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101. 发明授权

US08767181B2 Microlithographic exposure method as well as a projection exposure system for carrying out the method 有权
标题翻译：微光刻曝光方法以及用于实施该方法的投影曝光系统
公开(公告)号：US08767181B2
公开(公告)日：2014-07-01
申请号：US12946380
申请日：2010-11-15
申请人： Toralf Gruner , Daniel Kraehmer , Michael Totzeck , Johannes Wangler , Markus Brotsack , Nils Dieckmann , Aksel Goehnermeier , Markus Schwab , Damian Fiolka , Markus Zenzinger
发明人： Toralf Gruner , Daniel Kraehmer , Michael Totzeck , Johannes Wangler , Markus Brotsack , Nils Dieckmann , Aksel Goehnermeier , Markus Schwab , Damian Fiolka , Markus Zenzinger
IPC分类号： G03B27/72 , G03B27/54 , G03F7/20
CPC分类号： G03F7/70566 , G03F7/70108 , G03F7/70225 , G03F7/70308
摘要： In an exposure method for exposing a substrate which is arranged in the area of an image plane of a projection objective as well as in a projection exposure system for performing that method, output radiation directed at the substrate and having an output polarization state is produced. Through variable adjustment of the output polarization state with the aid of at least one polarization manipulation device, the output polarization state can be formed to approach a nominal output polarization state. The polarization manipulation can be performed in a control loop on the basis of polarization-optical measuring data.
摘要翻译：在用于曝光布置在投影物镜的像面的区域中的基板以及用于执行该方法的投影曝光系统中的曝光方法中，产生了指向基板并具有输出偏振态的输出辐射。通过借助于至少一个偏振操纵装置对输出偏振状态的可变调节，输出偏振状态可以形成为接近标称输出偏振状态。可以在基于偏振光学测量数据的控制回路中进行极化处理。

102. 发明授权

US08730455B2 Illumination system for a microlithographic projection exposure apparatus 有权
标题翻译：用于微光刻投影曝光装置的照明系统
公开(公告)号：US08730455B2
公开(公告)日：2014-05-20
申请号：US13181033
申请日：2011-07-12
申请人： Damian Fiolka , Manfred Maul , Axel Scholz , Markus Deguenther , Johannes Wangler , Vladimir Davydenko
发明人： Damian Fiolka , Manfred Maul , Axel Scholz , Markus Deguenther , Johannes Wangler , Vladimir Davydenko
IPC分类号： G03B27/54 , G03B27/72 , G03F7/20 , G03B27/68 , G03B27/42 , G03B27/52
CPC分类号： G03F7/7015 , G03B27/54 , G03F7/70075 , G03F7/70108
摘要： An illumination system for a microlithographic projection exposure step-and-scan apparatus has a light source, a first optical raster element and a second optical raster element. The first optical raster element extends in a first pupil plane of the illumination system and is designed such that the geometrical optical flux of the system is increased perpendicular to a scan direction of the projection exposure apparatus. The second optical raster element extends in a second pupil plane of the illumination system, which is not necessarily different from the first pupil plane, and is designed such that the geometrical optical flux of the system is increased in the scan direction and perpendicular thereto. This makes it possible to improve the irradiance uniformity in a reticle plane.
摘要翻译：用于微光刻投影曝光步进扫描装置的照明系统具有光源，第一光栅元件和第二光栅元件。第一光栅元件在照明系统的第一光瞳平面中延伸，并且被设计成使得系统的几何光通量垂直于投影曝光设备的扫描方向增加。第二光栅元件在照明系统的第二光瞳平面中延伸，其不一定与第一光瞳平面不同，并且被设计成使得系统的几何光通量在扫描方向上和垂直于其上增加。这使得可以提高掩模版平面中的辐照度均匀性。

103. 发明申请

US20100283985A1 MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 有权
标题翻译：微波投影曝光装置
公开(公告)号：US20100283985A1
公开(公告)日：2010-11-11
申请号：US12818844
申请日：2010-06-18
申请人： Michael Layh , Markus Deguenther , Michael Patra , Johannes Wangler , Manfred Maul , Damian Fiolka , Gundula Weiss
发明人： Michael Layh , Markus Deguenther , Michael Patra , Johannes Wangler , Manfred Maul , Damian Fiolka , Gundula Weiss
IPC分类号： G03B27/54
CPC分类号： G03F7/702 , G02B5/09 , G02B26/105 , G03F7/70116 , G03F7/7055 , G03F7/70583
摘要： A projection exposure apparatus for microlithography comprises illumination optics for illuminating object field points of an object field in an object plane is disclosed. The illumination optics have, for each object field point of the object field, an exit pupil associated with the object point, where sin(γ) is a greatest marginal angle value of the exit pupil. The illumination optics include a multi-mirror array that includes a plurality of mirrors to adjust an intensity distribution in exit pupils associated to the object field points. The illumination optics further contain at least one optical system to temporally stabilize the illumination of the multi-mirror array so that, for each object field point, the intensity distribution in the associated exit pupil deviates from a desired intensity distribution in the associated exit pupil in the case of a centroid angle value sin(β) by less than 2% expressed in terms of the greatest marginal angle value sin(γ) of the associated exit pupil and/or, in the case of ellipticity by less than 2%, and/or in the case of a pole balance by less than 2%.
摘要翻译：公开了一种用于微光刻的投影曝光装置，包括用于照射物平面中的物场的对象场点的照明光学装置。对于物场的每个物场点，照明光学器件具有与对象点相关联的出射光瞳，其中sin（γ）是出射光瞳的最大边缘角度值。照明光学器件包括多镜阵列，其包括多个反射镜以调整与对象场点相关联的出射光瞳中的强度分布。照明光学器件还包含至少一个光学系统，用于暂时稳定多镜阵列的照明，使得对于每个物体场点，相关出射光瞳中的强度分布偏离相关联的出射光瞳中的期望强度分布以关联出射光瞳的最大边缘角度值sin（γ）表示的质心角值sin（＆bgr）小于2％的情况和/或在椭圆度小于2％的情况下，和/或在极平衡小于2％的情况下。

104. 发明申请

US20090021716A1 ILLUMINATION SYSTEM FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 有权
标题翻译：微波投影曝光装置照明系统
公开(公告)号：US20090021716A1
公开(公告)日：2009-01-22
申请号：US12190308
申请日：2008-08-12
申请人： Johannes Wangler , Heiko Siekmann , Kenneth Weible , Ralf Scharnweber , Manfred Maul , Markus Deguenther , Michael Layh , Axel Scholz , Uwe Spengler , Reinhard Voelkel
发明人： Johannes Wangler , Heiko Siekmann , Kenneth Weible , Ralf Scharnweber , Manfred Maul , Markus Deguenther , Michael Layh , Axel Scholz , Uwe Spengler , Reinhard Voelkel
IPC分类号： G03B27/54
CPC分类号： G03F7/70191 , G02B3/0056 , G02B27/0911 , G03F7/70058 , G03F7/70075 , G03F7/70083 , G03F7/70158
摘要： Illumination systems for microlithographic projection exposure apparatus, as well as related systems, components and methods are disclosed. In some embodiments, an illumination system includes one or more scattering structures and an optical integrator that produces a plurality of secondary light sources.
摘要翻译：公开了用于微光刻投影曝光装置的照明系统，以及相关系统，组件和方法。在一些实施例中，照明系统包括一个或多个散射结构和产生多个次级光源的光学积分器。

105. 发明申请

US20070206171A1 Illumination system for a microlithographic projection exposure apparatus 有权
标题翻译：用于微光刻投影曝光装置的照明系统
公开(公告)号：US20070206171A1
公开(公告)日：2007-09-06
申请号：US11505408
申请日：2006-08-17
申请人： Damian Fiolka , Manfred Maul , Vladimir Davydenko , Axel Scholz , Markus Deguenther , Johannes Wangler
发明人： Damian Fiolka , Manfred Maul , Vladimir Davydenko , Axel Scholz , Markus Deguenther , Johannes Wangler
IPC分类号： G03B27/54
CPC分类号： G03F7/7015 , G03B27/54 , G03F7/70075 , G03F7/70108
摘要： An illumination system for a microlithographic projection exposure step-and-scan apparatus has a light source, a first optical raster element and a second optical raster element. The first optical raster element extends in a first pupil plane of the illumination system and is designed such that the geometrical optical flux of the system is increased perpendicular to a scan direction of the projection exposure apparatus. The second optical raster element extends in a second pupil plane of the illumination system, which is not necessarily different from the first pupil plane, and is designed such that the geometrical optical flux of the system is increased in the scan direction and perpendicular thereto. This makes it possible to improve the irradiance uniformity in a reticle plane.
摘要翻译：用于微光刻投影曝光步进扫描装置的照明系统具有光源，第一光栅元件和第二光栅元件。第一光栅元件在照明系统的第一光瞳平面中延伸，并且被设计成使得系统的几何光通量垂直于投影曝光设备的扫描方向增加。第二光栅元件在照明系统的第二光瞳平面中延伸，其不一定与第一光瞳平面不同，并且被设计成使得系统的几何光通量在扫描方向上和垂直于其上增加。这使得可以提高掩模版平面中的辐照度均匀性。

106. 发明授权

US06885434B2 Diaphragm for an integrator unit 失效
标题翻译：用于积分器单元的隔膜
公开(公告)号：US06885434B2
公开(公告)日：2005-04-26
申请号：US10777109
申请日：2004-02-13
申请人： Johannes Wangler , Markus Degünther
发明人： Johannes Wangler , Markus Degünther
IPC分类号： G03F7/20 , G03B27/72 , G03B27/42 , G03B27/54
CPC分类号： G03F7/70075 , G03F7/70091
摘要： The invention relates to a diaphragm (1) for an integrator unit of a microlithographic projection exposure system. The diaphragm (1) includes a diaphragm opening (3), which is symmetrical with respect to a first axis of symmetry (5). The widths of the diaphragm aperture (3) in the direction of the axis of symmetry (5) are dependent on the distance (y) from the first axis of symmetry (5). The widths are greater than or equal to the width at y=0. The diaphragm (1), together with a cylindrical integrator, forms an integrator unit, which is located in an illumination system.
摘要翻译：本发明涉及一种用于微光刻投影曝光系统的积分器单元的光圈（1）。隔膜（1）包括相对于第一对称轴线（5）对称的隔膜开口（3）。隔膜孔（3）在对称轴（5）方向上的宽度取决于距第一对称轴（5）的距离（y）。宽度大于或等于y = 0处的宽度。隔膜（1）与圆柱形积分器一起形成位于照明系统中的积分器单元。

107. 发明授权

US5041862A Lens screen 失效
标题翻译：镜头屏幕
公开(公告)号：US5041862A
公开(公告)日：1991-08-20
申请号：US531778
申请日：1990-06-01
申请人： Dieter Rossman , Johannes Wangler
发明人： Dieter Rossman , Johannes Wangler
IPC分类号： G02B7/00 , F21V5/04 , G02B3/00 , G02B7/02 , G03F7/20
CPC分类号： G02B3/0056 , G02B3/0062 , G02B3/0075 , G03F7/70058 , G03F7/70825
摘要： The invention is directed to a lens screen wherein lens elements are inserted into discrete openings of a carrier. The openings are defined by a plurality of interconnected struts so that a strut is disposed between each two mutually adjacent ones of the openings. The lens elements have two optically effective surfaces which are dissimilar in size and the lens elements are tapered in the region of the lens material which is not optically utilized on at least two opposite-lying faces. The struts of the carrier support the lens elements at these tapered regions and provide support from below as well as laterally. The width of the struts is dimensioned so that they do not project beyond the free space formed by the tapers. In this way, the condition is obtained that the lens elements are arranged so as to lie tightly against each other with an optically effective surface and yet receive mechanical support from the struts of the carrier.
摘要翻译：本发明涉及一种透镜屏，其中透镜元件插入到载体的离散开口中。开口由多个互连的支柱限定，使得支柱设置在每个相互相邻的两个开口之间。透镜元件具有两个尺寸不同的光学有效表面，并且透镜元件在透镜材料的区域中是渐缩的，该透镜材料在至少两个相对的面上不被光学利用。载体的支柱在这些锥形区域处支撑透镜元件并且从下方以及横向提供支撑。支柱的宽度的尺寸设计使得它们不会突出超过由锥形形成的自由空间。以这种方式，获得了这样的条件：透镜元件被布置成以光学有效的表面彼此紧紧地彼此紧贴，并且从载体的支柱接收机械支撑。

108. 发明申请

US20140233006A1 METHOD AND DEVICE FOR MONITORING MULTIPLE MIRROR ARRAYS IN AN ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 有权
公开(公告)号：US20140233006A1
公开(公告)日：2014-08-21
申请号：US14255302
申请日：2014-04-17
申请人： Stefan Xalter , Yim-Bun Patrick Kwan , Manfred Maul , Johannes Eisenmenger , Jan Horn , Markus Deguenther , Florian Bach , Michael Patra , Damian Fiolka , Andras G. Major , Johannes Wangler , Michael Layh
发明人： Stefan Xalter , Yim-Bun Patrick Kwan , Manfred Maul , Johannes Eisenmenger , Jan Horn , Markus Deguenther , Florian Bach , Michael Patra , Damian Fiolka , Andras G. Major , Johannes Wangler , Michael Layh
IPC分类号： G03F7/20 , G01N21/55
CPC分类号： G03F7/70258 , G01B11/002 , G01B11/272 , G01M11/30 , G01N21/55 , G02B26/0833 , G03F7/70058 , G03F7/70116 , G03F7/70133 , G03F7/702 , G03F7/70291 , G03F7/70516 , G03F7/7085 , G05B13/048 , Y10S359/904
摘要： Microlithographic illumination system includes individually drivable elements to variably illuminate a pupil surface of the system. Each element deviates an incident light beam based on a control signal applied to the element. The system also includes an instrument to provide a measurement signal, and a model-based state estimator configured to compute, for each element, an estimated state vector based on the measurement signal. The estimated state vector represents: a deviation of a light beam caused by the element; and a time derivative of the deviation. The illumination system further includes a regulator configured to receive, for each element: a) the estimated state vector; and b) target values for: i) the deviation of the light beam caused by the deviating element; and ii) the time derivative of the deviation.

109. 发明授权

US08724086B2 Microlithographic projection exposure apparatus having a multi-mirror array with temporal stabilisation 有权
标题翻译：具有具有时间稳定性的多镜阵列的微光刻投影曝光装置
公开(公告)号：US08724086B2
公开(公告)日：2014-05-13
申请号：US12818844
申请日：2010-06-18
申请人： Michael Layh , Markus Deguenther , Michael Patra , Johannes Wangler , Manfred Maul , Damian Fiolka , Gundula Weiss
发明人： Michael Layh , Markus Deguenther , Michael Patra , Johannes Wangler , Manfred Maul , Damian Fiolka , Gundula Weiss
IPC分类号： G03B27/54
CPC分类号： G03F7/702 , G02B5/09 , G02B26/105 , G03F7/70116 , G03F7/7055 , G03F7/70583
摘要： A projection exposure apparatus for microlithography comprises illumination optics for illuminating object field points of an object field in an object plane is disclosed. The illumination optics have, for each object field point of the object field, an exit pupil associated with the object point, where sin(γ) is a greatest marginal angle value of the exit pupil. The illumination optics include a multi-mirror array that includes a plurality of mirrors to adjust an intensity distribution in exit pupils associated to the object field points. The illumination optics further contain at least one optical system to temporally stabilize the illumination of the multi-mirror array so that, for each object field point, the intensity distribution in the associated exit pupil deviates from a second adjusted intensity distribution in the associated exit pupil by less than 0.1 in at least one of an inner σ or an outer σ.
摘要翻译：公开了一种用于微光刻的投影曝光装置，包括用于照射物平面中的物场的对象场点的照明光学装置。对于物场的每个物场点，照明光学器件具有与对象点相关联的出射光瞳，其中sin（γ）是出射光瞳的最大边缘角度值。照明光学器件包括多镜阵列，其包括多个反射镜以调整与对象场点相关联的出射光瞳中的强度分布。照明光学器件还包含至少一个光学系统，用于在时间上稳定多镜阵列的照明，使得对于每个物体场点，相关出射光瞳中的强度分布偏离相关出射光瞳中的第二调整的强度分布在内部和外部的至少一个中小于0.1; 或外部的。

110. 发明授权

US08395756B2 Illumination system for a microlithographic projection exposure apparatus 有权
公开(公告)号：US08395756B2
公开(公告)日：2013-03-12
申请号：US12190308
申请日：2008-08-12
申请人： Johannes Wangler , Heiko Siekmann , Kenneth Weible , Ralf Scharnweber , Manfred Maul , Markus Deguenther , Michael Layh , Axel Scholz , Uwe Spengler , Reinhard Voelkel
发明人： Johannes Wangler , Heiko Siekmann , Kenneth Weible , Ralf Scharnweber , Manfred Maul , Markus Deguenther , Michael Layh , Axel Scholz , Uwe Spengler , Reinhard Voelkel
IPC分类号： G03B27/32 , G03B27/42 , G03B27/54 , G03B27/72
CPC分类号： G03F7/70191 , G02B3/0056 , G02B27/0911 , G03F7/70058 , G03F7/70075 , G03F7/70083 , G03F7/70158
摘要： Illumination systems for microlithographic projection exposure apparatus, as well as related systems, components and methods are disclosed. In some embodiments, an illumination system includes one or more scattering structures and an optical integrator that produces a plurality of secondary light sources.

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