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    • 102. 发明授权
    • Continuous manufacturing process for organoalkoxysiloxanes
    • 有机烷氧基硅氧烷的连续制造工艺
    • US06767982B2
    • 2004-07-27
    • US09987267
    • 2001-11-14
    • Burkhard StandkeMichael Horn
    • Burkhard StandkeMichael Horn
    • C08G7706
    • C08G77/18C07F7/0872C08G77/06C09D4/00C09D183/04C08G77/04
    • A mixture of organoalkoxysiloxanes of formula I: wherein R and R″ are identical or different and are methyl, ethyl, vinyl, n-propyl, i-propyl, &ggr;-chloropropyl, n-butyl, i-butyl, n-pentyl, i-pentyl, n-hexyl, i-hexyl, n-heptyl, i-heptyl, n-octyl, i-octyl, hexadecyl, octadecyl or alkoxy, R′ represents methyl or ethyl, n and m are identical or different and each is 0 or an integer ranging from 1 to 20, on the condition that (n+m)≧2, is prepared by: reacting in a first stage the constituents of (i) an organotrichlorosilane or a mixture of organotrichlorosilanes or a mixture of at least one organotrichlorosilane and tetrachlorosilane, (ii) water and (iii) alcohol, combined in a molar ratio (i):(ii):(iii) of 1:(0.59 to 0.95):(0.5 to 100), at a temperature of 0 to 150° C., which produces hydrogen chloride as a product which is removed from the system and the crude organoalkoxysiloxane product is transferred proportionately to the reaction distillation column of a subsequent second stage after an average dwell time of 0.5 to 180 minutes; and conducting reaction and distillation in the reaction distillation column in a second stage in which volatile constituents are withdrawn from the top of the column and the organoalkoxysiloxane product is withdrawn as a bottom product, wherein the reaction-distillation column is operated at a bottom temperature of 50 to 200° C.
    • 式I的有机烷氧基硅氧烷的混合物:其中R和R“相同或不同,是甲基,乙基,乙烯基,正丙基,异丙基,γ-氯丙基,正丁基,异丁基,正戊基, 正戊基,正己基,异己基,正庚基,异庚基,正辛基,异辛基,十六烷基,十八烷基或烷氧基,R'表示甲基或乙基,n和m相同或不同, 在(n + m)> = 2的条件下,为0或1〜20的整数,通过以下步骤制备:在第一阶段中使(i)有机三氯硅烷或有机三氯硅烷的混合物的组分或 至少一种有机三氯硅烷和四氯硅烷,(ii)以1:(0.59至0.95):(0.5至100)的摩尔比(i):(ii):(iii)组合的水和(iii)醇, 温度为0至150℃,其产生作为从系统中除去的产物的氯化氢,粗有机烷氧基硅氧烷产物按比例转移到随后的第二阶段的反应蒸馏塔af 平均停留时间为0.5至180分钟; 在反应蒸馏塔中的第二阶段进行反应和蒸馏,其中挥发性成分从塔顶排出,有机烷氧基硅氧烷产物作为底部产物排出,其中反应蒸馏塔在底部温度为50℃ 至200℃