam irradiating droplets at the irradiation region to generate a plasma producing EUV radiation, and a shroud positioned along a portion of said stream, said shroud having a first shroud portion shielding droplets from said flow and an opposed open portion.
摘要翻译：本文公开了一种装置，其可以包括室，源提供目标材料液滴流，其沿着目标材料释放点和照射区域之间的路径将靶材料输送到腔室中的照射区域，腔室中的气流，所述气体的至少一部分沿着朝向所述液滴流的方向流动，产生在所述照射区域处照射液滴的激光束以产生等离子体产生EUV辐射的系统，以及沿着所述流的一部分定位的护罩，所述护罩具有屏蔽来自所述流动的液滴的第一护罩部分和相对的开口部分。

170. 发明申请

US20110122901A1 HIGH POWER HIGH PULSE REPETITION RATE GAS DISCHARGE LASER SYSTEM 审中-公开
标题翻译：高功率高脉冲重复率气体放电激光系统
公开(公告)号：US20110122901A1
公开(公告)日：2011-05-26
申请号：US13020330
申请日：2011-02-03
申请人： Richard L. Sandstrom , William N. Partlo , Daniel J.W. Brown
发明人： Richard L. Sandstrom , William N. Partlo , Daniel J.W. Brown
IPC分类号： H01S3/10
CPC分类号： H01S3/08009 , H01S3/08031 , H01S3/08059 , H01S3/097 , H01S3/1055
摘要： A method of line narrowing for a narrow band DUV high power high repetition rate gas discharge laser producing output laser light pulse beam pulses in bursts of pulses includes selecting at least one center wavelength for each pulse determined at least in part by the angle of incidence of the laser light pulse beam containing the respective pulse on a dispersive surface of a dispersive wavelength selection optic; changing the curvature of the dispersive surface in a first manner that includes imparting a catenary curvature to the dispersive surface; and changing the curvature of the dispersive surface in a second manner that includes imparting a cylindrical curvature to the dispersive surface.
摘要翻译：窄带DUV高功率高重复率气体放电激光器产生输出激光脉冲束脉冲的脉冲串的方法包括为至少部分地由入射角确定的每个脉冲选择至少一个中心波长，所述激光束在所述分散波长选择光学器件的分散表面上包含相应的脉冲; 以第一种方式改变分散表面的曲率，包括向分散表面施加悬链曲率; 并且以第二种方式改变分散表面的曲率，包括向分散表面施加圆柱形曲率。

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