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    • 101. 发明授权
    • X-ray generator and exposure apparatus having the same
    • X射线发生器和具有其的曝光装置
    • US07352842B2
    • 2008-04-01
    • US11293284
    • 2005-12-01
    • Akira Miyake
    • Akira Miyake
    • G21K5/00
    • G03F7/7005B82Y10/00G03F7/70033
    • An X-ray generator introducing an X-ray to an illumination optical system includes plural plasma light sources, and a reflector, movably arranged among the plural light sources, for switching light sources and for reflecting the X-ray from one of the plural light sources to the illumination optical system, wherein an angle between a plane determined by an optical axis of the X-ray emitted from the reflector and a line that connects the plural light sources to the reflector, and a polarization plane on which an electric field vector oscillates is between 45° and 135°, the polarization plane maximizing a reflectance to the X-ray of the illumination optical system.
    • 将X射线引入照明光学系统的X射线发生器包括多个等离子体光源和可移动地布置在多个光源中的反射器,用于切换光源并从多个光中的一个反射X射线 来源于照明光学系统,其中由从反射器发射的X射线的光轴确定的平面与将多个光源连接到反射体的线之间的角度以及电场矢量 振荡在45°和135°之间,偏振平面使对照明光学系统的X射线的反射率最大化。
    • 102. 发明授权
    • Apparatus for evaluating EUV light source, and evaluation method using the same
    • EUV光源评估装置及其评价方法
    • US07312459B2
    • 2007-12-25
    • US11082404
    • 2005-03-17
    • Mitsuaki AmemiyaAkira Miyake
    • Mitsuaki AmemiyaAkira Miyake
    • G01J1/42G21K5/00
    • G02B17/0631B82Y10/00G02B5/22G02B17/0642G02B17/0663G21K2201/061
    • Disclosed is a measuring apparatus for measuring the position, size and/or shape of a light convergent point of an EUV light source. In one preferred form, the apparatus includes a light receiving device for receiving EUV light diverging from a light convergent point, an optical system for directing the EUV light toward the light receiving device, a light blocking member disposed in a portion of light path for the EUV light and having a plurality of openings, and a system for detecting a spatial distribution of the EUV light at the light convergent point, on the basis of reception of EUV light by the light receiving device. In another preferred from, the apparatus includes a light receiving device for receiving EUV light diverging from a light convergent point, a gas filter disposed in a portion of a light path of the EUV light and being filled with a predetermined gas, and a system for detecting a spatial distribution of the EUV light at the light convergent point, on the basis of the reception of EUV light by the light receiving device.
    • 公开了一种用于测量EUV光源的聚光点的位置,大小和/或形状的测量装置。 在一个优选形式中,该装置包括用于接收从光会聚点发散的EUV光的光接收装置,用于将EUV光引向光接收装置的光学系统,设置在光路的一部分中的遮光构件,用于 EUV光并且具有多个开口,以及用于基于光接收装置的EUV光的接收来检测在聚光点处的EUV光的空间分布的系统。 在另一个优选的实施例中,该装置包括用于接收从光会聚点发散的EUV光的光接收装置,设置在EUV光的光路部分中并被预定气体填充的气体过滤器的系统, 基于由光接收装置接收到的EUV光,在光会聚点检测EUV光的空间分布。
    • 103. 发明授权
    • Mirror unit, method of producing the same, and exposure apparatus and method using the mirror unit
    • 镜面单元,其制造方法以及使用该镜单元的曝光装置和方法
    • US07311407B2
    • 2007-12-25
    • US11113113
    • 2005-04-22
    • Takeshi YamamotoAkira Miyake
    • Takeshi YamamotoAkira Miyake
    • G02B5/08G02B7/182
    • G02B26/0825G21K1/062Y10S359/90
    • Disclosed are a mirror unit and a method of producing the same. In one preferred embodiment, the mirror unit includes a mirror with a multilayered film formed on a substrate, the multilayered film having two materials periodically laminated in layers on the substrate, and a substrate deforming device for producing deformation of a shape of the substrate of the mirror, wherein, in the multilayered film, the number of laminated layers in a predetermined region of the substrate differs from that in another region of the substrate. A mirror unit producing method according to another preferred embodiment includes forming a multilayered film on a substrate, the multilayered film having two materials periodically laminated in layers on the substrate, providing substrate deforming means in association with the substrate, the deforming means having a function for producing deformation of the shape of the substrate, and partially removing the multilayered film.
    • 公开了镜单元及其制造方法。 在一个优选实施例中,反射镜单元包括具有在基板上形成的多层膜的反射镜,该多层膜具有在基板上周期层压的两种材料,以及用于产生基板的形状变形的基板变形装置 其特征在于,在所述多层膜中,所述基板的规定区域的层叠层数与所述基板的其他区域的层叠数不同。 根据另一优选实施例的镜单元制造方法包括在基板上形成多层膜,所述多层膜具有在基板上周期层压的两种材料,提供与基板相关联的基板变形装置,变形装置具有 产生基板形状的变形,并且部分地去除多层膜。
    • 106. 发明授权
    • Transgenic animals
    • 转基因动物
    • US07094948B2
    • 2006-08-22
    • US10493943
    • 2002-11-13
    • Akira MiyakeYukihiro NakamuraJianwei NiShinobu Mochizuki
    • Akira MiyakeYukihiro NakamuraJianwei NiShinobu Mochizuki
    • A01K67/027
    • A01K67/0275A01K2217/05A01K2227/105A01K2267/03C07K14/705C12N15/8509C12N2830/008
    • There is discloses a transgenic mouse over-expressing a potassium channel BEC1, which can be used as an effective tool for screening a substance for antidementia or a substance to improve learning and memory.Also disclosed are an in vivo screening method of a substance for antidementia or a substance to improve learning and memory, which uses the learning and memory abilities of said mouse as the index, and an in vivo screening of a substance for antianxiety, which uses acceleration of anxiety as the index.In addition, there is disclosed a method for producing a pharmaceutical composition for antidementia, learning and memory improvement use or antianxiety, using a substance capable of inhibiting the learning and memory potassium channel activity as the active ingredient which can be obtained by the aforementioned screening method of the present invention.
    • 公开了一种过表达钾通道BEC1的转基因小鼠,其可以用作筛选用于抗痴呆的物质的有效工具或改善学习和记忆的物质。 还公开了用于抗痴呆的物质的体内筛选方法或改善学习和记忆的物质,其使用所述小鼠的学习和记忆能力作为指标,并且对使用加速度的抗焦虑物质进行体内筛选 的焦虑作为指标。 此外,公开了使用能够抑制学习和记忆钾通道活性的物质作为活性成分的能够通过上述筛选方法获得的抗痴呆,学习和记忆改善用途或抗焦虑药物组合物的制备方法 的本发明。
    • 109. 发明授权
    • Optical measuring device
    • 光学测量装置
    • US07003075B2
    • 2006-02-21
    • US10618112
    • 2003-07-11
    • Akira MiyakeFumitaro Masaki
    • Akira MiyakeFumitaro Masaki
    • G01T1/36G01N23/20
    • G01J3/12G01J1/4257G01N23/20G01N2223/052G01N2223/611G21K1/06
    • The present invention provides a measuring device by which, even if a radiation intensity from a light source, a beam size or a beam intensity distribution of the light source changes, an optical characteristic of an optical element to be measured can be measured very precisely. In a measuring device according to the present invention, to this end, light from a light source is diffracted by a diffracting grating to thereby resolve the same into plural light beams, and by using different light beams, the object to be measured is measured and the intensity of incident light from the light source is measured. With this structure, even if the light from the light source changes, the intensity of the light from the light source is specified concurrently, and therefore, the optical characteristic of the object to be measured can be measured very accurately.
    • 本发明提供一种测量装置,通过该测量装置,即使来自光源的辐射强度,光束尺寸或光源的光束强度分布改变,也可以非常精确地测量待测量的光学元件的光学特性。 在根据本发明的测量装置中,为此,来自光源的光被衍射光栅衍射,从而将其分解为多个光束,并且通过使用不同的光束,测量被测量物体, 测量来自光源的入射光的强度。 利用这种结构,即使来自光源的光改变,来自光源的光的强度同时被指定,因此可以非常精确地测量被测量物体的光学特性。
    • 110. 发明申请
    • Mirror unit, method of producing the same, and exposure apparatus and method using the mirror unit
    • 镜面单元,其制造方法以及使用该镜单元的曝光装置和方法
    • US20050237618A1
    • 2005-10-27
    • US11113113
    • 2005-04-22
    • Takeshi YamamotoAkira Miyake
    • Takeshi YamamotoAkira Miyake
    • G21K1/06G02B5/08G02B26/08G03F7/20G21K5/00G21K5/02H01L21/027
    • G02B26/0825G21K1/062Y10S359/90
    • Disclosed is a mirror unit and a method of producing the same. In one preferred form of the present invention, the mirror unit includes (i) a mirror with a multilayered film formed on a substrate, the multilayered film having two materials periodically laminated in layers on the substrate, and (ii) a substrate deforming device for producing deformation of a shape of the substrate of the mirror, wherein, in the multilayered film, the number of laminated layers in a predetermined region of the substrate differs from that in another region of the substrate. A mirror unit producing method according to another preferred from of the present invention includes (a) forming a multilayered film on a substrate, the multilayered film having two materials periodically laminated in layers on the substrate, (b) providing substrate deforming means in association with the substrate, the deforming means having a function for producing deformation of the shape of the substrate, and (c) partially removing the multilayered film.
    • 公开了一种镜单元及其制造方法。 在本发明的一个优选形式中,反射镜单元包括:(i)具有形成在基底上的多层膜的反射镜,所述多层膜具有在基板上周期层压的两种材料,以及(ii)基板变形装置, 产生反射镜的基板的形状的变形,其中,在多层膜中,基板的预定区域中的层叠层的数量与基板的另一区域中的层叠层数不同。 根据本发明另一优选的镜单元制造方法包括(a)在基板上形成多层膜,所述多层膜具有在基板上周期性层压的两种材料,(b)提供基板变形装置,其与 基板,变形装置具有产生基板形状变​​形的功能,(c)部分地移除多层膜。