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101. 发明申请

US20080191061A1 TRIGGER-TYPE LIQUID SPRAYER 有权
标题翻译：触发式液体喷雾器
公开(公告)号：US20080191061A1
公开(公告)日：2008-08-14
申请号：US12026906
申请日：2008-02-06
申请人： Shinichi INABA , Takeshi Omi , Tetsuya Kobayashi , Takayuki Abe , Masayuki Nakamura , Hidesato Kizaki
发明人： Shinichi INABA , Takeshi Omi , Tetsuya Kobayashi , Takayuki Abe , Masayuki Nakamura , Hidesato Kizaki
IPC分类号： B05B1/34
CPC分类号： B05B11/3059 , B05B1/3421 , B05B11/0029 , B05B11/3011 , B05B11/3057
摘要： A trigger-type liquid sprayer of the present invention is provided with a liquid sprayer body 2 having a nozzle 21 and a trigger lever 22 and a shroud 3 covering the liquid sprayer body 2 and sprays a liquid from a spray hole 211 in the nozzle 21 by a pulling operation of the trigger lever 22. The nozzle 21 is rotatable with respect to the liquid sprayer body 2 and provided so as to open/close a flow passage for the liquid according to a rotational position of the nozzle 21 when an operation lever 24 mounted on the nozzle 21 is rotationally moved, and an abutment portion 31 for positioning the nozzle 21 at a position where the flow passage is opened through abutment of the operation lever 24 is provided at the shroud 3.
摘要翻译：本发明的触发式液体喷雾器设置有具有喷嘴21和触发杆22的液体喷雾器主体2和覆盖液体喷雾器主体2的护罩3，并且从喷嘴21中的喷射孔211喷射液体通过触发杆22的拉动操作。喷嘴21能够相对于液体喷雾器主体2旋转，并且设置成当安装在喷嘴21上的操作杆24旋转移动时，根据喷嘴21的旋转位置来打开/关闭液体的流路，并且在护罩3上设置有用于将喷嘴21定位在通过操作杆24的邻接而打开流路的位置的抵接部31。

102. 发明申请

US20080184190A1 METHOD FOR RESIZING PATTERN TO BE WRITTEN BY LITHOGRAPHY TECHNIQUE, AND CHARGED PARTICLE BEAM WRITING METHOD 有权
标题翻译：用于通过算术技术来记录图案的方法和充电的粒子束写法
公开(公告)号：US20080184190A1
公开(公告)日：2008-07-31
申请号：US11851176
申请日：2007-09-06
申请人： Jun YASHIMA , Junichi Suzuki , Takayuki Abe
发明人： Jun YASHIMA , Junichi Suzuki , Takayuki Abe
IPC分类号： G06F17/50
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J37/3026
摘要： A method for resizing a pattern to be written by using lithography technique includes calculating a first dimension correction amount of a pattern for correcting a dimension error caused by a loading effect, for each small region made by virtually dividing a writing region of a target workpiece into meshes of a predetermined size, based on an area density of the each small region, calculating a second dimension correction amount in accordance with a line width dimension of the pattern to be written in the each small region, correcting the first dimension correction amount by using the second dimension correction amount, and resizing the line width dimension of the pattern by using a corrected first dimension correction amount, and outputting a result of the resizing.
摘要翻译：通过使用光刻技术来调整要写入的图案的尺寸的方法包括：对通过将目标工件的写入区域进行实际分割而形成的每个小区域，计算用于校正由加载效应引起的尺寸误差的图案的第一维度校正量基于每个小区域的面积密度预定尺寸的网格，根据要写入每个小区域的图案的线宽度尺寸来计算第二维度校正量，通过使用来校正第一维度校正量第二维度校正量，并且通过使用校正的第一维度校正量来调整图案的线宽度尺寸，并输出调整大小的结果。

103. 发明申请

US20070114459A1 CHARGED PARTICLE BEAM WRITING METHOD AND APPARATUS AND READABLE STORAGE MEDIUM 有权
标题翻译：充电颗粒光束写入方法和装置和可读存储介质
公开(公告)号：US20070114459A1
公开(公告)日：2007-05-24
申请号：US11535725
申请日：2006-09-27
申请人： Junichi SUZUKI , Keiko Emi , Takayuki Abe , Tomohiro Iijima , Hideyuki Tsurumaki
发明人： Junichi SUZUKI , Keiko Emi , Takayuki Abe , Tomohiro Iijima , Hideyuki Tsurumaki
IPC分类号： G21K5/10
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J37/3026 , H01J2237/31769
摘要： A charged particle beam writing method includes inputting pattern data for writing a writing region, predicting a writing time for writing the pattern of the pattern data, acquiring, by using a correlation among a time required from a writing start time, the predicted writing time and a base dose of a charged particle beam, a base dose of the charged particle beam after an optional time from a writing start in the case in which the pattern are written, acquiring, by using a correlation among the time required from the writing start time, the predicted writing time and a proximity effect correction coefficient, a proximity effect correction coefficient after an optional time from the writing start in the case in which the pattern are written, calculating, by using the base dose and the proximity effect correction coefficient after the optional time, an exposure dose of the charged particle beam after an optional time from a writing start in the writing time, and writing an optional position in the writing region by using the charged particle beam corresponding to the dose.
摘要翻译：带电粒子束写入方法包括输入用于写入写入区域的图形数据，预测用于写入图案数据的图案的写入时间，通过使用从写入开始时间所需的时间，预测写入时间和带电粒子束的基本剂量，在写入图案的情况下从写入开始的任意时间之后的带电粒子束的基本剂量，通过使用写入开始时间所需的时间之间的相关性来获取，预测写入时间和接近效应校正系数，在写入图案的情况下从写入开始的可选时间之后的邻近效应校正系数，通过使用基本剂量和后面的邻近效应校正系数可选时间，在写入时间从写入开始的可选时间之后的带电粒子束的曝光剂量，以及写入可选的posi 通过使用与剂量对应的带电粒子束，在写入区域中进行。

104. 发明授权

US07081634B2 Variably shaped beam EB writing system 失效
公开(公告)号：US07081634B2
公开(公告)日：2006-07-25
申请号：US11222819
申请日：2005-09-12
申请人： Takayuki Abe
发明人： Takayuki Abe
IPC分类号： H01J37/302
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J37/3026 , H01J2237/31776
摘要： A variably shaped beam EB writing system which draws a pattern, comprises a recognition module, an adjustment module, and a drawing module. The recognition module recognizes at least one of a first length unit to specify a pattern length and a first position unit to specify a position described to a pattern data. The adjustment module adjusts at least one of a second length unit to specify a pattern length which is drawn by the variably shaped beam EB writing system and a second position unit to specify a position thereof to a value of which at least one of the first length unit and the first position unit are divided by a natural number. The drawing module draws a predetermined pattern based on at least one of the second length unit and the second position unit adjusted by the adjustment module.

105. 发明授权

US07041991B2 Variably shaped beam EB writing system 有权
公开(公告)号：US07041991B2
公开(公告)日：2006-05-09
申请号：US10891121
申请日：2004-07-15
申请人： Takayuki Abe
发明人： Takayuki Abe
IPC分类号： G02B21/00
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J37/3026 , H01J2237/31776
摘要： A variably shaped beam EB writing system which draws a pattern, comprises a recognition module, an adjustment module, and a drawing module. The recognition module recognizes at least one of a first length unit to specify a pattern length and a first position unit to specify a position described to a pattern data. The adjustment module adjusts at least one of a second length unit to specify a pattern length which is drawn by the variably shaped beam EB writing system and a second position unit to specify a position thereof to a value of which at least one of the first length unit and the first position unit are divided by a natural number. The drawing module draws a predetermined pattern based on at least one of the second length unit and the second position unit adjusted by the adjustment module.

106. 发明申请

US20050167451A1 Non-leaking non-dripping liquid jet pump 失效
标题翻译：不漏液滴喷液泵
公开(公告)号：US20050167451A1
公开(公告)日：2005-08-04
申请号：US11093224
申请日：2005-03-30
申请人： Shinji Shimada , Katsuhito Kuwahara , Takao Kishi , Takayuki Abe , Shuzo Endo , Yuji Kohara , Takamitsu Nozawa
发明人： Shinji Shimada , Katsuhito Kuwahara , Takao Kishi , Takayuki Abe , Shuzo Endo , Yuji Kohara , Takamitsu Nozawa
IPC分类号： B05B11/00 , B65D47/34 , B65D83/00 , B65D83/76 , B65D88/54 , B67D1/08 , B67D7/58 , B67D7/60 , G01F11/06
CPC分类号： B05B11/306 , B05B11/0062 , B05B11/0064 , B05B11/3001 , B05B11/3023 , B05B11/3039 , B05B11/3067 , B05B11/3077 , B05B11/3097
摘要： A liquid jetting pump of the present invention is constructed such that an intra container liquid is sucked into a cylinder 3 through a suction valve 9 by moving a vertically movable member 4 up and down, and the intra cylinder liquid is jetted out of a nozzle 29 through a discharge valve 31 from a stem 28. A plurality of ribs 10 are protruded in a peripheral direction from a lower edge part within the cylinder. Engagement recessed portions 11 are formed in inner parts of the upper surfaces of the ribs. A lower edge of a coil spring 39 for biasing the vertically movable member 4 is secured to each of the engagement recessed portions 11, thereby permitting a flow of liquid on both sides of the lower edge of the spring internally externally.
摘要翻译：本发明的液体喷射泵是通过使可垂直移动的构件4上下移动而将内部容器液体通过吸入阀9吸入气缸3的方式构成的，并且将气缸内液体从喷嘴29喷出通过来自杆28的排出阀31。多个肋10从气缸内的下边缘部沿圆周方向突出。接合凹部11形成在肋的上表面的内部。用于使可垂直运动的构件4偏置的螺旋弹簧39的下边缘固定到每个接合凹部11，从而允许在内部的外部在弹簧的下边缘两侧的液体流动。

107. 发明申请

US20050103669A1 Hermetically sealed container for large-sized precision sheet (semi-) product 审中-公开
标题翻译：用于大尺寸精密片（半））产品的密封容器
公开(公告)号：US20050103669A1
公开(公告)日：2005-05-19
申请号：US10989476
申请日：2004-11-17
申请人： Mikio Fukui , Shiro Arai , Takayuki Abe
发明人： Mikio Fukui , Shiro Arai , Takayuki Abe
IPC分类号： B65D85/86 , B65D85/00 , B65D85/48 , H01L21/673
CPC分类号： B65D85/48
摘要： A relatively light and generally resinous hermetically sealed container is provided for accommodating, supporting and transporting a precision sheet (semi-)product, such as a photomask, safely and in an airtight manner without exerting an inappropriate stress thereto, which precision sheet (semi-)product has such a large planar size that encounters an extreme difficulty in integral resin molding of a half of a container therefor. The container includes a main body and a lid member which are generally symmetrical with each other and respectively have sealing peripheries to be abutted to each other. Each of the main body and the lid member includes a plurality of resin-sheets which are disposed in a plane, abutted to each other at an intermediate joint boundary therebetween and joined with each other at the joint boundary. A reinforcing metal belt member is disposed from outside along the joint boundary and hermetically bolted to the resin sheets.
摘要翻译：提供相对较轻且通常为树脂密封的容器，用于容纳，支撑和运输诸如光掩模的精密片（半）产品，并且以不密封的方式安全地并且不施加不适当的应力，该精密片（半））产品具有如此大的平面尺寸，在其一半容器的整体树脂模制中遇到极大困难。容器包括主体和盖构件，它们彼此大致对称并且分别具有彼此邻接的密封周边。主体和盖部件中的每一个包括多个树脂片，它们设置在平面中，在它们之间的中间接合边界处彼此抵接并且在接合边界彼此接合。加强金属带构件沿着接合边界从外部设置并气密地螺栓连接到树脂片上。

108. 发明授权

US06774380B2 Variably shaped beam EB writing system 失效
标题翻译：可变形梁EB书写系统
公开(公告)号：US06774380B2
公开(公告)日：2004-08-10
申请号：US10255580
申请日：2002-09-27
申请人： Takayuki Abe
发明人： Takayuki Abe
IPC分类号： H01J37302
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J37/3026 , H01J2237/31776
摘要： A variably shaped beam EB writing system which draws a pattern, comprises a recognition module, an adjustment module, and a drawing module. The recognition module recognizes at least one of a first length unit to specify a pattern length and a first position unit to specify a position described to a pattern data. The adjustment module adjusts at least one of a second length unit to specify a pattern length which is drawn by the variably shaped beam EB writing system and a second position unit to specify a position thereof to a value of which at least one of the first length unit and the first position unit are divided by a natural number. The drawing module draws a predetermined pattern based on at least one of the second length unit and the second position unit adjusted by the adjustment module.
摘要翻译：绘制图案的可变形束EB写入系统包括识别模块，调整模块和绘图模块。识别模块识别指定图案长度的第一长度单元中的至少一个以及指定对图案数据描述的位置的第一位置单元。调整模块调整第二长度单元中的至少一个以指定由可变形束EB写入系统绘制的图案长度，以及第二位置单元，用于将其位置指定为第一长度中的至少一个单位和第一位置单位除以自然数。绘图模块基于由调整模块调整的第二长度单元和第二位置单元中的至少一个来绘制预定图案。

109. 发明授权

US06617260B2 Method of manufacturing semiconductor device prevented from peeling of wirings from insulating film 失效
公开(公告)号：US06617260B2
公开(公告)日：2003-09-09
申请号：US09968020
申请日：2001-10-02
申请人： Takayuki Abe , Yasuhide Den
发明人： Takayuki Abe , Yasuhide Den
IPC分类号： H01L2131
CPC分类号： H01L21/76864 , H01L21/3105 , H01L21/32051 , H01L21/76825 , H01L21/76828 , H01L27/10885
摘要： The present invention provides a manufacturing method of a semiconductor device which does not give rise to peeling of a metal film caused by oxygen held in a interlayer insulating film even when the wafer is subjected to a heat treatment after the metal film is formed on the interlayer insulating film. After the formation of the interlayer insulating film, oxygen held in the interlayer insulating film is removed from the interlayer insulating film, then a metal film on the interlayer insulating film.

110. 发明授权

US6047116A Method for generating exposure data for lithographic apparatus 失效
标题翻译：用于生成光刻设备的曝光数据的方法
公开(公告)号：US6047116A
公开(公告)日：2000-04-04
申请号：US40343
申请日：1998-03-18
申请人： Eiji Murakami , Hitoshi Higurashi , Shigehiro Hara , Kiyomi Koyama , Takayuki Abe
发明人： Eiji Murakami , Hitoshi Higurashi , Shigehiro Hara , Kiyomi Koyama , Takayuki Abe
IPC分类号： G03F1/20 , G03F1/68 , H01J37/302 , H01L21/027 , G06F17/50
CPC分类号： H01J37/3026 , H01J2237/31764
摘要： In a method of generating from design data the exposure data necessary for a multistage-deflection charged beam exposure device that has a main deflector and a sub-deflector and forms a pattern, before a shape larger than the size of a minimum subfield area is divided during the generation of subfield exposure data, the process of dividing the shape into shapes equal to or smaller than the size of a subfield area and restructuring the shape is performed. Moreover, after the overlapping cell arrays in the design data are changed into a cell array structure preventing the cell arrays from overlapping, the resulting cell arrays are subjected to a hierarchical shape data operation process and a formatting process, including compression, subfield division, and frame division. This makes it possible to reduce the amount of data supplied without increasing the time required to converting the design data into exposure data supplied to the charged beam exposure device.
摘要翻译：在从设计数据生成的方法中，在具有主偏转器和副偏转器并形成图案的多级偏转带电束曝光装置所需的曝光数据在大于最小子场区域的尺寸的形状之前被划分在产生子场曝光数据期间，执行将形状分割成等于或小于子场区域的尺寸并重构形状的形状的处理。此外，在将设计数据中的重叠单元阵列改变为防止单元阵列重叠的单元阵列结构之后，对所得单元阵列进行分层形状数据操作处理和格式化处理，包括压缩，子场划分和框架划分。这使得可以减少提供的数据量，而不需要将设计数据转换成提供给带电束的曝光装置的曝光数据所需的时间。

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