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    • 132. 发明授权
    • Lithography model for 3D resist profile simulations
    • 3D抗蚀剂轮廓模拟的平版印刷模型
    • US09235662B2
    • 2016-01-12
    • US13757472
    • 2013-02-01
    • Peng Liu
    • Peng Liu
    • G06F17/50G03F7/20
    • G06F17/5009G03F7/705G03F7/70625G03F7/70666
    • Described herein is a method for simulating a three-dimensional spatial intensity distribution of radiation formed within a resist layer on a substrate resulting from an incident radiation, the method comprising: calculating an incoherent sum of forward propagating radiation in the resist layer and backward propagating radiation in the resist layer; calculating an interference of the forward propagating radiation in the resist layer and the backward propagating radiation in the resist layer; and calculating the three-dimensional spatial intensity distribution of radiation from the incoherent sum and the interference.
    • 本文描述了一种用于模拟由入射辐射产生的在衬底上的抗蚀剂层内形成的辐射的三维空间强度分布的方法,所述方法包括:计算抗蚀剂层中的正向传播辐射和反向传播辐射的非相干和 在抗蚀剂层中; 计算抗蚀剂层中的正向传播辐射和抗蚀剂层中的反向传播辐射的干扰; 并计算来自非相干和辐射的三维空间强度分布和干扰。
    • 134. 发明授权
    • Carbon nanotube field emitter
    • 碳纳米管场发射极
    • US08917013B2
    • 2014-12-23
    • US13711982
    • 2012-12-12
    • Peng LiuKai-Li JiangShou-Shan Fan
    • Peng LiuKai-Li JiangShou-Shan Fan
    • H01J9/02H01J1/304
    • H01J9/025H01J1/304H01J31/123
    • A carbon nanotube field emitter is disclosed. The carbon nanotube field emitter includes an emission portion and a supporting portion. The emission portion and the supporting portion are configured as one piece to form a roll structure. The emission portion includes a first rolled carbon nanotube layer, which includes a number of carbon nanotubes. The supporting portion includes a rolled composite layer, which includes at least one second rolled carbon nanotube layer and a rolled metal layer stacked with each other. Another carbon nanotube field emitter with a number of separated emission tips on the emission portion is also disclosed.
    • 公开了一种碳纳米管场发射器。 碳纳米管场发射体包括发射部分和支撑部分。 发射部分和支撑部分被构造为一体以形成辊结构。 发光部包括包含多个碳纳米管的第一卷绕碳纳米管层。 支撑部分包括轧制复合层,其包括彼此堆叠的至少一个第二轧制碳纳米管层和轧制金属层。 还公开了在发射部分上具有多个分离的发射尖端的另一碳纳米管场发射器。
    • 140. 发明授权
    • Lens heating compensation systems and methods
    • 镜头加热补偿系统及方法
    • US08570485B2
    • 2013-10-29
    • US12475071
    • 2009-05-29
    • Jun YePeng LiuYu Cao
    • Jun YePeng LiuYu Cao
    • G03B27/52
    • G03F7/70441G03F7/70266G03F7/705G03F7/70533G03F7/706G03F7/70891G06F17/50
    • Methods for calibrating a photolithographic system are disclosed. A cold lens contour for a reticle design and at least one hot lens contour for the reticle design are generated from which a process window is defined. Aberrations induced by a lens manipulator are characterized in a manipulator model and the process window is optimized using the manipulator model. Aberrations are characterized by identifying variations in critical dimensions caused by lens manipulation for a plurality of manipulator settings and by modeling behavior of the manipulator as a relationship between manipulator settings and aberrations. The process window may be optimized by minimizing a cost function for a set of critical locations.
    • 公开了用于校准光刻系统的方法。 生成用于掩模版设计的冷透镜轮廓和用于掩模版设计的至少一个热透镜轮廓,由此定义处理窗口。 由透镜操纵器诱导的畸变在机械手模型中表征,并且使用机械手模型优化过程窗口。 像差的特征在于识别由多个操纵器设置的透镜操纵引起的关键尺寸的变化,以及通过将操纵器的行为建模为机械手设置和像差之间的关系。 可以通过最小化一组关键位置的成本函数来优化过程窗口。