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121. 发明申请

US20080094616A1 Surface defect inspection apparatus 审中-公开
标题翻译：表面缺陷检查装置
公开(公告)号：US20080094616A1
公开(公告)日：2008-04-24
申请号：US11986699
申请日：2007-11-26
申请人： Toshihiko Tanaka
发明人： Toshihiko Tanaka
IPC分类号： G01N21/00
CPC分类号： G01N21/8803 , G01N21/94 , G01N21/9501 , G01N2021/215 , G01N2021/8438 , G01N2021/9513 , G01N2201/0618
摘要： A surface defect inspection apparatus in accordance with the present invention is a surface defect inspection apparatus 500 which includes a tested object 40 a multi-layer film is formed on the surface thereof, and an illumination portion 5 which irradiates an illumination light 6b generated by the illumination lamp 41 onto the tested object 40 so that the image of the tested object irradiated with the illumination light 6b to detect a surface defect of the tested object 40 is visually observable by an observer 49. A wavelength distribution of the illumination light 6b is corrected so that the light intensity is substantially constant with respect to the wavelength sensitivity characteristics of the human eye. In accordance with the present invention, in a case of inspecting a tested object formed with a multi-layer film, even with a difference in film thickness in lower layers, unevenness in brightness or color of the surface hardly occurs, whereby it is possible to improve the detection accuracy of defects.
摘要翻译：根据本发明的表面缺陷检查装置是表面缺陷检查装置500，其包括测试对象40，其表面上形成有多层膜，照射部5照射由照明灯41到被检测物体40上，使得用照明光6b照射的检测对象的图像以检测检测对象40的表面缺陷，由观察者49可视地观察。校正照明光6b的波长分布，使得光强度相对于人眼的波长敏感度特性基本上是恒定的。根据本发明，在检查由多层膜形成的被检验物体的情况下，即使在下层中的膜厚度差异，几乎不发生表面的亮度或颜色的不均匀，由此，提高缺陷的检测精度。

122. 发明授权

US07361530B2 Method of fabricating a semiconductor integrated circuit that includes patterning a semiconductor substrate with a first photomask that uses metal for blocking light and patterning the same substrate with a second photomask that uses organic resin for blocking light 有权
标题翻译：一种半导体集成电路的制造方法，其包括使用第一光掩模图案化半导体衬底，所述第一光掩模使用金属来阻挡光，并且利用使用有机树脂阻挡光的第二光掩模对相同衬底进行图案化
公开(公告)号：US07361530B2
公开(公告)日：2008-04-22
申请号：US11714837
申请日：2007-03-07
申请人： Tsuneo Terasawa , Toshihiko Tanaka , Ko Miyazaki , Norio Hasegawa , Kazutaka Mori
发明人： Tsuneo Terasawa , Toshihiko Tanaka , Ko Miyazaki , Norio Hasegawa , Kazutaka Mori
IPC分类号： H01L21/58
CPC分类号： G03F7/70425 , G03F1/00 , G03F1/56 , H01L2224/05001 , H01L2224/05008 , H01L2224/05022 , H01L2224/05024 , H01L2224/05569 , H01L2224/05572 , H01L2224/16225 , H01L2224/32225 , H01L2224/73204 , H01L2224/92125 , H01L2924/15311 , Y10S438/944 , Y10S438/946 , H01L2924/00
摘要： Productivity of a semiconductor integrated circuit device is improved. According to how many times the photomask is used, a photomask having an opaque pattern made of metal and a photomask having an opaque pattern made of a resist film are properly used, and thereby an exposure treatment is performed.
摘要翻译：提高了半导体集成电路器件的生产率。根据使用光掩模的次数，适当地使用具有由金属制成的不透明图案的光掩模和由抗蚀剂膜制成的不透明图案的光掩模，从而进行曝光处理。

123. 发明申请

US20070188441A1 Display 审中-公开
标题翻译：显示
公开(公告)号：US20070188441A1
公开(公告)日：2007-08-16
申请号：US11701498
申请日：2007-02-02
申请人： Toshihiko Tanaka , Takashi Kunimori , Yutaka Sano , Masanori Yasumori
发明人： Toshihiko Tanaka , Takashi Kunimori , Yutaka Sano , Masanori Yasumori
IPC分类号： G09G3/36
CPC分类号： G09G3/3406 , G02F1/13318 , G02F2201/58 , G09G2360/144
摘要： A display 10 according to one embodiment of the invention includes a display panel having an active matrix substrate and a color filter substrate, a lighting unit for the display panel, ambient light photosensors 321 to 326, a controller that controls luminous intensity of the lighting unit based on outputs from the ambient light photosensors 321 to 326, and a spectral sensitivity adjustor provided at a position on the color filter substrate corresponding to the ambient light photosensors 321 to 326 in order to make the spectral sensitivity of the ambient light photosensors 321 to 326 match human visual sensitivity. The spectral sensitivity adjustor may be a color filter or a polarizing filter. The display thus structured automatically and stably controls on/off of its backlights depending on the brightness of the surroundings with a sensitivity corresponding to human visual sensitivity.
摘要翻译：根据本发明的一个实施例的显示器10包括具有有源矩阵基板和滤色器基板的显示面板，用于显示面板的照明单元，环境光感应器32 1至32 控制器，其基于来自环境光感应器32 1至32 6的输出控制照明单元的发光强度，以及提供的光谱灵敏度调节器在彩色滤光片基板上对应于环境光光敏元件32 1至32＆lt; 6＆lt; 6＆gt;之间的位置处，以便使环境光光敏元件32 1的光谱灵敏度至32 匹配人类视觉灵敏度。光谱灵敏度调节器可以是滤色器或偏振滤光器。根据周围环境的亮度，自动稳定地显示其背光的开/关的显示，其灵敏度对应于人的视觉灵敏度。

124. 发明申请

US20070103893A1 Defect inspection device and substrate manufacturing system using the same 失效
标题翻译：缺陷检查装置和基板制造系统使用相同
公开(公告)号：US20070103893A1
公开(公告)日：2007-05-10
申请号：US11584724
申请日：2006-10-20
申请人： Toshihiko Tanaka
发明人： Toshihiko Tanaka
IPC分类号： F21V33/00
CPC分类号： G01N21/4788 , G01N21/956
摘要： A defect inspection device includes an illumination section that irradiates a specimen with illumination light having a variable incident angle, and a light-receiving section that receives light from the specimen irradiated with illumination light from the illumination section with a variable detection angle; the light-receiving section receiving the light emitted in substantially the same direction as the direction of incidence of the illumination light from the illumination section.
摘要翻译：缺陷检查装置包括用具有可变入射角的照明光照射样本的照明部分和以可变检测角度从照明部分照射照明光的样本接收光的光接收部分; 所述光接收部接收与来自所述照明部的照明光的入射方向大致相同的方向发射的光。

125. 发明授权

US07130655B2 High-frequency switch circuit 有权
标题翻译：高频开关电路
公开(公告)号：US07130655B2
公开(公告)日：2006-10-31
申请号：US11090218
申请日：2005-03-28
申请人： Shigeru Kemmochi , Mitsuhiro Watanabe , Hiroyuki Tai , Tsuyoshi Taketa , Toshihiko Tanaka
发明人： Shigeru Kemmochi , Mitsuhiro Watanabe , Hiroyuki Tai , Tsuyoshi Taketa , Toshihiko Tanaka
IPC分类号： H04M1/00
CPC分类号： H01P1/2135 , H01P1/15 , H04B1/0057 , H04B1/44 , H04B1/48
摘要： A high-frequency switch circuit is provided for switching a connection between a common transmission circuit and an antenna side circuit in a plurality of transmitting and receiving systems. The high-frequency switch includes a connection between the antenna side circuit and a reception circuit in one of the plurality of transmitting and receiving systems, and a connection between the antenna side circuit and a reception circuit in the other of the plurality of transmitting and receiving systems, the high-frequency switch circuit comprising a first diode, a second diode, and a distributed constant line, wherein a third diode is connected to the first and second diodes through the distributed constant line.
摘要翻译：提供一种高频开关电路，用于在多个发送和接收系统中切换公共发送电路和天线侧电路之间的连接。高频开关包括天线侧电路和多个发送和接收系统之一中的接收电路之间的连接，以及天线侧电路和多个发送和接收中的另一个中的接收电路之间的连接系统，包括第一二极管，第二二极管和分布常数线路的高频开关电路，其中第三二极管通过分布常数线连接到第一和第二二极管。

126. 发明授权

US06965308B2 System and method for operating a plurality of power generation stations 有权
标题翻译：用于操作多个发电站的系统和方法
公开(公告)号：US06965308B2
公开(公告)日：2005-11-15
申请号：US09815265
申请日：2001-03-23
申请人： Hiroshi Fukuda , Toshihiko Tanaka , Toshio Fujiwara , Kanetoshi Nara , Jin Murata , Toshihiro Yamada
发明人： Hiroshi Fukuda , Toshihiko Tanaka , Toshio Fujiwara , Kanetoshi Nara , Jin Murata , Toshihiro Yamada
IPC分类号： G05B23/02 , G08B29/00
CPC分类号： G05B23/027 , G05B23/0272 , Y04S10/522
摘要： A system for operating a plurality of power generation stations. The system comprises: a general control device for monitoring a plurality of power generation stations, each of the stations including at least one electric power generation unit; a plurality of unit control devices, each of which monitoring each of the generation units, the unit control devices producing alarm data; and communication means for exchanging data between the general control device and each of the unit control devices. Only part of the alarm data produced in the unit control devices are displayed at the general control device.
摘要翻译：一种用于操作多个发电站的系统。该系统包括：用于监视多个发电站的通用控制装置，每个站包括至少一个发电单元; 多个单元控制装置，每个单元控制装置监视每个生成单元，单元控制装置产生报警数据; 以及用于在一般控制装置和每个单元控制装置之间交换数据的通信装置。在单位控制装置中仅生成的部分报警数据显示在通用控制装置上。

127. 发明授权

US06939649B2 Fabrication method of semiconductor integrated circuit device and mask 失效
标题翻译：半导体集成电路器件和掩模的制造方法
公开(公告)号：US06939649B2
公开(公告)日：2005-09-06
申请号：US10259397
申请日：2002-09-30
申请人： Shoji Hotta , Norio Hasegawa , Toshihiko Tanaka
发明人： Shoji Hotta , Norio Hasegawa , Toshihiko Tanaka
IPC分类号： G03F1/29 , G03F1/54 , G03F1/68 , G03F7/20 , H01L21/027 , G03F9/00 , G03C5/00
CPC分类号： G03F1/29
摘要： A method of fabrication of a semiconductor integrated circuit device uses a mark having, on a first main surface of a mask substrate, a first light transmitting region, a second light transmitting region disposed at the periphery of the first light transmitting region and permitting inversion of the phase of light transmitted through the second light transmitting region relative to light transmitted through the first light transmitting region, and a light shielding region disposed at the periphery of the second light transmitting region. The second light transmitting region is formed from a first film deposited over the first main surface of the mask substrate, said light shielding region is formed by a second film deposited over the first main surface of the mask substrate via said first film, and at least one of said first film and second is formed from a resist film.
摘要翻译：半导体集成电路器件的制造方法使用在掩模衬底的第一主表面上具有第一透光区域，设置在第一透光区域的周围的第二透光区域并允许反转透射通过第二透光区域的光相对于透过第一透光区域的光的相位，以及设置在第二透光区域周边的遮光区域。第二透光区域由沉积在掩模基板的第一主表面上的第一膜形成，所述遮光区域由通过所述第一膜沉积在掩模基板的第一主表面上的第二膜形成，并且至少所述第一膜和第二膜中的一个由抗蚀剂膜形成。

128. 发明授权

US06927002B2 Photomask, the manufacturing method, a patterning method, and a semiconductor device manufacturing method 有权
标题翻译：光掩模，制造方法，图案化方法和半导体器件制造方法
公开(公告)号：US06927002B2
公开(公告)日：2005-08-09
申请号：US10026973
申请日：2001-12-27
申请人： Takashi Hattori , Yasuko Gotoh , Hidetoshi Satoh , Toshihiko Tanaka , Hiroshi Shiraishi
发明人： Takashi Hattori , Yasuko Gotoh , Hidetoshi Satoh , Toshihiko Tanaka , Hiroshi Shiraishi
IPC分类号： G03F7/004 , G03F1/00 , G03F1/26 , G03F1/30 , G03F1/32 , G03F1/40 , G03F1/42 , G03F1/54 , G03F1/56 , G03F1/60 , G03F1/68 , G03F1/70 , G03F1/80 , G03F7/20 , H01L21/027 , G03F9/00
CPC分类号： G03F1/32 , G03F1/26 , G03F1/30 , G03F1/56
摘要： To develop a small quantity of various kinds of semiconductor devices in a short time and to realize a photomask suitable to be manufactured at a low cost. A shade pattern of a photomask is constituted by containing nanoparticles such as carbon in an organic film such as a photoresist film. A pattern is transferred to a photoresist on a semiconductor wafer by means of the reduction projection exposure using the photomask. At the time of the above exposure, it is possible to select exposure light within a range of wide wavelengths including i-line, KrF excimer laser beam, ArF excimer laser beam, or the like.
摘要翻译：为了在短时间内开发少量的各种半导体器件，并且实现了适合以低成本制造的光掩模。光掩模的阴影图案通过在诸如光致抗蚀剂膜的有机膜中含有诸如碳的纳米颗粒而构成。通过使用光掩模的还原投影曝光将图案转印到半导体晶片上的光刻胶上。在上述曝光时，可以选择宽波长范围内的曝光光，包括i线，KrF准分子激光束，ArF准分子激光束等。

129. 发明授权

US06893785B2 Method of manufacturing an electronic device and a semiconductor integrated circuit device 失效
标题翻译：制造电子装置和半导体集成电路装置的方法
公开(公告)号：US06893785B2
公开(公告)日：2005-05-17
申请号：US10684391
申请日：2003-10-15
申请人： Toshihiko Tanaka , Norio Hasegawa
发明人： Toshihiko Tanaka , Norio Hasegawa
IPC分类号： G03F1/00 , G03F1/32 , G03F1/68 , G03F7/20 , G03F9/00 , H01L21/027 , G03C5/00
CPC分类号： G03F7/70466 , G03F1/32 , G03F1/70 , G03F7/70125
摘要： A method of manufacturing an electronic device, such as a high-speed semiconductor integrated circuit device, provides improved dimensional accuracy in transferring fine patterns. Photolithography for gate patterns and wiring patterns is carried out by exposing a halftone phase-shift mask having shade areas made of resist with an oblique illumination system, and photolithography for contact hole patterns is carried out by using a photomask having a metal shade film with metal alignment wafer marks.
摘要翻译：诸如高速半导体集成电路器件的电子器件的制造方法在转印精细图案方面提供了改进的尺寸精度。用于栅极图案和布线图案的光刻通过使用具有由抗蚀剂制成的阴影区域的半色调相移掩模与倾斜照明系统进行曝光，并且通过使用具有金属阴影膜与金属的光掩模进行用于接触孔图案的光刻对准晶片标记。

130. 发明申请

US20050069788A1 Photomask, photomask manufacturing method and semiconductor device manufacturing method using photomask 审中-公开
标题翻译：光掩模，光掩模制造方法和使用光掩模的半导体器件制造方法
公开(公告)号：US20050069788A1
公开(公告)日：2005-03-31
申请号：US10952783
申请日：2004-09-30
申请人： Toshihiko Tanaka , Shuji Nakao
发明人： Toshihiko Tanaka , Shuji Nakao
IPC分类号： G03C5/00 , G03F1/29 , G03F1/32 , G03F1/36 , G03F1/54 , G03F1/68 , G03F7/20 , G03F9/00 , H01L21/027
CPC分类号： G03F1/29 , G03F1/32
摘要： The present invention provides a photomask including a field which attenuates exposure light and causes the exposure light passed therethrough to have the same phase as that of exposure light passed through a main pattern for transfer, and a rim pattern which causes exposure light to be transmitted through the rim region of the main pattern and causes the exposure light passed therethrough to have an opposite phase to that of the transmitted light from the main pattern. Use of this photomask makes it possible to provide a photomask and a semiconductor device manufacturing method which have a practical resolution applicable to 65-nm nodes, have no defect, and can be subjected to defect inspections.
摘要翻译：本发明提供一种光掩模，其包括使曝光光衰减并使通过其中的曝光光与通过主图案转印的曝光相同的相位的场，以及使曝光光透过的边缘图案主图案的边缘区域并使通过其中的曝光光具有与来自主图案的透射光的相反相位。使用该光掩模可以提供具有适用于65nm节点的实用分辨率的光掩模和半导体器件制造方法，没有缺陷，并且可以进行缺陷检查。

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