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101. 发明申请

US20060152703A1 Method of detecting relative position of exposure mask and object to be exposed, alignment method, and exposure method using the same 失效
标题翻译：检测曝光掩模和待曝光物体的相对位置的方法，对准方法和使用其的曝光方法
公开(公告)号：US20060152703A1
公开(公告)日：2006-07-13
申请号：US10529908
申请日：2004-05-12
申请人： Takako Yamaguchi , Ryo Kuroda
发明人： Takako Yamaguchi , Ryo Kuroda
IPC分类号： G03F1/00 , G03B27/32
CPC分类号： G03F7/7035 , G03F1/22 , G03F1/42 , G03F7/2039 , G03F9/7038
摘要： An alignment method for an exposure mask and an object to be exposed, wherein exposure is carried out while the exposure mask having a light blocking film formed at a membrane portion thereof is closely contacted to the object to be exposed and light from a light source is projected to the object to be exposed, through the exposure mask, and wherein alignment of the exposure mask and the object to be exposed is carried out prior to the exposure, the method comprising the steps of preparing an exposure mask having a light blocking film provided on a base material constituting the membrane portion and having a structure for performing position detection, flexing the membrane portion and detecting, by use of the structure, a relative position of the exposure mask and the object to be exposed, in a state in which the exposure mask is contacted to the object to be exposed, and aligning the exposure mask and the object to be exposed, with each other, on the basis of a result of the position detection.
摘要翻译：一种用于曝光掩模和待曝光物体的对准方法，其中在其膜部分形成有遮光膜的曝光掩模与待曝光的物体紧密接触并且来自光源的光是通过曝光掩模投影到待曝光的物体上，并且其中曝光前曝光掩模和待曝光对象的对准在曝光之前进行，该方法包括以下步骤：制备具有遮光膜的曝光掩模在构成膜部的基材上，具有进行位置检测的结构，弯曲膜部，并且通过使用该结构，在曝光掩模与被曝光物的相对位置之间，在曝光掩模与要曝光的物体接触，并且基于位置的结果将曝光掩模和待曝光的对象彼此对准检测。

102. 发明授权

US07001696B2 Near-field light exposure mask with avoidance of overlap of near-field light, method for manufacturing the same, exposure apparatus and method using near-field light exposure mask, and method for manufacturing device 失效
标题翻译：近场光曝光掩模，避免近场光的重叠，其制造方法，曝光装置和使用近场曝光掩模的方法，以及制造装置的方法
公开(公告)号：US07001696B2
公开(公告)日：2006-02-21
申请号：US10449505
申请日：2003-06-02
申请人： Yasuhisa Inao , Ryo Kuroda
发明人： Yasuhisa Inao , Ryo Kuroda
IPC分类号： G01F9/00
CPC分类号： G03F7/7035 , B82Y10/00 , G03F1/50 , G03F7/70325
摘要： A near-field light exposure mask provided with a plurality of apertures each having a width smaller than the wavelength of light used for exposure. In the mask described above, among the plurality of apertures, apertures adjacent to each other are disposed at a necessary distance so that near-field light effused from one of the apertures adjacent to each other does not overlap that generated from the other aperture.
摘要翻译：一种近场曝光掩模，其具有多个孔，每个孔的宽度小于用于曝光的光的波长。在上述掩模中，在多个孔之间，彼此相邻的孔设置在必要的距离处，使得从彼此相邻的一个孔中流出的近场光不与另一个孔产生的重叠。

103. 发明申请

US20050079437A1 Near-field exposure photoresist and fine pattern forming method using the same 失效
标题翻译：近场曝光光刻胶和使用其的精细图案形成方法
公开(公告)号：US20050079437A1
公开(公告)日：2005-04-14
申请号：US10921184
申请日：2004-08-19
申请人： Takako Yamaguchi , Ryo Kuroda
发明人： Takako Yamaguchi , Ryo Kuroda
IPC分类号： G03F7/023 , G03C5/18 , G03F7/004 , G03F7/022 , G03F7/16 , G03F7/20 , G03F7/38 , G03F7/40 , H01L21/027
CPC分类号： G03F7/0226 , G03F7/0236 , G03F7/0752 , G03F7/168 , G03F7/2014
摘要： A near-field photoresist for formation of a fine pattern with by near-field exposure includes an alkali-soluble novalac resin, a diazyde-type photosensitizer which is photoreactive by near-field exposure, a photoacid generator which generates acid by the near-field exposure, and a solvent.
摘要翻译：用于通过近场曝光形成精细图案的近场光致抗蚀剂包括碱溶性诺瓦克树脂，通过近场曝光光反应的二叠氮型光敏剂，通过近场产生酸的光酸产生剂暴露和溶剂。

104. 发明授权

US06720115B2 Exposure method and exposure apparatus using near-field light and exposure mask 失效
标题翻译：使用近场光和曝光掩模的曝光方法和曝光装置
公开(公告)号：US06720115B2
公开(公告)日：2004-04-13
申请号：US09795497
申请日：2001-03-01
申请人： Yasuhisa Inao , Ryo Kuroda , Takako Yamaguchi
发明人： Yasuhisa Inao , Ryo Kuroda , Takako Yamaguchi
IPC分类号： G03F900
CPC分类号： G03F7/7035 , B82Y10/00 , G03F1/36 , G03F1/50 , G03F7/70325 , G03F7/70558 , G03F9/703
摘要： A photolithography method using near-field light includes a step of controlling the position of an exposure mask and an object to be processed so as to make the object to be located in a region where near-field light is present, and a step of exposing the object to near-field light while controlling the intensity of such light as a function of the aperture density of the exposure mask. The intensity of near-field light is controlled by modifying the aperture width or modifying the transmissivity of the exposure mask depending on the aperture density.
摘要翻译：使用近场光的光刻方法包括控制曝光掩模和待处理物体的位置以使物体位于存在近场光的区域的步骤，以及曝光步骤该对象成为近场光，同时根据曝光掩模的孔径密度控制这种光的强度。通过根据孔径密度修改孔径宽度或修改曝光掩模的透射率来控制近场光的强度。

105. 发明授权

US06333497B2 Probe with tip having micro aperture for detecting or irradiating light, near-field optical microscope, recording/reproduction apparatus, and exposure apparatus using the probe, and method of manufacturing the probe 有权
公开(公告)号：US06333497B2
公开(公告)日：2001-12-25
申请号：US09765374
申请日：2001-01-22
申请人： Yasuhiro Shimada , Ryo Kuroda
发明人： Yasuhiro Shimada , Ryo Kuroda
IPC分类号： G02B2740
CPC分类号： G01Q60/22 , G01Q80/00 , G03F7/70375 , G03F7/70616 , G11B7/122 , G11B7/22 , Y10S977/862 , Y10S977/875
摘要： A probe for detecting or irradiating light includes a displaceable support member on a substrate, a tip formed on the support member, and a bonding layer for bonding the tip onto the support member. The tip has a micro aperture. When a light-shielding layer is further formed on a surface of the tip, the micro aperture is formed on the light-shielding layer. The tip consists of a light transmission material.

106. 发明授权

US06252238B1 Micro-processing method using a probe 失效
标题翻译：使用探针的微处理方法
公开(公告)号：US06252238B1
公开(公告)日：2001-06-26
申请号：US09149277
申请日：1998-09-09
申请人： Koji Yano , Ryo Kuroda
发明人： Koji Yano , Ryo Kuroda
IPC分类号： A61N500
CPC分类号： B82B3/00 , G01Q80/00 , G03F7/70383 , H01J2237/31738 , Y10S977/855 , Y10S977/868 , Y10S977/951 , Y10S977/954
摘要： An electroconductive micro-region surrounded by a non-electroconductive region is formed on a non-electroconductive substrate surface. Such an electroconductive micro-region is formed by forming a non-electroconductive thin film on a non-electroconductive substrate surface, then approximating a probe having a micro-aperture for irradiation of light to the spot to be processed of the non-electroconductive thin film, and irradiating the non-electroconductive thin film with light through the micro-aperture of the probe to thereby increasing the electroconductivity of the non-electroconductive thin film at the spot. The electroconductive micro-region can be formed so that it confines electrons to exhibit quantum effects.
摘要翻译：由非导电区域包围的导电微区域形成在非导电基板表面上。通过在非导电性基体表面上形成非导电性薄膜来形成这样的导电性微区域，然后将具有用于照射光的微孔的探针近似为非导电性薄膜的被处理点，并且通过探针的微孔照射非导电薄膜，从而在该点增加非导电薄膜的导电性。可以形成导电微区，使得它限制电子以显示量子效应。

107. 发明授权

US06201226B1 Probe with tip having micro aperture for detecting or irradiating light, near-field optical microscope, recording/reproduction apparatus, and exposure apparatus using the probe, and method of manufacturing the probe 失效
标题翻译：具有用于检测或照射光的微孔的尖端的探针，近场光学显微镜，记录/再现装置和使用该探针的曝光装置的探头及其制造方法
公开(公告)号：US06201226B1
公开(公告)日：2001-03-13
申请号：US09025036
申请日：1998-02-18
申请人： Yasuhiro Shimada , Ryo Kuroda
发明人： Yasuhiro Shimada , Ryo Kuroda
IPC分类号： G02B704
CPC分类号： G01Q60/22 , G01Q80/00 , G03F7/70375 , G03F7/70616 , G11B7/122 , G11B7/22 , Y10S977/862 , Y10S977/875
摘要： A probe for detecting or irradiating light includes a displaceable support member on a substrate, a tip formed on the support member, and a bonding layer for bonding the tip onto the support member. The tip has a micro aperture. When a light-shielding layer is further formed on a surface of the tip, the micro aperture is formed on the light-shielding layer. The tip consists of a light transmission material.
摘要翻译：用于检测或照射光的探针包括在基板上的位移支撑构件，形成在支撑构件上的尖端，以及用于将尖端粘合到支撑构件上的接合层。尖端具有微孔。当在尖端的表面上进一步形成遮光层时，微孔形成在遮光层上。尖端由透光材料组成。

108. 发明授权

US06187482B1 Mask for evanescent light exposure, object to be exposed and apparatus using same 有权
标题翻译：掩膜适用于ev逝的光线曝光，被曝光的物体和使用相同的设备
公开(公告)号：US06187482B1
公开(公告)日：2001-02-13
申请号：US09274110
申请日：1999-03-23
申请人： Ryo Kuroda , Junji Ohyama
发明人： Ryo Kuroda , Junji Ohyama
IPC分类号： G03F900
CPC分类号： G03F7/7035 , B82Y10/00 , G03F1/50 , G03F7/2014 , G03F7/70325
摘要： A mask is used in an evanescent light exposure apparatus in which the mask, with a front side provided with minute aperture patterns, is disposed opposite to an object to be exposed. The mask is irradiated with light from its back side, and the object is exposed to the minute aperture patterns, whereby the patterns are transferred thereto, by evanescent light that emerges from the minute aperture patterns. The outermost surface on the front side of the mask has an adsorption preventor.
摘要翻译：在其中具有微小孔径图案的正面设置的掩模与被曝光物体相对设置的渐逝曝光装置中使用掩模。该掩模被来自其背面的光照射，并且物体暴露于微小孔径图案，由此通过从微小孔径图案中出现的ev逝光将图案转印到其上。掩模前侧的最外表面具有吸附防止剂。

109. 发明授权

US6163519A Scanning near-field optical microscope using the probe and recording and/or reproducing apparatus using the probe 失效
标题翻译：使用探头和使用探针的记录和/或再现装置扫描近场光学显微镜
公开(公告)号：US6163519A
公开(公告)日：2000-12-19
申请号：US518104
申请日：2000-03-03
申请人： Ryo Kuroda , Yasuhiro Shimada
发明人： Ryo Kuroda , Yasuhiro Shimada
IPC分类号： G01B11/30 , G01N37/00 , G01Q10/06 , G01Q30/02 , G01Q60/02 , G01Q60/16 , G01Q60/18 , G01Q60/22 , G01Q60/38 , G01Q60/56 , G01Q70/06 , G01Q80/00 , G02B6/122 , G11B7/005 , G11B7/12 , G11B7/14 , G11B7/22 , G11B9/00 , G11B9/14 , G11B11/00 , G11B11/03 , G11B7/00
CPC分类号： G01Q60/22 , G01Q70/06 , G01Q80/00 , G02B6/122 , G11B7/005 , G11B7/12 , G11B7/14 , G11B7/22 , G11B9/14 , G11B9/1409 , G11B11/03 , Y10S977/862
摘要： In a method of manufacturing a probe with a minute aperture, the probe is coated with conductive material, a tip of the probe is brought into contact with a conductive substrate and a voltage is applied between the probe and the substrate to remove the coating material at the tip of the probe and form the minute aperture at the tip of the probe. The thus-fabricated probe can be used in a scanning near-field optical microscope for observing an object on the basis of a change in intensity of near-field light and an information recording and/or reproducing apparatus for reproducing information recorded in a record medium by using near-field light.
摘要翻译：在制造具有微小孔径的探针的方法中，探针用导电材料涂覆，探针的尖端与导电基底接触，并且在探针和基底之间施加电压以除去涂层材料探针的尖端，并在探针的尖端形成微小的孔。这样制造的探针可以用于扫描近场光学显微镜，用于基于近场光强度的变化来观察物体，以及用于再现记录在记录介质中的信息的信息记录和/或再现装置通过使用近场光。

110. 发明授权

US5717680A Information processing apparatus with mechanism for adjusting interval between substrate for supporting a plurality of probes and recording medium 失效
标题翻译：具有用于调整用于支撑多个探针的基板和记录介质之间的间隔的机构的信息处理设备
公开(公告)号：US5717680A
公开(公告)日：1998-02-10
申请号：US825064
申请日：1997-03-27
申请人： Akihiko Yamano , Ryo Kuroda
发明人： Akihiko Yamano , Ryo Kuroda
IPC分类号： G11B5/455 , G11B9/00 , G11B9/14 , G11B17/32 , G11B17/34
CPC分类号： B82Y10/00 , G11B17/32 , G11B17/34 , G11B9/1436 , Y10S977/851 , Y10S977/861 , Y10S977/866 , Y10S977/874 , Y10S977/881
摘要： An information processing apparatus for recording and/or reproducing information on and/or from a recording medium using a plurality of probes includes a plurality of probes and a substrate for supporting the plurality of probes. A first electrode is provided on the substrate and a second substrate is provided on the recording medium. An electrostatic capacitance between the first and second electrodes is detected so that an interval between the substrate and the recording medium is adjusted on the basis of the detection result. One of the first and second electrodes has a plurality of electrodes end faces with different heights.
摘要翻译：使用多个探针在信息记录介质上记录和/或再现信息的信息处理装置包括多个探针和用于支撑多个探针的基板。第一电极设置在基板上，第二基板设置在记录介质上。检测第一和第二电极之间的静电电容，使得基于检测结果调整基板和记录介质之间的间隔。第一和第二电极之一具有多个不同高度的电极端面。

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