专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

111. 发明授权

US08210022B2 Pressure type flow rate control reference and corrosion resistant pressure type flow rate controller used for the same 有权
标题翻译：压力式流量控制参考和耐腐蚀压力式流量控制器用于相同
公开(公告)号：US08210022B2
公开(公告)日：2012-07-03
申请号：US12332897
申请日：2008-12-11
申请人： Shuji Moriya , Wataru Okase , Tsutomu Shinohara , Nobukazu Ikeda , Michio Yamaji , Yasutaka Hayashi , Toshihide Yoshida , Yasuyuki Omata
发明人： Shuji Moriya , Wataru Okase , Tsutomu Shinohara , Nobukazu Ikeda , Michio Yamaji , Yasutaka Hayashi , Toshihide Yoshida , Yasuyuki Omata
IPC分类号： G01F25/00 , G05D7/06
CPC分类号： G05D7/0635 , Y10T137/2708 , Y10T137/776 , Y10T137/7761 , Y10T137/7793
摘要： A pressure type flow rate control reference allows the performance of flow rate calibrations of a flow rate controller on all types of gases, including corrosive gases, at low costs, and also has excellent flow rate control accuracy. The pressure type flow rate control reference includes a pressure controller for adjusting the pressure of a calibration gas from a calibration gas supply source, a first volume provided on the downstream side of a pressure controller, a first connection mouth of an uncalibrated flow rate controller provided on the downstream side of the first volume, a reference pressure type flow rate controller connected to a second connection mouth on the downstream side of the uncalibrated flow rate controller, a second volume provided on the downstream side of a reference pressure type flow rate controller, and an evacuation device provided on the downstream side of the second volume.
摘要翻译：压力式流量控制参考允许以低成本执行流量控制器对所有类型气体（包括腐蚀性气体）的流量校准，并且还具有优异的流量控制精度。压力型流量控制基准包括用于调节来自校准气体供给源的校准气体的压力的压力控制器，设置在压力控制器的下游侧的第一容积，未校准的流量控制器的第一连接口，在第一容积的下游侧具有与未校准流量控制器的下游侧的第二连接口连接的基准压力型流量控制器，设置在基准压力型流量控制器的下游侧的第二容积，以及设置在第二容积的下游侧的抽空装置。

112. 发明授权

US07935385B2 Metal material having formed thereon chromium oxide passive film and method for producing the same, and parts contacting with fluid and system for supplying fluid and exhausting gas 失效
标题翻译：在其上形成有氧化铬钝化膜的金属材料及其制造方法，以及与流体接触的部件和用于供应流体和排出气体的系统
公开(公告)号：US07935385B2
公开(公告)日：2011-05-03
申请号：US10646855
申请日：2003-08-21
申请人： Tadahiro Ohmi , Yasuyuki Shirai , Nobukazu Ikeda , Eiji Ideta , Akihiro Morimoto , Tetsutaro Ogushi , Takehisa Konishi
发明人： Tadahiro Ohmi , Yasuyuki Shirai , Nobukazu Ikeda , Eiji Ideta , Akihiro Morimoto , Tetsutaro Ogushi , Takehisa Konishi
IPC分类号： B05D3/02 , B05D3/04 , C25D5/50
CPC分类号： C23C8/02 , C23C26/00 , Y10T428/24322 , Y10T428/24355 , Y10T428/31678
摘要： The object of the present invention is to form a chromium-oxide film excellent in corrosion resistance without containing an oxide film of other metal onto the optional metallic material. The chromium-oxide passivation film excellent in corrosion resistance without containing the oxide film of other metal can be formed inexpensively and in a short time, and a fluid supplying system for supplying fluid hard in corrosivity in safety is able to be provided. This invention comprises a step of forming the passivation film consisting of a chromium oxide by giving heat treatment in an oxidizing atmosphere after coating chromium on metallic material of which surface roughness (Ra) of a coat surface is not more than 1.5 μm
摘要翻译：本发明的目的是在不含任何金属材料的其它金属的氧化物膜的情况下，形成耐腐蚀性优异的氧化铬膜。能够廉价且短时间地形成不含有其他金属的氧化物膜的耐腐蚀性优异的氧化铬钝化膜，能够提供安全的腐蚀性难以供给流体的流体供给系统。本发明包括以下步骤：在涂覆表面的粗糙度（Ra）不大于1.5μm的金属材料上涂覆铬后，在氧化气氛中进行热处理，形成由氧化铬组成的钝化膜

113. 发明授权

US07673649B2 Vacuum thermal insulating valve 失效
标题翻译：真空保温阀
公开(公告)号：US07673649B2
公开(公告)日：2010-03-09
申请号：US10597303
申请日：2005-01-13
申请人： Tadahiro Ohmi , Yukio Minami , Kenji Tubota , Tsutomu Shinohara , Michio Yamaji , Nobukazu Ikeda , Akihiro Morimoto , Koji Kawada , Toshio Nariai
发明人： Tadahiro Ohmi , Yukio Minami , Kenji Tubota , Tsutomu Shinohara , Michio Yamaji , Nobukazu Ikeda , Akihiro Morimoto , Koji Kawada , Toshio Nariai
IPC分类号： B65D81/20
CPC分类号： F16K51/02 , Y10T137/6606 , Y10T137/7043 , Y10T137/7062
摘要： The present invention provides a vacuum thermal insulating valve that may be used at high temperature in gas supply systems or gas exhaust systems, and also may be made substantially small and compact in size owing to its excellent thermal insulating performance. With a vacuum thermal insulating valve comprising a valve equipped with a valve body and an actuator, and a vacuum thermal insulating box that houses the valve, the afore-mentioned vacuum thermal insulating box S is formed by a square-shaped lower vacuum jacket S5 having a cylinder-shaped vacuum thermal insulating pipe receiving part J on a side and with its upper face made open, and the square-shaped upper vacuum jackets S4, which is hermetically fitted to the lower vacuum jacket S5 and with its lower face made open.
摘要翻译：本发明提供一种真空绝热阀，其可以在气体供给系统或排气系统中在高温下使用，并且由于其绝热性能优异，也可以制成大小小型的真空绝热阀。使用包括阀体和致动器的阀的真空隔热阀和容纳阀的真空保温箱，上述真空保温箱S由方形的下部真空夹套S5形成，圆筒形真空绝热管接收部分J的侧面并且其上表面打开，方形的上部真空夹套S4气密地装配到下部真空套筒S5上并且其下表面打开。

114. 发明授权

US07472887B2 Valve for vacuum exhaustion system 有权
标题翻译：真空排气系统阀门
公开(公告)号：US07472887B2
公开(公告)日：2009-01-06
申请号：US10545672
申请日：2004-02-09
申请人： Tadahiro Ohmi , Nobukazu Ikeda , Michio Yamaji , Masafumi Kitano , Akihiro Morimoto
发明人： Tadahiro Ohmi , Nobukazu Ikeda , Michio Yamaji , Masafumi Kitano , Akihiro Morimoto
IPC分类号： F16K7/17
CPC分类号： F16K7/14 , F16K27/003 , F16K51/02
摘要： The present invention provides a valve which makes it possible to reduce the diameter of the vacuum exhaustion pipings for making the facility for the vacuum exhaustion system small, as a result lowering the costs, and making the vacuum exhaustion time short, and also which can prevent the corrosions, cloggings, and seal leakages inside the piping system caused by the accumulation of substances produced by the decomposition of the gas.Specifically, the aluminum passivation is applied on the piping parts, i.e. the valve and others, used in the vacuum exhaustion system to inhibit the gas decomposition caused by the temperature rise at the time of the baking so that components for the reduction in the diameter size in the vacuum exhaustion system are provided. The corrosions, cloggings and seat leakages caused by the gas decomposition are prevented.
摘要翻译：本发明提供一种阀，其能够减小用于真空排气系统的设备的真空排气管的直径，结果是降低成本，并且使真空耗尽时间短，并且还可以防止由气体分解产生的物质的积聚引起的管道系统内的腐蚀，堵塞和密封泄漏。具体地说，在真空耗尽系统中使用的管道部件即阀门等上施加铝钝化，以抑制由烘烤时的温度升高引起的气体分解，从而减小直径尺寸的部件在真空耗尽系统中提供。防止气体分解引起的腐蚀，堵塞和座椅泄漏。

115. 发明申请

US20080003441A1 Metal material having formed thereon chromium oxide passive film and method for producing the same, and parts contacting with fluid and system 审中-公开
标题翻译：在其上形成有氧化铬钝化膜的金属材料及其制造方法，以及与流体和系统接触的部件
公开(公告)号：US20080003441A1
公开(公告)日：2008-01-03
申请号：US11878976
申请日：2007-07-30
申请人： Tadahiro Ohmi , Yasuyuki Shirai , Nobukazu Ikeda , Eiji Ideta , Akihiro Morimoto , Tetsutaro Ogushi , Takehisa Konishi
发明人： Tadahiro Ohmi , Yasuyuki Shirai , Nobukazu Ikeda , Eiji Ideta , Akihiro Morimoto , Tetsutaro Ogushi , Takehisa Konishi
IPC分类号： B32B15/04
CPC分类号： C23C8/02 , C23C26/00 , Y10T428/24322 , Y10T428/24355 , Y10T428/31678
摘要： The object of the present invention is to form a chromium-oxide film excellent in corrosion resistance without containing an oxide film of other metal onto the optional metallic material. The chromium-oxide passivation film excellent in corrosion resistance without containing the oxide film of other metal can be formed inexpensively and in a short time, and a fluid supplying system for supplying fluid hard in corrosivity in safety is able to be provided. This invention comprises a step of forming the passivation film consisting of a chromium oxide by giving heat treatment in an oxidizing atmosphere after coating chromium on metallic material of which surface roughness (Ra) of a coat surface is not more than 1.5 μm
摘要翻译：本发明的目的是在不含任何金属材料的其它金属的氧化物膜的情况下，形成耐腐蚀性优异的氧化铬膜。能够廉价且短时间地形成不含有其他金属的氧化物膜的耐腐蚀性优异的氧化铬钝化膜，能够提供安全的腐蚀性难以供给流体的流体供给系统。本发明包括以下步骤：在涂覆表面的表面粗糙度（Ra）不大于1.5μm的金属材料上涂覆铬之后，在氧化气氛中进行热处理，形成由氧化铬组成的钝化膜

116. 发明授权

US07103990B2 Rotary silicon wafer cleaning apparatus 有权
标题翻译：旋转硅片清洗装置
公开(公告)号：US07103990B2
公开(公告)日：2006-09-12
申请号：US10498800
申请日：2003-09-11
申请人： Tadahiro Ohmi , Yasuyuki Shirai , Takumi Fujita , Yukio Minami , Nobukazu Ikeda , Akihiro Morimoto , Koji Kawada
发明人： Tadahiro Ohmi , Yasuyuki Shirai , Takumi Fujita , Yukio Minami , Nobukazu Ikeda , Akihiro Morimoto , Koji Kawada
IPC分类号： F26B5/08
CPC分类号： H01L21/67034 , H01L21/02052
摘要： It is an object of the present invention to provide a rotation type silicon wafer cleaning device to further raise the stability of a silicon wafer by providing a better hydrogen termination on the silicon wafer after completion of chemical and pure water cleaning treatments.According to the present invention, a rotation type silicon wafer cleaning device has a silicon wafer support/rotation driving mechanism inside the case body for cleaning the silicon wafer at the post chemical cleaning with pure water, drying and hydrogen termination treatments on the outer surface of a silicon wafer is performed by means of installing a silicon wafer drying device comprising a gas supply panel attached to a case body to supply a mixed gas of the hydrogen gas and inactive gas containing a hydrogen gas of more than 0.05%, a mixed gas supply pipe coupled to a gas mixer of the afore-mentioned gas supply panel at one end, a mixed gas heating device to heat the mixed gas in the afore-mentioned gas supply pipe, and a hydrogen radical formation apparatus equipped with a platinum coating film to form hydrogen radical at the gas contacting part where to a high temperature gas heated with the afore-mentioned mixed gas heating device touches, thus to gush out the mixed gas containing hydrogen radical formed with the afore-mentioned radical formation apparatus onto the rotating silicon wafer after cleaning is completed.
摘要翻译：本发明的目的是提供一种旋转型硅晶片清洁装置，以在化学和纯净水清洗处理完成之后通过在硅晶片上提供更好的氢终止来进一步提高硅晶片的稳定性。根据本发明，旋转型硅晶片清洗装置在壳体内部具有硅晶片支撑/旋转驱动机构，用于在后期化学清洗时用纯水清洗硅晶片，在外表面上进行干燥和氢终止处理通过安装硅晶片干燥装置来执行硅晶片，所述硅晶片干燥装置包括附接到壳体的气体供应板，以供应氢气和含有大于0.05％的氢气的惰性气体的混合气体，混合气体供应一端连接上述气体供给面板的气体混合器的管道，将上述气体供给管内的混合气体加热的混合气体加热装置以及配备有铂镀膜的氢自由基形成装置，在与上述混合气体加热装置加热的高温气体接触的气体接触部分处形成氢自由基，从而喷出混合气体在完成清洁之后，将上述自由基形成装置形成的氢基团固定在旋转的硅晶片上。

117. 发明申请

US20060071192A1 Valve for vacuum exhaustion system 有权
公开(公告)号：US20060071192A1
公开(公告)日：2006-04-06
申请号：US10545672
申请日：2004-02-09
申请人： Tadahiro Ohmi , Nobukazu Ikeda , Michio Yamaji , Masafumi Kitano , Akhiro Morimoto
发明人： Tadahiro Ohmi , Nobukazu Ikeda , Michio Yamaji , Masafumi Kitano , Akhiro Morimoto
IPC分类号： F16K1/00
CPC分类号： F16K7/14 , F16K27/003 , F16K51/02
摘要： The present invention provides a valve which makes it possible to reduce the diameter of the vacuum exhaustion pipings for making the facility for the vacuum exhaustion system small, as a result lowering the costs, and making the vacuum exhaustion time short, and also which can prevent the corrosions, cloggings, and seal leakages inside the piping system caused by the accumulation of substances produced by the decomposition of the gas. Specifically, the aluminum passivation is applied on the piping parts, i.e. the valve and others, used in the vacuum exhaustion system to inhibit the gas decomposition caused by the temperature rise at the time of the baking so that components for the reduction in the diameter size in the vacuum exhaustion system are provided. The corrosions, cloggings and seat leakages caused by the gas decomposition are prevented.

118. 发明申请

US20050179259A1 Pipe joint 有权
标题翻译：管接头
公开(公告)号：US20050179259A1
公开(公告)日：2005-08-18
申请号：US10506671
申请日：2003-03-19
申请人： Kazuhiko Sugiyama , Keiko Hada , Eiji Ideta , Nobukazu Ikeda , Naofumi Yasumoto , Michio Yamaji
发明人： Kazuhiko Sugiyama , Keiko Hada , Eiji Ideta , Nobukazu Ikeda , Naofumi Yasumoto , Michio Yamaji
IPC分类号： F16L19/08 , F16L19/02 , F16L19/025 , F16L19/03 , F16L23/036 , F16L47/14 , F16L17/00
CPC分类号： F16L19/0218 , F16L19/0225 , F16L19/025
摘要： A pipe joint 1 comprises a first joint member 2 of synthetic resin having an annular recessed portion 7 in an end face thereof, and a second joint member 3 of synthetic resin having an annular ridge 8 on an end face thereof. The ridge 8 is fitted in the opening of the recessed portion 7, with a synthetic resin gasket 4 fitted in the recessed portion 7. When the pipe joint 1 is properly tightened up, the outer surface of the ridge 8 of the second joint member 3 is pressed against the inner surface of the recessed portion 7 of the first joint member 2 with the gasket 4 interposed therebetween in intimate contact the surfaces approximately over the entire areas thereof, a portion 2d of the end face of the first joint member 2 positioned radially inwardly of the recessed portion is then in intimate contact with a portion 3d of the end face of the second joint member 3 positioned radially inwardly of the ridge approximately over the entire surface areas thereof, a portion 2e of the end face of the first joint member 2 positioned radially outwardly of the recessed portion is then in intimate contact with a portion 3e of the end face of the second joint member 3 positioned radially outwardly of the ridge approximately over the entire surface areas thereof.
摘要翻译：管接头1包括合成树脂的第一接头构件2，其端面具有环形凹部7，在其端面上具有合成树脂的第二接头构件3，其具有环形脊8。脊8装配在凹部7的开口中，合成树脂垫圈4装配在凹部7中。当管接头1被适当地紧固时，第二接头构件3的脊8的外表面被密封接触地压靠在第一接头构件2的凹部7的内表面上，垫圈4插入其中表面大致在其整个区域上，位于凹部的径向内侧的第一接合构件2的端面的部分2d然后与位于第二接头构件3的端面的部分3d紧密接触大致在其整个表面区域的脊部的径向内侧，位于凹部的径向外侧的第一接合部件2的端面的部分2e紧密接触于凹部的端面部分3e 第二接头构件3大致在其整个表面区域上径向向外设置。

119. 发明授权

US06334962B1 Low flow rate moisture supply process 失效
标题翻译：低流量水分供应过程
公开(公告)号：US06334962B1
公开(公告)日：2002-01-01
申请号：US09207763
申请日：1998-12-09
申请人： Yukio Minami , Koji Kawada , Yoshikazu Tanabe , Nobukazu Ikeda , Akihiro Morimoto
发明人： Yukio Minami , Koji Kawada , Yoshikazu Tanabe , Nobukazu Ikeda , Akihiro Morimoto
IPC分类号： C01B500
CPC分类号： F22B1/003 , C01B5/00
摘要： A process of supplying moisture at low flow rates which permits high precision control of the flow of moisture to a semiconductor manufacturing line from an apparatus for the generation of moisture, characterized in that the flow of hydrogen to a moisture-generating reactor is controlled by means of a flow controller in such a way that an amount of hydrogen as fed is gradually increased from the start and reaches a specific set level such that when a specific time has passed, a predetermined rate of moisture begins to be produced and supplied to the semiconductor manufacturing line. The moisture is generated in the apparatus for generation of moisture in which hydrogen and oxygen are (a) fed into a reactor provided with a coat of platinum on the wall in the interior space, (b) enhanced in reactivity by the platinum catalytic action, and (c) caused to instantaneously react with each other at a temperature lower than the ignition point to produce moisture without undergoing combustion at a high temperature.
摘要翻译：以低流量供应水分的方法，其允许从用于产生水分的装置对半导体生产线的水分流的高精度控制，其特征在于，通过装置控制氢气流向产生水分的反应器的流量控制器，使得所供给的氢气的量从开始逐渐增加并达到特定设定水平，使得当经过特定时间时，开始产生预定的水分率并将其供应到半导体生产线。在用于产生水分的装置中产生水分，其中（a）在内部空间的壁上被供给到设置有铂层的反应器的反应器中，（b）通过铂催化作用增强反应性，和（c）在低于点火点的温度下彼此瞬间反应以产生湿气，而不会在高温下经历燃烧。

120. 发明授权

US06273477B1 Gasket and pipe joint 有权
标题翻译：垫圈和管接头
公开(公告)号：US06273477B1
公开(公告)日：2001-08-14
申请号：US09253942
申请日：1999-02-22
申请人： Tadahiro Ohmi , Michio Yamaji , Tsutomu Shinohara , Nobukazu Ikeda , Akihiro Morimoto
发明人： Tadahiro Ohmi , Michio Yamaji , Tsutomu Shinohara , Nobukazu Ikeda , Akihiro Morimoto
IPC分类号： F16L2500
CPC分类号： C22C38/44 , F16L19/0212 , Y10S285/917
摘要： A pipe joint comprises a pair of tubular joint members, an annular gasket interposed between opposed end faces of the two joint members, and threaded means for joining the two joint members. Each of the joint members is prepared from a stainless steel having a surface with a Vickers hardness of at least 300. The gasket is prepared from a stainless steel comprising, in ratio by weight, 12.90 to 15.00% of Ni, 16.50 to 18.00% of Cr, 2.00 to 3.00% of Mo, up to 0.02% of C, up 0.30% of Si, up to 0.40% of Mn, up to 0.03% of P, up to 0.003% of S, up to 0.25% of Cu and up to 0.01% of Al, the gasket having a surface with a Vickers hardness of 90 to 160.
摘要翻译：管接头包括一对管状接头构件，插入在两个接头构件的相对端面之间的环形垫圈，以及用于接合两个接头构件的螺纹装置。每个接合构件由具有维氏硬度至少为300的表面的不锈钢制成。垫圈由不锈钢制成，其包含按重量计12.10％至15.00％的Ni，16.50至18.00％的 Cr，2.00〜3.00％的Mo，高达0.02％的C，0.30％的Si，至多0.40％的Mn，至多0.03％的P，至多0.003％的S，至多0.25的Cu和高达0.01％的Al，垫圈具有维氏硬度为90至160的表面。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式