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111. 发明授权

US5770123A Method and apparatus for energy beam machining 失效
标题翻译：能量束加工方法和装置
公开(公告)号：US5770123A
公开(公告)日：1998-06-23
申请号：US531698
申请日：1995-09-21
申请人： Masahiro Hatakeyama , Katsunori Ichiki , Tadasuke Kobata , Masayuki Nakao , Yotaro Hatamura
发明人： Masahiro Hatakeyama , Katsunori Ichiki , Tadasuke Kobata , Masayuki Nakao , Yotaro Hatamura
IPC分类号： H01J37/305 , B29C59/16
CPC分类号： H01J37/3056 , H01J2237/3114
摘要： An energy beam is irradiated to a workpiece through a beam transmission hole defined in a mask. At that time, a relative position between an energy beam source and the mask or the mask and the workpiece is changed, so that machining depth of the workpiece is varied depending on machining portions of the workpiece, which correspond to amounts of irradiation of the energy beam. With this method, a machined product having locally different depths very easily can be made and further the product can be machined to desired depths with high accuracy by a single machining operation in a short time.
摘要翻译：能量束通过限定在掩模中的光束传播孔照射到工件。此时，能量束源与掩模或掩模和工件之间的相对位置改变，使得工件的加工深度根据工件的加工部分而变化，其对应于能量的照射量光束。通过这种方法，可以非常容易地形成具有局部不同深度的加工产品，并且通过在短时间内的单个加工操作，可以高精度地将产品加工成期望的深度。

112. 发明授权

US5640009A Fast atom beam source 失效
标题翻译：快原子束源
公开(公告)号：US5640009A
公开(公告)日：1997-06-17
申请号：US943569
申请日：1992-09-11
申请人： Masahiro Hatakeyama
发明人： Masahiro Hatakeyama
IPC分类号： G21K1/00 , H01J27/08 , H05H3/02
CPC分类号： H05H3/02
摘要： A small fast atom beam source is capable of neutralizing ions at a high rate and of emitting a fast atom beam efficiently and with excellent directivity. A gas is introduced into the area between a plate-shaped anode having a plurality of atom emitting holes and a plate-shaped anode facing the cathode. A gas discharge is induced by a DC high-voltage power supply, thereby forming a plasma. Ions that are produced by the plasma are accelerated toward the cathode and neutralized in and near the atom emitting holes, which have lengths larger than the diameters thereof, thereby emitting a fast atom beam at a high rate of neutralization.
摘要翻译：一个小的快速原子束源能够以高的速率中和离子并且有效地发射快速原子束并具有优良的方向性。在具有多个原子发射孔的板状阳极和面向阴极的板状阳极之间的区域中引入气体。由直流高压电源引起气体放电，从而形成等离子体。由等离子体产生的离子将朝着阴极加速并在原子发射孔内和附近中和，其长度大于其直径，从而以高的中和速率发射快速原子束。

113. 发明授权

US5216241A Fast atom beam source 失效
标题翻译：快速ATOM光束源
公开(公告)号：US5216241A
公开(公告)日：1993-06-01
申请号：US845202
申请日：1992-03-03
申请人： Masahiro Hatakeyama , Kazutoshi Nagai
发明人： Masahiro Hatakeyama , Kazutoshi Nagai
IPC分类号： H01J37/02 , H05H3/02
CPC分类号： H05H3/02 , H01J37/026
摘要： A fast atom beam source is capable of emitting a fast atom beam with low energy efficiently and is compact. A reaction gas mixed with a halogen or a halide is introduced into a fast atom beam source casing through a plate-shaped anode, and gas ions that are produced by a plasma discharge induced at a relatively low discharge voltage are converted into a fast atom beam, which is emitted from fast atom beam emitting holes provided in a plate-shaped cathode that is disposed opposite the anode.

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