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121. 发明申请

US20050155235A1 Inside/outside scribe 失效
标题翻译：内/外划痕
公开(公告)号：US20050155235A1
公开(公告)日：2005-07-21
申请号：US11077617
申请日：2005-03-11
申请人： Robert Allen
发明人： Robert Allen
IPC分类号： B25H7/04 , B26B29/06 , B43L7/00 , B43L13/02
CPC分类号： B43L13/02 , B25H7/04 , B26B29/06 , B43L7/007 , E04F21/0076
摘要： The invention is an improved, hand-held, adjustable, graduated marking gauge and scribe for carpentry and related activities. It is used to mark work-pieces at a given distance from an adjacent edge or intersecting surface such as is encountered when fitting cabinets or trim to uneven wall surfaces, or in the spiling of boat planking or the marking of cut-outs relative to an edge. The device consists of a main body, upon which are marked scales and which is bent and formed at one end to create an edge follower and a corner follower and upon which is mounted a sliding and stoppable instrument holder which holds marking, cutting or other instruments, inserted therein, in an adjustable fashion. The displacement of the centre-line of the marking instrument relative to the edge follower or the corner follower is read on the scales at the corresponding cursor edge of the instrument holder.
摘要翻译：本发明是用于木工和相关活动的改进的手持式，可调节的刻度标尺和划线器。它用于在距相邻边缘或相交表面一定距离处标记工件，例如在将机柜或装饰件安装到不平坦的墙壁表面时遇到，或者在船板的间隙或相对于边缘。该装置由主体组成，其上有标记的标尺，并且在其一端弯曲并形成，以形成边缘随动件和拐角随动件，并在其上安装有可滑动和可停止的仪器保持器，其保持标记，切割或其它仪器以可调节的方式插入其中。标记仪器相对于边缘跟随器或拐角跟随器的中心线的位移在仪器支架的相应光标边缘的刻度上读取。

122. 发明申请

US20050132320A1 Framework for hierarchical VLSI design 失效
标题翻译：分层VLSI设计框架
公开(公告)号：US20050132320A1
公开(公告)日：2005-06-16
申请号：US10733210
申请日：2003-12-10
申请人： Robert Allen , Ulrich Finkler , Mark Lavin , Robert Sayah
发明人： Robert Allen , Ulrich Finkler , Mark Lavin , Robert Sayah
IPC分类号： G06F17/50
CPC分类号： G06F17/5068
摘要： A method for hierarchical very large scale integration design comprises representing a structure of the hierarchical very large scale integrated design as a graph comprising design objects. The method further comprises specifying a transformation behavior applied to the design objects, and processing, top-down, the graph to perform the transformation on the hierarchical very large scale integrated design.
摘要翻译：用于分级非常大规模集成设计的方法包括将分级非常大规模集成设计的结构表示为包括设计对象的图。该方法还包括指定应用于设计对象的变换行为，以及自上而下的图形处理，以对分级非常大规模的集成设计进行变换。

123. 发明申请

US20050123852A1 Method for patterning a low activation energy photoresist 有权
标题翻译：图案化低活化能光致抗蚀剂的方法
公开(公告)号：US20050123852A1
公开(公告)日：2005-06-09
申请号：US10729452
申请日：2003-12-04
申请人： Robert Allen , Gregory Breyta , Phillip Brock , Richard DiPietro , Ratnam Sooriyakumaran , Hoa Truong , Gregory Wallraff
发明人： Robert Allen , Gregory Breyta , Phillip Brock , Richard DiPietro , Ratnam Sooriyakumaran , Hoa Truong , Gregory Wallraff
IPC分类号： G03F7/004 , G03F7/039 , G03F7/40
CPC分类号： G03F7/0392 , G03F7/0046 , G03F7/0397 , Y10S430/106 , Y10S430/108 , Y10S430/111
摘要： Polymers containing an acetal or ketal linkage and their use in lithographic photoresist compositions, particularly in chemical amplification photoresists, are provided. The polymer is prepared from at least one first olefinic monomer containing an acetal or ketal linkage, the acid-catalyzed cleavage of which renders the polymer soluble in aqueous base; and at least one second olefinic monomer selected from (i) an olefinic monomer containing a pendant fluorinated hydroxyalkyl group RH, (ii) an olefinic monomer containing a pendant fluorinated alkylsulfonamide group RS, and (iii) combinations thereof. The acetal or ketal linkage may be contained within an acid-cleavable substituent RCL in the first olefinic monomer. A method for using the photoresist compositions containing these polymers in preparing a patterned substrate is also provided in which the polymer is rendered soluble in aqueous base at a temperature of less than about 100° C. by acid-catalyzed deprotection of pendent acetal- or ketal-protected carboxylic acid groups.
摘要翻译：提供了含有缩醛或缩酮键的聚合物及其在平版光刻胶组合物中的用途，特别是在化学放大光致抗蚀剂中。聚合物由至少一种含有缩醛或缩酮键的第一烯属单体制备，其酸催化裂解使聚合物可溶于碱水溶液; 和至少一种第二烯烃单体，其选自（i）含有侧氟化羟基烷基R H的烯烃单体，（ii）含有侧氟化烷基磺酰胺基R S的烯烃单体， SUP），和（iii）其组合。缩醛或缩酮键可以包含在第一烯烃单体中的酸可裂解取代基R CL中。还提供了一种使用含有这些聚合物的光致抗蚀剂组合物来制备图案化基材的方法，其中聚合物在低于约100℃的温度下可溶于碱水溶液，通过酸催化的侧链缩醛或缩酮脱保护保护的羧酸基团。

124. 发明申请

US20050106494A1 Silicon-containing resist systems with cyclic ketal protecting groups 审中-公开
标题翻译：具有环状缩酮保护基的含硅抗蚀剂体系
公开(公告)号：US20050106494A1
公开(公告)日：2005-05-19
申请号：US10716785
申请日：2003-11-19
申请人： Wu-Song Huang , Robert Allen , Marie Angelopoulos , Ranee Kwong , Ratnam Sooriyakumaran
发明人： Wu-Song Huang , Robert Allen , Marie Angelopoulos , Ranee Kwong , Ratnam Sooriyakumaran
IPC分类号： G03F7/039 , C08G77/22 , G03C1/492 , G03F7/004 , G03F7/075 , G03F7/09 , G03F7/11 , G03F7/20 , H01L21/027
CPC分类号： G03F7/094 , G03F7/0045 , G03F7/0046 , G03F7/0757
摘要： Inventive silsesquioxane polymers are provided, and photoresist compositions that contain such silsesquioxane polymers are provided in which at least a portion of the silsesquioxane polymer contains fluorinated moieties, and at least a portion of the silisesquioxane polymer contains pendant solubility inhibiting cyclic ketal acid-labile moieties that have low activation energy for acid-catalyzed cleaving. The inventive polymer also contains pendant polar moieties that promote alkaline solubility of the resist in aqueous alkaline solutions. The inventive polymers are particularly useful in positive resist compositions. The invention encompasses methods of using such photoresist compositions in forming a patterned structure on a substrate, and particularly multilayer (e.g. bilayer) photolithographic methods, which methods are capable of producing high resolution images at wavelengths such as 193 nm and 157 nm.
摘要翻译：提供了本发明的倍半硅氧烷聚合物，并且提供了含有这种倍半硅氧烷聚合物的光致抗蚀剂组合物，其中至少一部分倍半硅氧烷聚合物含有氟化部分，并且至少一部分硅倍半硅氧烷聚合物含有侧链溶解性抑制性环状缩酮酸不稳定部分，具有低活化能的酸催化裂解。本发明的聚合物还含有侧链极性部分，其促进抗蚀剂在碱性水溶液中的碱溶性。本发明的聚合物在正性抗蚀剂组合物中特别有用。本发明包括使用这种光致抗蚀剂组合物在基底上形成图案化结构的方法，特别是多层（例如双层）光刻方法，该方法能够在诸如193nm和157nm的波长下产生高分辨率图像。

125. 发明申请

US20050050500A1 THE USE OF A LAYOUT-OPTIMIZATION TOOL TO INCREASE THE YIELD AND RELIABILITY OF VLSI DESIGNS 失效
公开(公告)号：US20050050500A1
公开(公告)日：2005-03-03
申请号：US10604962
申请日：2003-08-28
申请人： Robert Allen , Jason Hibbeler , Gustavo Tellez
发明人： Robert Allen , Jason Hibbeler , Gustavo Tellez
IPC分类号： G06F9/45 , G06F17/50
CPC分类号： G06F17/5068
摘要： The invention provides a method and structure for optimizing placement of redundant vias within an integrated circuit design. The invention first locates target vias by determining which vias do not have a redundant via. Then, the invention draws marker shapes on or adjacent to the target vias. The marker shapes are only drawn in a horizontal or vertical direction from each of the target vias. Next, the invention simultaneously expands all of the marker shapes in the first direction to a predetermined length or until the marker shapes reach the limits of a ground rule. During the expanding, different marker shapes will be expanded to different lengths. The invention determines which of the marker shapes were expanded sufficiently to form a valid redundant via to produce a first set of potential redundant vias and the invention eliminates marker shapes that could not be expanded sufficiently to form a valid redundant via. The invention repeats the foregoing processing in the direction perpendicular to the first. The invention can also be used to eliminate certain undesirable structures such as stacked vias or can be used to fix other problems such as insufficient via-to-via spacing. The invention then adds the redundant vias to the integrated circuit design, according to output produced by the optimizer.

126. 发明授权

US06213853B1 Integral machine for polishing, cleaning, rinsing and drying workpieces 失效
标题翻译：抛光，清洗，漂洗和干燥工件的整体机
公开(公告)号：US06213853B1
公开(公告)日：2001-04-10
申请号：US08926700
申请日：1997-09-10
申请人： Jose R. Gonzalez-Martin , Chris Karlsrud , Robert Allen , Toby Jordan , Craig Howard , Arthur Hamer , Jeff Cunnane , Periya Gopalan , Bill Thornton , Jon MacErnie , Fernando Calderon
发明人： Jose R. Gonzalez-Martin , Chris Karlsrud , Robert Allen , Toby Jordan , Craig Howard , Arthur Hamer , Jeff Cunnane , Periya Gopalan , Bill Thornton , Jon MacErnie , Fernando Calderon
IPC分类号： B24B500
CPC分类号： H01L21/02052 , B24B37/04 , B24B41/005
摘要： An integral machine for polishing, cleaning, rinsing and drying workpieces such as semiconductor wafers. A load/unload station has a plurality of platforms for receiving cassettes of wafers to be processed. A dry end-effector of a robot retrieves wafers from the cassettes and transfers them to an index table. A transfer apparatus having wafer carrier elements picks up wafers from the index table, moves the wafers to a polishing table for polishing, and returns the wafers to the index table for further processing. A flipper moves the polished wafers to a cleaning station. The cleaning station includes scrub stations, a rinsing station and a spin dryer station, and a connective system of water tracks. A wet end-effector of the robot transfers rinsed wafers to the spin dryer station. The dry end-effector of the robot moves dried wafers from the spin dryer station back to the cassette of origination.
摘要翻译：用于抛光，清洁，漂洗和干燥工件如半导体晶片的整体机器。装载/卸载站具有用于接收要处理的晶片盒的多个平台。机器的干燥末端执行器从盒中取出晶片并将它们转移到索引表。具有晶片载体元件的转印装置从分度台拾取晶片，将晶片移动到用于抛光的抛光台，并将晶片返回到索引表以进行进一步处理。抛光器将抛光的晶片移动到清洁站。清洁站包括洗刷站，漂洗站和旋转干燥站，以及水道连接系统。机器的湿端部执行器将冲洗的晶片传送到旋转干燥站。机器人的干燥末端执行器将干燥的晶片从旋转干燥器站移回到起始盒。

127. 外观设计

USD353698S Motorized golf bag cart 失效
公开(公告)号：USD353698S
公开(公告)日：1994-12-20
申请号：US11690
申请日：1993-08-12
申请人： Ronald D. Stevens , Robert Allen
设计人： Ronald D. Stevens , Robert Allen

128. 发明授权

US4081622A Electronic circuit for a speakerphone 失效
标题翻译：用于扬声器的电子电路
公开(公告)号：US4081622A
公开(公告)日：1978-03-28
申请号：US737015
申请日：1976-10-29
申请人： Jeremy Clark , Robert Allen
发明人： Jeremy Clark , Robert Allen
IPC分类号： H04R3/02 , H04M1/60
CPC分类号： H04R3/02
摘要： The invention relates to an electronic circuit for a speakerphone which, when in the balanced condition, will eliminate acoustic feedback as between the microphone and the speaker of the speakerphone. The arrangement consists of a bridge having four legs. Input from telephone lines are fed into the bridge between two adjacent points (i.e. across one leg) of the bridge. The microphone is connected between one of the input points and a point opposite to the one input point. The legs on either side of the opposite point of the microphone connection contain equal impedances, and the fourth leg, between the input leg and one of the equal impedance legs, contains a variable impedance. To balance the bridge, the variable impedance is adjusted such that the microphone signal, appearing in opposite sides of the bridge, will be canceled out and thereby prevented from exiting on the speaker circuits. However, because of the imbalance relative thereto, the microphone signal will be passed up the telephone lines. Again, because of a similar imbalance, input from the telephone lines will be fed out to the speaker circuits.

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