专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

131. 发明申请

US20050225223A1 Polarizing photonic band gap system 有权
标题翻译：偏振光子带隙系统
公开(公告)号：US20050225223A1
公开(公告)日：2005-10-13
申请号：US10819158
申请日：2004-04-07
申请人： Chien-Hua Chen , Murali Chaparala , Robert Bicknell
发明人： Chien-Hua Chen , Murali Chaparala , Robert Bicknell
IPC分类号： G02B6/10 , G02B6/122 , G02F1/13357 , H01J5/16
CPC分类号： G02B6/105 , B82Y20/00 , G02B6/1225 , G02F1/13362
摘要： A polarizing photonic band gap system has a photonic crystal emitter. The photonic crystal emitter has a crystal end surface. The photonic crystal emitter is configured to generate electromagnetic energy having a wavelength λ. The system has a polarizer. The polarizer is connected to the photonic crystal emitter. The polarizer has a polarizer surface. The polarizer surface is located within a distance of said crystal end surface. The distance is sufficient to quantum mechanically couple the polarizer surface with said crystal end surface at the wavelength λ.
摘要翻译：偏振光子带隙系统具有光子晶体发射极。光子晶体发射器具有晶体端面。光子晶体发射器被配置为产生具有波长λ的电磁能。该系统具有偏振器。偏振器连接到光子晶体发射器。偏振器具有偏振器表面。偏振器表面位于所述晶体端面的一定距离内。该距离足以量子力学地将偏振器表面与波长λ的所述晶体端面结合。

132. 发明申请

US20050200782A1 MULTI-DOMAIN VERTICAL ALIGNMENT LIQUID CRYSTAL DISPLAY 审中-公开
标题翻译：多域垂直对准液晶显示
公开(公告)号：US20050200782A1
公开(公告)日：2005-09-15
申请号：US10905932
申请日：2005-01-27
申请人： Chien-Hua Chen , Yu-Fu Lin , Jung-Lieh Hsu
发明人： Chien-Hua Chen , Yu-Fu Lin , Jung-Lieh Hsu
IPC分类号： G02F1/1337
CPC分类号： G02F1/133707 , G02F1/133753 , G02F1/1393
摘要： A multi-domain vertical alignment (MVA) liquid crystal display (LCD) comprising a first substrate, a second substrate and a liquid crystal layer disposed between the first substrate and the second substrate is provided. A plurality of first protrusions including a plurality of radiation-shaped protrusions arranged in stripe is formed over the first substrate. In addition, a plurality of second protrusions including stripe protrusions is formed over the second substrate. The first protrusions and the second protrusions are interlaced correspondingly. Since the radiation-shaped protrusions arranged in stripe are disposed over the first substrate, the liquid crystal molecules of the LCD may have more tilt directions. Thus, the range of the viewing angle of the LCD is increased.
摘要翻译：提供了包括第一基板，第二基板和设置在第一基板和第二基板之间的液晶层的多域垂直取向（MVA）液晶显示器（LCD）。在第一基板上形成包括多个以条状排列的辐射状突起的第一突起。此外，在第二基板上形成包括条纹突起的多个第二突起。第一突起和第二突起相互交错。由于设置在第一基板上的辐射状突起，所以LCD的液晶分子可以具有更多的倾斜方向。因此，LCD的视角的范围增加。

133. 发明授权

US06893577B2 Method of forming substrate for fluid ejection device 有权
标题翻译：形成流体喷射装置的基材的方法
公开(公告)号：US06893577B2
公开(公告)日：2005-05-17
申请号：US10374033
申请日：2003-02-25
申请人： Chien-Hua Chen , Kenneth Michael Kramer
发明人： Chien-Hua Chen , Kenneth Michael Kramer
IPC分类号： B41J2/16 , G01D15/00 , G11B5/127
CPC分类号： B41J2/1603 , B41J2/1628 , B41J2/1629 , B41J2/1631 , B41J2/1642 , Y10T29/49401
摘要： A method of forming an opening through a substrate having a first side and a second side opposite the first side includes extending spaced etch stops into the substrate from the first side, etching into the substrate between the spaced etch stops, and etching into the substrate from the second side toward the first side to the spaced etch stops. Etching into the substrate between the spaced etch stops includes forming a first portion of the opening and etching into the substrate to the spaced etch stops includes forming a second portion of the opening.
摘要翻译：通过具有第一侧和与第一侧相对的第二侧的衬底形成开口的方法包括从第一侧延伸到衬底中的间隔开的蚀刻停止件，在间隔开的蚀刻停止件之间蚀刻到衬底中，并从朝向第一侧的第二侧到间隔开的蚀刻停止。在间隔的蚀刻停止点之间蚀刻到基底中包括形成开口的第一部分并且蚀刻到衬底中至间隔开的蚀刻停止包括形成开口的第二部分。

134. 发明授权

US06662663B2 Pressure sensor with two membranes forming a capacitor 有权
公开(公告)号：US06662663B2
公开(公告)日：2003-12-16
申请号：US10120944
申请日：2002-04-10
申请人： Chien-Hua Chen
发明人： Chien-Hua Chen
IPC分类号： G01L912
CPC分类号： G01L9/0073
摘要： A pressure sensor may include a first membrane that flexes in response to pressure, a reference cavity covered by the first membrane where the reference cavity contains a vacuum and a second membrane, adjacent to the first membrane, the first and second membranes forming a capacitor having a capacitance that varies in accordance with the flexing of the first membrane and the pressure.

135. 发明授权

US06583382B2 Apparatus for creating re-entrant nozzles 失效
标题翻译：用于创建入口喷嘴的装置
公开(公告)号：US06583382B2
公开(公告)日：2003-06-24
申请号：US09866076
申请日：2001-05-25
申请人： Chien-Hua Chen , Michael A. Pate
发明人： Chien-Hua Chen , Michael A. Pate
IPC分类号： B23K2636
CPC分类号： B41J2/1634 , B41J2/162 , B41J2/1626 , B41J2/1631 , B41J2/1646
摘要： A method for manufacturing ink-jet printheads having nozzles with re-entrant profiles has the following steps. A source of electromagnetic energy is created which is then used with an optical system to produce a source of energy having a constant illumination angle on an process plane. A substrate is then exposed with the electromagnetic source to define the nozzles having the re-entrant profile. Also, apparatus for creating the constant illumination angle include an optical deflecting mask and an afocal optical system.
摘要翻译：用于制造具有带入口轮廓的喷嘴的喷墨打印头的方法具有以下步骤。产生电磁能源，然后与光学系统一起使用以在处理平面上产生具有恒定照明角度的能量源。然后用电磁源将衬底暴露以限定具有入口轮廓的喷嘴。此外，用于产生恒定照明角度的装置包括光学偏转掩模和无焦光学系统。

136. 发明授权

US06364466B1 Particle tolerant ink-feed channel structure for fully integrated inkjet printhead 有权
标题翻译：用于全集成喷墨打印头的耐磨油墨通道结构
公开(公告)号：US06364466B1
公开(公告)日：2002-04-02
申请号：US09727429
申请日：2000-11-30
申请人： Chien-Hua Chen , Kenneth M. Kramer
发明人： Chien-Hua Chen , Kenneth M. Kramer
IPC分类号： B41J205
CPC分类号： B41J2/17513 , B41J2/1404 , B41J2/14145 , B41J2/1603 , B41J2/1628 , B41J2/1629 , B41J2/1631 , B41J2/1634 , B41J2002/14467
摘要： Described herein is a monolithic printhead formed using integrated circuit techniques. Thin film layers, including a resistive layer, are formed on a top surface of a silicon substrate. The various layers are etched to provide heater resistors and conductors. The thin film layers are also etched to expose portions of the upper surface of the substrate where ink feed holes leading into ink chambers are to be formed. A trench is etched in the bottom surface of the substrate while leaving a relatively thin membrane of the substrate underlying the thin film layers. After the trench is formed and using a backside etch, ink feed holes are formed in the substrate membrane leading from the trench to the ink chambers. Ink channels are also formed in the substrate membrane leading to sides of the ink feed holes. These channels preferably have widths smaller than the widths of the ink feed holes. Ink particles or other particles which may clog an ink feed hole opening do not block the narrower channels leading to the sides of the ink feed holes. Various examples of such channels and ink feed holes are described to form a particle-tolerant printhead for use in an inkjet printer.
摘要翻译：这里描述的是使用集成电路技术形成的单片打印头。包括电阻层的薄膜层形成在硅衬底的顶表面上。蚀刻各层以提供加热电阻和导体。还蚀刻薄膜层以暴露出将要形成通向墨水腔的墨水供给孔的基板的上表面的部分。在衬底的底表面中蚀刻沟槽，同时留下薄膜层下面的较薄的衬底的薄膜。在形成沟槽并使用背面蚀刻之后，在从沟槽引导到墨室的基板膜中形成墨水供给孔。油墨通道也形成在通向油墨供给孔侧面的基板膜中。这些通道优选具有小于供墨孔的宽度的宽度。可能堵塞墨水供给孔开口的墨水颗粒或其它颗粒不会阻塞通向墨水供给孔侧面的较窄通道。描述了这种通道和供墨孔的各种实例以形成用于喷墨打印机的耐磨性打印头。

137. 发明授权

US06273557B1 Micromachined ink feed channels for an inkjet printhead 有权
标题翻译：用于喷墨打印头的微加工墨水供给通道
公开(公告)号：US06273557B1
公开(公告)日：2001-08-14
申请号：US09408116
申请日：1999-09-29
申请人： Donald J. Milligan , Chien-Hua Chen
发明人： Donald J. Milligan , Chien-Hua Chen
IPC分类号： B41J205
CPC分类号： B41J2/14072 , B41J2/1404 , B41J2/1408 , B41J2/14129 , B41J2/1433 , B41J2/1603 , B41J2/1626 , B41J2/1628 , B41J2/1629 , B41J2/1631 , B41J2/1639 , B41J2/164 , B41J2/1645 , B41J2002/14387 , B41J2002/14475
摘要： An inkjet print cartridge comprising a printhead that is formed using a sequence of etch process steps is described. The first etch of the two etch step process is comprised of a wet chemical etch. A dry etch process follows. Both etch steps are consecutively initiated from the back of the wafer. The fabrication process described offers several advantages including precise dimensional control of the ink feed channel, greater packing density of ink ejectors disposed in the printhead and greater printing speed. Additionally, the time required to manufacture the printhead, in contrast to a conventional printhead, is reduced.
摘要翻译：描述了包括使用一系列蚀刻工艺步骤形成的打印头的喷墨打印盒。两个蚀刻步骤工艺的第一次蚀刻由湿化学蚀刻构成。以下是干蚀刻工艺。两个蚀刻步骤从晶片的背面连续地起始。所描述的制造工艺提供了几个优点，包括油墨供给通道的精确尺寸控制，设置在打印头中的喷墨器的更大包装密度和更高的打印速度。此外，与常规打印头相比，制造打印头所需的时间减少了。

138. 发明授权

US6066291A Nickel aluminide intermetallic alloys for tooling applications 失效
标题翻译：镍铝合金金属间合金用于加工应用
公开(公告)号：US6066291A
公开(公告)日：2000-05-23
申请号：US920448
申请日：1997-08-29
申请人： Chien-Hua Chen , Guy Monroe Maddox, Jr. , John Edward Orth , Elliott Lee Turbeville
发明人： Chien-Hua Chen , Guy Monroe Maddox, Jr. , John Edward Orth , Elliott Lee Turbeville
IPC分类号： C22C19/03 , C22C19/05 , C22F1/10
CPC分类号： C22C19/03 , C22C19/057
摘要： Castings based on the nickel aluminide intermetallic alloy IC-221M were melted and poured with an addition of enough molybdenum to bring its concentration to 5 weight %. This resulted in a minimization or elimination of the nickel-zirconium eutectic phase in the dies machined and prepared from these castings. The benefit of eliminating or minimizing the nickel zirconium eutectic phase with the addition of measurable amounts of molybdenum (Mo) to the nickel aluminide (Ni.sub.3 Al) alloy is the increase in the useful service life of the tooling made from it; thus providing the advantages of increased productivity, enhanced quality and reduced costs in a manufacturing setting. Heat treatment of the dies machined and prepared from these castings was also undertaken. The heat treatment regimen includes solution treatment at 2100.degree. F. for 24 hours and aging from between 1150.degree. F. and 1300.degree. F. for between 12 to 24 hours. The benefit of heat treating the dies is the increase in the mechanical properties and hence the service life of the tooling made from it.
摘要翻译：将基于铝酸镍金属间化合物IC-221M的铸件熔融并加入足量的钼使其浓度达到5重量％。这导致了由这些铸件加工和制备的模具中的镍 - 锆共晶相的最小化或消除。通过向镍铝化合物（Ni3Al）合金添加可测量的钼（Mo），消除或最小化镍锆共晶相的好处是由其制成的工具的有用使用寿命的增加; 从而提供了生产效率提高，质量提高和降低成本的优势。还进行了由这些铸件加工和制备的模具的热处理。热处理方案包括在2100°F的溶液处理24小时，并在1150°F和1300°F之间老化12至24小时。对模具进行热处理的好处在于机械性能的增加以及由此制成的工具的使用寿命。

139. 发明授权

US10058119B1 Fruit and vegetable washer 有权
公开(公告)号：US10058119B1
公开(公告)日：2018-08-28
申请号：US15425659
申请日：2017-02-06
申请人： Chien-Hua Chen
发明人： Chien-Hua Chen
IPC分类号： A23N12/02 , B08B3/04
摘要： A fruit and vegetable washer includes a housing, an upper cover, a spin-and-turbulence unit, a power unit, a control assembly, a cleaning basket and a stabilizing shaft. A polygonal accommodating chamber is formed in the housing. The cleaning basket is cylindrical and is mounted rotatably in the accommodating chamber. Because of the polygonal cross section of the accommodating chamber of the housing and the circular cross section of the cleaning basket, the space between the accommodating chamber and the cleaning basket has a circular inner surface and a rectangular outer surface. When water fills up the space and the power unit starts to rotate the cleaning basket, the water will flow between the rectangular outer surface and the circular inner surface and keep pushing the inner surface of the accommodating chamber, producing complex turbulent flows and fully cleaning the fruits and vegetables inside the cleaning basket.

140. 发明授权

US08778769B2 Semiconductor package having passive device and method for making the same 有权
标题翻译：具有无源器件的半导体封装及其制造方法
公开(公告)号：US08778769B2
公开(公告)日：2014-07-15
申请号：US13723782
申请日：2012-12-21
申请人： Chien-Hua Chen , Teck-Chong Lee
发明人： Chien-Hua Chen , Teck-Chong Lee
IPC分类号： H01L23/34 , H01L21/20
CPC分类号： H01L28/40 , H01L21/486 , H01L23/49822 , H01L23/49827 , H01L23/642 , H01L23/645 , H01L2224/48091 , H01L2224/48227 , H01L2924/30107 , H01L2924/00014 , H01L2924/00
摘要： The present invention relates to a semiconductor package and a method for making the same. The semiconductor package includes a substrate, a first capacitor, a first protective layer, a first metal layer and a second protective layer. The substrate has at least one via structure. The first capacitor is disposed on a first surface of the substrate. The first protective layer encapsulates the first capacitor. The first metal layer is disposed on the first protective layer, and includes a first inductor. The second protective layer encapsulates the first inductor. Whereby, the first inductor, the first capacitor and the via structure are integrated into the semiconductor package, so that the size of the product is reduced.
摘要翻译：半导体封装及其制造方法技术领域本发明涉及半导体封装及其制造方法。半导体封装包括衬底，第一电容器，第一保护层，第一金属层和第二保护层。衬底具有至少一个通孔结构。第一电容器设置在基板的第一表面上。第一保护层封装第一电容器。第一金属层设置在第一保护层上，并且包括第一电感器。第二保护层封装第一电感器。由此，第一电感器，第一电容器和通孔结构被集成到半导体封装中，从而减小了产品的尺寸。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式